Double-sided special-shaped heat insulation pattern disc for stage lamp

Abstract

The invention discloses a two-sided opposite-polarity heat insulation pattern disc for a stage lamp. The two-sided opposite-polarity heat insulation pattern disc comprises a light-transmitting substrate; the black film is arranged on the side, close to a stage lamp light source, of the light-transmitting substrate, and the black film is in a hollow shape; the infrared high-reflection film is arranged on the side, close to the stage lamp light source, of the black film and used for reflecting the infrared band of the stage lamp light source; and the special antireflection film has a first transmittance for light with the wavelength of less than 550nm and a second transmittance for light with the wavelength of more than 550nm, and the first transmittance is greater than the second transmittance. An infrared high-reflective film is designed to reflect an infrared band, so that the infrared band is prevented from irradiating on the black film, and the problem that the color temperature of the black film deviates under the influence of heat is prevented; the visible light wave band and the near-infrared wave band irradiate on the black film and irradiate on the special antireflection film after passing through the hollow shape, so that the wave band influencing the color temperature area is adjusted, the transmittance of the wave band above 550 nm is reduced, the effect of improving the overall color temperature is achieved, and the effect of the stage lamp is guaranteed.

Description

Technical Field

[0001] The present application relates to the technical field of stage lighting lamps, and in particular to a double-sided anisotropic heat-insulating pattern plate for stage lamps. Background Art

[0002] like Figure 1 As shown, stage lighting lamps are often required to produce light patterns of different shapes to meet different stage effects. Usually, a pattern plate is installed at the front end of the stage lamp. The required shape part on the pattern plate is hollowed out to allow light to pass through, and the rest is opaque.

[0003] The pattern plate is composed of glass material, shading film (also known as black film) and total reflection film. After the light source is irradiated onto the pattern plate, most of the light beam is returned to the light source by the reflection film on the pattern plate. After mixing with the original light source, the blue light in the light beam is reduced and the red light is increased, resulting in the light beam of the light source presenting a low color temperature effect after passing through the pattern plate.

[0004] Since the stage lights themselves have high power, strong light, and high heat radiation, as the stage lights are used, the black film will exhibit a low color temperature due to the large amount of heat radiated by the stage lights to the black film. Summary of the invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention proposes a pattern plate that ensures the color temperature of the light emitted by a stage light, and the technical solution adopted includes:

[0006] A double-sided anisotropic heat-insulating pattern plate for stage lighting, comprising:

[0007] Light-transmitting substrate;

[0008] A black film is arranged on a side of the light-transmitting substrate close to the light source of the stage light;

[0009] An infrared high-reflection film is arranged on the side of the black film close to the stage light source, and is used to reflect the infrared band of the stage light source; the black film and the infrared high-reflection film are provided with corresponding hollow shapes;

[0010] A special antireflection film has a first transmittance for light with a wavelength below 550nm and a second transmittance for light with a wavelength above 550nm, and the first transmittance is greater than the second transmittance.

[0011] A technical solution adopted by an embodiment of the present invention to solve the technical problem is: the first transmittance is not less than 99%, and the second transmittance is 75-85%.

[0012] An embodiment of the present invention adopts a technical solution to solve its technical problem: the material of the light-transmitting substrate can be white glass or quartz. Considering that quartz has good high temperature resistance, quartz is preferred, and the material has a wider transmission band.

[0013] A technical solution adopted by an embodiment of the present invention to solve its technical problem is: the infrared high-reflective film includes a first high-refractive index film layer and a first low-refractive index film layer arranged in sequence on the black film, and the number of layers of the first high-refractive index film layer is not less than eleven layers, and the number of layers of the first low-refractive index film layer is not less than ten layers.

[0014] A technical solution adopted by an embodiment of the present invention to solve its technical problem is: the special anti-reflection film includes a second high refractive index film layer and a second low refractive index film layer arranged in sequence on the transparent substrate, the number of layers of the second low refractive index film layer is n layers, and the number of layers of the second high refractive index film layer is n+1 layers, where n≥1.

