Meter-scale epitaxial system strip tensioning mechanism and meter-scale epitaxial system

Abstract

The invention discloses a meter-scale epitaxial system strip tensioning mechanism and a meter-scale epitaxial system, and relates to the technical field of semiconductor production, the meter-scale epitaxial system strip tensioning mechanism comprises a support frame, one end of the support frame is fixedly provided with a positive electrode fixing assembly, and the interior of the support frame is slidably connected with a negative electrode fixing assembly; an epitaxial strip is fixedly connected between the positive electrode fixing assembly and the negative electrode fixing assembly, a driving assembly used for pulling the negative electrode fixing assembly to move is arranged below the supporting frame, a pulling rope is fixedly connected between the driving assembly and the negative electrode fixing assembly, and a tensioning spring is fixedly connected to the middle of the pulling rope; according to the meter-scale epitaxial system strip tensioning mechanism, the two ends of the strip are clamped and fixed through the positive electrode fixing assembly and the negative electrode fixing assembly at the two ends of the epitaxial strip, and the epitaxial strip is pulled in the mode that the tensioning spring is arranged in the middle of the pulling rope, so that the epitaxial strip is tensioned smoothly, and epitaxial operation is facilitated.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor production, in particular to a strip tensioning mechanism of a meter-level epitaxy system and a meter-level epitaxy system. Background Art

[0002] Epitaxy of semiconductors, also known as epitaxial growth, is an important part of the semiconductor manufacturing process. It is mainly used to grow one or more layers of single-crystal thin films with specific structures and properties on a single-crystal substrate. Epitaxy can be divided into many types, such as chemical vapor deposition (CVD), molecular beam epitaxy (MBE), metal organic chemical vapor deposition (MOCVD), etc. Taking CVD as an example, its epitaxial growth process includes gas introduction: that is, introducing gases containing the required elements (such as silane, germane, trimethyl gallium, etc.) and carrier gases (such as hydrogen and nitrogen) into the reaction chamber. Then heat the substrate: heat the substrate to a certain temperature, usually higher than the melting point of the required epitaxial material, to promote the decomposition and chemical reaction of the gas molecules. At high temperatures, the gas molecules react chemically on the surface of the substrate to form the required epitaxial layer.

[0003] Existing epitaxial processing equipment is difficult to process base substrates of larger sizes (such as meter-level), and due to the increase in length, how to keep the strip flat and tensioned during processing to ensure stable and uniform growth of the epitaxial layer is also a practical problem. Summary of the invention

[0004] The object of the present invention is to provide a meter-level epitaxy system strip tensioning mechanism and a meter-level epitaxy system to solve the problems of the prior art difficulties and the processing of larger-sized base substrates mentioned in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] The strip tensioning mechanism of the meter-level epitaxy system and the strip tensioning mechanism of the meter-level epitaxy system include a support frame, a positive electrode fixing component is fixedly installed on one end of the support frame, a negative electrode fixing component is slidably connected inside the support frame, an epitaxial strip is fixedly connected between the positive electrode fixing component and the negative electrode fixing component, a driving component for pulling the negative electrode fixing component to move is arranged below the support frame, a traction rope is fixedly connected between the driving component and the negative electrode fixing component, and a tensioning spring is fixedly connected to the middle part of the traction rope.

[0007] As a further solution of the present invention: a guide assembly for guiding the traction rope is provided at one end of the support frame, and the guide assembly includes a guide frame, one side of the guide frame is rotatably connected to a guide roller, and the middle part of the traction rope bypasses the outer wall of the guide roller.

[0008] As a further solution of the present invention: a plurality of supporting rollers are rotatably connected to both sides of the guide frame, the outer walls of the plurality of supporting rollers are provided with docking grooves, and a supporting rod is fixedly connected to both sides of the support frame, and the inner walls of the docking grooves are fitted with the outer walls of the supporting rods.

