Mask assembly, evaporation equipment and evaporation method

Abstract

The invention discloses a mask assembly, evaporation equipment and an evaporation method, the application number is CN202310335049.1, the application date is a divisional application of March 30, 2023, and the invention relates to the mask assembly, the evaporation equipment and the evaporation method, the mask assembly comprises at least one mask frame and a mask sheet arranged on the bearing surface of the mask frame; the mask frame comprises a mask frame and at least one support beam located in a surrounding area of the mask frame; and the bearing surface of the supporting beam is flush with the bearing surface of the mask frame. The problem that the mask sheet deforms due to gravity can be reduced, the method is suitable for mask sheets of various sizes, the alignment accuracy of the target substrate is improved, and the evaporation effect is improved.

Description

[0001] The present disclosure is: The invention name is a mask assembly, an evaporation device and an evaporation method, the application number is CN202310335049.1, and the application date is a divisional application on March 30, 2023. Technical Field

[0002] The present disclosure relates to the field of display technology, and in particular to a mask assembly, an evaporation device and an evaporation method. Background Art

[0003] OLED (Organic Light-Emitting Diode) displays are replacing LCD (Liquid Crystal Display) with their excellent performance. The evaporation machine used in the manufacture of OLED devices requires a fine metal mask (FMM). Displays manufactured using FMM have excellent performance.

[0004] The production of large-sized OLED devices requires large-sized substrates. The larger the size, the higher the production efficiency or the larger the size of the OLED device. Large-sized substrates require corresponding large-sized masks. The larger the size of the mask, the greater the deformation due to environmental influences such as gravity and temperature. Therefore, the deformation of the mask, especially large substrates, due to its own gravity is an urgent problem that needs to be solved, whether it is horizontal or vertical evaporation. Summary of the invention

[0005] In order to solve the above technical problems or at least partially solve the above technical problems, the present disclosure provides a mask assembly, an evaporation device and an evaporation method, which can reduce the problem of deformation of the mask sheet due to gravity, is suitable for mask sheets of various sizes, improves the alignment accuracy of the target substrate, and enhances the evaporation effect.

[0006] In a first aspect, the present disclosure provides a mask assembly, comprising at least one mask frame and a mask sheet disposed on a carrying surface of the mask frame;

[0007] The mask frame includes a mask frame and at least one supporting beam located in an area surrounded by the mask frame; a bearing surface of the supporting beam is flush with a bearing surface of the mask frame.

[0008] In some embodiments, the mask frame is provided with a plurality of sequentially arranged columns of the mask sheets; the extension direction of the mask sheets is parallel to the extension direction of the support beam; and the gap between two adjacent columns of the mask sheets in the same mask frame overlaps with the support beam.

[0009] In some embodiments, the edge of the mask sheet is fixed to the support beam and / or the mask frame.

[0010] In some embodiments, a gasket is provided at a gap between two adjacent columns of the mask sheets of the same mask frame; and the gasket is located on the support beam.

[0011] In some embodiments, the spacer is fixed to the support beam.

[0012] In some embodiments, the mask assembly includes a target substrate setting area, in which a target substrate is placed;

[0013] The gasket structure is fixed to the mask frame outside the target substrate setting area.

[0014] In some embodiments, a gap between two adjacent columns of the mask sheets in the same mask frame is smaller than a preset value.

[0015] In some embodiments, a bearing surface of the support beam is provided with a groove; and the mask sheet is fixed in the groove.

[0016] In some embodiments, a groove is provided on the bearing surface of the support beam, and an edge of the gasket is tightly fixed in the groove.

[0017] In some embodiments, a constant temperature liquid pipeline is provided in the support beam.

[0018] In some embodiments, the bearing surface of the support beam is provided with a groove; a support platform is provided in the groove;

[0019] The edge of the mask sheet is fixed in the groove, and the bearing surface of the supporting platform is flush with a side of the mask sheet away from the mask frame.

[0020] In some embodiments, the mask sheet disposed on the carrying surface of the mask frame is a whole-piece structure.

[0021] In some embodiments, the gasket at the gap between two adjacent columns of mask sheets of the same mask frame overlaps with the edges of the two adjacent columns of mask sheets, and the mask sheets are located on a side of the gasket away from the support beam.

[0022] In some embodiments, along an extension direction parallel to the support beam, a length of the spacer is smaller than a length of the mask.

[0023] In some embodiments, the mask frame and the support beam are integrally formed.

[0024] In some embodiments, x mask frames are included; each mask sheet on the x mask frames corresponds to an evaporation pattern;

[0025] The masks on the x mask frames are divided into x groups;

[0026] The mask sheets satisfying the i+nxth column are arranged in sequence according to the column number and set on the i-th mask frame to form the i-th mask plate;

[0027] The distance between the edges of the mask sheets in adjacent columns on the same mask frame is smaller than the sum of the widths of the mask sheets in other columns between the column numbers of the mask sheets in the adjacent columns;

[0028] Wherein, i and x are both positive integers, and i is less than or equal to x; x is greater than 1; and n is a non-negative integer.

[0029] In a second aspect, an embodiment of the present disclosure further provides an evaporation device, comprising an evaporation source and any one of the mask assemblies provided in the first aspect, wherein the mask assembly is disposed between the evaporation source and a target substrate.

[0030] In a second aspect, an embodiment of the present disclosure further provides an evaporation method using a mask assembly, which is applied to any mask assembly provided in the first aspect, and the method includes:

[0031] The mask assembly is used to perform vapor deposition on a target substrate.

[0032] Compared with the prior art, the technical solution provided by the embodiments of the present disclosure has the following advantages:

[0033] The present disclosure provides a mask assembly, including at least one mask frame and a mask sheet arranged on a bearing surface of the mask frame; the mask frame includes a mask frame and at least one support beam located in an area surrounded by the mask frame; the bearing surface of the support beam is flush with the bearing surface of the mask frame. The present disclosure provides a support beam in the mask frame, and the mask sheet is arranged above the support beam, and the support beam supports the mask sheet, wherein the size of the mask sheet can also be selected according to demand, and a large-sized mask sheet can also be supported by the support beam to prevent the mask sheet from being completely suspended on the mask frame, and then sagging due to gravity, causing the mask sheet to deform and affect the evaporation effect. The present disclosure can reduce the problem of deformation of the mask sheet due to gravity, is applicable to mask sheets of various sizes, improves the alignment accuracy of the target substrate, and enhances the evaporation effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present disclosure and, together with the description, serve to explain the principles of the present disclosure.

