Non-stop plasma cleaning device for cleaning vacuum pump

Abstract

The non-stop plasma cleaning device comprises a rack body, a power cabinet is arranged on one side of the rack body, a supporting frame is fixedly installed in the power cabinet, an integrated air supply assembly is fixedly installed on one side of the supporting frame, and a switchboard is fixedly installed on one side of the top end of the supporting frame; a controller body is fixedly installed at the bottom end of the supporting frame, a power supply assembly is fixedly installed on one side of the top end of the power cabinet, and a programmable controller is fixedly installed in the middle of the inner wall of the rack body. The power cabinet is arranged, the integrated power cabinet comprises an integrated gas supply assembly, a switchboard and a programmable logic controller, an injection pipeline and an exhaust pipeline which are installed on the power cabinet are used for protecting special gas in a conveying mode, and the use safety of the device is improved.

Description

Technical Field

[0001] The invention relates to the technical field of pipeline cleaning systems, and in particular to a non-stop plasma cleaning device for cleaning a vacuum pump. Background Art

[0002] Chemical vapor deposition is a chemical technology that is mainly used to form thin films on the surface of substrates through chemical reactions. This technology uses one or more gaseous compounds or single substances containing thin film elements to react chemically under specific conditions to form the desired thin film on the substrate. The basic principle of chemical vapor deposition is to introduce the vapor of gaseous reactants or liquid reactants containing thin film elements and other gases required for the reaction into the reaction chamber at a certain temperature, and chemical reactions occur on the surface of the substrate to form thin films. The specific process includes the following steps: the reactants form volatile substances at high temperatures: the reactants enter the reaction chamber in gaseous form and are activated in the reaction chamber; the volatile substances begin to diffuse and contact the substrate: the activated reactants react on the surface of the substrate to form a thin film; a chemical deposition reaction occurs on the substrate to form a thin film: the reactants continuously enter the reaction chamber and react with the surface of the substrate to form a thin film. The growth rate of the thin film is affected by the reaction conditions and the concentration of the reactants.

[0003] Chemical vapor deposition process is an important process application technology for semiconductor wafer processing. Chemical vapor deposition equipment is equipment used for chemical vapor deposition process. In the equipment cavity, the wafer is exposed to one or more chemical precursors, and chemical reactions continue to occur under a specific process environment to form thin film deposition. In the chemical vapor deposition equipment in the semiconductor production process, a vacuum pump is usually used to provide a vacuum environment for the cavity. The equipment cavity and the vacuum pump are connected by a pipeline. The vacuum pump rotates between the internal rotors to draw the gas in the cavity through the vacuum pipeline, through the air inlet of the vacuum pump, and then discharged through the exhaust port after compression, thereby continuously providing a vacuum process environment for the cavity.

[0004] However, the application of chemical vapor deposition equipment with traditional chamber remote plasma cleaning technology has the following disadvantages:

[0005] Since the chemical vapor deposition process will produce many by-products during the production process, such as white silicon oxide powder and dark brown hydrocarbon organic compounds, these by-products will adhere to the rotor of the vacuum pump during the process of being discharged through the vacuum pipe via the vacuum pump. After accumulation, it will affect the gap between the rotors, thereby causing the vacuum pump's ability to compress the gas to decrease, resulting in a decrease in the vacuum degree of the equipment, or directly causing the vacuum pump to get stuck after accumulating to a certain extent. This situation will affect the service life of the vacuum pump, directly lead to an increase in the cost of use, and at the same time affect the operating efficiency of the chemical vapor deposition equipment. Summary of the invention

[0006] The object of the present invention is to provide a non-stop plasma cleaning device for cleaning vacuum pumps, so as to solve the problem raised in the above background technology that the chemical vapor deposition process will produce many by-products in the production process, such as white silicon oxide powder and dark brown hydrocarbon organic compounds. These by-products will adhere to the rotor of the vacuum pump during the discharge through the vacuum pipe via the vacuum pump. After accumulation, it will affect the gap between the rotors, thereby causing the vacuum pump's ability to compress the gas to decrease, resulting in a decrease in the vacuum degree of the equipment, or directly causing the vacuum pump to get stuck after accumulating to a certain extent. This situation will affect the service life of the vacuum pump, directly lead to an increase in the cost of use, and at the same time affect the operating efficiency of the chemical vapor deposition equipment.