[0009] As a further solution of the present invention: the positive electrode fixing assembly includes an insulating ceramic block, the top of the insulating ceramic block is fixedly connected to an electrode seat, the top of the electrode seat is fixedly connected to an electrode cover plate by fixing bolts, and the epitaxial strip is clamped and fixed between the electrode seat and the electrode cover plate; the structure of the negative electrode fixing assembly is consistent with that of the positive electrode fixing assembly.

[0010] A meter-level epitaxial system comprises an epitaxial cell, an upper cover plate is arranged on the top of the epitaxial cell, a strip tensioning mechanism is arranged inside the epitaxial cell, a plurality of air induction components for introducing reaction gas are fixedly mounted on the top of the inner wall of the upper cover plate, and an opening cover component for driving the upper cover plate to lift and lower is arranged on one side of the epitaxial cell.

[0011] As a further solution of the present invention: the air bleed assembly includes an arc-shaped spreader plate, a plurality of spreader nozzles are fixedly connected to the bottom of the arc-shaped spreader plate, an air intake pipe is fixedly connected to the top of the arc-shaped spreader plate, the top of the inner wall of the upper cover plate is arranged to be arc-shaped, and the top of the arc-shaped spreader plate is arranged to fit the top of the inner wall of the upper cover plate.

[0012] As a further solution of the present invention: the cover opening assembly includes a plurality of lifting frames arranged in parallel, a lifting guide rail is fixedly installed on one side of the lifting frame, a connecting frame is slidably installed on the inner wall of the lifting guide rail, and one end of the connecting frame is fixedly connected to one side of the upper cover plate.

[0013] As a further solution of the present invention: a dispersion and homogenization component is fixedly installed on the bottom of the inner wall of the epitaxial groove, and the dispersion and homogenization component includes an air collecting hood, an air supply frame is fixedly connected to the top of the air collecting hood, a supply fan is fixedly installed inside the air supply frame, and a dust screening net is fixedly installed on the top of the inner wall of the air supply frame; lower air supply ducts are fixedly connected to both sides of the air collecting hood, and upper air supply ducts are fixedly connected to both sides of the inner wall of the upper cover plate, the two upper air supply ducts are correspondingly arranged with the two lower air supply ducts, and the outer walls of the upper air supply ducts and the lower air supply ducts are provided with a plurality of air vents.

[0014] As a further solution of the present invention: both ends of the air collecting hood are provided with side air inlets, both sides of the air supply frame are provided with side ventilation slots, and the side ventilation slots are located between the air supply fan and the dust screening net.

[0015] As a further solution of the present invention: the bottom edge of the upper cover plate and the top edge of the epitaxial groove are fixedly connected with docking pieces, one side of the two docking pieces are fixedly connected with sealing gaskets, and the top of the upper cover plate is fixedly connected with an exhaust pipe.

[0016] Compared with the prior art, the present invention has the following beneficial effects: the present invention sets a meter-level epitaxy system strip tensioning mechanism, uses the positive electrode fixing assembly and the negative electrode fixing assembly to clamp and fix the two ends of the strip, and cooperates with the drive assembly to drive the negative electrode fixing assembly to move, so as to adjust the distance between the positive electrode fixing assembly and the negative electrode fixing assembly, thereby achieving stable clamping of epitaxy strips of different lengths; and by setting a tensioning spring in the middle of the traction rope, the epitaxy strip is pulled to make it tensioned and smooth, which is conducive to epitaxy operation;

[0017] In order to realize the epitaxial operation of meter-level strips, the present invention sets up an epitaxial system that matches the length of the strip tensioning mechanism of the meter-level epitaxial system, in order to solve the problem of uneven distribution of internal reaction gas caused by the increase of its length; by setting up multiple large-area arc-shaped distribution plates, the reaction gas is sent into the reaction chamber from multiple points to improve the uniformity of the reaction gas; and a dispersion and homogenization component is set up to evacuate the overlapping area and send it out from each air supply port, and then send it out through the upper air supply port end and a number of air vents, so as to realize dispersion and diversion, and improve the uniformity of the reaction gas in the inner cavity of the closed container. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a three-dimensional diagram of the strip tensioning mechanism of the present invention;