[0035] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0036] Figure 1 It is a structural schematic diagram of a mask plate in the prior art;

[0037] Figure 2 A structural schematic diagram of a mask assembly provided in an embodiment of the present disclosure;

[0038] Figure 3 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0039] Figure 4 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0040] Figure 5 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0041] Figure 6 A schematic cross-sectional view of a mask assembly along the AA' direction provided by an embodiment of the present disclosure;

[0042] Figure 7 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0043] Figure 8 A cross-sectional schematic diagram of a support beam provided in an embodiment of the present disclosure;

[0044] Fig. 9 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0045] Fig.10 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0046] Fig.11 A schematic cross-sectional view of another support beam provided in an embodiment of the present disclosure;

[0047] Fig.12 A schematic cross-sectional view of another support beam provided in an embodiment of the present disclosure;

[0048] Fig.13 A schematic cross-sectional view of another support beam provided in an embodiment of the present disclosure;

[0049] Fig.14 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0050] Fig.15 A schematic cross-sectional view of another support beam provided in an embodiment of the present disclosure;

[0051] Fig.16 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0052] Fig.17 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0053] Fig.18 A schematic cross-sectional view of another support beam provided in an embodiment of the present disclosure;

[0054] Fig.19 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0055] Fig. 20 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0056] Fig.21 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0057] Fig. 22 To adopt Fig.21 The mask assembly shown forms an evaporation pattern on a target substrate by evaporation;

[0058] Fig.23 The embodiment of the present disclosure provides Fig.21 A schematic diagram of the evaporation pattern of the left mask plate in the mask assembly shown after the first evaporation;

[0059] Fig.24 The embodiment of the present disclosure provides Fig.21 A schematic diagram of the evaporation pattern of the right mask plate in the mask assembly shown after the second evaporation;

[0060] Fig.25 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0061] Fig.26 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure;

[0062] Fig. 27 To adopt Fig.26 The vapor deposition pattern formed after the vapor deposition of the first mask plate of the mask assembly shown;

[0063] Fig.28 To adopt Fig.26 The vapor deposition pattern formed after the vapor deposition of the second mask plate of the mask assembly shown;

[0064] Fig.29 A schematic diagram of the structure of an evaporation device provided in an embodiment of the present disclosure;

[0065] Fig.30 A schematic diagram of the structure of another evaporation equipment provided in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0066] In order to more clearly understand the above-mentioned objectives, features and advantages of the present disclosure, the scheme of the present disclosure will be further described below. It should be noted that the embodiments of the present disclosure and the features in the embodiments can be combined with each other without conflict.

[0067] In the following description, many specific details are set forth to facilitate a full understanding of the present disclosure, but the present disclosure may also be implemented in other ways different from those described herein; it is obvious that the embodiments in the specification are only part of the embodiments of the present disclosure, rather than all of the embodiments.

[0068] In the process of making OLED, an evaporation machine is needed to complete the pattern evaporation, and a precision metal mask plate is needed. A mask piece will be set on the precision metal mask plate. The mask piece is prone to drooping and deforming due to its own weight, making it difficult to align the mask plate with the target substrate. The larger the mask plate, the larger the size of the mask piece will be, and it will be more affected by gravity. Figure 1 FIG. 1 is a schematic diagram of the structure of a mask plate in the prior art. Figure 1 As shown, it includes a mask frame and a mask sheet, and the mask sheet is used together for evaporation to form an evaporation pattern (the evaporation pattern includes Figure 1 However, since the mask frame only includes four sides of the frame, the edge of the mask sheet can only overlap the four sides of the frame, and the part without four sides of the frame is suspended, resulting in insufficient support under the mask sheet. Under the influence of its own weight, it will sag and deform, thereby affecting the evaporation effect.

[0069] In view of the above technical problems, the present disclosure provides a mask assembly. Figure 2 A schematic diagram of the structure of a mask assembly provided in an embodiment of the present disclosure is shown in FIG. Figure 2 As shown, it includes at least one mask frame 11 and a mask sheet 12 arranged on the carrying surface of the mask frame.

[0070] The mask frame 11 includes a mask frame 111 and at least one supporting beam 112 located in an area surrounded by the mask frame. The bearing surface of the supporting beam 112 is flush with the bearing surface of the mask frame 11 .

[0071] Specifically, the mask assembly includes a mask frame 11, the mask frame 11 includes a mask frame 111 and at least one supporting beam 112 located in the area surrounded by the mask frame, the mask frame 111 only includes frames on all sides, and the hollow part of the central area of ​​the mask frame 111 is provided with a supporting beam 112, the number of the supporting beam 112 is at least one, and the mask sheet 12 is placed on the mask frame 111. First, the mask frame 111 will support the edge of the mask sheet 12 in contact with it, and the edge portion of the mask sheet 12 that is not in contact with the mask frame 111 requires the supporting beam 112. The supporting beam supports the suspended edge portion of the mask sheet 12, so that the mask sheet 12 is supported on all sides, reducing its sagging due to its own weight, and avoiding the deviation of the mask plate from the target substrate during evaporation. Moreover, the bearing surface of the support beam 112 is flush with the bearing surface of the mask frame 111 and is in the same plane. When the mask sheet 12 is placed on the mask frame 111, there will be no protrusion but it will always remain horizontal. When it is subsequently aligned with the target substrate, the alignment effect is better.

[0072] For example, Figure 1 A mask frame 111, three support beams 112 and four mask sheets 12 are provided. It can be seen that the left edge of the leftmost mask sheet 12 along the length direction is set on the mask frame 111, and the right edge is set on the support beam 112. The two side edges of the middle two mask sheets 12 along the length direction are both set on the support beam 112. The left edge of the rightmost mask sheet 12 along the length direction is set on the support beam 112, and the right edge is set on the mask frame 111, so that each mask sheet 12 is subjected to the support force on all sides, reducing the influence of gravity and avoiding deformation of the mask sheet 12.

[0073] Optionally, Figure 3 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Figure 3 As shown, two mask frames are exemplarily provided, namely a first mask frame and a second mask frame, wherein the left figure is the first mask frame, including a first mask frame 111a and a first support beam 112a, and a plurality of first mask sheets 12a, and the four edges of the first mask sheet 12a are all arranged on the first mask frame 111a or the first support beam 112a, providing support for the first mask sheet 12a. The right figure is the second mask frame, including a second mask frame 111b and a second support beam 112b, and a plurality of second mask sheets 12b, and the four edges of the second mask sheet 12b are all arranged on the second mask frame 111b or the second support beam 112b, providing support for the second mask sheet 12b. In the right figure, if the second mask sheets 12b on both sides are directly arranged on the second mask frame 111b along the length direction, the support beam between the second mask frame 111b and the second mask sheet 12b can be eliminated. Use Figure 3When evaporating the two mask plates provided in, it is necessary to evaporate one of the mask plates first, and then evaporate the second mask plate. The evaporation patterns on the two mask plates are combined to form a complete evaporation pattern, thereby improving the utilization rate of the target substrate.

[0074] The present invention provides a support beam in the mask frame, and the mask sheet is arranged above the support beam, and the support beam supports the mask sheet, wherein the size of the mask sheet can also be selected according to the demand, and a large-sized mask sheet can also be supported by the support beam, so as to avoid the mask sheet being completely suspended on the mask frame, and then drooping under the influence of gravity, causing the mask sheet to deform and affect the evaporation effect. The present invention can reduce the problem of deformation of the mask sheet due to gravity, is applicable to mask sheets of various sizes, improves the alignment accuracy of the target substrate, and improves the evaporation effect.

[0075] It should be noted that the mask assembly provided in the embodiment of the present disclosure does not limit the number of mask frames. One mask frame, two mask frames, or multiple mask frames can be set according to actual needs. In addition, the mask sheets and mask support beams in the above embodiments are arranged in columns, or in rows. The present disclosure does not limit this, nor does it provide examples. It is a conventional technical means in the field of the present technology and does not affect the technical effect.

[0076] In some embodiments, Figure 4 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Figure 4 As shown, a plurality of sequentially arranged columns of mask sheets 12 are provided on the mask frame, the extension direction of the mask sheets 12 is parallel to the extension direction of the support beam 112 , and a portion of the edges and gaps of two adjacent columns of mask sheets 12 in the same mask frame overlap with the support beam 112 .

