Reticle cartridge provided with reticle support absorbing downforce

Abstract

The present invention provides a photomask cartridge provided with a photomask support for absorbing down force, comprising: at least one photomask support for absorbing down force, the photomask support having an elastic means; wherein the height of the photomask support member is maintained at a predetermined height when a downward pressure borne by the photomask support member is less than or equal to a critical value; wherein when the downward pressure borne by the photomask supporting piece is larger than the critical value, the photomask supporting piece absorbs the downward pressure through deformation, and the photomask supporting piece is recovered to the preset height until the downward pressure is dispersed to other photomask supporting pieces. According to the photomask box provided with the photomask supporting pieces capable of absorbing the downward pressure, the supporting pieces can absorb excessive loads when the photomasks are taken and placed, so that collision and friction between the photomasks and the corresponding supporting pieces are avoided, and abrasion and pollution of the photomasks or the supporting pieces are avoided.

Description

Technical Field

[0001] The present invention relates to a reticle box, and more particularly to a reticle box provided with a reticle support member for absorbing downward pressure. Background Art

[0002] In the current extreme ultraviolet (EUV) lithography process, a dual pod is mainly used to protect the photomask. The existing dual pod includes an outer pod (EOP) and an inner pod (EIP). The photomask is contained in the inner pod, and the inner pod is contained in the outer pod.

[0003] When the double-layer box is running in the exposure machine, the inner box and the outer box are opened to expose the photomask, and then the photomask is taken out by the robot arm. In the process of the robot arm putting the photomask back, if the robot arm makes the photomask non-horizontal for some reason, that is, the four corners of the photomask are not substantially on the same horizontal plane, the photomask may first contact one of the support members of the base with only a single corner. At this time, if the robot arm does not provide an adjustment or buffer mechanism, the reverse force of the support member is excessively concentrated on a single corner of the photomask, causing serious collision and friction between the corner of the photomask and the corresponding support member, thereby generating particles, and causing damage and contamination of the photomask. Summary of the invention

[0004] In view of the above problems, the present invention provides a mask box provided with a mask support member for absorbing downward pressure, which can absorb excessive load when the mask is taken and placed to avoid collision and friction between the mask and the corresponding support member, thereby avoiding wear and contamination of the mask or the support member.

[0005] The present invention aims to provide a mask box provided with a mask support member for absorbing downward pressure, the mask box comprising a base and at least one mask support member arranged on the base. The mask support member is used to carry a mask and has an elastic means; when the downward pressure borne by the mask support member is less than or equal to a critical value, a height of the mask support member is maintained at a predetermined height; when the downward pressure borne by the mask support member is greater than the critical value, the mask support member absorbs the downward pressure by deformation until the downward pressure is dispersed to other mask support members, and the mask support member is restored to the predetermined height.

[0006] In a specific embodiment, the elastic means is an elastic material, a spring or a hollow structure, and the critical value is determined according to the elastic means.

[0007] In a specific embodiment, the photomask support has a protrusion, and the protrusion has an elastic material so that the protrusion can form an elastic contact with a photomask, and the elastic material is rubber or thermoplastic material.

[0008] In a specific embodiment, the mask support absorbs the downward force by means of compression deformation of the elastic material.

[0009] In a specific embodiment, an elastic element is provided at the bottom of the mask support, so that the mask support is elastically connected to the base of the mask box through the elastic element.

[0010] In a specific embodiment, the elastic element is subjected to a downward pressure greater than the critical value, and correspondingly deforms and sinks to absorb the downward pressure.

[0011] In a specific embodiment, the elastic element is a spring, and the mask support is connected to the base via the spring.

[0012] In a specific embodiment, the elastic element is a plurality of elastic gaskets, and the mask support is connected to the base through the elastic gaskets.

[0013] In a specific embodiment, the plurality of elastic gaskets cooperate with the plurality of locking elements of the mask support to fix the mask support to the base.

[0014] In a specific embodiment, the photomask support has a protrusion and two edge limits located on both sides of the protrusion, and a plurality of the elastic gaskets are arranged below the protrusion and the two edge limits of the photomask support.

[0015] In a specific embodiment, the weight of the mask is between 320 g and 330 g, and the critical value is greater than or equal to 3.14N.