[0019] Figure 2 It is a side view of the strip tensioning mechanism of the present invention;

[0020] Figure 3 is a cross-sectional view of the strip tensioning mechanism of the present invention;

[0021] Figure 4 A three-dimensional diagram of the meter-scale epitaxy system of the present invention;

[0022] Figure 5 is a cross-sectional view of a meter-scale epitaxy system of the present invention;

[0023] Figure 6 It is a three-dimensional diagram of the dispersion and homogenization component of the present invention;

[0024] Figure 7 It is a cross-sectional view of the dispersing and homogenizing component of the present invention.

[0025] In the figure: 101, insulating ceramic block; 102, electrode holder; 103, electrode cover plate; 104, traction rope; 105, support frame; 106, supporting rod; 107, guide frame; 108, guide roller; 109, supporting roller; 110, driving block; 111, tensioning spring; 112, epitaxial strip; 201, epitaxial groove; 202, upper cover plate; 203, docking piece; 204, lifting frame; 205, connecting frame; 206, air inlet pipe; 207, exhaust pipe; 208, arc-shaped spreading plate; 209, spreading nozzle; 210, air collecting hood; 211, side air inlet; 212, air supply frame; 213, dust screen; 214, air supply fan; 215, side ventilation slot; 216, lower air supply pipe; 217, upper air supply pipe. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0027] See also Figure 1-Figure 4 In the embodiment of the present invention, the strip tensioning mechanism of the meter-level epitaxy system includes a support frame 105, one end of the support frame 105 is fixedly installed with a positive electrode fixing component, the inside of the support frame 105 is slidably connected with a negative electrode fixing component, an epitaxy strip 112 is fixedly connected between the positive electrode fixing component and the negative electrode fixing component, and a driving component for pulling the negative electrode fixing component to move is arranged below the support frame 105, the driving component includes a driving guide rail, the inner wall of the driving guide rail is slidably installed with a driving block 110, one side of the driving block 110 is fixedly connected to one end of the traction rope 104 The middle part of the traction rope 104 is fixedly connected, and a tension spring 111 is fixedly connected. The present application clamps and fixes the two ends of the strip by setting the positive electrode fixing assembly and the negative electrode fixing assembly at the two ends of the strip, and cooperates with the setting of the driving assembly to drive the negative electrode fixing assembly to move, so as to adjust the distance between the positive electrode fixing assembly and the negative electrode fixing assembly, thereby realizing the stable clamping of the epitaxial strips 112 of different lengths; and by setting the tension spring 111 in the middle part of the traction rope, the pulling of the epitaxial strip 112 is maintained, so that it is tensioned and smooth, which is conducive to the epitaxial operation;

[0028] To ensure the stability of the traction direction of the traction rope 104, a guide assembly for guiding the traction rope 104 is provided at one end of the support frame 105, and the guide assembly includes a guide frame 107, and one side of the guide frame 107 is rotatably connected to a guide roller 108, and the middle part of the traction rope 104 bypasses the outer wall of the guide roller 108, and the height of the guide roller 108 is sufficient. When the traction rope 104 bypasses the guide roller 108 and is connected to the insulating ceramic block 101 of the negative electrode fixing assembly, the traction rope 104 itself can be parallel to the sliding direction of the negative electrode fixing assembly, thereby ensuring the stability of the traction force on the negative electrode fixing assembly, thereby making the force on the epitaxial strip 112 stable and avoiding damage to the strip.

[0029] Both sides of the guide frame 107 are rotatably connected with a number of supporting rollers 109, and the outer walls of the supporting rollers 109 are provided with docking grooves. Both sides of the support frame 105 are fixedly connected with supporting rods 106, and the inner walls of the docking grooves are fitted with the outer walls of the supporting rods 106 to ensure the stable position of the guide frame 107. In specific implementation, the two sides of the guide frame 107 are fixed to the support frame 105 or other peripheral installation points by connecting bolts to achieve the installation and fixation of the guide frame 107.