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a non-stop plasma cleaning device for vacuum pump cleaning, comprising a frame body, a power cabinet is provided on one side of the frame body, a support frame is fixedly installed inside the power cabinet, an integrated gas supply component is fixedly installed on one side of the support frame, a distribution board is fixedly installed on one side of the top of the support frame, a controller body is fixedly installed on the bottom end of the support frame, a power supply component is fixedly installed on one side of the top of the power cabinet, a programmable controller is fixedly installed on the middle part of the inner wall of the frame body, a plasma generator carrier plate is fixedly installed on the top of the frame body, a remote plasma generator is fixedly installed on the top of the plasma generator carrier plate, a first ion introduction tube is fixedly connected to the bottom end of the remote plasma generator, and the first ion introduction tube is fixedly connected to the bottom end of the remote plasma generator. One end of an ion introduction tube away from a remote plasma generator is fixedly connected to a second ion introduction tube, one side of the remote plasma generator is provided with a gas supply pipeline mechanism, a gate valve is fixedly installed at the connection between the first ion introduction tube and the second ion introduction tube, a vacuum gauge is installed in the middle of the gas supply pipeline mechanism, a control panel box is fixedly installed at the top of the remote plasma generator, a control panel is fixedly installed at the top of the control panel box, the gas supply pipeline mechanism includes a gas manifold and a gas transmission pipe, the middle of the gas manifold is fixedly connected to one end of the gas transmission pipe, one end of the gas manifold is fixedly connected to a gas injection pipeline, and the remote plasma generator bearing plate is made of a whole aluminum block, with protrusions on all sides and a circular hole in the middle; it is connected to the frame body through corresponding screw holes.

[0008] As a preferred technical solution of the present invention, a normally closed valve is fixedly installed between the gas manifold and the gas transmission pipe, and a normally open valve is connected to the third end of the gas manifold away from the gas injection pipeline and the gas transmission pipe.

[0009] As a preferred technical solution of the present invention, the power supply component includes a power supply frame and a length frame, a positioning shell is provided on one side of the power supply frame, the top of the positioning shell is slidably connected to the bottom end of the length frame, both sides of the inner wall of the length frame are rotatably connected with connecting shafts, a direction plate is rotatably connected between the two connecting shafts, one end of the two sides of the direction plate is fixedly installed with a movable rod, both sides of the power supply frame are provided with movable grooves, the two movable grooves are respectively arranged corresponding to the two movable rods, a solar panel is fixedly installed on the top of the direction plate, the bottom end of the power supply frame and the bottom end of the positioning shell are fixedly connected to the power cabinet, the length frame slides relative to the positioning shell, the length frame drives the direction plate to deflect at an angle through the connecting shaft, the direction plate slides relative to the movable groove through the movable rod, the direction plate deflects at an angle relative to the power supply frame, and the power supply angle of the solar panel is adjusted.

[0010] As a preferred technical solution of the present invention, a connecting air pipe is fixedly connected to the surface of the remote plasma generator, an end of the connecting air pipe away from the remote plasma generator is fixedly connected to the side opposite to the integrated air supply assembly, one side of the power cabinet is fixedly connected to an injection pipe, and the top of the power cabinet is fixedly connected to an exhaust pipe on the side away from the power supply assembly, and sealed doors are hinged on both sides of the front of the power cabinet, and the integrated air supply assembly and the connecting air pipe connect the power cabinet and the remote plasma generator to guide the clean gas.

[0011] The cam is an airbag that is fixedly mounted on the bottom of the power cabinet, and the mobile assembly includes a lifting cylinder and a lifting platform. The fixed end of the lifting cylinder is fixedly connected to the middle part of the top of the lifting platform. The four corners at the bottom of the lifting platform are fixedly mounted with moving wheels. The four corners at the top of the lifting platform are slidably connected with lifting rods. The bottom ends of the four lifting rods are fixedly mounted with suction cups. The surface of the lifting platform is fixedly mounted with connecting springs. The top ends of the four connecting springs and the movable end of the lifting cylinder are fixedly connected to the power cabinet. The lifting cylinder performs telescopic movement, and the lifting cylinder pushes the lifting platform from the top to adjust the height of the moving wheel. The moving wheel contacts the ground, and the moving wheel rotates relative to the friction of the ground, which is convenient for users to transfer and transport the power cabinet. During the lifting of the lifting platform, the connecting spring is pulled, and the connecting spring undergoes elastic deformation to buffer the pulling force.

[0012] As a preferred technical solution of the present invention, one end of the gas transmission tube away from the gas manifold is fixedly connected to the side directly opposite the remote plasma generator, the middle part of the gas transmission tube is connected to the vacuum gauge, a branch of the gas manifold is connected to one end of the normally closed valve, and the other end of the normally closed valve is connected to the air inlet of the remote plasma generator.

