Treatment device for catalyst

Abstract

The invention discloses a treatment device for a catalyst, and relates to the technical field of catalyst treatment.The treatment device is characterized in that an installation space is defined by a shell, a feeding port and a discharging port are formed in the side wall of the installation space, and the feeding port and the discharging port both communicate with the installation space; the spraying mechanism is arranged on the shell and is used for spraying substances into the mounting space; and the material conveying mechanism is arranged in the mounting space, the material conveying mechanism is used for conveying the catalyst entering the mounting space from the feeding port in the mounting space so as to enable the spraying mechanism to spray substances to the catalyst, and the material conveying mechanism is further used for enabling the catalyst on the material conveying mechanism to fall into the mounting space. Therefore, the effect of continuously spraying substances to steep the catalyst can be achieved, so that the production efficiency can be improved, the catalyst can uniformly absorb the substances, no redundant substances are left in the treatment device, the treatment device is simple in structure and easy to maintain, and the treatment cost of the catalyst can be further reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of catalyst treatment, and in particular to a treatment device for catalyst. Background Art

[0002] In the related art, the impregnation method is the most common preparation method for industrial preparation of solid catalysts. The main catalyst impregnation methods are supersaturated impregnation and equal volume impregnation. The impregnation method can make the metal components evenly distributed on the catalyst, reduce the amount of active components, and improve the utilization rate of active components. However, the existing catalyst impregnation device generally adopts an intermittent impregnation method, impregnating the catalyst into the impregnation liquid storage tank, and taking out the catalyst after the impregnation is completed. The impregnation uniformity is poor, and continuous impregnation is not possible, which affects the production efficiency, and the remaining impregnation liquid needs to be specially recovered, resulting in a high impregnation cost. Summary of the invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, one purpose of the present invention is to provide a treatment device for a catalyst, which can achieve the effect of continuously injecting a substance into the catalyst to impregnate it, thereby improving production efficiency, and can also make the catalyst absorb the substance uniformly without any excess substance remaining in the treatment device, and the treatment device has a simple structure and is easy to maintain, thereby reducing the treatment cost of the catalyst.

[0004] A catalyst processing device according to an embodiment of the present invention includes: a shell, the shell defines an installation space, the side wall of the installation space is formed with a feed port and a discharge port, and the feed port and the discharge port are both connected to the installation space; an injection mechanism, the injection mechanism is arranged in the shell and is used to inject substances into the installation space; a feeding mechanism, the feeding mechanism is arranged in the installation space, the feeding mechanism is used to transport the catalyst entering the installation space from the feed port in the installation space so that the injection mechanism sprays substances onto the catalyst, and the feeding mechanism is also used to make the catalyst on the feeding mechanism fall into the installation space.

[0005] According to the processing device for catalysts of the embodiment of the present invention, the feeding mechanism is used to transport the catalyst entering the installation space from the feed port within the installation space so that the injection mechanism can spray substances to the catalyst, and the feeding mechanism is also used to make the catalyst on the feeding mechanism fall into the installation space, which can achieve the effect of continuously injecting substances to impregnate the catalyst, thereby improving production efficiency, and can also make the catalyst absorb substances evenly without excess substances remaining in the processing device, and the processing device has a simple structure and is easy to maintain, thereby reducing the processing cost of the catalyst.

[0006] According to some embodiments of the present invention, the injection mechanism is disposed on the top wall of the installation space, and the feeding mechanism and the injection mechanism are correspondingly disposed along the height direction of the processing device, and the feeding mechanism is used to transport the catalyst toward the injection mechanism.

[0007] According to some embodiments of the present invention, the feeding mechanism is constructed as a spiral disk structure, and the spiral disk structure is rotatably disposed on the housing.

[0008] According to some embodiments of the present invention, the processing device further comprises: a driving mechanism, the driving mechanism is drivingly connected to the feeding mechanism, and the driving mechanism is used to drive the feeding mechanism to rotate.

[0009] According to some embodiments of the present invention, the rotation speed of the spiral disk structure is V, which satisfies the relationship: 10 rpm / min≤V≤30 rpm / min.

[0010] According to some embodiments of the present invention, part of the installation space is constructed as a discharge buffer space, which is arranged around the feeding mechanism along the circumference of the processing device, and the discharge buffer space is connected to the discharge port, and the feeding mechanism is used to make the catalyst on the feeding mechanism fall into the discharge buffer space.

[0011] According to some embodiments of the present invention, a guide wall is provided in the discharge buffer space, and the guide wall is arranged around the feeding mechanism along the circumference of the processing device. At least part of the guide wall is constructed as an inclined wall, and the lowest point of the inclined wall is arranged corresponding to the discharge port.

