Device and method for improving exposure power density of maskless photoetching machine and photoetching machine

Abstract

The invention discloses a device and method for improving the exposure power density of a maskless photoetching machine and the maskless photoetching machine, the device comprises a light source, an illumination light path, a modulation unit and a controller, the controller is connected with the light source, and the controller is also connected with the modulation unit and used for controlling the light source to emit irradiation light, after the original image is sent to the modulation unit or the original image is stretched, the obtained stretched image is sent to the modulation unit; the modulation unit is used for carrying out unidirectional stretching and compression processing on the original image in the first irradiation area to obtain an exposed image, or the modulation unit is used for carrying out unidirectional compression processing on the stretched image in the first irradiation area to obtain the exposed image, and the first irradiation area is larger than or equal to the area occupied by the original image. The invention can ensure that the output exposure image is not deformed, so that the size of the exposure image is consistent with that of the original image, the power density of the exposure surface is improved, the scanning width is not lost, and the cost is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography systems, and in particular to a device, method and photolithography machine for improving the exposure power density of a maskless photolithography machine. Background Art

[0002] In the related art, there are two methods to increase the exposure power density of maskless lithography machines. On the one hand, the exposure power density is increased by increasing the laser power, but this will increase the cost of the laser and is limited by the power density that each device can withstand. On the other hand, the exposure power density is increased by increasing the focusing magnification of the optical imaging system, but this will lose the processing scanning width and increase the scanning speed, which has higher requirements on the motion platform and leads to a decrease in the overall processing rate.

[0003] In scanning exposure, since multiple reciprocating scans are required to complete the entire surface processing, the low scanning width and high scanning speed method will increase the number of scanning reciprocations and the platform acceleration and deceleration time, further extending the overall processing time, and increasing the cost due to higher requirements for the refresh frequency of the spatial light modulator. Summary of the invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art.

[0005] To this end, one object of the present invention is to propose a device for improving the exposure power density of a maskless lithography machine, which can ensure that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, thereby improving the power density of the exposure surface and bringing about the coverage capability of a long scanning width at a low scanning speed, significantly reducing the number of scans while reducing costs.

[0006] To this end, a second object of the present invention is to provide a method for improving the exposure power density of a maskless lithography machine.

[0007] To this end, the third object of the present invention is to provide a maskless lithography machine.

[0008] To achieve the above-mentioned purpose, an embodiment of the first aspect of the present invention discloses a device for improving the exposure power density of a maskless lithography machine, comprising: a light source, an illumination optical path, a modulation unit and a controller, wherein the light source is used to provide illumination light; the illumination optical path is used to receive the illumination light, collimate and homogenize the illumination light, and output a first processing light; the modulation unit is used to receive the first processing light and form a first illumination area; the controller is connected to the light source, and the controller is also connected to the modulation unit, and is used to control the light source to emit the illumination light, and to send an original image to the modulation unit or to stretch the original image and then send the obtained stretched image to the modulation unit; the modulation unit is used to perform unidirectional stretching and compression processing on the original image in the first illumination area to obtain an exposure image, or the modulation unit is used to perform unidirectional compression processing on the stretched image in the first illumination area to obtain the exposure image, wherein the first illumination area is greater than or equal to the area occupied by the original image.

[0009] According to the device for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention, the device can control the light source to emit irradiation light through a controller, and then output a first processing light after collimation and homogenization of the illumination light path, and form a first irradiation area on the modulation unit. At this time, the controller sends the original image to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first irradiation area after receiving the original image, or the controller stretches the original image and sends the stretched image to the modulation unit, and the modulation unit compresses the stretched image to output the exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of long scanning width at low scanning speed, significantly reducing the number of scans.

[0010] In addition, the device for improving the exposure power density of a maskless lithography machine according to the above embodiment of the present invention may also have the following additional technical features: In some embodiments, the modulation unit includes: a spatial light modulator, used to stretch the original image and output a first processed image; an imaging optical path, connected to the spatial light modulator, used to compress the first processed image and output the exposure image, or to compress the stretched image and output the exposure image.