[0016] In a specific embodiment, the predetermined height is between 0.17 mm and 0.23 mm.

[0017] The present invention provides a mask box with a mask support member that absorbs downward pressure. The support member can absorb excessive load when the mask is taken or placed to avoid collision and friction between the mask and the corresponding support member, thereby avoiding wear and contamination of the mask or the support member. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The accompanying drawings described herein are only for explanation purposes and are not intended to limit the scope of the present invention in any way. In addition, the shapes and proportional dimensions of the various components in the figures are only schematic, used to help understand the present invention, and are not specifically limited to the shapes and proportional dimensions of the various components of the present invention. Those skilled in the art can select various possible shapes and proportional dimensions to implement the present invention according to the teachings of the present invention.

[0019] Figure 1A It is a schematic diagram of a mask base carrying a mask in a normal state according to an embodiment of the present invention.

[0020] Figure 1B It is a schematic diagram of a mask base according to an embodiment of the present invention when the mask is tilted by an external force.

[0021] Figure 2A Schematic diagram of the support structure of the second embodiment of the present invention.

[0022] Figure 2B Schematic diagram of the structural changes of the support member according to the second embodiment of the present invention.

[0023] Figure 3 FIG. 4 is an exploded view of a mask base and a mask according to a third embodiment of the present invention.

[0024] Figure 4 FIG. 4 is a top view of a mask base and a mask according to a third embodiment of the present invention.

[0025] Figure 5A This is an exploded view of a support member according to a third embodiment of the present invention.

[0026] Figure 5B for Figure 4 A cross-sectional view of the support member of the third embodiment taken along line AA.

[0027] Fig. 6A This is an exploded view of the support member of variation 1 of the third embodiment of the present invention.

[0028] Figure 6B for Figure 4 A cross-sectional view of the support member of variation 1 of the third embodiment taken along line AA.

[0029] Fig. 7A This is an exploded view of the support member of variation 2 of the third embodiment of the present invention.

[0030] Figure 7B for Figure 4 A cross-sectional view of the support member of variation 2 of the third embodiment taken along line AA.

[0031] Description of Reference Numerals

[0032] 100 Photomask support

[0033] 113 Fixed convex part

[0034] 114 Fixing holes

[0035] 200 Second Embodiment Photomask Support

[0036] 200' Second embodiment of the mask support

[0037] 201 Bump

[0038] 202 Connection

[0039] 203 Connection

[0040] 30 Support mechanism

[0041] 31. Photomask support

[0042] 311 Bump

[0043] 312 Card groove

[0044] 313 Edge Limit

[0045] 314 Locking hole

[0046] 32 elastic gasket

[0047] 33 Locking parts

[0048] 50 Base

[0049] 501 Upper surface of base

[0050] 51 Mounting holes

[0051] H Predetermined height

[0052] h Height

[0053] R Mask

[0054] R1 mask bottom surface

[0055] α Angle DETAILED DESCRIPTION

[0056] The details of the present invention can be more clearly understood with reference to the accompanying drawings and the description of the specific embodiments of the present invention. However, the specific embodiments of the present invention described herein are only used for the purpose of explaining the present invention and cannot be understood as limiting the present invention in any way. Under the guidance of the present invention, technicians can conceive of any possible variations based on the present invention, which should all be considered to belong to the scope of the present invention.

[0057] The present invention provides a photomask box including at least one photomask support member capable of absorbing downward pressure, wherein the photomask support member has elastic means for absorbing downward pressure and buffering excess downward pressure. In order to more clearly describe the present invention, only the photomask and the base of the photomask box of the present invention are shown in the drawings.

[0058] like Figure 1A As shown, Figure 1ASchematic diagram of a photomask base (such as the base of the inner box of the double-layer box) carrying a photomask R in a normal state. The photomask support 100 of the present invention is disposed on the upper surface 501 of the base 50 of the photomask box, and the photomask support 100 is used to carry the photomask R. When the photomask R is placed on the photomask support 100, a predetermined height H is maintained between the lower surface R1 of the photomask and the upper surface 501 of the base, that is, the height of the uncompressed photomask support 100 extending upward from the upper surface 501, that is, the height of the photomask support 100 exposed from the upper surface 501. In an embodiment of the inner box of a double-layer box, the predetermined height H is between 0.17 mm and 0.23 mm.