[0015] A technical solution adopted by an embodiment of the present invention to solve the technical problem is: the material of the high refractive index film layer is titanium dioxide, and the material of the low refractive index film layer is silicon dioxide.

[0016] The technical solution adopted by an embodiment of the present invention to solve the technical problem is: the thickness of the first high refractive index film layer 1 is: 20nm-100nm;

[0017] The thickness of the first low refractive index film layer 1 is 20nm-100nm;

[0018] The thickness of the first high refractive index film layer 2 is 80nm-180nm;

[0019] The thickness of the first low refractive index film layer 2 is: 200nm-300nm;

[0020] The thickness of the first high refractive index film layer 3 is 80nm-180nm;

[0021] The thickness of the first low refractive index film layer 3 is 200nm-300nm;

[0022] The thickness of the first high refractive index film layer 4 is 80nm-180nm;

[0023] The thickness of the first low refractive index film layer 4 is: 200nm-300nm;

[0024] The thickness of the first high refractive index film layer 5 is 80nm-180nm;

[0025] The thickness of the first low refractive index film layer 5 is: 200nm-300nm;

[0026] The thickness of the first high refractive index film layer 6 is 80nm-180nm;

[0027] The film thickness of the first low refractive index film layer 6 is: 200nm-300nm;

[0028] The thickness of the first high refractive index film layer 7 is: 80nm-200nm;

[0029] The thickness of the first low refractive index film layer 7 is: 200nm-300nm;

[0030] The film thickness of the first high refractive index film layer 8 is: 80nm-180nm;

[0031] The film thickness of the first low refractive index film layer 8 is: 200nm-300nm;

[0032] The thickness of the first high refractive index film layer nine is 80nm-180nm;

[0033] The thickness of the first low refractive index film layer nine is: 200nm-300nm;

[0034] The thickness of the first high refractive index film layer 10 is 80nm-180nm;

[0035] The thickness of the first low refractive index film layer 10 is 200nm-300nm;

[0036] The thickness of the first high refractive index film layer eleven is 80nm-180nm.

[0037] The technical solution adopted by an embodiment of the present invention to solve the technical problem is: the film thickness d1 of the second high refractive index film layer 1 is: 0nm<d1≤50nm;

[0038] The film thickness d2 of the second low refractive index film layer 1 is: 0nm<d2≤50nm;

[0039] The film thickness d3 of the second high refractive index film layer 2 is: 20nm≤d3≤80nm;

[0040] The film thickness d4 of the second low refractive index film layer 2 is: 0nm<d4≤50nm;

[0041] The film thickness d5 of the second high refractive index film layer 3 is: 20nm≤d5≤80nm;

[0042] The film thickness d6 of the second low refractive index film layer 3 is: 0nm<d6≤50nm;

[0043] The film thickness d7 of the second high refractive index film layer 4 is: 0nm<d7≤50nm;

[0044] The film thickness d8 of the second low refractive index film layer 4 is: 20nm≤d8≤100nm;

[0045] The film thickness d9 of the second high refractive index film layer 5 is: 80nm≤d9≤180nm;

[0046] The film thickness d10 of the second low refractive index film layer 5 is: 20nm≤d10≤100nm;

[0047] The film thickness d11 of the second high refractive index film layer 6 is: 0nm<d11≤20nm.

[0048] The technical solution adopted by an embodiment of the present invention to solve the technical problem is: the film material of the black film is an oxide of a variable valence metal, and the refractive index of the black film in the visible light to near infrared band is 2.3-2.6.

[0049] A technical solution adopted by an embodiment of the present invention to solve its technical problem is: the thickness is greater than 200nm.