[0011] In some embodiments, the imaging optical path includes: a cylindrical mirror, the cylindrical mirror including a functional direction and a non-functional direction, used to compress the first processed image in the functional direction and keep the first processed image parallel in the non-functional direction, or to compress the stretched image in the functional direction and keep the stretched image parallel in the non-functional direction, wherein the functional direction refers to the direction in which the curvature of the cylindrical mirror is non-infinite, and the non-functional direction refers to the direction in which the curvature of the cylindrical mirror is infinite.

[0012] In some embodiments, the imaging optical path further includes: an infinity correction tube lens, which is arranged opposite to the functional direction of the cylindrical mirror and is used to adjust the compression ratio of the cylindrical mirror.

[0013] In some embodiments, the compression ratio is determined based on a ratio of a focal length of the infinity-corrected tube lens to a focal length of the cylindrical lens.

[0014] In some embodiments, the stretching ratio of the original image is consistent with the compression ratio of the first processed image, or the stretching ratio of the original image is consistent with the compression ratio of the imaging optical path on the stretched image.

[0015] In some embodiments, the stretching direction of the original image is consistent with the compression direction of the first processed image; or, the stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging optical path.

[0016] In some embodiments, the device for improving the exposure power density of a maskless lithography machine also includes: a processing unit, which is arranged between the controller and the modulation unit, and the processing unit includes: a substrate, which is used to receive the exposure image; and a motion platform, on which the substrate is arranged, which is used to drive the substrate to move to complete processing of the substrate.

[0017] To achieve the above-mentioned purpose, an embodiment of the second aspect of the present invention discloses a method for improving the exposure power density of a maskless lithography machine, which is used in the device for improving the exposure power density of a maskless lithography machine described in the embodiment of the first aspect of the present invention. The method includes: controlling the light source to emit the illumination light to the illumination light path so that the illumination light path collimates and homogenizes the illumination light and outputs a first processing light; controlling the modulation unit to receive the first processing light and form a first illumination area; controlling the modulation unit to receive an original image, or stretching the original image and sending the obtained stretched image to the modulation unit; controlling the modulation unit to perform unidirectional stretching and compression processing on the original image in the first illumination area to obtain an exposure image, or controlling the modulation unit to perform unidirectional compression processing on the stretched image in the first illumination area to obtain the exposure image, wherein the first illumination area is greater than or equal to the area occupied by the original image.

[0018] According to the method for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention, the method can control the light source to emit illumination light, and then after the illumination light path is collimated and uniformized, a first processing light is output, and a first illumination area is formed on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first illumination area after receiving the original image, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output the exposure image. In this way, it can be ensured that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time, the power density of the exposure surface is improved without losing the processing scanning width, and the coverage capability of long scanning width at low scanning speed is brought about, which significantly reduces the number of scans.

[0019] To achieve the above-mentioned purpose, an embodiment of the third aspect of the present invention discloses a maskless lithography machine, including: the device for improving the exposure power density of the maskless lithography machine as described in the embodiment of the first aspect of the present invention.

[0020] According to the maskless lithography machine of the embodiment of the present invention, the light source is controlled to emit illumination light, and then after the illumination light path is collimated and uniformized, the first processing light is output, and a first illumination area is formed on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first illumination area after receiving the original image, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output an exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of long scanning width at low scanning speed, significantly reducing the number of scans.