[0059] Next, please refer to Figure 1B As shown, the mask support 100 of the present invention is configured such that when the downward pressure is excessively concentrated on a single or a few mask support members 100 due to the tilt of the mask R when placing or taking the mask R, and the normal force (normal force) of the mask support 100 borne by the corner of the mask support 100 is greater than a critical value, an elastic means of the mask support 100 absorbs the downward pressure. Through the elastic means, the mask support 100 between the lower surface R1 of the mask and the upper surface 501 of the base must form a height h less than a predetermined height H, so that the lower surface R1 of the mask and the upper surface 501 of the base define an angle α, until the downward pressure is dispersed to other mask support members 100, and the mask support 100 that first contacts the mask returns to the predetermined height H. Among them, the critical value design of the mask support 100 itself can be determined according to the weight of the mask and / or the downward pressure provided by the movement mode of the robot arm. For example, when the weight of the photomask is between 320g and 330g, the critical value can be greater than or equal to 3.14N through the material and structure design of the photomask support 100. In this case, when the downward pressure on a single photomask support 100 in contact with the photomask is greater than 3.14N, the elastic means of the photomask support 100 intervenes and takes effect to absorb the downward pressure, thereby preventing the corresponding corner of the photomask from being subjected to excessive positive force.

[0060] In the first embodiment of the present invention, the mask support 100 uses an elastic material that is compressible and resilient, high temperature resistant, highly wear resistant, or highly plastic as an elastic means. The material includes but is not limited to rubber or thermoplastic material (TPE), such as styrene (TPR), polyolefin (TPV), polyurethane (TPU), or polyether (TPEE).

[0061] Therefore, when the mask support 100 is made of elastic material, the top of the mask support 100 forms elastic contact with the mask lower surface R1. When the downward pressure on a single mask support 100 is greater than a critical value, the mask support 100 absorbs the downward pressure by self-compression deformation.

[0062] The second embodiment of the present invention can be found in Figure 2A and Figure 2B , the mask support 200 and the mask support 200' include a protrusion 201, and the protrusion 201 of the mask support 200 is combined with a connecting portion 202, and the protrusion 201 of the mask support 200' is combined with another connecting portion 203. Among them, the connecting portion 202 and the connecting portion 203 are different variations of the elastic element. The second embodiment of the present invention uses the elastic element of the mask support 200 and the mask support 200' as an elastic means to absorb downward pressure. The protrusion 201 is connected or coupled to the connection portion 202 and the connection portion 203. Figure 1A The base 50 allows the protrusion 201 to be compressed or swung relative to the upper surface 501 of the base. The connecting parts 202 and 203 have structures that are easier to deform than the protrusion 201 to absorb the downward pressure. Preferably, the connecting part 202 is a spring, the bottom of which can be buried in the base 50 by an appropriate connection method, and the top of the spring is connected to the protrusion 201. The connecting part 203 is a hollow structure. Figure 2B As shown, the connecting portion 203 is mainly composed of four thin columns and a bottom plate. The material of the thin columns can be appropriately selected, such as the elastic material mentioned above, to present a flexible property. It can be seen that the four thin columns of the connecting portion 203 can be deformed and bent due to the force, thereby causing the protrusion 201 to swing or sink.

[0063] Therefore, when the connection portion 202 of the mask support 200 and the connection portion 203 of the mask support 200' are elastic elements, in response to the downward pressure on the mask support 200 and the mask support 200' being greater than the critical value, the protrusion 201 of the mask support 200 and the mask support 200' slightly sinks relative to the upper surface 501 of the base to absorb the downward pressure from the corner of the mask R. In other words, the mask support 200 and the mask support 200' absorb the downward pressure through the deformation of the elastic element.

[0064] Preferably, the protrusion 201 or the connection part 202 of the mask support 200, the protrusion 201 or the connection part 203 of the mask support 200' can be made of elastic material as in the first embodiment of the present case. The protrusion 201 is connected or coupled to a mounting interface (omitted and not shown) of the base 50 through the connection part 202, the connection part 203. When the downward pressure on the mask support 200, the mask support 200' is greater than the critical value, the protrusion 201 or the connection part 202, the connection part 203 absorbs the downward pressure by means of compression deformation.