[0030] The positive electrode fixing assembly includes an insulating ceramic block 101, the top of the insulating ceramic block 101 is fixedly connected to an electrode holder 102, the top of the electrode holder 102 is fixedly connected to an electrode cover plate 103 by a fixing bolt, and the electrode holder 102 and the electrode cover plate 103 are clamped and fixed to the epitaxial strip 112; the negative electrode fixing assembly has the same structure as the positive electrode fixing assembly; the electrode holder 102 and the electrode cover plate 103 are electrically connected, and the epitaxial strip 112 is electrically heated to promote the decomposition and chemical reaction of gas molecules, so as to facilitate the epitaxial operation. The specific fixing method between the positive electrode fixing assembly and the negative electrode fixing assembly and the epitaxial strip 112 is: turn the fixing bolt, lift the electrode cover plate 103, put the end of the epitaxial strip 112 between the electrode cover plate 103 and the electrode holder 102, and then turn and tighten the fixing bolt.

[0031] The application of the strip tensioning mechanism of the meter-level epitaxy system of the present application needs to meet the needs of epitaxy operation of meter-level strips, so a corresponding meter-level epitaxy system is required. Due to the increase in the length of the equipment, there will be uneven distribution of the internal reaction gas during the epitaxy operation, which will affect the uniformity of the epitaxy. Please refer to Figure 5-Figure 7 The meter-level epitaxial system of the present application includes an epitaxial groove 201, a top cover plate 202 is arranged on the top of the epitaxial groove 201, a strip tensioning mechanism is arranged inside the epitaxial groove 201, and a plurality of gas introduction components for introducing reaction gas are fixedly installed on the top of the inner wall of the upper cover plate 202.

[0032] In order to improve the uniformity of gas distribution, the air entrainment component of the present application includes an arc-shaped distribution plate 208, a plurality of distribution nozzles 209 are fixedly connected to the bottom of the arc-shaped distribution plate 208, an air inlet pipe 206 is fixedly connected to the top of the arc-shaped distribution plate 208, the top of the inner wall of the upper cover plate 202 is arranged to be arc-shaped, and the top of the arc-shaped distribution plate 208 is arranged to fit the top of the inner wall of the upper cover plate 202. By arranging multiple large-area arc-shaped distribution plates 208, the reaction gas is delivered to the reaction chamber (i.e., the closed container cavity formed by the epitaxial trench 201 and the upper cover plate 202) from multiple points, thereby improving the uniformity of the reaction gas.

[0033] Since there are overlapping areas between the air supply coverage of each component, there are more reactive gases distributed in the overlapping area. In order to disperse and homogenize the reactive gases in this part of the area, a dispersion and homogenization component is fixedly installed at the bottom of the inner wall of the epitaxial groove 201 of the present application. The dispersion and homogenization component includes an air collecting hood 210, and an air supply frame 212 is fixedly connected to the top of the air collecting hood 210. A supply fan 214 is fixedly installed inside the air supply frame 212, and a dust shielding net 213 is fixedly installed on the top of the inner wall of the air supply frame 212; both sides of the air collecting hood 210 are fixedly connected to the lower air supply Tube 216, the air supply direction of the air supply fan 214 is toward the position of the lower air supply tube 216, and the upper air supply tube 217 is fixedly connected to the inner wall of the upper cover plate 202 on both sides. The two upper air supply tubes 217 are arranged corresponding to the two lower air supply tubes 216, and the outer walls of the upper air supply tube 217 and the lower air supply tube 216 are opened with a plurality of air vents; the present application arranges a dispersion and homogenization component to exhaust the overlapping area and send it out through each air supply port, and sends it out through the end of the upper air supply port and a plurality of air vents, so as to realize dispersion and diversion, and improve the uniformity of the reaction gas in the inner cavity of the closed container.