[0050] Beneficial effects of the present invention:

[0051] The heat energy of the light source is mainly concentrated in the infrared band, so the infrared high-reflection film is designed to reflect the infrared band of 1100-1500nm; the light emitted by the stage light source irradiates the infrared high-reflection film 30, and the infrared high-reflection film reflects the infrared band in the light back to the light source, so that the remaining visible light band and near-infrared band are irradiated on the black film; because the infrared band that generates heat is reflected, the infrared band is prevented from irradiating on the black film, thereby preventing the black film from having a color temperature shift under the influence of heat;

[0052] The visible light band and near-infrared band passing through the infrared high-reflective film are irradiated on the black film and pass through the hollow shape, and then pass through the translucent substrate and irradiate on the special anti-reflection film. Since the special anti-reflection film has a first transmittance for light with a wavelength below 550nm and a second transmittance for light with a wavelength above 550nm, the first transmittance is greater than the second transmittance, so the band affecting the color temperature area is adjusted, and the transmittance of the band above 550nm is lowered, thereby achieving the effect of improving the overall color temperature and ensuring the effect of the stage light. BRIEF DESCRIPTION OF THE DRAWINGS

[0053] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0054] Figure 1 This is a schematic diagram of the light effect of stage lighting;

[0055] Figure 2 This is a schematic diagram of the structure of a double-sided anisotropic heat-insulating pattern plate for stage lighting;

[0056] Figure 3 is the reflection curve of the infrared anti-reflection film in this embodiment to the infrared band;

[0057] Figure 4 This is the light transmittance curve of the special anti-reflection film described in this embodiment. DETAILED DESCRIPTION

[0058] This section will describe in detail the specific embodiments of the present invention. The preferred embodiments of the present invention are shown in the accompanying drawings. The purpose of the accompanying drawings is to supplement the description of the text part of the specification with graphics, so that people can intuitively and vividly understand each technical feature and the overall technical solution of the present invention, but it cannot be understood as a limitation on the scope of protection of the present invention.

[0059] In the description of the present invention, the meaning of "above", "below", "exceed", etc. is not inclusive of the number itself, and the meaning of "above", "below", "within", etc. is inclusive of the number itself. If there is a description of "first" or "second", it is only used to distinguish the technical features, and cannot be understood as indicating or implying the relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0060] In the description of the present invention, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., and orientations or positional relationships indicated are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0061] In the present invention, unless otherwise clearly defined, the words "set", "install", "connect" and the like should be understood in a broad sense, for example, they can be directly connected or indirectly connected through an intermediate medium; they can be fixedly connected or detachably connected or integrally formed; they can be mechanically connected; they can be the internal connection of two elements or the interaction relationship between two elements. Those skilled in the art can reasonably determine the specific meanings of the above words in the present invention in combination with the specific content of the technical solution.

[0062] Reference Figure 2 The figure shows a schematic diagram of the structure of the double-sided anisotropic heat-insulating pattern plate for stage lights according to the present embodiment. The double-sided anisotropic heat-insulating pattern plate for stage lights comprises:

[0063] A light-transmitting substrate 10;

[0064] The black film 20 is arranged on a side of the light-transmitting substrate 10 close to the stage light source;

[0065] The infrared high-reflection film 30 is arranged on the side of the black film 20 close to the stage light source, and is used to reflect the infrared band of the stage light source. The black film 20 and the infrared high-reflection film 30 are provided with corresponding hollow shapes;

[0066] The special antireflection film 40 has a first transmittance for light with a wavelength of less than 550 nm and a second transmittance for light with a wavelength of more than 550 nm, and the first transmittance is greater than the second transmittance.