[0012] According to some embodiments of the present invention, the guide wall and the bottom wall of the installation space are spaced apart to form a feed channel between the guide wall and the bottom wall of the installation space, and the feed port is located below the highest point of the guide wall, and the catalyst entering the installation space from the feed port moves toward the feeding mechanism through the feed channel.

[0013] According to some embodiments of the present invention, the spraying mechanism includes: a plurality of spray heads, and the plurality of spray heads are arranged along the circumference of the installation space.

[0014] According to some embodiments of the present invention, the feed port and the discharge port are located on opposite sides of the feeding mechanism, and the setting height of the feed port is the same as the setting height of the discharge port.

[0015] According to some embodiments of the present invention, both the feed port and the discharge port are provided with a first opening and closing valve.

[0016] According to some embodiments of the present invention, a side wall of the installation space is further formed with an inspection hole, the inspection hole is communicated with the installation space, and the inspection hole is provided with a second opening and closing valve.

[0017] According to some embodiments of the present invention, the processing device further includes: a bracket, and the outer shell is arranged on the upper surface of the bracket.

[0018] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0020] Figure 1 is a schematic structural diagram of a processing device according to an embodiment of the present invention;

[0021] Figure 2 is a top view of a processing device according to an embodiment of the present invention.

[0022] Reference numerals:

[0023] Processing device 100;

[0024] Shell 10; feed port 11; discharge port 12; first opening and closing valve 13; inspection hole 14; second opening and closing valve 15;

[0025] Installation space 20; discharging buffer space 21; guide wall 211; feeding channel 22;

[0026] Spraying mechanism 30; spray head 31; delivery pipeline 32;

[0027] Feeding mechanism 40; spiral blade 41; rotating shaft 42; turntable side wall 43;

[0028] Driving mechanism 50;

[0029] Bracket 60; support leg 61; support beam 62. DETAILED DESCRIPTION

[0030] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0031] Reference below Figure 1-Figure 2 The catalyst treatment device 100 according to an embodiment of the present invention is described, which can be used for impregnating or drying the catalyst. The present application takes the treatment device 100 used for impregnating the catalyst as an example for explanation.

[0032] A catalyst processing device 100 according to an embodiment of the present invention includes: a shell 10, the shell 10 defines an installation space 20, and the side wall of the installation space 20 is formed with a feed port 11 and a discharge port 12, and the feed port 11 and the discharge port 12 are both connected to the installation space 20; an injection mechanism 30, the injection mechanism 30 is arranged in the shell 10 and is used to inject substances into the installation space 20; a feeding mechanism 40, the feeding mechanism 40 is arranged in the installation space 20, the feeding mechanism 40 is used to transport the catalyst entering the installation space 20 from the feed port 11 in the installation space 20 so that the injection mechanism 30 sprays substances onto the catalyst, and the feeding mechanism 40 is also used to make the catalyst on the feeding mechanism 40 fall into the installation space 20.

[0033] The housing 10 defines an installation space 20, and a feed port 11 and a discharge port 12 are formed on the side wall of the installation space 20, and both the feed port 11 and the discharge port 12 are connected to the installation space 20. Specifically, the catalyst can be continuously fed from the feed port 11 to the installation space 20 manually, or other mechanical equipment can continuously feed the catalyst from the feed port 11 to the installation space 20, and the catalyst entering the installation space 20 can be discharged from the discharge port 12 to form a flow route of the catalyst.

[0034] The injection mechanism 30 can be a motor-driven, pneumatic-driven, piezoelectric-injection type, etc. The injection mechanism 30 is arranged in the housing 10. For example, the injection mechanism 30 and the housing 10 can be fixedly connected by bolts, or the injection mechanism 30 and the housing 10 can be fixedly connected by snap-fitting, but the present invention is not limited thereto. The injection mechanism 30 and the housing 10 can also be fixedly connected by other methods, as long as the injection mechanism 30 is arranged in the housing 10. And the spraying method of the injection mechanism 30 can be ultrasonic atomization, two-fluid atomization and other spraying methods, which can be reasonably selected according to actual conditions. And the injection mechanism 30 is used to spray substances into the installation space 20. The type of catalyst is not specifically limited here. The substance sprayed by the injection mechanism 30 is an impregnation liquid for impregnating the corresponding catalyst. This application takes the catalyst as spherical aluminum oxide particles as an example for explanation. The injection mechanism 30 can spray the impregnation liquid into the installation space 20 for impregnating the catalyst, thereby improving the hydrolysis performance of the catalyst. The feeding mechanism 40 may be a spiral feeding mechanism 40 , a vibration feeding mechanism 40 or the like, but the present invention is not limited thereto and may also be other types of feeding mechanisms 40 .