[0034] To improve the suction capacity of the reaction gas, side air inlets 211 are provided at both ends of the air collecting hood 210, and side ventilation slots 215 are provided on both sides of the air supply frame 212. The side ventilation slots 215 are located between the air supply fan 214 and the dust shield 213.

[0035] A cover opening assembly for driving the upper cover plate 202 to move up and down is provided on one side of the epitaxial groove 201, and the cover opening assembly includes a plurality of parallel lifting frames 204, a lifting guide rail is fixedly installed on one side of the lifting frame 204, a connecting frame 205 is slidably installed on the inner wall of the lifting guide rail, and one end of the connecting frame 205 is fixedly connected to one side of the upper cover plate 202; the connecting frame 205 is driven to move up and down by the lifting guide rail, thereby driving the upper cover plate 202 to move up and down, thereby realizing the opening of the device, thereby facilitating the loading and unloading operations of the epitaxial strip 112.

[0036] In order to improve the sealing performance of the device, the bottom edge of the upper cover plate 202 and the top edge of the epitaxial groove 201 are fixedly connected with docking pieces 203, and one side of the two docking pieces 203 is fixedly connected with sealing gaskets. The top of the upper cover plate 202 is fixedly connected with an exhaust pipe 207, and the exhaust pipe 207 is fixedly connected to the output end of the external exhaust equipment, so as to achieve the regulation of the gas pressure inside the closed container.

[0037] When the present invention is used, first one end of the strip 112 to be epitaxially grown is fixedly connected to the positive electrode fixing assembly, and then the other end is fixedly connected to the negative electrode fixing assembly. At this time, the epitaxially grown strip 112 is in a bent state. At this time, the driving guide rail drives the driving block 110 to move, and then drives the traction rope 104 to move. The traction rope 104 pulls the electrode holder 102 of the negative electrode fixing assembly to move away from the positive electrode fixing assembly until the epitaxially grown strip 112 is stretched and straightened; the installation of the epitaxially grown strip 112 is completed;

[0038] Then the lifting rail drives the upper cover plate 202 to press down until the sealing gaskets on the two docking pieces 203 are pressed against each other to seal the reaction chamber, and then the external exhaust device is used to exhaust gas to adjust the air pressure in the reaction chamber to meet the requirements of the epitaxial operation. Then the reaction gas is sent into the reaction chamber through the air inlet pipe 206 to fill the reaction chamber. At the same time, the electrode holder 102 is connected to electricity in the dispersion and homogenization component, so that the epitaxial strip 112 is powered on and heated. Under high temperature conditions, the gas molecules react chemically on the surface of the substrate to form an epitaxial layer, completing the epitaxial operation;

[0039] Then the lifting rail drives the upper pressure cover to move up and open. After the epitaxial strip 112 cools down, the driving rail drives the driving block 110 to move to relax the epitaxial strip 112. Then the fixing bolts are turned to separate the electrode pressure plate from the electrode holder 102 and remove the epitaxial strip 112.

[0040] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment as above, it is not used to limit the present invention. Any technical personnel in this field can make some changes or modify the technical contents disclosed above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of the technical solution of the present invention.

Claims

1. The strip tensioning mechanism of the meter-level epitaxy system is characterized by: The invention comprises a support frame (105), one end of which is fixedly mounted with a positive electrode fixing assembly, the interior of the support frame (105) is slidably connected with a negative electrode fixing assembly, an epitaxial strip (112) is fixedly connected between the positive electrode fixing assembly and the negative electrode fixing assembly, a driving assembly for pulling the negative electrode fixing assembly to move is arranged below the support frame (105), a traction rope (104) is fixedly connected between the driving assembly and the negative electrode fixing assembly, and a tensioning spring (111) is fixedly connected to the middle of the traction rope (104).