[0021] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which: Figure 1 is a structural block diagram of a device for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention; Figure 2 is a structural block diagram of a modulation unit according to an embodiment of the present invention; Figure 3 is a structural block diagram of an imaging optical path according to an embodiment of the present invention; Figure 4 is a schematic diagram of a cylindrical mirror optical path according to an embodiment of the present invention; Figure 5 is a schematic diagram of an imaging optical path structure according to an embodiment of the present invention; Figure 6 is a schematic diagram of a unidirectional stretching process according to an embodiment of the present invention; Figure 7 is a schematic diagram of unidirectional compression processing according to an embodiment of the present invention; Figure 8 is a functional schematic diagram of a spatial light modulator with a stretching function according to an embodiment of the present invention; Fig. 9 is a structural block diagram of a device for improving the exposure power density of a maskless lithography machine according to another embodiment of the present invention; Fig.10 is a schematic structural diagram of a device for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention; Fig.11is a flow chart of a method for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention; Fig.12 4 is a structural block diagram of a maskless lithography machine according to an embodiment of the present invention. DETAILED DESCRIPTION

[0023] Embodiments of the present invention are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. Embodiments of the present invention are described in detail below.

[0024] Reference below Figure 1-Figure 12 A device, method and lithography machine for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention are described.

[0025] Figure 1 FIG. 1 is a structural block diagram of a device for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention. Figure 1 As shown, the device 100 for improving the exposure power density of a maskless lithography machine includes: a light source 110 , an illumination light path 120 , a modulation unit 130 and a controller 140 .

[0026] Specifically, the light source 110 is used to provide illumination light; the illumination light path 120 is used to receive the illumination light, collimate and homogenize the illumination light, and output a first processed light; the modulation unit 130 is used to receive the first processed light and form a first illumination area.

[0027] The controller 140 is connected to the light source 110 and is also connected to the modulation unit 130 for controlling the light source 110 to emit illumination light and sending the original image to the modulation unit 130 or sending the obtained stretched image to the modulation unit 130 after stretching the original image.

[0028] The modulation unit 130 is used to perform unidirectional stretching and compression processing on the original image in the first irradiation area to obtain an exposure image, or the modulation unit 130 is used to perform unidirectional compression processing on the stretched image in the first irradiation area to obtain an exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

[0029] In an embodiment, the controller 140 can control whether the light source 110 can provide illumination light for the illumination light path 120, for example, by controlling the switch of the light source 110. When the controller 140 controls the light source 110 to turn on, the light source 110 can provide illumination light for the illumination light path 120. When the controller 140 controls the light source 110 to turn off, the light source 110 cannot provide illumination light for the illumination light path 120.

[0030] When the illumination light path 120 receives the illumination light, it will collimate the illumination light to adjust the illumination light emitted by the light source 110 into parallel light, ensure that the illumination light maintains a consistent direction during propagation, reduce the divergence angle of the illumination light, and improve the directionality and parallelism of the illumination light. At the same time, the illumination light path 120 also performs a homogenization process on the illumination light to homogenize the intensity distribution of the illumination light, so that the energy distribution of the illumination light is uniform in the illumination area, avoiding areas with excessively high or low intensity, thereby improving the quality of the illumination light. Therefore, after the illumination light path 120 performs a collimation and homogenization process on the illumination light, it will output a first processed light, that is, output a parallel light with uniform intensity.

[0031] The modulation unit 130 will receive the first processing light output by the illumination light path 120 and form a first irradiation area on the modulation unit 130. At this time, the controller 140 sends the original image to the modulation unit 130. After the modulation unit 130 receives the original image, it will perform unidirectional stretching and compression processing on the original image in the first irradiation area to obtain an exposure image, so as to ensure that the output exposure image is not deformed and the exposure image is consistent in size with the original image. At the same time, the power density of the exposure surface is also improved, and the coverage capability of a long scanning width at a low scanning speed is also brought about, which significantly reduces the number of scans.

[0032] Alternatively, when the modulation unit 130 does not have a stretching function, the original image can be selected in the controller 140, and the original image can be stretched by the controller 140 to obtain a stretched image, and then the stretched image is sent to the modulation unit 130. After the modulation unit 130 receives the stretched image, the stretched image is also compressed in one direction within the first irradiation area to obtain an exposure image.