[0035] The feeding mechanism 40 is arranged in the installation space 20 . The feeding mechanism 40 is used to transport the catalyst entering the installation space 20 from the feed port 11 in the installation space 20 so that the injection mechanism 30 injects substances onto the catalyst. The feeding mechanism 40 is also used to make the catalyst on the feeding mechanism 40 fall into the installation space 20 . Specifically, the catalyst can be continuously fed into the installation space 20 from the feed port 11 manually, or other mechanical equipment can be used to continuously feed the catalyst into the installation space 20 from the feed port 11. The catalyst entering the installation space 20 from the feed port 11 can be transported by the feeding mechanism 40 to move the catalyst in the installation space 20, or the catalyst entering the installation space 20 from the feed port 11 can be transported by the feeding mechanism 40 to the position corresponding to the injection mechanism 30, and the feeding mechanism 40 continuously transports the catalyst at the feed port 11 to the position corresponding to the injection mechanism 30, and the impregnation liquid sprayed by the injection mechanism 30 can continuously fall on the catalyst on the feeding mechanism 40, and the impregnated catalyst can fall into the installation space 20 under the drive of the feeding mechanism 40, and the catalyst that falls into the installation space 20 can move toward the discharge port 12, so that the catalyst that falls into the installation space 20 is discharged from the discharge port 12. For example, the bottom wall of the installation space 20 may be provided with a conveyor belt for transporting the catalyst dropped into the installation space 20 to the discharge port 12, so that the catalyst is discharged from the discharge port 12, or a guide slope inclined toward the discharge port 12 may be formed in the installation space 20, so that the catalyst dropped into the installation space 20 rolls toward the discharge port 12, so that the catalyst is discharged from the discharge port 12. In this way, the catalyst that has not been impregnated can be continuously impregnated, thereby improving the production efficiency, and the catalyst can be impregnated by the spraying method of the injection mechanism 30, so that the catalyst can uniformly absorb the impregnation liquid, so that the catalyst can fully contact with the active components in the impregnation liquid, thereby improving the impregnation effect of the catalyst, and also saving the impregnation liquid, avoiding the impregnation liquid from remaining in the treatment device 100. At the same time, the treatment device 100 has a simple structure and is easy to maintain, thereby reducing the treatment cost of the catalyst.

[0036] According to the catalyst processing device 100 of the embodiment of the present invention, the feeding mechanism 40 is used to transport the catalyst entering the installation space 20 from the feed port 11 within the installation space 20 so that the injection mechanism 30 injects substances to the catalyst, and the feeding mechanism 40 is also used to make the catalyst on the feeding mechanism 40 fall into the installation space 20, which can achieve the effect of continuously injecting substances to impregnate the catalyst, thereby improving production efficiency, and can also make the catalyst absorb substances evenly, and no excess substances remain in the processing device 100, and the processing device 100 has a simple structure and is easy to maintain, thereby reducing the processing cost of the catalyst.

[0037] According to some embodiments of the present invention, Figure 1As shown, the injection mechanism 30 is disposed on the top wall of the installation space 20 , and along the height direction of the processing device 100 , the feeding mechanism 40 and the injection mechanism 30 are correspondingly disposed, and the feeding mechanism 40 is used to transport the catalyst toward the injection mechanism 30 .

[0038] Among them, the injection mechanism 30 is arranged on the top wall of the installation space 20, and the top wall of the shell 10 is the top wall of the installation space 20. For example, the injection mechanism 30 and the shell 10 can be fixedly connected by bolts, or the injection mechanism 30 and the shell 10 can be fixedly connected by snap-fitting, but the present invention is not limited to this. The injection mechanism 30 and the shell 10 can also be fixedly connected by other means, as long as the injection mechanism 30 is arranged on the top wall of the installation space 20.

[0039] Along the height direction of the processing device 100, the feeding mechanism 40 and the injection mechanism 30 are correspondingly arranged, and the feeding mechanism 40 is located below the injection mechanism 30. The feeding mechanism 40 is used to transport the catalyst toward the injection mechanism 30. The feeding mechanism 40 can transport the catalyst from the feed port 11 to the position corresponding to the injection mechanism 30, so that the injection mechanism 30 can accurately spray the impregnation liquid onto the catalyst to reduce the loss of the impregnation liquid. The parameters such as the spraying amount and spraying angle of the impregnation liquid can be accurately controlled according to the actual situation to ensure that the impregnation liquid can evenly and fully cover the surface of the catalyst, thereby achieving the effect of impregnating the catalyst to improve the performance of the catalyst.

