Glass ceramic cleaning and thinning method

By cleaning the microcrystalline glass with alkaline and acidic cleaning agents in sequence, the problems of poor cleaning effect and reduced surface quality in the prior art are solved, and the surface of microcrystalline glass with high cleanliness and low roughness is achieved, which is suitable for high-end electronic equipment applications.

CN119504146APending Publication Date: 2025-02-25BOWEN HI TECH (HUIZHOU) CO LTD +1
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Patent Information

Application Number
CN202411748835.5
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-02
Publication Date
2025-02-25

AI Technical Summary

Technical Problem

The existing microcrystalline glass cleaning and thinning methods have problems with poor cleaning results and reduced surface quality, especially in the application of high-end electronic equipment, which is difficult to meet strict cleanliness and surface quality requirements.

Method used

A method of cleaning and thinning for microcrystalline glass is adopted. By cleaning the microcrystalline glass with alkaline cleaning agent and acidic cleaning agent in turn, the cleaning time is controlled to ensure the consistent etching depth of the glass phase and the microcrystalline phase.

Benefits of technology

It achieves a crystal-crystalline glass surface with high cleanliness and low roughness, meets the strict requirements of high-end electronic equipment, and maintains the quality of the crystal-crystalline glass surface.

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Abstract

The invention discloses a glass ceramic cleaning and thinning method, and belongs to the technical field of glass ceramic. According to the scheme, a glass phase in the microcrystalline glass is etched by using strong base, and then a microcrystalline phase in the microcrystalline glass is etched by using strong acid, or the microcrystalline glass is cleaned by using strong acid and then cleaned by using strong base. By accurately controlling the reaction time, the etching depth of the glass phase and the etching depth of the microcrystalline phase are ensured to be consistent, so that the microcrystalline glass with high cleanliness and low roughness is obtained. According to the scheme, the good cleaning effect can be guaranteed, the surface quality of the glass ceramics can be kept, and the glass ceramics cleaning agent is suitable for various types of glass ceramics and large-scale production and has wide application prospects.
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Description

Technical Field

[0001] The present invention relates to the technical field of microcrystalline glass, and in particular to a method for cleaning and thinning microcrystalline glass. Background Art

[0002] With the rapid development of smart phones, smart wearable devices, in-vehicle systems and smart homes, glass-ceramics are increasingly used in the cover plates of these products. Glass-ceramics is an ideal choice for these high-end electronic devices due to its excellent physical and chemical properties, such as high hardness, heat resistance and good optical properties.

[0003] However, there are some problems with the existing cleaning solutions for microcrystalline glass. Although the commonly used neutral detergents are less corrosive to microcrystalline glass, their cleaning effect is poor. After cleaning with neutral detergents, the microcrystalline glass cover plate often has dirt residue, resulting in poor cleanliness. This incomplete cleaning will cause a series of problems in the subsequent process, such as pad printing discoloration, coating discoloration, surface dirt, and film shedding, which seriously affect the quality and appearance of the product.

[0004] In contrast, alkaline cleaning agents can provide better cleaning effects, but since the chemical reaction rate of alkaline cleaning agents with the glass phase in microcrystalline glass is much faster than the reaction rate with the microcrystalline phase, this will increase the surface roughness of the microcrystalline glass. Therefore, when using alkaline cleaning agents to clean microcrystalline glass, although the cleanliness can be improved, it will lead to the problem of reduced surface quality.

[0005] In addition, the existing microcrystalline glass thinning solution usually adopts HF acid etching. Although HF acid etching can effectively thin microcrystalline glass, it will also cause the surface of microcrystalline glass to become whitish. The chemical reaction rate of HF acid with the microcrystalline phase in microcrystalline glass is much faster than the reaction rate with the glass phase, which will also cause the surface roughness of microcrystalline glass to increase, affecting the quality and appearance of the final product.

[0006] In summary, the existing microcrystalline glass cleaning and thinning methods have certain limitations, and there is an urgent need for a method that can ensure a good cleaning effect while maintaining the surface quality of the microcrystalline glass. Summary of the invention

[0007] The technical problem to be solved by the present invention is: in view of the above-mentioned defects of the prior art, a method for cleaning and thinning microcrystalline glass is provided to improve the cleanliness and surface quality of the microcrystalline glass to meet the strict requirements of high-end electronic equipment.

[0008] To achieve the above object, the present invention provides a method for cleaning and thinning microcrystalline glass, the method comprising the following steps:

[0009] Step S1, cleaning the glass-ceramics with an alkaline cleaning agent;

[0010] Step S2, cleaning the glass-ceramics with an acidic cleaning agent;

[0011] Step S3, cleaning the glass-ceramics with a neutral cleaning agent;

[0012] Step S4, washing the glass-ceramics with pure water;

[0013] Step S5, wind-cutting and drying the glass-ceramics;

[0014] In the step S1, the etching depth of the surface of the microcrystalline glass by the alkaline cleaning agent is a first depth, and in the step S2, the etching depth of the surface of the microcrystalline glass by the acidic cleaning agent is a second depth, and the cleaning time of the microcrystalline glass in the alkaline cleaning agent and the acidic cleaning agent is controlled so that the second depth is equal to the first depth;

[0015] The order of step S1 and step S2 can be interchanged.