[0033] In addition, in order to ensure that the original image can be completely displayed in the first illumination area, the first illumination area shall be larger than or equal to the area occupied by the original image.

[0034] Thus, the above-mentioned device for improving the exposure power density of the maskless lithography machine controls the light source 110 to emit the illuminating light through the controller 140, and then outputs the first processing light after the collimation and homogenization processing of the illumination light path 120, and forms a first irradiation area on the modulation unit 130. At this time, the controller 140 sends the original image to the modulation unit 130, and the modulation unit 130 performs unidirectional stretching and compression processing in the first irradiation area after receiving the original image, or, after the controller 140 stretches the original image, it sends the stretched image to the modulation unit 130, and the modulation unit 130 compresses the stretched image to output the exposure image. This can ensure that the output exposure image is not deformed, so that the exposure image is consistent with the size of the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of long scanning width at low scanning speed, which significantly reduces the number of scans.

[0035] In one embodiment of the present invention, Figure 2 As shown, the modulation unit 130 includes: a spatial light modulator 131 and an imaging optical path 132, the spatial light modulator 131 is used to stretch the original image and output a first processed image; the imaging optical path 132 is connected to the spatial light modulator 131, and is used to compress the first processed image and output an exposure image, or to compress the stretched image and output an exposure image.

[0036] In an embodiment, after the controller 140 sends the original image to the spatial light modulator 131, the spatial light modulator 131 will stretch the original image to generate a first processed image that has been stretched, and then the spatial light modulator 131 will transmit the first processed image to the imaging optical path 132. The imaging optical path 132 receives the first processed image, compresses the first processed image, and then outputs an exposure image, so that the exposure image can maintain the same size as the original image and the output exposure image is not deformed.

[0037] Alternatively, when the spatial light modulator 131 does not have a stretching function, the controller 140 directly sends the stretched image to the spatial light modulator 131, and the spatial light modulator 131 then transmits the stretched image to the imaging optical path 132, which compresses the stretched image to output an exposure image. This ensures that regardless of whether the spatial light modulator 131 has a stretching function, the device can flexibly complete the stretching and compression processing of the original image, thereby outputting a high-quality exposure image.

[0038] In one embodiment of the present invention, Figure 3As shown, the imaging optical path 132 includes: a cylindrical mirror 1321, the cylindrical mirror 1321 includes a functional direction and a non-functional direction, and is used to compress the first processed image in the functional direction and keep the first processed image parallel in the non-functional direction, or to compress the stretched image in the functional direction and keep the stretched image parallel in the non-functional direction, wherein the functional direction refers to the direction in which the curvature of the cylindrical mirror 1321 is non-infinite, and the non-functional direction refers to the direction in which the curvature of the cylindrical mirror 1321 is infinite.

[0039] In the embodiments, reference Figure 4 As shown, the cylindrical mirror 1321 includes a functional direction and a non-functional direction. The functional direction refers to the direction in which the curvature of the cylindrical mirror 1321 is infinite. In the non-functional direction, the surface of the cylindrical mirror 1321 is flat, so it does not have the optical function of focusing the light. When the light passes through the cylindrical mirror 1321 in the non-functional direction, it will maintain its original parallel state or divergent state without any change. In the functional direction, the curvature of the cylindrical mirror 1321 is not infinite, that is, it has a certain degree of curvature, which makes the light be focused when passing through the cylindrical mirror 1321 in the functional direction. When parallel light rays are incident on the cylindrical mirror 1321 along the functional direction, these parallel light rays will be focused to one point (for example, the cylindrical mirror is a convex cylindrical mirror).

[0040] Therefore, when the imaging optical path 132 performs compression processing on the first processed image, the first processed image will be compressed in the functional direction of the cylindrical mirror 1321, and the first processed image will be kept parallel in the non-functional direction. Alternatively, when the imaging optical path 132 performs processing on the stretched image, the stretched image will be compressed in the functional direction of the cylindrical mirror 1321, and the stretched image will be kept parallel in the non-functional direction. This can ensure that the output exposure image is not deformed.