[0040] According to some embodiments of the present invention, Figure 1 As shown, the feeding mechanism 40 can be constructed as a spiral disk structure, and the spiral disk structure is rotatably disposed on the housing 10 .

[0041] Among them, the feeding mechanism 40 can be constructed as a spiral disk structure, which can include a rotating shaft 42 and a plurality of spiral blades 41, the rotating shaft 42 is sequentially penetrated by the plurality of spiral blades 41, and the plurality of spiral blades 41 are fixed to the rotating shaft 42, the spiral blades 41 are arranged along the extension direction of the rotating shaft 42, any two adjacent spiral blades 41 are connected to form a continuous spiral channel, each spiral blade 41 has a consistent pitch and spiral angle, and the spiral blade 41 can be in a mesh shape or a corrugated shape, and the mesh-like or corrugated spiral blade 41 can increase the friction between the catalyst and the spiral blade 41, avoid the catalyst from running around, so as to ensure the continuous and stable transportation of the catalyst in the spiral channel, and can also increase the mixing uniformity of the catalyst, thereby promoting the uniform infiltration of the catalyst to enhance the impregnation effect of the catalyst. It should be noted that the mesh aperture should be slightly smaller than the particle size of the catalyst to avoid the catalyst from falling from the spiral blade 41.

[0042] The rotating shaft 42 extends along the height direction of the processing device 100, and the spiral disk structure is rotatably provided on the outer shell 10. The rotating shaft 42 of the spiral disk structure is rotatably provided on the outer shell 10. For example, the rotating shaft 42 and the outer shell 10 can be rotatably connected through a bearing, or the rotating shaft 42 and the outer shell 10 can be rotatably connected through a hinge, but the present invention is not limited to this. The rotating shaft 42 and the outer shell 10 can also be rotatably connected by other means, as long as the spiral disk structure is rotatably provided on the outer shell 10.

[0043] Further, the spiral disk structure may further include a turntable side wall 43. As an example, the turntable side wall 43 is arranged around the plurality of spiral blades 41 along the circumference of the spiral disk structure, and along the height direction of the processing device 100, the turntable side wall 43 extends from the spiral blade 41 of the lowest layer to the bottom wall of the spiral blade 41 of the highest layer. As another example, the turntable side wall 43 is arranged along the side edges of the plurality of spiral blades 41. The catalyst may not fall into the installation space 20 when in the spiral disk structure, and the turntable side wall 43 may not enclose the circumference of the spiral blade 41 of the highest layer, so that the catalyst on the spiral blade 41 of the highest layer can fall out of the installation space 20.

[0044] When the rotating shaft 42 rotates, it will drive the spiral blade 41 to rotate together. The rotation of the spiral blade 41 will continuously transport the catalyst upward. During the transportation process, the catalyst is subjected to the directional thrust of the spiral blade 41 and rotates around the rotating shaft 42 as the spiral blade 41 rotates. As the rotating shaft 42 continues to rotate, the catalyst is continuously and stably transported to the top of the spiral disk structure (to the position corresponding to the injection mechanism 30), and due to the directional thrust of the spiral blade 41, the catalyst is continuously and stably transported to the top of the spiral disk structure and then pushed to fall into the installation space 20. While the catalyst is transported to the top of the spiral disk structure, the injection mechanism 30 can spray the impregnation liquid onto the catalyst at the top of the spiral disk structure to achieve the impregnation of the catalyst. The impregnated catalyst falls into the installation space 20 and is discharged from the discharge port 12. In this way, the effect of continuous impregnation of the catalyst can be achieved, which greatly improves the production efficiency.

[0045] According to some embodiments of the present invention, Figure 1 As shown, the processing device 100 may further include: a driving mechanism 50, the driving mechanism 50 is transmission-connected to the feeding mechanism 40, and the driving mechanism 50 is used to drive the feeding mechanism 40 to rotate.

[0046] Among them, the driving mechanism 50 can be a motor, etc. The driving mechanism 50 is connected to the rotating shaft 42 of the feeding mechanism 40. The driving mechanism 50 is used to drive the feeding mechanism 40 to rotate. The driving mechanism 50 can drive the rotating shaft 42 to rotate. When the rotating shaft 42 rotates, the feeding mechanism 40 rotates in the installation space 20. The rotation of the feeding mechanism 40 will produce a continuous transportation effect to transport the catalyst from the feed port 11 to the top of the feeding mechanism 40. During the transportation process, the catalyst will be pushed by the feeding mechanism 40, thereby realizing continuous and stable transportation.