[0077] Exemplarily, a plurality of sequentially arranged columns of mask sheets 12 are provided on the mask frame, the extension direction of the mask sheets 12 is parallel to the extension direction of the support beam 112, a portion of the edges of two adjacent columns of mask sheets 12 of the same mask frame in the extension direction overlap with the support beam 112, and there is a gap D between two adjacent columns of mask sheets 12 of the same mask frame, and the exposed portion of the gap D is a portion of the support beam 112, so a portion of the edge of two adjacent columns of mask sheets 12 of the same mask frame and the gap overlap with the support beam 112. Under this structure, the size of the mask sheet is small, and the absolute expansion amount of a single mask sheet due to environmental influences such as temperature becomes small, making it easier to align the mask plate with the target substrate, and the alignment success rate can be improved.

[0078] Optionally, a plurality of columns of sequentially arranged mask sheets are provided on the mask frame, the extension direction of the mask sheets is parallel to the extension direction of the support beam, and a portion of the edge and the gap of two adjacent columns of mask sheets of the same mask frame overlap with the support beam. The mask frame composed of mask sheets and support beams arranged in columns and the mask frame composed of rows have the same effect when performing evaporation, which will not be described in detail here. The following embodiments can also be arranged in rows or columns.

[0079] In some embodiments, Figure 4 As shown, the edge of the mask sheet 12 is fixed on the support beam 112 and / or the mask frame 111 .

[0080] Specifically, according to the position of the mask sheet 12, the edge of the mask sheet 12 can be fixed on the support beam 112 or the mask frame 111. The fixing method can reduce the influence of the mask sheet 12 on its own weight. Being fixed on all sides can also prevent the edge from expanding due to heat, thereby reducing the amount of expansion of the mask sheet affected by the environment.

[0081] For example, Figure 4 The dotted line portion is the edge of the mask sheet 12. The edge of the mask sheet 12 in the extension direction is in contact with the support beam 112, and the edge of the mask sheet 12 in the extension direction is fixed to the support beam 112. The edge of the mask sheet 12 in the width direction is in contact with the mask frame 111, and the edge of the mask sheet 12 in the width direction is fixed to the mask frame 111. The fixed mask sheet 12 will not move. When fixing, a certain force can be applied to the mask sheet 12, such as pulling it outward, and after it has tension, the edge is fixed to the support beam 112 or the mask frame 111. The mask sheet 12 has tension, which can also reduce the amount of expansion when affected by temperature.

[0082] When fixing, a variety of process methods can be used, such as fixing by welding, heating or pressurizing it, or using ultrasonic welding, which has a faster speed. Spot welding or bonding can also be used to fix the mask sheet on the support beam and / or the mask frame. The specific fixing method can be selected according to actual needs.

[0083] In some embodiments, Figure 5 A schematic diagram of the structure of another mask assembly provided in an embodiment of the present disclosure is shown. Figure 6 A schematic cross-sectional view of a mask assembly along the AA' direction provided in an embodiment of the present disclosure is shown in FIG. Figure 5 and Figure 6 As shown, a gasket 13 is provided at the gap between two adjacent rows of mask sheets 12 of the same mask frame, and the gasket 13 is located on the support beam 112 .

[0084] For example, if the size of the mask sheet is small, there will be a gap between two adjacent rows of mask sheets 12 in the same mask frame, and a target substrate will be placed on the mask assembly, and the thickness of the target substrate is, for example, 0.7 mm. If the gap is too large, the target substrate will sag under the influence of gravity, affecting the evaporation effect. Therefore, the embodiment of the present disclosure is provided with a gasket 13 for shielding the gap at the gap position. Figure 5 As shown, a gasket 13 is disposed above the gap between two adjacent rows of mask sheets 12 . The gasket 13 is located above the support beam 112 , and the support beam 112 can also support the gasket 13 . Figure 6 for Figure 5 Schematic diagram of the cross section at AA', according to Figure 6 The specific structural relationship between the support beam 112, the mask sheet 12 and the gasket 13 can be obtained. The gasket 13 is specifically used to make the plane where the mask sheet 12 contacts the target substrate more flat, to prevent the target substrate from sagging, and to prevent the uneven edge of the mask assembly from damaging the target substrate. It should be noted that the embodiments of the present disclosure do not limit the gasket material.

[0085] Optionally, the thickness of the gasket of the same mask frame is the same as the thickness of two adjacent rows of mask sheets of the same mask frame. The gasket is placed in the gap between the mask sheets, and when the thickness of the gasket is the same as the thickness of the mask sheet, the planes of the two contacting the target substrate can be kept at the same level.

[0086] In some embodiments, the spacers are secured to the support beams.

[0087] Specifically, the gasket can also be fixed on the support beam to make the gasket more stable, improve the stability and availability of the entire mask assembly, adapt to various environmental requirements, and will not loosen due to angle changes. When fixing the gasket, a variety of process methods can also be used, such as fixing it by welding, heating or pressurizing it, or using ultrasonic welding, which has a faster speed. Spot welding or bonding can also be used to fix the mask sheet on the support beam and / or the mask frame. The specific fixing method can be selected according to actual needs and is not limited here.

[0088] In some embodiments, Figure 7 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Figure 7 As shown, the mask assembly includes a target substrate setting area S1, and the target substrate setting area S1 is used to place the target substrate.

[0089] The spacer 13 is fixed to the mask frame 111 outside the target substrate setting area S1.

[0090] Specifically, the mask assembly includes a target substrate setting area S1. When the mask assembly is used for evaporation, a target substrate is placed on its surface, and the evaporation pattern on the mask assembly is evaporated onto the target substrate. Therefore, a target substrate setting area S1 is set on the mask assembly, and the target substrate is placed in the target substrate setting area S1, so that the target substrate and the mask assembly are more accurately aligned, and the position of the evaporation pattern is also more accurate. Among them, the gasket 13 is placed on the mask frame. When the gasket 13 is fixed to the mask frame 111, the gasket 13 can be fixed to the mask frame 111 outside the target substrate setting area S1, such as in Figure 7 When it is fixed within the dotted circle frame, when it is fixed outside the target substrate setting area S1, even if fixing traces, such as welding traces or bonding traces, are produced, they will not affect the target substrate setting area S1. There is no need to worry that when the target substrate is placed on the mask assembly during evaporation, the traces produced by the fixing will scratch the target substrate, or affect the target substrate and the evaporation effect.

[0091] Optionally, the area of ​​the target substrate setting area is greater than or equal to the area of ​​the target substrate. To ensure that the target substrate setting area can completely cover the target substrate, the area of ​​the target substrate setting area should be larger, greater than or equal to the area of ​​the target substrate, and the area outside the target substrate setting area will not overlap with the target substrate.

[0092] In some embodiments, the gap between two adjacent columns of mask sheets in the same mask frame is smaller than a preset value.

[0093] Specifically, in the disclosed embodiment, the gap between two adjacent columns of mask sheets in the same mask frame needs to be smaller than a preset value. Since the mask sheets are all placed on the mask frame, the mask sheets need to contact the mask frame and / or the support beam. If the gap is too large, the edge of the mask sheet in the extension direction may not be able to contact the edge of the support beam in the extension direction. Therefore, the gap between two adjacent columns of mask sheets in the same mask frame should be smaller than a preset value, wherein the preset value is the size of the gap between adjacent mask sheets after the edge of the mask sheet in the extension direction overlaps the edge of the support beam in the extension direction. In addition, because the mask assembly needs to be aligned with the target substrate, and the target substrate is placed on the mask sheet, if the gap is too large, the target substrate will sag due to gravity, affecting the flatness, and further affecting the pattern effect of the evaporation. In order to avoid the above situation, the gap needs to be reduced. Therefore, the gap between two adjacent columns of mask sheets in the same mask frame should be as small as possible, and can be approximately equal to 0. When there is no gap between the two, the target substrate is completely in contact with the mask sheet.