[0041] In one embodiment of the present invention, the imaging optical path 132 further includes: an infinity correction tube lens 1322 , wherein the infinity correction tube lens 1322 and the cylindrical mirror 1321 are arranged opposite to each other in functional direction and are used to adjust the compression ratio of the cylindrical mirror 1321 .

[0042] In the embodiments, reference Figure 5 As shown, the functional directions of the infinity correction tube lens 1322 and the cylindrical mirror 1321 are arranged relative to each other, that is, the curved surfaces of the infinity correction tube lens 1322 and the cylindrical mirror 1321 are arranged relative to each other, which can further adjust the compression ratio of the cylindrical mirror 1321 to the first processed image or the stretched image, thereby improving the flexibility of image processing.

[0043] In one embodiment of the present invention, the compression ratio is determined based on the ratio of the focal length of the infinity-corrected tube lens 1322 to the focal length of the cylindrical lens 1321 .

[0044] In an embodiment, the compression ratio is determined based on the ratio between the focal length of the infinity correction tube lens 1322 and the focal length of the cylindrical lens 1321. By determining the focal lengths of the infinity correction tube lens 1322 and the cylindrical lens 1321, the compression ratio of the first processed image or the stretched image can be determined. For example, if the ratio of the focal lengths of the infinity correction tube lens 1322 and the cylindrical lens 1321 is 4, then the compression ratio is 4, thereby achieving accuracy in image processing.

[0045] In one embodiment of the present invention, the stretching ratio of the original image is consistent with the compression ratio of the first processed image, or the stretching ratio of the original image is consistent with the compression ratio of the stretched image by the imaging optical path 132 .

[0046] In an embodiment, the stretching ratio of the original image by the spatial light modulator 131 is consistent with the compression ratio of the first processed image by the cylindrical mirror 1321, or the stretching ratio of the original image by the controller 140 is consistent with the compression ratio of the stretched image by the imaging optical path 132. For example, if the stretching ratio is 4, the compression ratio is also 4. This ensures that after the original image is stretched, the first processed image or the stretched image can be compressed by the cylindrical mirror 1321, and the exposure image obtained by compression processing is consistent with the size of the original image.

[0047] In one embodiment of the present invention, the stretching direction of the original image is consistent with the compression direction of the first processed image; or, the stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging optical path 132 .

[0048] In an embodiment, the stretching direction of the original image by the spatial light modulator 131 is consistent with the compression direction of the first processed image by the cylindrical mirror 1321, or the stretching direction of the original image by the controller 140 is consistent with the compression direction of the stretched image by the cylindrical mirror 1321, both of which are unidirectional stretching and compression, and the stretching direction and the compression direction are both functional directions of the cylindrical mirror 1321, which can ensure that the size of the original image is consistent with that of the exposed image.

[0049] For example, the stretching ratio of the original image is 4, and the compression ratio of the first processed image or the stretched image is also 4. When the spatial light modulator is a DMD (Digital Micromirror Device) with a stretching function, after the controller 140 transmits the original image to the spatial light modulator 131, as shown in FIG. Figure 6 As shown, the spatial light modulator 131 stretches the original image by 4 times in the vertical direction to obtain a first processed image.

[0050] Alternatively, when the spatial light modulator does not have a stretching function, the controller 140 determines the original image, such as Figure 6As shown, the original image is stretched 4 times in the vertical direction of the original image to obtain a stretched image.

[0051] On the other hand, Figure 7 As shown, when the spatial light modulator 131 transmits the first processed image or the stretched image to the cylindrical mirror 1321, the cylindrical mirror 1321 will compress the first processed image or the stretched image in the vertical direction to ensure that the exposure image is not deformed and that the final exposure image is consistent with the size of the original image.