[0047] According to some embodiments of the present invention, the rotation speed of the spiral disk structure is V, which satisfies the relationship: 10 rpm / min≤V≤30 rpm / min.

[0048] Among them, the rotation speed V of the spiral disk structure can be any value between 10rpm / min-30rpm / min, for example: the rotation speed V of the spiral disk structure can be 10rpm / min, 20rpm / min, 30rpm / min and other values, but the present invention is not limited to this. The rotation speed V of the spiral disk structure can be other values ​​between 10rpm / min-30rpm / min, as long as the rotation speed V of the spiral disk structure satisfies the relationship: 10rpm / min≤V≤30rpm / min.

[0049] When the rotation speed of the spiral disk structure is less than 10rpm / min, the transport speed of the catalyst will be too low, thereby reducing the working efficiency of the treatment device 100. When the rotation speed of the spiral disk structure is greater than 30rpm / min, the transport speed of the catalyst will be too high, thereby causing the catalyst to fall into the installation space 20 without uniformly absorbing the impregnation liquid, thereby reducing the catalyst's absorption efficiency of the impregnation liquid. The rotation speed V of the spiral disk structure satisfies the relationship: 10rpm / min≤V≤30rpm / min, which can ensure the impregnation effect of the catalyst while ensuring the working efficiency of the treatment device 100, thereby meeting the impregnation requirements of the catalyst, and the volume and mass of the impregnation liquid required per unit time can be calculated through the rotation speed V of the spiral disk structure, and the precise impregnation of the catalyst can be achieved through the cooperation of the spiral disk structure and the injection mechanism 30.

[0050] It can be explained that the specific value of the rotation speed V of the spiral disk structure can be reasonably set according to the water absorption rate of the catalyst, the spray flow rate of the injection mechanism 30, and the conveying amount of the spiral disk structure, as long as it can meet the normal operation of the processing device 100. In addition, the driving mechanism 50 can control the rotation speed of the spiral disk structure within 10rpm / min-30rpm / min through a reduction device or a self-contained reduction device. The reduction device can be connected between the spiral disk structure and the driving mechanism 50, and the driving mechanism 50 is used to drive the spiral disk structure to rotate.

[0051] According to some embodiments of the present invention, Figure 1 As shown, part of the installation space 20 is constructed as a discharge buffer space 21, which is arranged around the feeding mechanism 40 along the circumference of the processing device 100. The discharge buffer space 21 is connected to the discharge port 12, and the feeding mechanism 40 is used to make the catalyst on the feeding mechanism 40 fall into the discharge buffer space 21.

[0052] Among them, part of the installation space 20 is constructed as the discharge buffer space 21. For example, one-half, one-third, etc. proportions of the installation space 20 can be constructed as the discharge buffer space 21, but the present invention is not limited to this. The installation space 20 can also have other proportions constructed as the discharge buffer space 21, as long as part of the installation space 20 is constructed as the discharge buffer space 21.

[0053] The discharge buffer space 21 is arranged around the feeding mechanism 40 along the circumference of the processing device 100, and the feeding mechanism 40 is used to make the catalyst on the feeding mechanism 40 fall into the discharge buffer space 21, and help the impregnated catalyst to fall evenly into the discharge buffer space 21, avoiding the accumulation of the impregnated catalyst at the same position. The discharge buffer space 21 is connected to the discharge port 12 so that the impregnated catalyst can be discharged from the discharge port 12, thereby improving the discharge efficiency and uniformity of the impregnated catalyst, and further improving the efficiency and performance of the processing device 100.

[0054] According to some embodiments of the present invention, Figure 1 As shown, a guide wall 211 is provided in the discharge buffer space 21 , and the guide wall 211 is arranged around the feeding mechanism 40 along the circumference of the processing device 100 , and at least part of the guide wall 211 is constructed as an inclined wall, and the lowest point of the inclined wall is arranged corresponding to the discharge port 12 .