[0016] Preferably, the alkaline cleaning agent comprises a strong base and a complexing agent.

[0017] Preferably, in terms of weight percentage, the content of the strong base is 10-50%, the content of the complexing agent is 1-40%, and the rest is water.

[0018] Preferably, the strong base includes one or more of potassium hydroxide, sodium hydroxide, and rubidium hydroxide, and the complexing agent includes one or more of gluconate, sodium citrate, sodium alginate, sodium tartrate, and potassium tartrate.

[0019] Preferably, the acid cleaning agent comprises hydrofluoric acid in an amount of 1 to 10% by weight.

[0020] Preferably, the acid cleaning agent further comprises an auxiliary agent, the weight percentage of which is 1-5%, and the auxiliary agent comprises one or more of nitric acid, citric acid and hydrochloric acid.

[0021] Preferably, between step S1 and step S2, the step generally further includes: washing the microcrystalline glass with pure water to wash away the cleaning agent remaining on the surface of the microcrystalline glass in the previous step.

[0022] The present invention has the following beneficial effects: In this solution, a strong alkali is first used to etch the glass phase in the microcrystalline glass, and then a strong acid is used to etch the microcrystalline phase in the microcrystalline glass, or the glass is first cleaned with a strong acid and then with a strong alkali. By precisely controlling the reaction time, the etching depths of the glass phase and the microcrystalline phase are ensured to be consistent, thereby obtaining microcrystalline glass with high cleanliness and low roughness. This solution can not only ensure a good cleaning effect, but also maintain the quality of the surface of the microcrystalline glass, and is suitable for various types of microcrystalline glass and large-scale production, and has broad application prospects. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0024] Figure 1 A schematic diagram of the steps of a method for cleaning and thinning microcrystalline glass provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0025] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] The general idea of ​​the present invention is: based on the principle that the glass phase in the microcrystalline glass reacts faster with a strong base, and the microcrystalline phase reacts faster with a strong acid, the microcrystalline glass is cleaned with a strong acid and a strong base in sequence. First, the glass phase in the microcrystalline glass is etched with a strong base, and then the microcrystalline phase in the microcrystalline glass is etched with a strong acid, or the glass is first cleaned with a strong acid and then with a strong base. By precisely controlling the reaction time, the etching depth of the glass phase and the microcrystalline phase is ensured to be consistent, thereby obtaining a microcrystalline glass with high cleanliness and low roughness.

[0027] The embodiments of the present invention are further described in detail below in conjunction with the accompanying drawings of the specification. It should be understood that the embodiments described herein are only used to illustrate and explain the present invention, and are not used to limit the present invention.

[0028] The present invention is suitable for cleaning and thinning of microcrystalline glass. The main purpose of cleaning microcrystalline glass is to remove surface dirt and ensure surface cleanliness, and the main purpose of thinning is to reduce the thickness of microcrystalline glass according to design requirements. Cleaning and thinning usually have high requirements on the surface roughness of microcrystalline glass.

[0029] like Figure 1As shown, an embodiment of the present invention provides a method for cleaning and thinning micro-ceramic glass, which is used to clean or thin micro-ceramic glass, and the method includes the following steps:

[0030] Step S1, using an alkaline cleaning agent to clean the microcrystalline glass, wherein the alkaline cleaning agent etches the surface of the microcrystalline glass to a first depth.

[0031] In the process of cleaning microcrystalline glass, the main purpose of using alkaline cleaning agents is to remove dirt on the surface of the microcrystalline glass and to etch the glass phase on the surface of the microcrystalline glass.

[0032] In the process of thinning the microcrystalline glass, the main purpose of using alkaline cleaning agents for cleaning is to etch the glass phase on the surface of the microcrystalline glass so as to reduce the thickness of the microcrystalline glass according to the design requirements.

[0033] In an embodiment of the present invention, the alkaline cleaning agent comprises a strong base and a complexing agent. In terms of weight percentage, the content of the strong base is 10-50%, the content of the complexing agent is 1-40%, and the rest is water. The strong base comprises one or more of potassium hydroxide, sodium hydroxide, and rubidium hydroxide, and the complexing agent comprises one or more of gluconate, sodium citrate, sodium alginate, sodium tartrate, and potassium tartrate. The complexing agent may also be other commonly used complexing agent components.