[0094] In some embodiments, Figure 8 A cross-sectional schematic diagram of a support beam provided in an embodiment of the present disclosure, such as Figure 8 As shown, a groove 113 is provided on the bearing surface of the support beam 112 , and the mask sheet 12 is fixed in the groove 113 .

[0095] Specifically, a groove 113 is provided on the bearing surface of the support beam 112, and the mask sheet 12 is placed on the support beam 112, and the edge of the mask sheet 12 is bent downward into the groove 113, and the edge of the mask sheet 12 is fixed in the groove 113. Since the groove is lower than the bearing surface of the support beam 112, and the mask sheet 12 is relatively thin, for example, 0.02 mm, no bulge will be generated after the mask sheet 12 is bent into the groove 113, but the mask sheet 12 is completely fixed in the groove 113, and the welding marks or bonding marks generated by the fixation are also retained in the groove and will not be higher than the bearing surface of the support beam 112, so that there will be no bulge on the bearing surface of the support beam 112, and when the target substrate is placed on the mask assembly and in contact with the mask sheet 12, no bulge will contact the target substrate, so as to avoid the bulge scratching the target substrate. It should be noted that Figure 8 The dotted lines represent the openings on the mask, which are used to display the evaporation pattern during the evaporation process. The dotted lines in the following figures have the same function as here and will not be explained repeatedly. In some of the following embodiments, the mask is represented by lines instead of filled graphics, just for better understanding.

[0096] Illustratively, the present disclosure also provides a mask assembly, Fig. 9 and Fig.10 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig. 9 and Fig.10 As shown, two mask frames are provided. Fig. 9 A first mask frame is provided. The specific structure of the first groove 113a can be seen from the cross-sectional view along the BB' direction of the first mask frame. The portion where the edge of the first mask sheet 12a overlaps with the first support beam 113a is bent downward into the first groove 113a and fixed in the first groove 113a. The edges of the first mask sheet 12a located on the far left and the far right are fixed on the first mask frame 111a. Fig.10 A second mask frame is provided. The specific structure of the second groove 113b can be seen from the cross-sectional view along the CC' direction of the second mask frame. The portion where the edge of the second mask sheet 12b overlaps with the second support beam 113b is bent downward into the second groove 113b and fixed in the second groove 113b. The edges of the second mask sheet 12b located on the far left and the far right are fixed in the second groove 113b, and the fixing can be carried out by welding, bonding or other fixing processes.

[0097] Optionally, the groove shape may include multiple types. The embodiment of the present disclosure also provides grooves with different structures. For example, Fig.11A cross-sectional schematic diagram of another support beam provided in an embodiment of the present disclosure, wherein two grooves 113 are provided on the bearing surface of each support beam 112, respectively bearing the mask sheets 12 on both sides, and each groove only fixes the mask sheet 12 on its side, so that the bearing space is larger. Figure 12-13 A cross-sectional schematic diagram of another support beam provided in an embodiment of the present disclosure is shown in FIG. Fig.12 and Fig.13 As shown, the groove 113 provided on the bearing surface of the support beam 112 has a larger space, which reduces the volume space of the support beam 112 itself, thereby reducing the weight of the support beam 112, and is suitable for a lightweight mask assembly. Fig.13 The bottom of the support beam 112 has an arc, which is convenient for the gas to reach the target substrate during evaporation, reduces obstruction, and is conducive to improving the evaporation effect. Therefore, the grooves can include a variety of different shapes, sizes and quantities, which can be set according to actual needs. This disclosure does not limit this, nor does it give examples one by one.

[0098] In some embodiments, Fig.14 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig.14 As shown, a groove 113 is provided on the bearing surface of the support beam 112 , and the edge of the gasket 13 is tightly fixed in the groove 113 .

[0099] For example, Fig.14 A mask box is provided in Fig.14 As shown in the figure below, a gasket 13 is provided on the mask frame, and the edge of the gasket 13 in the extending direction is provided on the support beam 112, and a cross-sectional structure is obtained along the AA' direction, that is, Fig.14 In the above figure, it can be seen that the edge of the mask sheet 12 in contact with the support beam 112 is completely inserted into the groove 113 and fixed, and a gasket 13 is also provided between two adjacent rows of mask sheets 12, and the edge of the gasket 13 is also bent into the groove 113 and fastened in the groove 113. Among them, the dotted line in the above figure is the opening on the mask sheet. When there is a large gap between two adjacent rows of mask sheets 12, the above structure can fill the gap part with the gasket 13 to reduce the suspended area of ​​the contact surface with the target substrate. The effect of fixing the gasket 13 in the groove is the same as that of fixing the mask sheet 12 in the groove, which avoids the appearance of fastening marks on the bearing surface of the support beam 112 and damage to the target substrate.

[0100] Optionally, when the mask assembly includes a gasket, the grooves of the support beam may also include multiple types, wherein the shape of the grooves is the same as the shape provided in the embodiment where the gasket is not present, which will not be described in detail here, and reference may be made to the above embodiments and drawings.

[0101] In some embodiments, Fig.15 A cross-sectional schematic diagram of another support beam provided in an embodiment of the present disclosure is shown in FIG. Fig.15As shown, a constant temperature liquid pipeline 114 is arranged in the support beam 112 .

[0102] In the embodiment of the present disclosure, a constant temperature liquid pipeline 114 is also provided in the support beam 112, and the constant temperature liquid pipeline 114 can flow through the constant temperature liquid, and the constant temperature liquid can provide a constant temperature environment for the mask assembly, for example, provide a lower temperature environment, and the mask sheet 12 expands more in a high temperature environment. If it is in a lower temperature environment, the expansion of the mask sheet 12 can be effectively reduced, and the evaporation effect can be improved. It should be noted that the embodiment of the present disclosure does not limit the shape, size and number of the constant temperature liquid pipeline. The cross-section of the constant temperature liquid pipeline in the figure is circular, and it can also be other shapes, which is only for example. Optionally, a gasket can also be provided on this basis, and the gasket is provided between two adjacent columns of mask sheets.

[0103] In some embodiments, Fig.16 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig.16 As shown, a groove 113 is provided on the bearing surface of the support beam 112 , and a support platform 115 is provided in the groove 113 .

[0104] The edge of the mask sheet 12 is fixed in the groove 113 , and the bearing surface of the supporting platform 115 is flush with the side of the mask sheet 12 facing away from the mask frame.

[0105] Specifically, the bearing surface of the support beam 112 is provided with a groove 113, and a support platform 115 is provided in the groove 113. The edge of the mask sheet 12 is bent downward and fixed in the groove 113. The target substrate will be placed on the mask sheet 12. If the gap between two adjacent rows of mask sheets 12 is too large, the target substrate will sag under the influence of gravity. Therefore, the support platform 115 is provided in the groove 113, and the bearing surface of the support platform 115 is flush with the side of the mask sheet 12 away from the mask frame, that is, the bearing surface of the support platform 115 and the mask sheet 12 jointly support the target substrate to prevent the target substrate from sagging. The support platform 115 and the support beam 112 are connected by the contact part to increase stability.