[0013] As a preferred technical solution of the present invention, a signal trigger mechanism is connected to one side of the programmable controller, and a first pressure sensor and a second pressure sensor are arranged in the signal trigger mechanism, and both the first pressure sensor and the second pressure sensor are connected to the programmable controller.

[0014] As a preferred technical solution of the present invention, the first ion introduction tube comprises an outer tube, a first outer tube flange and a second outer tube flange, the two ends of the outer tube are connected to the inner tube through the first outer tube flange and the second outer tube flange respectively, the two ends of the inner tubes facing away from each other are respectively installed with the first inner tube flange and the second inner tube flange, the surface of the outer tube is fixedly connected with two symmetrically arranged cooling water connecting pipes, the middle part of the outer tube is fixedly installed with a water diversion isolation baffle, the surface of the elbow part arranged at one end of the inner tube is fixedly installed with a water baffle, the elbow part is divided into a 90-degree arc elbow, the first ion introduction tube has a water cooling structure, the outlet of the remote plasma generator is connected with the first ion introduction tube and the second ion introduction tube, the first ion introduction tube is an L-shaped elbow pipe with a water cooling structure, and the water baffle and the water diversion isolation baffle are evenly opened with small holes for water flow to pass through.

[0015] As an optimal technical solution of the present invention, a frame cover is snap-fitted and installed on the surface of the frame body, and four corners of the bottom end of the frame body are threadedly installed with adjusting feet, and the four adjusting feet each include a height rod and a shock-absorbing foot, the bottom end of the height rod is fixedly connected to the top end of the shock-absorbing foot, the middle part of the height rod is installed with a height shell, and the middle part of the height shell is fixedly installed with an assembly table, spring shock absorbers are fixedly installed on both sides of the top end of the assembly table, and mounting plates are fixedly installed on the top ends of the two spring shock absorbers, and screw rods are rotatably connected to the top ends of the two mounting plates, and the top ends of the two screw rods are threadedly connected to the frame body. The snap-fit ​​installation of the frame cover increases the sealing of the frame body itself, and the user rotates the screw rod, and the thread on the surface of the screw rod matches the thread on the inner wall of the frame body, so that the screw rod rotates and rises relative to the frame body to complete the assembly of the adjusting feet, and when located in a vibrating use place, the spring shock absorber weakens the generated vibration force, thereby improving the stability of the adjustment foot support.

[0016] As a preferred technical solution of the present invention, a first leakage collecting tray is fixedly installed on the bottom end of the inner wall of the frame body, and a second leakage collecting tray is fixedly installed on the top end of the inner wall of the frame body, the first leakage collecting tray and the second leakage collecting tray both include a leakage collecting shell and four pulling shells, the two ends on both sides of the leakage collecting shell are respectively fixedly connected to one end of the four pulling shells, the four pulling shells are slidably connected to one end of the leakage collecting shell with a pull rod, the four pull rods are fixedly installed on one end of the pulling shell with a pulley, the top end of the leakage collecting shell is clamped with a tray, the four corners of the bottom end of the leakage collecting shell are fixedly installed with a loading rack, and the four pulleys are slidably connected to the frame body.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] 1. The present invention cleans the vacuum pump used in chemical vapor deposition equipment without stopping the machine, thereby extending the service life of the vacuum pump and improving production efficiency;

[0019] 2. By setting up a power cabinet, the integrated power cabinet includes an integrated gas supply component, a distribution board, a programmable logic controller, and the injection pipe and exhaust pipe installed on the power cabinet are used to transport special gases for protection, thereby improving the safety of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A perspective view of the present invention;

[0021] Figure 2 It is a rear view of the present invention;

[0022] Figure 3 It is a front view of the present invention;

[0023] Figure 4 It is a schematic diagram of the connection between the remote plasma generator and the gas pipeline mechanism of the present invention;

[0024] Figure 5 It is a connection diagram of the signal trigger mechanism of the present invention;

[0025] Figure 6 is an external view of a first ion introduction tube of the present invention;

[0026] Figure 7 This is a view inside the first ion introduction tube of the present invention;

[0027] Figure 8 This is a schematic diagram of the cleaning process of the front vacuum pipeline of the present invention;

[0028] Fig. 9 is a cross-sectional view of the power cabinet of the present invention;

[0029] Fig.10 It is a side view of the power supply assembly of the present invention;

[0030] Fig.11 is a side view of the mobile assembly of the present invention;

[0031] Fig.12 A side view of the adjustable foot of the present invention;

[0032] Fig.13 It is a side view of the first spill containment tray of the present invention.