[0055] Among them, a guide wall 211 can be provided in the discharge buffer space 21, and the guide wall 211 is the bottom wall of the discharge buffer space 21. The guide wall 211 is arranged around the feeding mechanism 40 along the circumference of the processing device 100. Specifically, the guide wall 211 can be arranged along the circumference of the turntable side wall 43 of the feeding mechanism 40, and at least part of the guide wall 211 is constructed as an inclined wall. For example, one-half, one-third, etc. of the guide wall 211 can be constructed as an inclined wall, but the present invention is not limited to this. The guide wall 211 can also have other proportions constructed as an inclined wall, as long as at least part of the guide wall 211 is constructed as an inclined wall. The lowest point of the inclined wall is set corresponding to the discharge port 12, the lowest point of the inclined wall can be set corresponding to the lowest point of the discharge port 12, and the lowest point of the inclined wall can also be set corresponding to between the highest point and the lowest point of the discharge port 12, so that when the catalyst falls to the guide wall 211, it can roll toward the discharge port 12, thereby prompting the catalyst to be quickly discharged from the discharge port 12 to the discharge buffer space 21, so as to avoid the catalyst from accumulating in the discharge buffer space 21, thereby improving the working efficiency of the processing device 100.

[0056] According to some embodiments of the present invention, Figure 1 As shown, the guide wall 211 and the bottom wall of the installation space 20 are spaced apart to form a feed channel 22 between the guide wall 211 and the bottom wall of the installation space 20, and the feed port 11 is located below the highest point of the guide wall 211. The catalyst entering the installation space 20 from the feed port 11 moves toward the feeding mechanism 40 through the feed channel 22.

[0057] The guide wall 211 is spaced apart from the bottom wall of the installation space 20 to form a feed channel 22 between the guide wall 211 and the bottom wall of the installation space 20, so that the feed channel 22 is separated from the discharge buffer space 21, thereby preventing the impregnated catalyst from mixing with the unimpregnated catalyst. The feed channel 22 and the discharge buffer space 21 constitute the installation space 20. The feed port 11 is located below the highest point of the guide wall 211. The catalyst entering the installation space 20 from the feed port 11 moves toward the feeding mechanism 40 through the feed channel 22. This arrangement can not only separate the feed channel 22 from the discharge buffer space 21, but also increase the spatial volume of the feed channel 22 so that the catalyst can smoothly enter the feeding mechanism 40 from the feed channel 22, reducing the risk of catalyst blockage and accumulation. The feed port 11 is located below the highest point of the guide wall 211, so that the catalyst that falls from the feeding mechanism 40 to the position of the guide wall 211 corresponding to the feed port 11 can spontaneously roll toward the discharge port 12, which helps to reduce the blockage and accumulation of the catalyst in the discharge buffer space 21, and can also improve the working efficiency of the processing device 100 and reduce the energy consumption of the processing device 100.

[0058] According to some embodiments of the present invention, Figure 2 As shown, the spray mechanism 30 may include: a plurality of spray heads 31 , and the plurality of spray heads 31 are arranged along the circumference of the installation space 20 .

[0059] Among them, the injection mechanism 30 may include: a plurality of nozzles 31, for example: the injection mechanism 30 may include two, three, four or the like nozzles 31, but the present invention is not limited thereto, and the injection mechanism 30 may also have other numbers of nozzles 31, as long as the injection mechanism 30 includes a plurality of nozzles 31. This application is described by taking the injection mechanism 30 including four nozzles 31 as an example. The plurality of nozzles 31 are evenly arranged along the circumference of the installation space 20, which can ensure that the injection mechanism 30 evenly sprays the impregnation liquid onto the catalyst, thereby ensuring the impregnation effect of the catalyst. The number and spacing of the nozzles 31 can be reasonably designed according to the shape, size and properties of the catalyst and the impregnation liquid to ensure the impregnation effect.

[0060] The injection mechanism 30 may also include a delivery pipeline 32, one end of which is connected to the nozzle 31, and the other end of which is connected to the impregnation liquid supply device, so that the delivery pipeline 32 delivers the impregnation liquid from the impregnation liquid supply device to the nozzle 31, and the nozzle 31 sprays the impregnation liquid onto the surface of the catalyst to achieve impregnation of the catalyst.

[0061] As an example of the present application, the flow rate of the nozzle 31 can be reasonably calculated based on the conveying volume of the spiral disk structure, the water absorption rate of the catalyst and other parameters. For example: the water absorption rate of the catalyst is 70%, the conveying volume of the spiral disk structure is 2kg / min, and the mass fraction of the active component in the impregnation liquid is a saturated solution of 40%, that is, the total flow rate of the four nozzles 31 is 3500ml / min, and the flow rate of a single nozzle 31 is 875ml / min, which can achieve precise impregnation of the catalyst without the need for additional treatment of excess impregnation liquid, thereby reducing the processing cost of the catalyst.

[0062] According to some embodiments of the present invention, Figure 1 As shown, the feed port 11 and the discharge port 12 are located on opposite sides of the feeding mechanism 40 , and the setting height of the feed port 11 is the same as the setting height of the discharge port 12 .