[0106] Optionally, the support platform 115 and the support beam 112 are formed by 3D printing.

[0107] In some embodiments, the mask sheet disposed on the carrying surface of the mask frame is a whole sheet structure.

[0108] Fig.17 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig.17As shown, the mask sheet set on the mask frame is a whole-piece structure. Two mask frames are provided in the figure, the left side is the first mask frame, and the right side is the second mask frame. The first mask sheet 12a is set on the bearing surface of the first mask frame, and the second mask sheet 12b is set on the bearing surface of the second mask frame. The first mask sheet 12a and the second mask sheet 12b are both whole-piece structures and are not divided. The mask frame and the supporting beam jointly support the mask sheet.

[0109] Optionally, under this premise, if the support beam is provided with a groove, the mask sheet can be directly pressed down and welded to fix it. Fig.18 A cross-sectional schematic diagram of another support beam provided in an embodiment of the present disclosure is shown in FIG. Fig.18 As shown, the mask sheet 12 covers the mask frame, and the groove 113 of the support beam 112 is also covered with the mask sheet 12. When fixing the mask sheet 12, the mask sheet 12 above the groove 113 can be directly pressed downward to bend it into the groove 113 and fix it in the groove. It can be bent and fixed on each edge of the groove 113, or it can be selected to be fixed at a certain point of the groove 113 such as the lowest point. The present disclosure does not limit this.

[0110] In some embodiments, a gasket at a gap between two adjacent columns of mask sheets in the same mask frame overlaps with edges of the two adjacent columns of mask sheets, and the mask sheets are located on a side of the gasket away from the support beam.

[0111] For example, Fig.19 and Fig. 20 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig.19 and Fig. 20 As shown, two mask frames are provided. Fig.19 A first mask frame is provided, Fig. 20 A second mask frame is provided, Fig.19 The above figure is a schematic cross-sectional view of the first mask frame along BB'. Fig. 20 The above figure is a cross-sectional schematic diagram of the second mask frame along CC'. Fig.19 It can be seen that a first gasket 13a is provided in the gap between two adjacent columns of the first mask sheets 12a of the same mask frame, and the first gasket 13a overlaps with the edges of the two adjacent columns of the first mask sheets 12a. The first mask sheet 12a is located on the side of the first gasket 13a away from the first support beam 112a. The placement order from the mask frame upward is the first support beam 112a, the first gasket 13a, and the first mask sheet 12a. The edges of the first mask sheets 12a located on the leftmost and rightmost sides are fixed on the first mask frame 111a. Fig. 20The placement method of the second mask frame is the same as that of the first mask frame. A second gasket 13b is provided in the gap between two adjacent columns of the second mask sheets 12b of the same mask frame, and the second gasket 13b overlaps with the edges of the two adjacent columns of the second mask sheets 12b. The second mask sheet 12b is located on the side of the second gasket 13b away from the second support beam 112b. The placement order from the mask frame upward is the second support beam 112b, the second gasket 13b, and the second mask sheet 12b. The edges of the second mask sheets 12b located on the far left and the far right are placed on the second gasket 13b, and the second gasket 13b is arranged on the second support beam 112b.

[0112] The gasket here can be a support plate with strong supporting force. The presence of the gasket can increase the contact area between the support and the mask, thereby improving the supporting force. The prior art also includes the technical feature of only using a support plate to support the mask without providing a supporting beam.

[0113] In some embodiments, along an extension direction parallel to the support beam, a length of the spacer is smaller than a length of the mask.

[0114] Continue to refer Fig.19 For example, the length of the first gasket 13a is smaller than the length of the first mask sheet 12a. Considering the process during fixing, when the length of the gasket is smaller than the mask sheet, welding or other fixing operations can be performed to completely fix the gasket on the mask frame without leaving gaps on the edges. If the length of the gasket is larger than the mask sheet, it will be more difficult to fix the mask sheet, increasing the complexity of the process. Therefore, along the extension direction parallel to the support beam, the length of the gasket is smaller than the length of the mask sheet.

[0115] In some embodiments, the mask frame and the support beam are integrally formed.

[0116] Specifically, the mask frame and the support beam are integrally formed during production, and there is no need to produce them separately and then process them for assembly and fixation, which makes the production process faster. The integrally formed mask frame and support beam will not have any fastening marks, and the connection is more stable, and the mask frame is more rigid.

[0117] In some embodiments, x mask frames are included; each mask sheet on the x mask frames corresponds to an evaporation pattern;

[0118] The masks on the x mask frames are divided into x groups;

[0119] The mask sheets satisfying the i+nxth column are arranged in sequence according to the column number and set on the i-th mask frame to form the i-th mask plate;

[0120] The distance between the edges of the mask sheets in adjacent columns on the same mask frame is smaller than the sum of the widths of the mask sheets in other columns between the column numbers of the mask sheets in the adjacent columns;

[0121] Wherein, i and x are both positive integers, and i is less than or equal to x; x is greater than 1; and n is a non-negative integer.

[0122] Specifically, the mask assembly may include x mask frames, and each mask sheet on the x mask frames corresponds to a vapor deposition pattern. After the mask plates formed by the 1st to xth mask assemblies are sequentially used to vapor deposit the target substrate, the gap between the effective vapor deposition areas of adjacent mask sheets can be reduced, so the utilization rate of the target substrate can be improved.

[0123] After the mask sheets are arranged in sequence, the effective evaporation areas of the sequentially arranged mask sheets correspond to the evaporation patterns. The disclosed embodiment divides the mask sheets on the x mask frames into x groups, wherein the mask sheets satisfying the i+nxth column are arranged in sequence on the i-th mask frame according to the column number to form the i-th mask plate.

[0124] For example, the mask sheets in the 1st column, the mask sheets in the 1+xth column, the mask sheets in the 1+2xth column, ..., the mask sheets in the 1+nxth column are arranged in sequence on the 1st mask frame according to the column number to form the 1st mask plate; the mask sheets in the 2nd column, the mask sheets in the 2+xth column, the mask sheets in the 2+2xth column, ..., the mask sheets in the 2+nxth column are arranged in sequence on the 2nd mask frame according to the column number to form the 1st mask plate; ...; the mask sheets in the xth column, the mask sheets in the x+xth column, the mask sheets in the x+2xth column, ..., the mask sheets in the x+nxth column are arranged in sequence on the xth mask frame according to the column number to form the xth mask plate.

[0125] Wherein, i and x are both positive integers, and i is less than or equal to x; x is greater than 1; and n is a non-negative integer.

[0126] The distance between the edges of adjacent columns of mask sheets on the same mask frame is less than the sum of the widths of other columns of mask sheets between the column numbers of the adjacent columns of mask sheets. The disclosed embodiment includes x mask plates. When vapor deposition is performed on a target substrate, the 1st to xth mask plates are sequentially used to vapor deposit the target substrate. Since the distance between the edges of adjacent columns of mask sheets on the same mask frame is less than the sum of the widths of other columns of mask sheets between the column numbers of the adjacent columns of mask sheets, the mask sheets of adjacent column numbers used in two adjacent vapor depositions may have overlapping areas. For example, the mask sheets of the 1st+2xth columns of the first mask plate have overlapping areas with the mask sheets of the 2nd+2xth columns of the second mask plate. Accordingly, by using the mask assembly disclosed in the present invention for vapor deposition, the gap between the effective vapor deposition areas of the mask sheets of adjacent column numbers can be reduced, thereby improving the utilization rate of the target substrate.