[0033] In the figure: 1, rack body; 2, programmable controller; 3, remote plasma generator; 4, control panel; 5, control panel box; 6, vacuum gauge; 7, gas supply pipeline mechanism; 701, gas transmission pipe; 702, normally closed valve; 703, normally open valve; 704, gas manifold; 8, gate valve; 9, first leak tray; 91, leak shell; 92, tray; 93, loading rack; 94, pulling shell; 95, pull rod; 96, pulley; 10, Second spill tray; 11, adjusting foot; 111, shock-absorbing foot; 112, height rod; 113, height shell; 114, assembly table; 115, spring shock absorber; 116, mounting plate; 117, screw rod; 12, first ion introduction tube; 1201, first inner tube flange; 1202, first outer tube flange; 1203, cooling water pipe; 1204, outer tube; 1205, inner tube; 1206, second inner tube flange; 1207, second Outer pipe flange; 1208, water baffle; 1209, elbow part; 1210, water diversion isolation baffle; 13, second ion introduction tube; 14, plasma generator bearing plate; 15, rack cover; 16, signal trigger mechanism; 1601, first pressure sensor; 1602, second pressure sensor; 17, power cabinet; 18, exhaust pipe; 19, injection pipe; 20, connecting air pipe; 21, support frame; 22, integrated air supply assembly; 23. Distribution board; 24. Controller body; 25. Sealed door; 26. Power supply assembly; 261. Power supply rack; 262. Movable slot; 263. Movable rod; 264. Positioning shell; 265. Length rack; 266. Connecting shaft; 267. Steering plate; 268. Solar panel; 27. Moving assembly; 271. Lifting platform; 272. Moving wheel; 273. Suction cup; 274. Lifting rod; 275. Connecting spring; 276. Lifting cylinder. DETAILED DESCRIPTION

[0034] The following will be combined with the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0035] See also Figure 1-13The present invention provides a non-stop plasma cleaning device for vacuum pump cleaning, comprising a frame body 1, a power cabinet 17 is arranged on one side of the frame body 1, a support frame 21 is fixedly installed inside the power cabinet 17, an integrated gas supply component 22 is fixedly installed on one side of the support frame 21, a distribution board 23 is fixedly installed on one side of the top of the support frame 21, a controller body 24 is fixedly installed on the bottom end of the support frame 21, a power supply component 26 is fixedly installed on one side of the top of the power cabinet 17, a programmable controller 2 is fixedly installed on the middle of the inner wall of the frame body 1, a plasma generator carrier plate 14 is fixedly installed on the top of the frame body 1, a remote plasma generator 3 is fixedly installed on the top of the plasma generator carrier plate 14, a first ion introduction tube 12 is fixedly connected to the bottom end of the remote plasma generator 3, and an end of the first ion introduction tube 12 away from the remote plasma generator 3 is fixedly connected to A second ion introduction tube 13 and a gas supply pipeline mechanism 7 are provided on one side of the remote plasma generator 3. A gate valve 8 is fixedly installed at the connection between the first ion introduction tube 12 and the second ion introduction tube 13. A vacuum gauge 6 is installed in the middle of the gas supply pipeline mechanism 7. A control panel box 5 is fixedly installed on the top of the remote plasma generator 3. A control panel 4 is fixedly installed on the top of the control panel box 5. The gas supply pipeline mechanism 7 includes a gas manifold 704 and a gas transmission tube 701. The middle of the gas manifold 704 is fixedly connected to one end of the gas transmission tube 701. One end of the gas manifold 704 is fixedly connected to a gas injection pipeline. The plasma generator carrier plate 14 is processed from a whole piece of aluminum block, with raised edges and a circular hole in the middle; there are corresponding 4 screw holes for connection with the frame body 1. The control panel box 5 is low in front and high in the back, with an inclined top and grooves on the side for the gas transmission tube 701 to pass through.

[0036] A normally closed valve 702 is fixedly installed between the gas manifold 704 and the gas transmission tube 701 , and a normally open valve 703 is connected to the third end of the gas manifold 704 away from the gas injection pipeline and the gas transmission tube 701 .

[0037] The power supply assembly 26 includes a power supply frame 261 and a length frame 265. A positioning shell 264 is provided on one side of the power supply frame 261. The top of the positioning shell 264 is slidably connected to the bottom of the length frame 265. Both sides of the inner wall of the length frame 265 are rotatably connected with connecting shafts 266. A direction plate 267 is rotatably connected between the two connecting shafts 266. One end of both sides of the direction plate 267 is fixedly installed with a movable rod 263. Both sides of the power supply frame 261 are provided with movable grooves 262. The two movable grooves 262 are respectively connected to the two movable rods 263. Correspondingly, a solar panel 268 is fixedly installed on the top of the direction plate 267, the bottom end of the power supply frame 261 and the bottom end of the positioning shell 264 are fixedly connected to the power cabinet 17, the length frame 265 slides relative to the positioning shell 264, and the length frame 265 drives the direction plate 267 to deflect at an angle through the connecting shaft 266. The direction plate 267 slides relative to the movable groove 262 through the movable rod 263, and the direction plate 267 deflects at an angle relative to the power supply frame 261 to adjust the power supply angle of the solar panel 268.