[0052] In addition, when the spatial light modulator 131 is a DMD with a stretching function, the stretching function of the DMD can adjust the size of the image in one direction while maintaining the image quality, and the image data loading time of the DMD stretching function is significantly shortened. Figure 8 As shown, for example, the loading time is reduced to 1 / 4 of the original time, which greatly improves the efficiency of image processing.

[0053] In one embodiment of the present invention, Fig. 9 As shown, the device 100 for improving the exposure power density of the maskless lithography machine also includes: a processing unit 150, the processing unit 150 is arranged between the controller 140 and the modulation unit 130, and the processing unit 150 includes: a substrate 151 and a motion platform 152, wherein the substrate 151 is used to receive the exposure image; the substrate 151 is arranged on the motion platform 152, and the motion platform 152 is used to drive the substrate 151 to move to complete the processing of the substrate 151.

[0054] In an embodiment, Fig. 9 As shown, the substrate 151 is adsorbed on the motion platform 152, the imaging optical path 132 can project the exposure image on the substrate 151, and the substrate 151 can receive the exposure image. After the substrate 151 receives the exposure image, the controller 140 can control the motion platform 152 to move, so that the motion platform 152 drives the substrate 151 to move. For example, the motion platform 152 moves at a constant speed, so that the substrate 151 can move accurately according to a preset trajectory, which not only enables the exposure image on the substrate 151 to be evenly and efficiently exposed, but also completes the processing of the exposure image on the substrate 151 through the flexible control of the motion platform 152, thereby greatly improving the exposure power density and ensuring the high quality and efficiency of the lithography process.

[0055] In summary, if Fig.10As shown, when the light source 110 emits illumination light under the control instruction of the controller 140, the illumination light is collimated and homogenized by the illumination light path 120 to obtain a first processed light. The illumination light path 120 outputs the first processed light and irradiates it onto the spatial light modulator 131, forming a first illumination area on the spatial light modulator 131. At this time, the controller 140 sends the original image to the spatial light modulator 131. After receiving the original image, the spatial light modulator 131 stretches the original image and outputs the first processed image to the imaging light path 132. The cylindrical mirror 1321 in the imaging light path 132 compresses the first processed image, wherein the stretching direction of the original image and the compression direction of the first processed image are The first processed image is consistent with the stretching ratio of the original image and the compression ratio of the first processed image. Then the imaging optical path 132 compresses the first processed image to obtain an exposure image, and projects the exposure image onto the substrate 151. At this time, the controller 140 sends a control instruction to the motion platform 152 to control the motion platform 152 to perform three-dimensional movement. Since the substrate 151 is adsorbed on the motion platform 152, the motion platform 152 can drive the substrate 151 to move, thereby completing the processing of the substrate 151 and ensuring that the exposure image is not deformed. The exposure image obtained in this way is consistent with the size of the original image, and the power density of the exposure surface is effectively improved. Without losing the scanning width, the processing efficiency of the substrate 151 is improved and the cost is reduced.

[0056] The present invention further proposes a method for improving the exposure power density of a maskless lithography machine in an embodiment, which is used in the device for improving the exposure power density of a maskless lithography machine described in any one of the above embodiments of the present invention.

[0057] Fig.11 FIG. 1 is a flow chart of a method for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention. Fig.11 As shown, the method comprises the following steps: Step S1, controlling the light source to emit illumination light to the illumination light path, so that the illumination light path performs collimation and homogenization processing on the illumination light and outputs a first processed light.

[0058] Step S2, controlling the modulation unit to receive the first processing light and form a first irradiation area.

[0059] Step S3, controlling the modulation unit to receive the original image, or stretching the original image and sending the obtained stretched image to the modulation unit.

[0060] Step S4, controlling the modulation unit to perform unidirectional stretching and compression processing on the original image in the first irradiation area to obtain an exposure image, or controlling the modulation unit to perform unidirectional compression processing on the stretched image in the first irradiation area to obtain an exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

[0061] Therefore, the method for improving the exposure power density of a maskless lithography machine in the above-mentioned embodiment of the present invention controls the light source to emit illumination light, and then outputs the first processing light after the illumination light path is collimated and uniformized, and forms a first illumination area on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first illumination area after receiving the original image, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output the exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of long scanning width at low scanning speed, significantly reducing the number of scans.