[0127] The following takes x as 2 as an example. Fig.21 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig.21 As shown,

[0128] The present disclosure provides a mask assembly including a plurality of rows of mask sheets 12 ( Fig.21 Exemplarily, 7 columns) and 2 mask frames are provided. The multiple columns of mask sheets 12 correspond to the vapor deposition patterns formed on the target substrate, that is, the mask sheets in the first to seventh columns correspond to the vapor deposition patterns formed on the target substrate. Fig.21 In the middle left figure, from left to right are the first column of masks 121 , the third column of masks 123 , the fifth column of masks 125 , and the seventh column of masks 127 . Fig.21 In the middle right figure, from left to right are the second column of masks 122 , the fourth column of masks 124 , and the sixth column of masks 126 .

[0129] The embodiment of the present disclosure divides the multiple columns of mask sheets 12 into two groups. The first column of mask sheets, the third column of mask sheets, the fifth column of mask sheets, and the seventh column of mask sheets are sequentially arranged on the first mask frame 11a to form a first mask plate (such as Fig.21 The second mask plate, the fourth mask plate, and the sixth mask plate are sequentially arranged on the second mask frame 11b to form a second mask plate (such as the left mask plate in FIG. 1 ). Fig.21 That is, the odd-numbered columns of masks are disposed on the first mask frame 11a (not labeled in the figure) and the first support beam 112a, and the even-numbered columns of masks are disposed on the second mask frame 11b (not labeled in the figure) and the second support beam 112b.

[0130] The distance between the edges of the mask sheets in adjacent columns on the same mask frame is smaller than the sum of the widths of the mask sheets in other columns between the column numbers of the mask sheets in the adjacent columns.

[0131] For example, Fig.21 As shown, the mask sheets in the first to third columns are used as an example for description. The distance between the right edge of the mask sheet in the first column on the first mask frame and the left edge of the mask sheet in the third column is A1. The mask sheet between the mask sheet in the first column and the mask sheet in the third column on the first mask frame is the mask sheet in the second column, which is located on the second mask frame, and the width of the mask sheet in the second column is A2.

[0132] Since the distance between the edges of adjacent columns of mask sheets on the same mask frame is smaller than the sum of the widths of other columns of mask sheets between the column numbers of the adjacent columns of mask sheets, when the mask assembly is used for column evaporation, the first mask plate and the second mask plate are used for evaporation in sequence. Therefore, the setting positions of the first column of mask sheets and the third column of mask sheets when the first mask plate is used for evaporation can partially overlap with the setting position of the second column of mask sheets when the second mask plate is used for evaporation.

[0133] like Fig.21, when the first mask plate is used for evaporation, the right edge of the first column of mask sheets and the left edge of the second column of mask sheets when the second mask plate is used for evaporation can have an overlapping area X1, and when the first mask plate is used for evaporation, the left edge of the third column of mask sheets and the right edge of the second column of mask sheets when the second mask plate is used for evaporation can have an overlapping area X2. That is, the sum of the length of A1, the length of X1, and the length of X2 is equal to the length of A2. Therefore, the right edge of the pattern deposited in the effective evaporation area of ​​the first column of mask sheets and the left edge of the pattern deposited in the effective evaporation area of ​​the second column of mask sheets can be seamlessly connected. The right edge of the pattern deposited in the effective evaporation area of ​​the second column of mask sheets and the left edge of the pattern deposited in the effective evaporation area of ​​the third column of mask sheets can also be seamlessly connected, without being limited by the edge distance outside the effective evaporation area of ​​each mask sheet. Fig. 22 To adopt Fig.21 The mask assembly is shown to form a vapor deposition pattern on a target substrate by vapor deposition. Fig.21 In the figure, B1 indicates the setting position corresponding to the mask sheet in the first column when the first mask plate is used for evaporation, B3 indicates the setting position corresponding to the mask sheet in the third column when the first mask plate is used for evaporation, B2 indicates the setting position corresponding to the mask sheet in the second column when the second mask plate is used for evaporation, C1 indicates the position of the pattern deposited in the effective evaporation area of ​​the mask sheet in the first column when the first mask plate is used for evaporation, C3 indicates the position of the pattern deposited in the effective evaporation area of ​​the mask sheet in the third column when the first mask plate is used for evaporation, and C2 indicates the position of the pattern deposited in the effective evaporation area of ​​the mask sheet in the second column when the second mask plate is used for evaporation. Fig. 22 As shown, the distance between the right edge of the pattern deposited in the effective deposition area of ​​the first column of mask sheets and the left edge of the pattern deposited in the effective deposition area of ​​the second column of mask sheets is reduced to 0. The distance between the right edge of the pattern deposited in the effective deposition area of ​​the second column of mask sheets and the left edge of the pattern deposited in the effective deposition area of ​​the third column of mask sheets is reduced to 0, thereby improving the utilization rate of the target substrate. Fig. 22 and Figure 1 ( Figure 1 As shown in the right figure of the figure, for the target substrate of the same area, Figure 1 The evaporation pattern with 4 rows and 5 columns is obtained. Fig. 22 A vapor deposition pattern of 4 rows and 6 columns is obtained. By adopting the solution of the embodiment of the present disclosure, the utilization rate of the target substrate is higher.

[0134] It should be noted that Fig. 22 The effective evaporation area of ​​each column of the mask sheets has a precision evaporation pattern, and the specific form of the precision evaporation pattern is not limited here.

[0135] In addition, the embodiment of the present disclosure groups the mask sheets, which can reduce the size of a single mask sheet compared to the prior art method of sequentially arranging each mask sheet on a mask frame. Therefore, the absolute expansion of a single mask sheet due to environmental influences such as temperature becomes smaller, making it easier to align the mask plate with the target substrate, thereby improving the alignment success rate. For example, when the above-mentioned mask assembly is used for evaporation to prepare an OLED display panel, a similar Fig. 22 Multiple evaporation unit patterns arranged in an array ( Fig. 22 4 rows and 6 columns of 24 evaporation unit patterns are shown as an example). Each evaporation unit pattern corresponds to an OLED display panel area. Fig. 22 The large version shown forms a single OLED display panel. As the size of a single mask sheet is reduced, the absolute expansion of a single mask sheet due to environmental influences such as temperature becomes smaller, so the size of the OLED display panel unit pixel evaporation pattern in the effective evaporation area of ​​the mask sheet can be reduced, so the resolution of the prepared OLED display panel can also be improved.

[0136] It should be noted that the multi-column mask sheets can also be divided into three groups, four groups or more groups, which is not specifically limited here. The principle of dividing into three groups, four groups or more groups to improve the utilization rate of the target substrate is similar to the principle of dividing into two groups mentioned above, which is not repeated here. In addition, it can also be divided by row, which is not repeated here.

[0137] Optionally, the mask assembly further corresponds to a vapor deposition method, and the target substrate is vapor deposited using the first to xth mask plates in sequence.

[0138] Specifically, the following takes x equal to 2 as an example. Fig. 22 As shown, adopt Fig. 22 The left mask plate (referred to as the first mask plate) and Fig. 22 The mask plate on the right side in the middle (referred to as the second mask plate) is used to evaporate the target substrate. Since the patterns of the first mask plate and the second mask plate are complementary, the evaporation of the target evaporation pattern can be completed by performing the evaporation successively.