[0065] The third embodiment of the present invention can be found in Figures 3 to 5B . Figure 3 A three-dimensional diagram of a base 50 and a photomask R of an inner box of a photomask box is shown as an example. Figure 4FIG. 5 is a top view of a base 50 carrying a light mask R. Four corners of the base 50 have mounting holes 51 , and the supporting mechanism 30 is disposed in the mounting holes 51 . Figure 5A and Figure 5B As shown, the support mechanism 30 includes a mask support 31, an elastic gasket 32, and two locking members 33. The locking member 33 is detachably fixed to the fixing hole 114 of the base 50 through two locking holes 314 of the mask support 31. In the third embodiment of the present invention, the mask support 31 uses the elastic gasket 32 ​​as an elastic means to absorb downward pressure.

[0066] The mask support 31 includes a protrusion 311 (for contacting the lower surface of the mask R) and at least one edge limiter 313 (for limiting the side of the mask R). An elastic gasket 32 ​​is provided on the top of the protrusion 311, so that the mask R contacts the elastic gasket 32 ​​when it is supported on the mask support 31, and an elastic contact is formed between the mask R and the protrusion 311. When the downward pressure on the mask support 31 is greater than a critical value, the elastic gasket 32 ​​is sufficient to absorb the downward pressure applied by the corner of the mask R. In this case, the height of the protrusion 311 exposed plus the thickness of the compressed elastic gasket 32 ​​is essentially necessarily smaller than the height of the protrusion 311 exposed plus the thickness of the uncompressed elastic gasket 32, as shown in FIG. Figure 1A and Figure 1B The relationship between the predetermined height H and the height h. Preferably, a groove 312 can be appropriately formed at the top of the protrusion 311 to match and connect the elastic gasket 32. Preferably, the groove 312 can be appropriately configured so that the elastic gasket 32 ​​is connected to the protrusion 311 in a detachable manner. By arranging the elastic gasket 32 ​​on the top of the protrusion 311, the hard contact between the photomask R and the protrusion 311 is replaced by elastic contact, which can reduce the wear of contamination particles and the protrusion 311. In addition, the detachable means provided by the locking member 33 or the groove 312 facilitates the replacement of different photomask supports 31 or elastic gaskets 32.

[0067] See Variation 1 of the third embodiment of the present invention. Fig. 6A and Figure 6B, the variation 1 of the third embodiment of the present invention has two elastic gaskets 32 and two locking pieces 33 to fix the mask support 31 to the base 50. Specifically, the elastic gasket 32 ​​is arranged between the fixing hole 114 of the base 50 and the mask support 31, so that elastic contact is formed between the mask support 31 and the base 50, but this assembly does not actually compress the elastic gasket 32. The locking piece 33 passes through the locking hole 314 of the mask support 31, the elastic gasket 32, and the fixing hole 314 in sequence to install the mask support 31 in the mounting hole 51 of the base 50. By setting the elastic gasket 32 ​​between the mask support 31 and the base 50, the downward force is absorbed. In a feasible variation, the two elastic gaskets 32 can also be replaced by a single elastic gasket with a pair of holes, and it is also set between the fixing hole 114 of the base 50 and the mask support 31.

[0068] Preferably, the variation 1 of the third embodiment of the present invention has two elastic gaskets 32, which cooperate with two locking pieces 33 respectively, so that elastic contact is formed between the mask support 31 and the base 50, and the downward force is absorbed by the two elastic gaskets 32. In this case, the height of the protrusion 311 exposed plus the thickness of the compressed elastic gasket 32 ​​is essentially smaller than the height of the protrusion 311 exposed plus the thickness of the uncompressed elastic gasket 32, as shown in FIG. Figure 1A and Figure 1B The relationship between the predetermined height H and the height h.

[0069] See Variation 2 of the third embodiment of the present invention. Fig. 7A and Figure 7B , three elastic gaskets 32 are arranged below the protrusion 311 and two edge limits 313 of the mask support 31, so that elastic contact is formed between the mask support 31 and the base 50. A fixing protrusion 113 corresponding to the bottom of the edge limit 313 is provided in the mounting hole 51 of the base 50. During assembly, the elastic gasket 32 ​​can be first placed in the mounting hole 51 and surrounded by the fixing protrusion 113, and then the mask support 31 is placed and the elastic gasket 32 ​​is limited by pressing down the mask support 31 (but the elastic gasket 32 ​​is not actually compressed) to avoid unnecessary displacement. In other feasible variations, the number of elastic gaskets 32 may be less than three, such as only two elastic gaskets 32 corresponding to the edge limit 313, or only one elastic gasket 32 ​​corresponding to the protrusion 311.