[0063] The feed port 11 and the discharge port 12 are located on opposite sides of the feeding mechanism 40, which helps the catalyst to form a stable flow path inside the processing device 100, so as to avoid accumulation or blockage of the catalyst during transportation, which is beneficial to improving the working efficiency of the processing device 100. The setting height of the feed port 11 and the setting height of the discharge port 12 are the same, which helps to maintain the load balance on both sides of the processing device 100, thereby helping to extend the service life of the processing device 100 and reduce failures and maintenance costs caused by load imbalance.

[0064] According to some embodiments of the present invention, Figure 1 As shown, both the feed port 11 and the discharge port 12 may be provided with a first opening and closing valve 13. The first opening and closing valve 13 at the feed port 11 may be used to open or close the feed port 11, and the first opening and closing valve 13 at the discharge port 12 may be used to open or close the discharge port 12. When the processing device 100 is working normally, the first opening and closing valve 13 at the feed port 11 and the first opening and closing valve 13 at the discharge port 12 are both opened, so that the catalyst can normally enter the feeding mechanism 40 from the feed port 11 and move out of the discharge buffer space 21 from the discharge port 12, thereby allowing the catalyst impregnation process to proceed normally to meet the normal working requirements of the processing device 100. When the processing device 100 is not working, the first opening and closing valve 13 may be closed so that both the feed port 11 and the discharge port 12 are closed to prevent impurities such as water vapor and dust in the air from entering the installation space 20, thereby keeping the processing device 100 dry and clean.

[0065] According to some embodiments of the present invention, Figure 1 As shown, a side wall of the installation space 20 may also be formed with an inspection hole 14 , the inspection hole 14 is in communication with the installation space 20 , and the inspection hole 14 is provided with a second opening and closing valve 15 .

[0066] Among them, the side wall of the installation space 20 can also be formed with an inspection hole 14, the inspection hole 14 is connected to the installation space 20, and the inspection hole 14 is provided with a second opening and closing valve 15, and the second opening and closing valve 15 can be used to open or close the inspection hole 14. When the treatment device 100 is working normally, the second opening and closing valve 15 closes the inspection hole 14 to prevent the catalyst from falling out of the installation space 20 from the inspection hole 14. When the treatment device 100 fails, the treatment device 100 can be shut down first and the second opening and closing valve 15 can be opened to check the internal situation of the treatment device 100 and perform maintenance. There is no need to disassemble the entire treatment device 100, thereby reducing the difficulty of maintenance of the treatment device 100, and can also shorten the maintenance time and reduce the maintenance cost.

[0067] According to some embodiments of the present invention, Figure 1 As shown, the processing device 100 may further include: a bracket 60 , and the housing 10 is disposed on the upper surface of the bracket 60 .

[0068] The housing 10 is disposed on the upper surface of the bracket 60, for example, the housing 10 and the bracket 60 may be integrally formed, or the housing 10 and the bracket 60 may be fixedly connected by welding or screwing, so that the housing 10 is disposed on the upper surface of the bracket 60. The bracket 60 may also include a supporting leg 61 and a supporting beam 62, and there may be multiple supporting legs 61, for example, there may be four supporting legs 61, and the four supporting legs 61 are used to support the housing 10 and provide a stable working environment for the housing 10.

[0069] There can be multiple support beams 62, one ends of the multiple support beams 62 can be connected to the bottom wall of the shell 10, and the other ends of the multiple support beams 62 extend and connect downward and toward the central axis of the shell 10 to form an installation structure corresponding to the rotating shaft 42. The installation structure is used to install the drive mechanism 50. The installation structure can be formed with an installation groove, an installation hole, etc., so as to ensure that the drive mechanism 50 is correctly docked with the rotating shaft 42. Along the height direction of the processing device 100, the lower end of the rotating shaft 42 can be penetrated through the bottom wall of the shell 10, and the upper end of the driving mechanism 50 is connected to the lower end of the rotating shaft 42. The driving mechanism 50 can drive the rotating shaft 42 to rotate. When the rotating shaft 42 rotates, it will drive the spiral blade 41 to rotate together. The rotation of the spiral blade 41 continuously transports the catalyst upward, and the catalyst is continuously and stably delivered to the top of the spiral disk structure. While the catalyst is transported to the top of the spiral disk structure, the injection mechanism 30 can spray the impregnation liquid onto the catalyst at the top of the spiral disk structure to achieve the impregnation of the catalyst. The impregnated catalyst falls into the discharge buffer space 21 and is discharged from the discharge port 12. In this way, the effect of continuous impregnation of the catalyst can be achieved, which greatly improves the production efficiency, and there is no need for additional treatment of excess impregnation liquid, thereby reducing the processing cost of the catalyst.