[0038] A connecting air pipe 20 is fixedly connected to the surface of the remote plasma generator 3, and one end of the connecting air pipe 20 away from the remote plasma generator 3 is fixedly connected to the side directly opposite to the integrated air supply component 22. An injection pipe 19 is fixedly connected to one side of the power cabinet 17, and an exhaust pipe 18 is fixedly connected to the side of the top of the power cabinet 17 away from the power supply component 26. Sealed doors 25 are hinged on both sides of the front of the power cabinet 17. The integrated air supply component 22 and the connecting air pipe 20 connect the power cabinet 17 and the remote plasma generator 3 to guide the clean gas.

[0039] A moving assembly 27 is fixedly installed at the bottom of the power cabinet 17. The moving assembly 27 includes a lifting cylinder 276 and a lifting platform 271. The fixed end of the lifting cylinder 276 is fixedly connected to the middle of the top of the lifting platform 271. The four corners at the bottom of the lifting platform 271 are fixedly installed with moving wheels 272. The four corners at the top of the lifting platform 271 are slidably connected with lifting rods 274. The bottom ends of the four lifting rods 274 are fixedly installed with suction cups 273. The surface of the lifting platform 271 is fixedly installed with connecting springs 275. The top of the connecting spring 275 and the movable end of the lifting cylinder 276 are fixedly connected to the power cabinet 17. The lifting cylinder 276 performs telescopic movement. The lifting cylinder 276 pushes the lifting platform 271 from the top to adjust the height of the moving wheel 272. The moving wheel 272 is in contact with the ground, and the moving wheel 272 rotates relative to the friction of the ground, which is convenient for the user to transfer and transport the power cabinet 17. During the lifting and lowering of the lifting platform 271, the connecting spring 275 is pulled, and the connecting spring 275 undergoes elastic deformation to buffer the pulling force.

[0040] One end of the gas transmission tube 701 away from the gas manifold 704 is fixedly connected to the side directly opposite the remote plasma generator 3, the middle part of the gas transmission tube 701 is connected to the vacuum gauge 6, a branch of the gas manifold 704 is connected to one end of the normally closed valve 702, and the other end of the normally closed valve 702 is connected to the air inlet of the remote plasma generator 3. A pressure gauge is installed on the gas transmission tube 701 to monitor the system pressure.

[0041] A signal trigger mechanism 16 is connected to one side of the programmable controller 2. A first pressure sensor 1601 and a second pressure sensor 1602 are arranged in the signal trigger mechanism 16. The first pressure sensor 1601 and the second pressure sensor 1602 are both connected to the programmable controller 2. The pressure interface of the first pressure sensor 1601 in the signal trigger mechanism 16 is connected to the compressed air interface of the idle valve of the first chemical vapor deposition device. The signal interface of the first pressure sensor 1601 is connected to the programmable controller 2. The pressure interface of the second pressure sensor 1602 is connected to the compressed air interface of the idle valve of the second chemical vapor deposition device. The signal interface of the second pressure sensor 1602 is connected to the programmable controller 2. A gate valve 8 is installed between the first ion introduction tube 12 and the second ion introduction tube 13. The gate valve 8 is controlled by the programmable controller 2. It is opened when the front-stage pipeline cleaning system is working and closed when the front-stage pipeline cleaning system is not working.

[0042] The first ion introduction tube 12 comprises an outer tube 1204, a first outer tube flange 1202 and a second outer tube flange 1207. Both ends of the outer tube 1204 are connected to the inner tube 1205 through the first outer tube flange 1202 and the second outer tube flange 1207 respectively. The first inner tube flange 1201 and the second inner tube flange 1206 are respectively installed at the opposite ends of the two inner tubes 1205. The surface of the outer tube 1204 is fixedly connected with two symmetrically arranged cooling water pipes 1203. 04 is fixedly installed with a water diversion isolation baffle 1210 in the middle part, and a water baffle 1208 is fixedly installed on the surface of the elbow part 1209 set at one end of the inner tube 1205. The first ion introduction tube 12 has a water cooling structure. The air outlet of the remote plasma generator 3 is connected with the first ion introduction tube 12 and the second ion introduction tube 13. The first ion introduction tube 12 is an L-shaped elbow pipe with a water cooling structure. The water baffle 1208 and the water diversion isolation baffle 1210 are evenly provided with small holes for water to flow through.

