Formula of high-emissivity resistance heating biological wave emitting chip and manufacturing method of high-emissivity resistance heating biological wave emitting chip
By using silicon carbide substrate and nanomaterial composite sintering in the biowave chip to form a high-intensity emission layer, the problem of low emissivity of the existing resistance heat-emitting sheet is solved, efficient biowave emission is achieved, and the treatment effect is improved.
Patent Information
- Application Number
- CN202411280982.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-13
- Publication Date
- 2025-01-10
AI Technical Summary
The existing resistance heat-emitting sheets have few biological peaks and low emissivity, resulting in poor or ineffective treatment effects, and a new chip structure and function is needed.
Using silicon carbide substrate as support plate, the high-strength, high-thermal conductivity first and second emission layers are formed by composite sintering of nano-lanthanum hexaboride, nanographite, black vanadium titanium powder, nanoceramic powder, titanium chromium yellow and adhesive. , and combine the aluminum bar layer and the colloid protective layer to form a high emissivity biowave chip.
It achieves high emissivity, has high intensity, high thermal conductivity, high vacuum adaptability, low thermal expansion coefficient, excellent thermal shock and anti-oxidation properties, and improves the therapeutic effect.
Smart Images

Figure CN119280683A_ABST