[0067] The heat energy of the light source is mainly concentrated in the infrared band, so the infrared high-reflection film 30 is designed to reflect the infrared band 1100-1500nm; the light emitted by the stage light source irradiates the infrared high-reflection film 30, and the infrared high-reflection film 30 reflects the infrared band in the light back to the light source, so that the remaining visible light band and near-infrared band are irradiated on the black film 20; because the infrared band that generates heat is reflected, the infrared band is prevented from irradiating the black film 20, thereby preventing the black film 20 from having a color temperature shift under the influence of heat;

[0068] The visible light band and near infrared band passing through the infrared high-reflective film 30 are irradiated on the black film 20 and pass through the hollow shape, and then pass through the transparent substrate 10 and irradiate on the special anti-reflection film 40. Since the special anti-reflection film 40 has a first transmittance for light with a wavelength below 550nm and a second transmittance for light with a wavelength above 550nm, the first transmittance is greater than the second transmittance, so the band affecting the color temperature area is adjusted, and the transmittance of the band above 550nm is lowered, so as to achieve the effect of improving the overall color temperature and ensure the effect of the stage light;

[0069] The present application sets film layers with different characteristics on both sides of the light-transmitting substrate 10. One side is used for coating black film and infrared high-reflection film, which is then hollowed out after coating. The other side is set with a special anti-reflection film 40 to adjust the color temperature for easy production.

[0070] In the present application, the black film 20 is a matte film. The film material of the black film 20 is an oxide of a variable-valence metal. The variable-valence metal can be metallic nickel. The refractive index of the black film 20 in the visible to near-infrared band is 2.3-2.6, and the thickness is above 200nm, maintaining a relatively high matte performance.

[0071] The infrared high-reflective film 30 is used to reflect the infrared band spectrum that generates heat back to avoid long-term high temperature affecting the performance of the black film 20. The infrared high-reflective film 30 includes a high-refractive index film layer and a low-refractive index film layer that are alternately plated. The high-refractive index film layer material is TiO2, and the low-refractive index film layer material is SiO2; wherein,

[0072] The thickness of the first high refractive index film layer 1 is 20nm-100nm;

[0073] The thickness of the first low refractive index film layer 1 is 20nm-100nm;

[0074] The thickness of the first high refractive index film layer 2 is 80nm-180nm;

[0075] The thickness of the first low refractive index film layer 2 is: 200nm-300nm;

[0076] The thickness of the first high refractive index film layer 3 is 80nm-180nm;

[0077] The thickness of the first low refractive index film layer 3 is 200nm-300nm;

[0078] The thickness of the first high refractive index film layer 4 is 80nm-180nm;

[0079] The thickness of the first low refractive index film layer 4 is: 200nm-300nm;

[0080] The thickness of the first high refractive index film layer 5 is 80nm-180nm;

[0081] The thickness of the first low refractive index film layer 5 is: 200nm-300nm;

[0082] The thickness of the first high refractive index film layer 6 is 80nm-180nm;

[0083] The film thickness of the first low refractive index film layer 6 is: 200nm-300nm;

[0084] The thickness of the first high refractive index film layer 7 is: 80nm-200nm;

[0085] The thickness of the first low refractive index film layer 7 is: 200nm-300nm;

[0086] The film thickness of the first high refractive index film layer 8 is: 80nm-180nm;

[0087] The film thickness of the first low refractive index film layer 8 is: 200nm-300nm;

[0088] The thickness of the first high refractive index film layer nine is 80nm-180nm;

[0089] The thickness of the first low refractive index film layer nine is: 200nm-300nm;

[0090] The thickness of the first high refractive index film layer 10 is 80nm-180nm;

[0091] The thickness of the first low refractive index film layer 10 is 200nm-300nm;

[0092] The thickness of the first high refractive index film layer eleven is 80nm-180nm.