[0043] The surface of the rack body 1 is snap-fitted with a rack cover 15, and the four corners at the bottom of the rack body 1 are threadedly installed with adjustable feet 11, and the four adjustable feet 11 include a height rod 112 and a shock-absorbing foot 111, and the bottom end of the height rod 112 is fixedly connected to the top of the shock-absorbing foot 111, and a height shell 113 is installed in the middle of the height rod 112, and an assembly platform 114 is fixedly installed in the middle of the height shell 113, and spring shock absorbers 115 are fixedly installed on both sides of the top of the assembly platform 114, and mounting plates 116 are fixedly installed on the tops of the two spring shock absorbers 115. The top ends of the two mounting plates 116 are rotatably connected with screw rods 117, and the top ends of the two screw rods 117 are threadedly connected to the frame body 1. The snap-fit ​​installation of the frame cover 15 increases the sealing performance of the frame body 1 itself. When the user rotates the screw rod 117, the threads on the surface of the screw rod 117 match the threads on the inner wall of the frame body 1, so the screw rod 117 rotates and rises relative to the frame body 1, completing the assembly of the adjustment foot 11. When located in a vibrating use location, the spring shock absorber 115 weakens the vibration force generated, thereby improving the stability of the support of the adjustment foot 11.

[0044] A first leak tray 9 is fixedly installed at the bottom end of the inner wall of the frame body 1, and a second leak tray 10 is fixedly installed at the top end of the inner wall of the frame body 1. A leakage detection belt is installed on the leak tray. The first leak tray 9 and the second leak tray 10 both include a leak shell 91 and four pulling shells 94. The two ends on both sides of the leak shell 91 are respectively fixedly connected to one end of the four pulling shells 94, and the ends of the four pulling shells 94 away from the leak shell 91 are slidably connected with pull rods 95, and the ends of the four pull rods 95 away from the pulling shells 94 are fixedly installed with pulleys 96. A tray 92 is mounted on the top of the leak shell 91, and a loading rack 93 is fixedly installed on the four corners of the bottom end of the leak shell 91, and the four pulleys 96 are slidably connected to the frame body 1.

[0045] In the present invention, the lifting cylinder 276 performs telescopic movement, and the lifting cylinder 276 pushes the lifting platform 271 from the top to adjust the height of the moving wheel 272. The moving wheel 272 contacts the ground, and the moving wheel 272 rotates relative to the friction of the ground, which is convenient for the user to transfer and transport the power cabinet 17. During the lifting and lowering of the lifting platform 271, the connecting spring 275 is pulled, and the connecting spring 275 undergoes elastic deformation to buffer the pulling force. The length frame 265 slides relative to the positioning shell 264, and the length frame 265 drives the direction plate 267 to deflect at an angle through the connecting shaft 266, and the direction plate 267 slides relative to the movable groove 262 through the movable rod 263. , the direction plate 267 is deflected relative to the power supply rack 261 to adjust the power supply angle of the solar panel 268. As an auxiliary system of the chemical vapor deposition equipment, the operation of the system cannot affect the operation of the main equipment, so the start signal must be given by the main equipment to avoid the working time of the main equipment; the front-stage pipeline cleaning system of the present invention cannot be controlled by the main equipment software, so except that the cleaning gas is referenced from the main equipment and controlled by the main equipment, all other working parameters and states of the front-stage pipeline cleaning system are controlled by the programmable controller 2, and the start signal of the main equipment must be effectively linked with the programmable controller 2 before the system can be started;The linkage method between the programmable controller of the front-stage vacuum pipeline cleaning system and the main equipment is as follows: two idle valves of the main equipment cavity, the idle valve of the first equipment and the idle valve of the second equipment, are selected. These two valves will not be used in any process of the main equipment. The main equipment control software is set at an appropriate time to switch the two valve states to open the idle valve of the first equipment and close the idle valve of the second equipment. These two valves are pneumatic valves. The open state of the idle valve of the first equipment corresponds to the compressed air state that controls it to be greater than or equal to 80psi, and the closed state of the idle valve of the second equipment corresponds to the compressed air state that controls it to be less than 5psi. The first pressure sensor 1601 is used to detect the compressed air pressure of the idle valve of the first equipment, and the pressure signal is converted into an electrical signal. The second pressure sensor 1602 is used to detect the compressed air pressure of the idle valve of the second equipment, and the pressure signal is converted into an electrical signal, thereby obtaining a set of binary signals of 10, and the signal is input into the programmable controller 2. The signal is set on the programmable controller 2 as the start signal for the pipeline cleaning system to start working. As above, the main equipment and the front-stage pipeline cleaning system complete the signal linkage. As long as the master device inputs the valve state that the idle valve of the first device is open and the idle valve of the second device is closed, the programmable controller 2 of the front-stage pipeline cleaning system will control the system to start. The front-stage pipeline cleaning system embodiment of the present invention: when the system is started, the normally closed valve 702 will be opened and the normally open valve 703 will be closed. At this time, the gas passage originally leading to the device is guided to the front-stage pipeline cleaning system. At the same time, the gate valve 8 will also be opened, and the ignition gas argon will be introduced into the system first. The argon passes through the normally open valve 703 and enters the remote plasma generator 3 through the gas transmission pipe 701. Ignition activation is performed. After successful activation, argon plasma is generated. Then nitrogen trifluoride and oxygen are introduced into the system. After entering the remote plasma generator 3, nitrogen trifluoride and oxygen are continuously ionized. The fluorine ions and oxygen ions generated by the ionization are guided along the first ion introduction tube 12, through the gate valve 8, and then through the second ion introduction tube 13 to the part of the front-stage pipeline that needs to be cleaned, and continuously react chemically with the attachments in the pipeline. At present, the two most common products in the chemical vapor deposition process are silicon compounds and carbon compounds. For silicon compounds, the main reaction principle is as follows: Si+F->SiF; 4 (gaseous) + other reaction byproducts; for carbon compounds, the main principle is as follows: C+O->CO 2+Other reaction by-products, after continuous chemical reaction, the original solid attachments are replaced by gaseous products by chemical reaction, and then are sucked away by the vacuum pump along the front-stage pipeline, thereby completing the cleaning of the front-stage pipeline. During the operation of the system, cooling water needs to be continuously introduced into the first ion introduction tube 12. The gas ionized by the remote plasma generator 3 has a very high temperature and energy, and will generate high temperature at the right angle of the first ion introduction tube 12, so cooling water needs to be continuously introduced to prevent the outer surface of the stainless steel pipeline from discoloring and oxidizing due to high temperature.