2. The strip tensioning mechanism for a meter-level epitaxy system according to claim 1, characterized in that: A guide assembly for guiding the traction rope (104) is disposed at one end of the support frame (105), and the guide assembly comprises a guide frame (107), and a guide roller (108) is rotatably connected to one side of the guide frame (107).

3. The strip tensioning mechanism for a meter-level epitaxy system according to claim 2, characterized in that: Both sides of the guide frame (107) are rotatably connected to a plurality of supporting rollers (109), and the outer walls of the plurality of supporting rollers (109) are provided with docking grooves. Both sides of the support frame (105) are fixedly connected to supporting rods (106), and the inner walls of the docking grooves are arranged in close contact with the outer walls of the supporting rods (106).

4. The strip tensioning mechanism for a meter-level epitaxy system according to claim 1, characterized in that: The positive electrode fixing assembly comprises an insulating ceramic block (101), the top of the insulating ceramic block (101) is fixedly connected to an electrode seat (102), the top of the electrode seat (102) is fixedly connected to an electrode cover plate (103) via fixing bolts, and the epitaxial strip (112) is clamped and fixed between the electrode seat (102) and the electrode cover plate (103); the structure of the negative electrode fixing assembly is consistent with that of the positive electrode fixing assembly.

5. Meter-level epitaxy system, characterized in that: The invention comprises an epitaxial groove (201), wherein an upper cover plate (202) is arranged on the top of the epitaxial groove (201), a strip tensioning mechanism is arranged inside the epitaxial groove (201), a plurality of air introduction components for introducing reaction gas are fixedly mounted on the top of the inner wall of the upper cover plate (202), and an opening cover component for driving the upper cover plate (202) to move up and down is arranged on one side of the epitaxial groove (201).

6. The meter-scale epitaxy system according to claim 5, characterized in that: The air bleed assembly comprises an arc-shaped spreading plate (208), a plurality of spreading nozzles (209) are fixedly connected to the bottom of the arc-shaped spreading plate (208), an air inlet pipe (206) is fixedly connected to the top of the arc-shaped spreading plate (208), and the top of the arc-shaped spreading plate (208) is arranged to fit the top of the inner wall of the upper cover plate (202).

7. The meter-scale epitaxy system according to claim 5, characterized in that: The cover opening assembly comprises a plurality of lifting frames (204) arranged in parallel, a lifting guide rail being fixedly mounted on one side of the lifting frame (204), a connecting frame (205) being slidably mounted on the inner wall of the lifting guide rail, and one end of the connecting frame (205) being fixedly connected to one side of the upper cover plate (202).

8. The meter-scale epitaxy system according to claim 5, characterized in that: A dispersion and homogenization component is fixedly installed at the bottom of the inner wall of the epitaxial groove (201), and the dispersion and homogenization component includes an air collecting hood (210), and an air supply frame (212) is fixedly connected to the top of the air collecting hood (210), and a supply fan (214) is fixedly installed inside the air supply frame (212), and a dust shielding net (213) is fixedly installed on the top of the inner wall of the air supply frame (212); both sides of the air collecting hood (210) are fixedly connected to a lower air supply pipe (216), and both sides of the inner wall of the upper cover plate (202) are fixedly connected to an upper air supply pipe (217), and the two upper air supply pipes (217) are arranged corresponding to the two lower air supply pipes (216), and the outer walls of the upper air supply pipe (217) and the lower air supply pipe (216) are provided with a plurality of air vents.

9. The meter-scale epitaxy system according to claim 8, characterized in that: Both ends of the air collecting cover (210) are provided with side air inlets (211), and both sides of the air supply frame (212) are provided with side ventilation slots (215).

10. The meter-scale epitaxy system according to claim 5, characterized in that: The bottom edge of the upper cover plate (202) and the top edge of the epitaxial groove (201) are both fixedly connected with docking pieces (203), one side of the two docking pieces (203) is fixedly connected with a sealing gasket, and the top of the upper cover plate (202) is fixedly connected with an exhaust pipe (207).

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