[0139] Optionally, Fig.23 The embodiment of the present disclosure provides Fig.21 Schematic diagram of the evaporation pattern of the left mask plate in the mask assembly shown in the figure after the first evaporation. Fig.24 The embodiment of the present disclosure provides Fig.21 Schematic diagram of the evaporation pattern of the right mask plate in the mask assembly shown in the figure after the second evaporation. The mask plates in the first to third columns are used as an example for description.

[0140] When the first mask plate is used for evaporation, the positions of the first and third mask plates may partially overlap with the positions of the second mask plates when the second mask plate is used for evaporation. Fig.21, when the first mask plate is used for evaporation, the right edge of the first column of mask sheets and the left edge of the second column of mask sheets when the second mask plate is used for evaporation can have an overlapping area X1, and when the first mask plate is used for evaporation, the left edge of the third column of mask sheets and the right edge of the second column of mask sheets when the second mask plate is used for evaporation can have an overlapping area X2. Therefore, the distance between the right edge of the pattern deposited in the effective evaporation area of ​​the first column of mask sheets and the upper edge of the pattern deposited in the effective evaporation area of ​​the second column of mask sheets is significantly reduced, for example, seamless connection can be achieved. The distance between the right edge of the pattern deposited in the effective evaporation area of ​​the second column of mask sheets and the left edge of the pattern deposited in the effective evaporation area of ​​the third column of mask sheets is significantly reduced, for example, seamless connection can be achieved, and is not limited by the edge distance outside the effective evaporation area of ​​each mask sheet. Fig.24 As shown, the distance between the right edge of the pattern deposited in the effective deposition area of ​​the first column of mask sheets and the left edge of the pattern deposited in the effective deposition area of ​​the second column of mask sheets is reduced to 0. The distance between the right edge of the pattern deposited in the effective deposition area of ​​the second column of mask sheets and the left edge of the pattern deposited in the effective deposition area of ​​the third column of mask sheets is reduced to 0, thereby improving the utilization rate of the target substrate.

[0141] Based on this, continue to see Figure 1 and Fig.24 ,like Figure 1 As shown, the right side is the evaporation pattern of the prior art. In addition to the required evaporation pattern, there is also a film layer material evaporated due to the existence of the gap. Therefore, when cutting the evaporation pattern, it is necessary to cut twice in the horizontal direction so that the evaporation unit patterns of different columns can be separated. Fig.24 As shown, in the evaporation pattern after two evaporation processes in this embodiment, since there is no gap or a very small gap between each evaporation unit pattern on the mask sheet in the horizontal direction, only one cutting is required. Based on the above arrangement, the number of cuts during the segmentation process is reduced, thereby improving production efficiency.

[0142] Optionally, the evaporation pattern includes a plurality of evaporation unit patterns arranged in an array; each column of mask sheets corresponds to a column of evaporation unit patterns of the evaporation pattern.

[0143] Fig.25 A structural schematic diagram of another mask assembly provided in an embodiment of the present disclosure is shown in FIG. Fig.25 As shown, each column of mask sheets corresponds to a column of evaporation unit patterns 21 of the evaporation pattern. That is, the effective evaporation area of ​​each row of mask sheets corresponds to a column of evaporation unit patterns of the evaporation pattern.

[0144] When vapor deposition is performed on the target substrate, the first to xth mask plates are sequentially used to vapor deposit the target substrate. Since the distance between the edges of adjacent columns of mask sheets on the same mask frame is less than the sum of the widths of other columns of mask sheets between the column numbers of the adjacent columns of mask sheets, the mask plates used for two adjacent vapor depositions and the mask sheets with adjacent column numbers may have overlapping areas. This arrangement can reduce the gap between the effective vapor deposition areas of the mask sheets with adjacent column numbers and improve the utilization rate of the target substrate.

[0145] Optionally, the evaporation pattern includes a plurality of evaporation unit patterns arranged in an array; except for the first and last columns of the mask sheets, each column of the mask sheets corresponds to part of the evaporation unit patterns in the previous column and part of the evaporation unit patterns in the next column of the evaporation pattern.

[0146] For example, Fig.21 As shown, Fig.21 The first row of masks on the left side of the mask plate is the first row of masks, and the seventh row of masks is the last row of masks. The first row of masks only corresponds to the part of one row of evaporation unit patterns of the evaporation pattern, and the seventh row of masks only corresponds to the part of one row of evaporation unit patterns of the evaporation pattern. Fig.21 The 3rd and 5th columns of the mask plate on the left side of the middle mask plate, as well as Fig.21 The second, fourth and sixth columns of the mask sheet on the right side of the middle mask plate all correspond to the partial evaporation unit pattern of the previous column and the partial evaporation unit pattern of the next column of the evaporation pattern. Therefore, except for the first and last columns of mask sheets, each column of mask sheets corresponds to the partial evaporation unit pattern of the previous column and the partial evaporation unit pattern of the next column of the evaporation pattern. This setting can make the distance between the edges of the patterns evaporated by the mask sheets with adjacent column numbers zero, further improving the utilization rate of the target substrate.

[0147] Optionally, the evaporation pattern is an evaporation unit pattern.

[0148] For example, Fig.26 A schematic structural diagram of another mask assembly provided in an embodiment of the present disclosure; Fig. 27 To adopt Fig.26 The deposition pattern is formed after the deposition of the first mask plate of the mask assembly. Fig.28 To adopt Fig.26 The deposition pattern is formed after the deposition of the second mask plate of the mask assembly. Fig.26 The upper middle picture is a schematic diagram of the structure of the first mask plate. Fig.26 The lower middle figure is a schematic diagram of the structure of the second mask plate. Fig.26 After the upper and lower masks are evaporated respectively, the distance between the edge of the pattern obtained after the upper mask is evaporated and the edge of the pattern obtained after the lower mask is evaporated is 0, and the following is obtained: Fig.28 The graphics in . Fig.26After the mask assembly shown is evaporated by the first mask plate and the second mask plate in sequence, a completed evaporation unit pattern can be formed. Therefore, by using the mask assembly provided by the embodiment of the present disclosure for evaporation, the production of large-size devices can be achieved, such as the evaporation of large-size OLED display panels.

[0149] An embodiment of the present disclosure further provides an evaporation device, comprising an evaporation source and a mask assembly as described in any of the above embodiments, wherein the mask assembly is disposed between the evaporation source and a target substrate.

[0150] In some embodiments, the evaporation device includes at least one evaporation chamber; the evaporation chamber includes a plurality of evaporation zones; and a plurality of mask plates of a mask assembly are used in a one-to-one correspondence in the plurality of evaporation zones to perform evaporation on the target substrate.

[0151] In some embodiments, various evaporation zones in the same evaporation chamber may be connected to each other and share the same evaporation source; the evaporation source is used to sequentially scan and evaporate each evaporation zone. Fig.29 A schematic diagram of the structure of a vapor deposition device provided in an embodiment of the present disclosure is shown in FIG. Fig.29 As shown, an evaporation chamber is provided, and the evaporation chamber includes multiple evaporation areas, a first R evaporation area 102a, a second R evaporation area 102b, a first G evaporation area 103a, a second G evaporation area 103b, a first B evaporation area 104a, a second B evaporation area 104b, and a first buffer area 101a and a second buffer area 101b. In the multiple evaporation areas, multiple mask plates of the mask assembly are used in a one-to-one correspondence to evaporate the target substrate. This arrangement can save the number of evaporation chambers and reduce equipment costs.