[0093] The special anti-reflection film 40 is designed with a high transmittance of 99% before 550nm, and is reduced to about 80% after 550nm to reduce the transmittance of the band that affects the color temperature, thereby achieving the effect of improving the overall color temperature. The special anti-reflection film 40 includes alternating high-refractive index film layers and low-refractive index film layers, the high-refractive index film layer material is TiO2, and the low-refractive index film layer material is SiO2; the total number of coating layers is an odd number, and the middle layer can be increased or decreased according to the color temperature to be adjusted. In this embodiment,

[0094] The film thickness d1 of the second high refractive index film layer 1 is: 0nm<d1≤50nm;

[0095] The film thickness d2 of the second low refractive index film layer 1 is: 0nm<d2≤50nm;

[0096] The film thickness d3 of the second high refractive index film layer 2 is: 20nm≤d3≤80nm;

[0097] The film thickness d4 of the second low refractive index film layer 2 is: 0nm<d4≤50nm;

[0098] The film thickness d5 of the second high refractive index film layer 3 is: 20nm≤d5≤80nm;

[0099] The film thickness d6 of the second low refractive index film layer 3 is: 0nm<d6≤50nm;

[0100] The film thickness d7 of the second high refractive index film layer 4 is: 0nm<d7≤50nm;

[0101] The film thickness d8 of the second low refractive index film layer 4 is: 20nm≤d8≤100nm;

[0102] The film thickness d9 of the second high refractive index film layer 5 is: 80nm≤d9≤180nm;

[0103] The film thickness d10 of the second low refractive index film layer 5 is: 20nm≤d10≤100nm;

[0104] The film thickness d11 of the second high refractive index film layer 6 is: 0nm<d11≤20nm.

[0105] Based on the above content, a specific embodiment of the present application is proposed. In this embodiment:

[0106] The film material of the black film 20 is nickel oxide, and its refractive index is 2.3-2.6; the film thickness is 200nm;

[0107] The film structure of the infrared high reflection film 30 is shown in Table 1. The reflectivity test of the infrared high reflection film 30 in this embodiment is as follows: Figure 3 As shown, according to Figure 3 It can be seen from the shown contents that the infrared high-reflective film 30 described in this embodiment has a relatively high reflectivity in the infrared band.

[0108] Table 1

[0109]

[0110]

[0111] The film structure of the special antireflection film 40 is shown in Table 2. The transmittance test of the special antireflection film 40 in this embodiment is as follows: Figure 4 As shown, according to Figure 4 As can be seen from the contents shown, the transmittance of the special antireflection film 40 in the wavelength band below 550 nm is higher than the transmittance in the wavelength band below 550 nm.

[0112] Table 2

[0113] Serial number name Film material Thickness(nm) 1 The second high refractive index film layer 1 <![CDATA[TiO2]]> 27.7 2 The second low refractive index film layer 1 <![CDATA[SiO2]]> 21.01 3 The second high refractive index film layer 2 <![CDATA[TiO2]]> 40.3 4 The second low refractive index film layer <![CDATA[SiO2]]> 26.99 5 The second high refractive index film layer three <![CDATA[TiO2]]> 61.6 6 The second low refractive index film layer three <![CDATA[SiO2]]> 28.52 7 The second high refractive index film layer 4 <![CDATA[TiO2]]> 13.5 8 The second low refractive index film layer 4 <![CDATA[SiO2]]> 82.2 9 The second high refractive index film layer 5 <![CDATA[TiO2]]> 101.1 10 The second low refractive index film layer five <![CDATA[SiO2]]> 62.15 11 The second high refractive index film layer 6 <![CDATA[TiO2]]> 6.2

[0114] Of course, the present invention is not limited to the above-mentioned embodiments, and those skilled in the art may make equivalent modifications or substitutions without violating the spirit of the present invention. These equivalent modifications and substitutions are all included in the scope defined by the claims of this application.

Claims

1. A double-sided anisotropic heat-insulating pattern plate for stage lighting, characterized in that: include: A light-transmitting substrate (10); A black film (20) is arranged on a side of the light-transmitting substrate (10) close to the light source of the stage light; An infrared high-reflection film (30) is arranged on a side of the black film (20) close to the stage light source and is used to reflect the infrared band of the stage light source; the black film (20) and the infrared high-reflection film (30) are provided with corresponding hollow shapes; A special anti-reflection film (40) has a first transmittance for light with a wavelength below 550 nm and a second transmittance for light with a wavelength above 550 nm, wherein the first transmittance is greater than the second transmittance.

2. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 1, characterized in that: The first transmittance is not less than 99%, and the second transmittance is between 75% and 85%.

3. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 1, characterized in that: The material of the light-transmitting substrate (10) may be white glass or quartz.

4. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 1, characterized in that: The infrared high-reflective film (30) comprises a first high-refractive index film layer and a first low-refractive index film layer sequentially arranged on the black film (20), the number of layers of the first high-refractive index film layer being no less than eleven, and the number of layers of the first low-refractive index film layer being no less than ten.

5. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 1, characterized in that: The special anti-reflection film (40) comprises a second high refractive index film layer and a second low refractive index film layer sequentially arranged on the light-transmitting substrate (10), the second low refractive index film layer has n layers, and the second high refractive index film layer has n+1 layers, wherein n≥1.

6. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 4 or 5, characterized in that: The material of the high refractive index film layer is titanium dioxide, and the material of the low refractive index film layer is silicon dioxide.

7. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 6, characterized in that: The thickness of the first high refractive index film layer 1 is 20nm-100nm; The thickness of the first low refractive index film layer 1 is 20nm-100nm; The thickness of the first high refractive index film layer 2 is 80nm-180nm; The thickness of the first low refractive index film layer 2 is 200nm-300nm; The thickness of the first high refractive index film layer 3 is 80nm-180nm; The thickness of the first low refractive index film layer 3 is 200nm-300nm; The thickness of the first high refractive index film layer 4 is 80nm-180nm; The thickness of the first low refractive index film layer 4 is 200nm-300nm; The thickness of the first high refractive index film layer 5 is 80nm-180nm; The thickness of the first low refractive index film layer 5 is: 200nm-300nm; The thickness of the first high refractive index film layer 6 is 80nm-180nm; The film thickness of the first low refractive index film layer 6 is: 200nm-300nm; The thickness of the first high refractive index film layer 7 is: 80nm-200nm; The thickness of the first low refractive index film layer 7 is: 200nm-300nm; The film thickness of the first high refractive index film layer 8 is: 80nm-180nm; The film thickness of the first low refractive index film layer 8 is: 200nm-300nm; The thickness of the first high refractive index film layer nine is 80nm-180nm; The thickness of the first low refractive index film layer nine is: 200nm-300nm; The thickness of the first high refractive index film layer 10 is 80nm-180nm; The thickness of the first low refractive index film layer 10 is 200nm-300nm; The thickness of the first high refractive index film layer eleven is 80nm-180nm.

8. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 6, characterized in that: The film thickness d1 of the second high refractive index film layer 1 is: 0nm<d1≤50nm; The film thickness d2 of the second low refractive index film layer 1 is: 0nm<d2≤50nm; The film thickness d3 of the second high refractive index film layer 2 is: 20nm≤d3≤80nm; The film thickness d4 of the second low refractive index film layer 2 is: 0nm<d4≤50nm; The film thickness d5 of the second high refractive index film layer 3 is: 20nm≤d5≤80nm; The film thickness d6 of the second low refractive index film layer 3 is: 0nm<d6≤50nm; The film thickness d7 of the second high refractive index film layer 4 is: 0nm<d7≤50nm; The film thickness d8 of the second low refractive index film layer 4 is: 20nm≤d8≤100nm; The film thickness d9 of the second high refractive index film layer 5 is: 80nm≤d9≤180nm; The film thickness d10 of the second low refractive index film layer 5 is: 20nm≤d10≤100nm; The film thickness d11 of the second high refractive index film layer 6 is: 0nm<d11≤20nm.

9. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 1, characterized in that: The film material of the black film (20) is an oxide of a variable-valence metal, and the refractive index of the black film (20) in the visible light to near-infrared band is 2.3-2.

6.

10. The double-sided anisotropic heat-insulating pattern plate for stage lighting according to claim 9, characterized in that: The thickness is greater than 200nm.

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