[0062] In one embodiment of the present invention, an exposure image is obtained based on an original image or a stretched image, including: stretching the original image and outputting a first processed image; compressing the first processed image and outputting an exposure image, or compressing the stretched image and outputting an exposure image.

[0063] In one embodiment of the present invention, the first processed image or the stretched image is compressed, including: compressing the first processed image in a functional direction and keeping the first processed image parallel in a non-functional direction, or compressing the stretched image in a functional direction and keeping the stretched image parallel in a non-functional direction, wherein the functional direction refers to a direction in which the curvature of the cylindrical mirror is non-infinite, and the non-functional direction refers to a direction in which the curvature of the cylindrical mirror is infinite.

[0064] In one embodiment of the present invention, the method for improving the exposure power density of a maskless lithography machine further includes: adjusting the compression ratio of the cylindrical mirror according to the infinity correction tube mirror.

[0065] In another embodiment of the present invention, the compression ratio is determined based on a ratio of a focal length of the infinity-corrected tube lens to a focal length of the cylindrical lens.

[0066] In one embodiment of the present invention, the stretching ratio of the original image is consistent with the compression ratio of the first processed image, or the stretching ratio of the original image is consistent with the compression ratio of the imaging optical path to the stretched image.

[0067] In one embodiment of the present invention, the stretching direction of the original image is consistent with the compression direction of the first processed image; or, the stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging optical path.

[0068] It should be noted that when improving the exposure power density of the maskless lithography machine, the specific implementation method of the method for improving the exposure power density of the maskless lithography machine is similar to the specific implementation method of the device for improving the exposure power density of the maskless lithography machine described in any of the above embodiments of the present invention. Therefore, for a detailed exemplary description of the method for improving the exposure power density of the maskless lithography machine, please refer to the aforementioned description of the device for improving the exposure power density of the maskless lithography machine. In order to reduce redundancy, it will not be repeated here.

[0069] According to the method for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention, the light source is mainly controlled to emit irradiation light, and then after the illumination light path is collimated and uniformized, a first processing light is output, and a first irradiation area is formed on a modulation unit. At this time, the original image is sent to the modulation unit, and after the modulation unit receives the original image, a unidirectional stretching and compression process is performed in the first irradiation area, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output an exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of a long scanning width at a low scanning speed, significantly reducing the number of scans.

[0070] A further embodiment of the present invention provides a maskless lithography machine 200 .

[0071] like Fig.12 1 is a block diagram of a maskless lithography machine according to an embodiment of the present invention. Fig.12 As shown, the maskless lithography machine 200 of the embodiment of the present invention includes the device 100 for improving the exposure power density of the maskless lithography machine as described in any one of the above embodiments of the present invention.

[0072] It should be noted that when the exposure power density of the maskless lithography machine is improved, its specific implementation method is similar to the specific implementation method of the device or method for improving the exposure power density of the maskless lithography machine in any one of the above-mentioned embodiments of the present invention. Therefore, for a detailed exemplary description of the process of improving the exposure power density of the maskless lithography machine, please refer to the relevant description part of the aforementioned device or method for improving the exposure power density of the maskless lithography machine. In order to reduce redundancy, it will not be repeated here.

[0073] According to the maskless lithography machine 200 of the embodiment of the present invention, the maskless lithography machine mainly controls the light source to emit irradiation light, and then outputs the first processing light after the collimation and homogenization processing of the illumination light path, and forms a first irradiation area on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first irradiation area after receiving the original image, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output the exposure image. In this way, it can be ensured that the output exposure image is not deformed, so that the exposure image is consistent with the size of the original image, and at the same time, the power density of the exposure surface is improved without losing the processing scanning width, and it also brings the coverage capability of long scanning width at low scanning speed, which significantly reduces the number of scans.