[0070] In general, the working process of the processing device 100 is as follows: the catalyst can be continuously fed from the feed port 11 to the installation space 20 manually, or other mechanical equipment can be used to continuously feed the catalyst from the feed port 11 to the installation space 20. The catalyst entering the installation space 20 from the feed port 11 moves toward the feeding mechanism 40 through the feed channel 22. The driving mechanism 50 can drive the rotating shaft 42 to rotate. When the rotating shaft 42 rotates, the spiral blade 41 will be driven to rotate together. The rotation of the spiral blade 41 will continuously transport the catalyst upward to transport the catalyst from the feed port 11 to the top of the feeding mechanism 40, and due to the directional thrust of the spiral blade 41, the catalyst is continuously and stably fed to the top of the spiral disk structure and then pushed to fall into the discharge buffer space 21. While the catalyst is transported to the top of the spiral disk structure, the injection mechanism 30 can spray the impregnation liquid onto the catalyst at the top of the spiral disk structure to impregnate the catalyst. The impregnated catalyst falls into the discharge buffer space 21 and is discharged from the discharge port 12. Thereby, the effect of continuous impregnation of catalyst can be achieved, which greatly improves the production efficiency.

[0071] Furthermore, the processing device 100 of the present application can also be used for drying operations of catalysts. When the catalyst needs to be dried, the injection mechanism 30 can be replaced with a drying mechanism to dry the catalyst.

[0072] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0073] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A catalyst treatment device, characterized in that: include: A housing, wherein the housing defines an installation space, a side wall of the installation space is formed with a feed inlet and a discharge port, and the feed inlet and the discharge port are both in communication with the installation space; an injection mechanism, the injection mechanism being disposed on the housing and being used to inject a substance into the installation space; A feeding mechanism is disposed in the installation space, and is used to transport the catalyst entering the installation space from the feed port in the installation space so that the injection mechanism can inject material onto the catalyst, and the feeding mechanism is also used to make the catalyst on the feeding mechanism fall into the installation space.

2. The processing device according to claim 1, characterized in that The injection mechanism is arranged on the top wall of the installation space. Along the height direction of the processing device, the feeding mechanism and the injection mechanism are arranged correspondingly. The feeding mechanism is used to transport the catalyst toward the injection mechanism.

3. The processing device according to claim 2, characterized in that The feeding mechanism is constructed as a spiral disc structure, and the spiral disc structure is rotatably arranged on the shell.

4. The processing device according to claim 3, characterized in that Also includes: A driving mechanism is connected to the feeding mechanism in a transmission manner, and is used to drive the feeding mechanism to rotate.

5. The processing device according to claim 3, characterized in that The rotation speed of the spiral disk structure is V, which satisfies the relationship: 10rpm / min≤V≤30rpm / min.

6. The processing device according to claim 1, characterized in that Part of the installation space is constructed as a discharge buffer space, which is arranged around the feeding mechanism along the circumference of the processing device, and is connected to the discharge port. The feeding mechanism is used to make the catalyst on the feeding mechanism fall into the discharge buffer space.

7. The processing device according to claim 6, characterized in that A guide wall is provided in the discharge buffer space, and the guide wall is arranged around the feeding mechanism along the circumference of the processing device. At least part of the guide wall is constructed as an inclined wall, and the lowest point of the inclined wall is arranged corresponding to the discharge port.

8. The processing device according to claim 7, characterized in that The guide wall and the bottom wall of the installation space are spaced apart to form a feed channel between the guide wall and the bottom wall of the installation space. The feed port is located below the highest point of the guide wall. The catalyst entering the installation space from the feed port moves toward the feeding mechanism through the feed channel.

9. The processing device according to claim 1, characterized in that The spraying mechanism includes: a plurality of spray heads, and the plurality of spray heads are arranged along the circumference of the installation space.

10. The processing device according to any one of claims 1 to 9, characterized in that: The feed inlet and the discharge outlet are located on opposite sides of the feeding mechanism, and the feed inlet is arranged at the same height as the discharge outlet.

11. The processing device according to any one of claims 1 to 9, characterized in that: The feed port and the discharge port are both provided with a first opening and closing valve.

12. The processing device according to any one of claims 1 to 9, characterized in that: A side wall of the installation space is also formed with an inspection hole, the inspection hole is communicated with the installation space, and the inspection hole is provided with a second opening and closing valve.

13. The processing device according to any one of claims 1 to 9, characterized in that: Also includes: The bracket is provided with the outer shell on the upper surface of the bracket.

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