[0152] Optionally, the same evaporation source may be used to perform scanning evaporation deposition on the evaporation area at one time. Fig.30 A schematic diagram of another evaporation device structure provided in an embodiment of the present disclosure is shown in FIG. Fig.30 As shown, an evaporation source 31 is provided, and the same evaporation source 31 is used to sequentially evaporate the first mask plate 1a and the second mask plate 1b, thereby reducing the number of evaporation sources and reducing equipment costs.

[0153] It should be noted that the above embodiment is only introduced by taking a certain structure in the evaporation device as an example. The evaporation device may include multiple evaporation chambers, and the number of evaporation zones included in different evaporation chambers may be the same or different. The present disclosure does not limit the number of evaporation zones included in the evaporation chamber, and the number of evaporation sources may also be selected according to actual conditions.

[0154] The embodiment of the present disclosure further provides an evaporation method using a mask assembly. The method may use the mask assembly described in any of the above embodiments, and the method includes:

[0155] The target substrate is evaporated using a mask assembly.

[0156] Specifically, the target substrate is placed on the mask assembly, and then the mask assembly as a whole can be placed in the evaporation equipment, and the target substrate is evaporated in sequence according to the arrangement requirements of different evaporation areas.

[0157] Optionally, when the target substrate is evaporated using the mask assembly, the method includes:

[0158] The relative movement between the evaporation source and the mask assembly is controlled, and the moving direction is parallel to the plane where the mask assembly is located and perpendicular to the length direction of the mask sheet.

[0159] Specifically, controlling the relative movement between the evaporation source and the first mask plate includes fixing the first mask plate and controlling the evaporation source to move in a direction parallel to the plane where the first mask plate is located and perpendicular to the length of the mask plate. Controlling the relative movement between the evaporation source and the first mask plate may also include fixing the evaporation source and controlling the first mask plate to move in a direction parallel to the plane where the first mask plate is located and perpendicular to the length of the mask plate.

[0160] Optionally, when the target substrate is evaporated using a mask plate, the method further includes:

[0161] Controlling the relative movement speed of the evaporation source and the mask assembly to be smaller at the first position than at the second position;

[0162] The first position refers to the position where the evaporation source is below the mask sheet; the second position refers to the position where the evaporation source is not below the mask sheet.

[0163] Specifically, during evaporation, only the evaporation unit pattern on the mask sheet needs to be evaporated, and no evaporation is required for positions in the mask assembly where no mask sheet is provided (e.g., positions on the gasket or support beam where no mask sheet is provided). However, it is unavoidable that the evaporation source will perform evaporation when passing through the first shielding portion. Therefore, it is necessary to increase the moving speed of the evaporation source when passing through a position where evaporation is not required, and to use a normal moving speed when passing through a mask sheet where evaporation is required.

[0164] Based on this, the position where the evaporation source is below the mask is called the first position, and the position where the evaporation source is not below the mask is called the second position. The relative movement speed between the evaporation source and the mask should be smaller at the first position than at the second position. This arrangement can avoid wasting evaporation materials at the second position, and because the relative movement speed increases at the second position, the overall movement time is reduced, saving evaporation time and avoiding waste of evaporation materials.

[0165] It should be noted that, in this article, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0166] The above description is only a specific embodiment of the present disclosure, so that those skilled in the art can understand or implement the present disclosure. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present disclosure. Therefore, the present disclosure will not be limited to the embodiments described herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A mask assembly, characterized in that: It comprises at least one mask frame and a mask sheet arranged on a carrying surface of the mask frame; The mask frame comprises a mask frame and at least one supporting beam located in the area surrounded by the mask frame; the bearing surface of the supporting beam is flush with the bearing surface of the mask frame; The mask frame is provided with a plurality of sequentially arranged columns of mask sheets; the extension direction of the mask sheets is parallel to the extension direction of the support beam; a portion of the edge and the gap of the mask sheets in two adjacent columns of the same mask frame overlap with the support beam.

2. The mask assembly according to claim 1, characterized in that: The edge of the mask sheet is fixed on the support beam and / or the mask frame.

3. The mask assembly according to claim 1, characterized in that: A gasket is provided at the gap between two adjacent rows of the mask sheets of the same mask frame; the gasket is located on the support beam.

4. The mask assembly according to claim 3, characterized in that: The gasket is fixed to the support beam.

5. The mask assembly according to claim 3, characterized in that: The mask assembly comprises a target substrate setting area, in which a target substrate is placed; The gasket structure is fixed to the mask frame outside the target substrate setting area.

6. The mask assembly according to claim 1, characterized in that: The gap between two adjacent columns of the mask sheets in the same mask frame is smaller than a preset value.

7. The mask assembly according to claim 1, characterized in that: The bearing surface of the support beam is provided with a groove; the mask sheet is fixed in the groove.

8. The mask assembly according to claim 4, characterized in that: The bearing surface of the support beam is provided with a groove, and the edge of the gasket is tightly fixed in the groove.

9. The mask assembly according to claim 1, characterized in that: The bearing surface of the support beam is provided with a groove; a support platform is provided in the groove; The edge of the mask sheet is fixed in the groove, and the bearing surface of the supporting platform is flush with a side of the mask sheet away from the mask frame.

10. The mask assembly according to claim 1, characterized in that: The mask sheet arranged on the carrying surface of the mask frame is a whole sheet structure.

11. The mask assembly according to claim 3, characterized in that: The gasket at the gap between two adjacent columns of mask sheets of the same mask frame overlaps with the edges of the two adjacent columns of mask sheets, and the mask sheets are located on a side of the gasket away from the support beam.

12. The mask assembly according to claim 11, characterized in that: Along an extension direction parallel to the support beam, the length of the gasket is smaller than the length of the mask.

13. The mask assembly according to claim 1, characterized in that: The mask frame and the support beam are integrally formed.

14. The mask assembly according to any one of claims 1 to 13, characterized in that: It includes x mask frames; each mask sheet on the mask frame corresponds to a vapor deposition pattern; The masks on the mask frame are divided into x groups; The mask sheets satisfying the i+nxth column are arranged in sequence according to the column number and set on the i-th mask frame to form the i-th mask plate; The distance between the edges of the mask sheets in adjacent columns on the same mask frame is smaller than the sum of the widths of the mask sheets in other columns between the column numbers of the mask sheets in the adjacent columns; Wherein, i and x are both positive integers, and i is less than or equal to x; x is greater than 1; and n is a non-negative integer.

15. The mask assembly according to any one of claims 1 to 13, characterized in that: It includes a mask frame; each mask sheet on the mask frame corresponds to a vapor deposition pattern; The masks on the mask frame are divided into x groups; The mask sheets satisfying the i+nxth column are arranged in sequence according to the column number and set on the i-th mask frame to form the i-th mask plate; The distance between the edges of the mask sheets in adjacent columns on the same mask frame is smaller than the sum of the widths of the mask sheets in other columns between the column numbers of the mask sheets in the adjacent columns; Wherein, i and x are both positive integers, and i is less than or equal to x; x is greater than 1; and n is a non-negative integer.

16. The mask assembly according to claim 15, characterized in that: The mask assembly comprises a target substrate setting area, in which a target substrate is placed; the target substrate completes the evaporation of the first to x mask plates.

17. A vapor deposition device, characterized in that: The invention comprises an evaporation source and the mask assembly according to any one of claims 1 to 16, wherein the mask assembly is arranged between the evaporation source and a target substrate.

18. A vapor deposition method using a mask assembly, characterized in that: Using the mask assembly according to any one of claims 1 to 16, the method comprises: The mask assembly is used to perform vapor deposition on a target substrate.

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