[0074] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example.

[0075] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A device for improving the exposure power density of a maskless lithography machine, characterized in that: include: Light source, lighting optical path, modulation unit and controller, The light source is used to provide irradiation light; The illumination light path is used to receive the illumination light, collimate and homogenize the illumination light, and output a first processed light; The modulation unit is used to receive the first processing light and form a first irradiation area; The controller is connected to the light source, and is also connected to the modulation unit, and is used to control the light source to emit the illumination light, and to send the original image to the modulation unit or to send the obtained stretched image to the modulation unit after stretching the original image; The modulation unit is used to perform unidirectional stretching and compression processing on the original image in the first irradiation area to obtain the exposure image, or the modulation unit is used to perform unidirectional compression processing on the stretched image in the first irradiation area to obtain the exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

2. The device for improving the exposure power density of a maskless lithography machine according to claim 1, characterized in that: The modulation unit comprises: A spatial light modulator, used for stretching the original image and outputting a first processed image; An imaging optical path is connected to the spatial light modulator and is used to compress the first processed image and output the exposure image, or to compress the stretched image and output the exposure image.

3. The device for improving the exposure power density of a maskless lithography machine according to claim 2, characterized in that: The imaging optical path comprises: A cylindrical mirror, wherein the cylindrical mirror comprises a functional direction and a non-functional direction, and is used for compressing the first processed image in the functional direction and keeping the first processed image parallel in the non-functional direction, or compressing the stretched image in the functional direction and keeping the stretched image parallel in the non-functional direction, wherein the functional direction refers to the direction in which the curvature of the cylindrical mirror is non-infinite, and the non-functional direction refers to the direction in which the curvature of the cylindrical mirror is infinite.

4. The device for improving the exposure power density of a maskless lithography machine according to claim 3, characterized in that: The imaging optical path also includes: The infinity correction tube lens is arranged opposite to the functional direction of the cylindrical lens and is used to adjust the compression ratio of the cylindrical lens.

5. The device for improving the exposure power density of a maskless lithography machine according to claim 4, characterized in that: The compression ratio is determined based on a ratio of a focal length of the infinity correction tube lens to a focal length of the cylindrical lens.

6. The device for improving the exposure power density of a maskless lithography machine according to claim 5, characterized in that: The stretching ratio of the original image is consistent with the compression ratio of the first processed image, or, The stretching ratio of the original image is consistent with the compression ratio of the imaging optical path to the stretched image.

7. The device for improving the exposure power density of a maskless lithography machine according to claim 1, characterized in that: The stretching direction of the original image is consistent with the compression direction of the first processed image; or, The stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging optical path.

8. The device for improving the exposure power density of a maskless lithography machine according to claim 1, characterized in that: Also includes: A processing unit, the processing unit is arranged between the controller and the modulation unit, and the processing unit comprises: a substrate, for receiving the exposure image; A motion platform, on which the substrate is arranged, is used to drive the substrate to move so as to complete the processing of the substrate.

9. A method for improving the exposure power density of a maskless lithography machine, characterized in that: The device for improving the exposure power density of a maskless lithography machine according to any one of claims 1 to 8, the method comprising: Controlling the light source to emit the illumination light to the illumination light path, so that the illumination light path performs collimation and homogenization processing on the illumination light and outputs a first processed light; Controlling the modulation unit to receive the first processing light and form a first irradiation area; Controlling the modulation unit to receive the original image, or after stretching the original image, sending the obtained stretched image to the modulation unit; Control the modulation unit to perform unidirectional stretching and compression processing on the original image within the first irradiation area to obtain the exposure image, or control the modulation unit to perform unidirectional compression processing on the stretched image within the first irradiation area to obtain the exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

10. A maskless lithography machine, characterized in that: The invention comprises a device for improving the exposure power density of a maskless lithography machine as described in any one of claims 1 to 8.

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