[0046] Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments, or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A non-stop plasma cleaning device for vacuum pump cleaning, comprising a frame body (1), characterized in that: A power cabinet (17) is provided on one side of the frame body (1), a support frame (21) is fixedly installed inside the power cabinet (17), an integrated gas supply assembly (22) is fixedly installed on one side of the support frame (21), a distribution board (23) is fixedly installed on one side of the top of the support frame (21), a controller body (24) is fixedly installed on the bottom of the support frame (21), a power supply assembly (26) is fixedly installed on one side of the top of the power cabinet (17), a programmable controller (2) is fixedly installed in the middle of the inner wall of the frame body (1), a plasma generator carrier plate (14) is fixedly installed on the top of the frame body (1), a remote plasma generator (3) is fixedly installed on the top of the plasma generator carrier plate (14), and the bottom of the remote plasma generator (3) is fixedly connected to a first ion introduction tube (12), One end of the first ion introduction tube (12) away from the remote plasma generator (3) is fixedly connected to the second ion introduction tube (13); a gas supply pipeline mechanism (7) is provided on one side of the remote plasma generator (3); a gate valve (8) is fixedly installed at the connection between the first ion introduction tube (12) and the second ion introduction tube (13); a vacuum gauge (6) is installed in the middle of the gas supply pipeline mechanism (7); a control panel box (5) is fixedly installed at the top of the remote plasma generator (3); a control panel (4) is fixedly installed at the top of the control panel box (5); the gas supply pipeline mechanism (7) comprises a gas guide manifold (704) and a gas transmission tube (701); the middle of the gas guide manifold (704) is fixedly connected to one end of the gas transmission tube (701); and one end of the gas guide manifold (704) is fixedly connected to a gas injection pipeline.

2. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: A normally closed valve (702) is fixedly installed between the gas guide manifold (704) and the gas transmission pipe (701), and a normally open valve (703) is connected to the third end of the gas guide manifold (704) away from the gas injection pipeline and the gas transmission pipe (701).

3. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: The power supply assembly (26) comprises a power supply frame (261) and a length frame (265). A positioning shell (264) is provided on one side of the power supply frame (261). The top end of the positioning shell (264) is slidably connected to the bottom end of the length frame (265). Both sides of the inner wall of the length frame (265) are rotatably connected with connecting shafts (266). A direction plate (267) is rotatably connected between the two connecting shafts (266). One end of both sides of the direction plate (267) is fixedly installed with a movable rod (263). Both sides of the power supply frame (261) are provided with movable grooves (262). The two movable grooves (262) are respectively arranged corresponding to the two movable rods (263). The top end of the direction plate (267) is fixedly installed with a solar panel (268). The bottom end of the power supply frame (261) and the bottom end of the positioning shell (264) are fixedly connected to the power cabinet (17).

4. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: The surface of the remote plasma generator (3) is fixedly connected to a connecting air pipe (20); one end of the connecting air pipe (20) away from the remote plasma generator (3) is fixedly connected to a side directly opposite to the integrated air supply component (22); one side of the power cabinet (17) is fixedly connected to an injection pipe (19); the top of the power cabinet (17) is fixedly connected to an exhaust pipe (18) on a side away from the power supply component (26); and both sides of the front of the power cabinet (17) are hinged with sealed doors (25).

5. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: A moving assembly (27) is fixedly mounted at the bottom end of the power cabinet (17), and the moving assembly (27) comprises a lifting cylinder (276) and a lifting platform (271). The fixed end of the lifting cylinder (276) is fixedly connected to the middle of the top end of the lifting platform (271). Moving wheels (272) are fixedly mounted at the four corners of the bottom end of the lifting platform (271). Lifting rods (274) are slidably connected to the four corners of the top end of the lifting platform (271). Suction cups (273) are fixedly mounted at the bottom ends of the four lifting rods (274). Connecting springs (275) are fixedly mounted on the surface of the lifting platform (271). The top ends of the four connecting springs (275) and the movable end of the lifting cylinder (276) are fixedly connected to the power cabinet (17).

6. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: One end of the gas transmission tube (701) away from the gas guide manifold (704) is fixedly connected to the side directly opposite to the remote plasma generator (3), and the middle part of the gas transmission tube (701) is connected to the vacuum gauge (6).

7. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: One side of the programmable controller (2) is connected to a signal trigger mechanism (16), and a first pressure sensor (1601) and a second pressure sensor (1602) are arranged inside the signal trigger mechanism (16), and the first pressure sensor (1601) and the second pressure sensor (1602) are both connected to the programmable controller (2).

8. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: The first ion introduction tube (12) comprises an outer tube (1204), a first outer tube flange (1202) and a second outer tube flange (1207); the two ends of the outer tube (1204) are respectively connected to the inner tube (1205) via the first outer tube flange (1202) and the second outer tube flange (1207); the two ends of the inner tubes (1205) which are separated from each other are respectively provided with the first inner tube flange (1201) and the second inner tube flange (1206); the surface of the outer tube (1204) is fixedly connected with two symmetrically arranged cooling water connecting pipes (1203); a water diversion isolation baffle (1210) is fixedly installed in the middle of the outer tube (1204); and a water baffle (1208) is fixedly installed on the surface of the elbow part (1209) arranged at one end of the inner tube (1205).

9. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: A frame cover plate (15) is mounted on the surface of the frame body (1), and four corners of the bottom end of the frame body (1) are threadedly mounted with adjusting feet (11), and the four adjusting feet (11) each comprise a height rod (112) and a shock absorbing foot (111), the bottom end of the height rod (112) is fixedly connected to the top end of the shock absorbing foot (111), a height shell (113) is mounted in the middle of the height rod (112), an assembly platform (114) is fixedly mounted in the middle of the height shell (113), spring shock absorbers (115) are fixedly mounted on both sides of the top end of the assembly platform (114), mounting plates (116) are fixedly mounted on the top ends of the two spring shock absorbers (115), screw rods (117) are rotatably connected to the top ends of the two mounting plates (116), and the top ends of the two screw rods (117) are threadedly connected to the frame body (1).

10. The non-stop plasma cleaning device for vacuum pump cleaning according to claim 1, characterized in that: A first leakage collecting tray (9) is fixedly mounted on the bottom end of the inner wall of the frame body (1), and a second leakage collecting tray (10) is fixedly mounted on the top end of the inner wall of the frame body (1). Both the first leakage collecting tray (9) and the second leakage collecting tray (10) comprise a leakage collecting shell (91) and four pulling shells (94). The two ends of both sides of the leakage collecting shell (91) are respectively fixedly connected to one end of the four pulling shells (94). The ends of the four pulling shells (94) away from the leakage collecting shell (91) are slidably connected to pull rods (95). The ends of the four pulling rods (95) away from the pulling shells (94) are fixedly mounted with pulleys (96). The top end of the leakage collecting shell (91) is clamped with a tray (92). The four corners of the bottom end of the leakage collecting shell (91) are fixedly mounted with a loading rack (93), and the four pulleys (96) are slidably connected to the frame body (1).

Images