[0070] Preferably, the variation 2 of the third embodiment of the present invention has three elastic gaskets 32, which are respectively arranged under the protrusion 311 of the mask support 31 and the two edge limits 313, and the downward force is absorbed by the three elastic gaskets 32. In this case, the height of the protrusion 311 exposed plus the thickness of the compressed elastic gasket 32 ​​is essentially smaller than the height of the protrusion 311 exposed plus the thickness of the uncompressed elastic gasket 32, as shown in FIG. Figure 1A and Figure 1B The relationship between the predetermined height H and the height h.

[0071] The elastic gasket 32 ​​can be a hardware component with load absorption such as a rubber gasket or a spring washer. By installing an additional elastic gasket 32, the installation position and number of the elastic gasket 32 ​​can be flexibly adjusted to match the load changes of different machine operations, so as to avoid excessive external force between the photomask and the support when taking and placing, thereby generating particles or causing damage.

[0072] The various embodiments and variations of the present invention can be arbitrarily combined and matched according to actual usage requirements without violating the intent or technical principles of the present invention.

[0073] The detailed explanation of the above-mentioned embodiments is only intended to explain the present invention so as to facilitate a better understanding of the present invention. However, these descriptions cannot be interpreted as limitations on the present invention for any reason. In particular, the various features described in different embodiments may also be arbitrarily combined with each other to form other embodiments. Unless there is a clear description to the contrary, these features should be understood to be applicable to any embodiment and are not limited to the described embodiments.

Claims

1. A reticle box provided with a reticle support member for absorbing downward pressure, the reticle box comprising a base and at least one reticle support member disposed on the base, characterized in that: The photomask support is used to carry a photomask and has an elastic means; When the pressure on the photomask support is less than or equal to a critical value, a height of the photomask support is maintained at a predetermined height; When the downward pressure on the photomask support is greater than the critical value, the photomask support absorbs the downward pressure by deformation until the downward pressure is dispersed to other photomask support members, and then the photomask support returns to the predetermined height.

2. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 1, characterized in that: The elastic means is an elastic material, a spring or a hollow structure, and the critical value is determined according to the elastic means.

3. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 1, characterized in that: The light mask supporting component has a protrusion, and the protrusion has an elastic material so that the protrusion can form an elastic contact with the light mask, and the elastic material is rubber or thermoplastic material.

4. The reticle box provided with a reticle support member for absorbing downward pressure as claimed in claim 3, characterized in that: The light mask support absorbs the downward pressure by means of compression deformation of the elastic material.

5. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 1, characterized in that: An elastic element is provided at the bottom of the light mask support, so that the light mask support forms an elastic connection with the base through the elastic element.

6. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 5, characterized in that: The elastic element receives a downward pressure greater than the critical value, and correspondingly deforms and sinks to absorb the downward pressure.

7. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 5, characterized in that: The elastic element is a spring, and the light mask support is connected to the base through the spring.

8. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 5, characterized in that: The elastic element is a plurality of elastic pads, and the light mask support is connected to the base through the elastic pads.

9. The reticle box provided with a reticle support member for absorbing downward pressure according to claim 8, characterized in that: The plurality of elastic gaskets cooperate with a plurality of locking members to fix the light mask support member to the base.

10. The reticle box provided with a reticle support member absorbing downward pressure as claimed in claim 8, characterized in that: The photomask support has a protrusion and two edge limits located on both sides of the protrusion, and a plurality of elastic pads are arranged below the protrusion and the two edge limits of the photomask support.

11. The reticle box provided with a reticle support member absorbing downward pressure according to claim 1, characterized in that: The weight of the mask is between 320g and 330g, and the critical value is greater than or equal to 3.14N.

12. The reticle box provided with a reticle support member absorbing downward pressure as claimed in claim 1, characterized in that: The predetermined height is between 0.17 mm and 0.23 mm.

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