[0034] Stubborn dirt is firmly attached to the surface of microcrystalline glass through chemical bonds such as SI-O, and is difficult to remove by ordinary cleaning methods such as ultrasonic, flat cleaning, brushes, etc. Strong alkali can react chemically with the dirt components on the surface of microcrystalline glass and the microcrystalline glass matrix to remove the dirt components and achieve the purpose of decontamination. The greater the amount of strong alkali used, the stronger the decontamination ability. However, while strong alkali is decontaminating, it will react chemically with the microcrystalline glass matrix and destroy the SI-O network structure of the microcrystalline glass itself, thereby causing the glass phase of the microcrystalline glass to corrode. The microcrystalline phase is not easily corroded by alkali, resulting in an uneven surface of the microcrystalline glass, increased roughness and increased haze.

[0035] Complexing agent is also an important component of glass cleaning agent. It plays multiple roles in glass cleaning agent, such as adjusting pH value, softening water quality, enhancing cleaning effect, dissolving reactants to prevent secondary pollution, protecting sensitive surfaces and improving the stability of cleaning liquid. It is an indispensable component for optimizing glass cleaning performance.

[0036] Step S2, using an acidic cleaning agent to clean the microcrystalline glass, wherein the acidic cleaning agent etches the surface of the microcrystalline glass to a second depth.

[0037] In the process of cleaning and thinning the microcrystalline glass, the main purpose of using acidic cleaning agents is to etch the microcrystalline phase on the surface of the microcrystalline glass.

[0038] In an embodiment of the present invention, the acid cleaning agent includes hydrofluoric acid, and its weight percentage is 1-10%. The acid cleaning agent also includes an auxiliary agent, and its weight percentage is 1-5%, and the auxiliary agent includes one or more of nitric acid, citric acid, and hydrochloric acid. The role of hydrofluoric acid is to react chemically with microcrystalline glass. Because the reaction rate of the microcrystalline phase with hydrofluoric acid is much greater than that of the glass phase, the microcrystalline phase is mainly etched. The role of the auxiliary agent is mainly to dissolve the reactants and prevent the reactants from secondary precipitation on the glass surface to form white spots.

[0039] In the embodiment of the present invention, a dedicated alkaline cleaning tank and an acid cleaning tank are provided, the prepared alkaline cleaning agent is poured into the alkaline cleaning tank, the acid cleaning agent is poured into the acid cleaning tank, and the microcrystalline glass is soaked and cleaned in the above two tanks in turn.

[0040] In the embodiment of the present invention, in order to obtain good surface roughness, it is necessary to control the cleaning time of the microcrystalline glass in the alkaline cleaning agent and the acidic cleaning agent so that the second depth is equal to the first depth. In specific implementation, after the alkaline cleaning agent and the acidic cleaning agent are prepared, the etching speed of the microcrystalline glass in the two cleaning agents is tested, and the etching time is controlled according to the etching speed and the expected etching depth, so that the microcrystalline phase and the glass phase are etched with the same amount of the same depth to obtain a flat surface.

[0041] In the process of cleaning the microcrystalline glass, the order of step S1 and step S2 can be interchanged. There is no requirement for the removal amount during cleaning. Part of the glass phase can be etched off first, and then the microcrystalline phase of the same depth can be etched off, or part of the microcrystalline phase can be etched off first, and then the glass phase of the same depth can be etched off.

[0042] In the process of thinning microcrystalline glass, the order of step S1 and step S2 can also be interchanged. Part of the glass phase can be etched off first, and then the microcrystalline phase of equal depth can be etched off. Alternatively, part of the microcrystalline phase can be etched off first, and then the glass phase of equal depth can be etched off. However, thinning has precise requirements for the removal amount, and usually it is necessary to adjust the cleaning time several times to obtain the precise thinning depth. In addition, thinning usually also has requirements for processing time, because the reaction speed of hydrofluoric acid and microcrystalline phase is very fast. It is more efficient to first use an acidic cleaning agent to obtain a large removal amount and then use an alkaline cleaning agent to repair the surface roughness than to first use an alkaline cleaning agent and then use an acidic cleaning agent to clean.

[0043] Between step S1 and step S2, the following step is usually included: using pure water to clean the microcrystalline glass to wash away the cleaning agent remaining on the surface of the microcrystalline glass in the previous step. Taking alkaline cleaning first and then acid cleaning as an example, after the microcrystalline glass is taken out from the alkaline cleaning tank, alkaline cleaning agent remains on the surface of the microcrystalline glass. Passing the microcrystalline glass through pure water can remove the alkaline cleaning agent remaining on the surface of the microcrystalline glass, preventing the alkaline cleaning agent from neutralizing with the acidic cleaning agent in the acidic cleaning tank, which affects the pH value and service life of the acidic cleaning agent.

[0044] In the prior art, alkaline cleaning agents or acidic cleaning agents are usually used alone to treat the surface of microcrystalline glass. However, no matter what the material of the microcrystalline glass is, it contains two components: glass phase and microcrystalline phase. There are significant differences in the reaction rates of these two components with acids and alkalis, resulting in the surface roughness of the microcrystalline glass after cleaning being unsatisfactory regardless of whether an alkaline cleaning agent or an acidic cleaning agent is used. In an embodiment of the present invention, an original two-step cleaning method is used to etch the glass phase and microcrystalline phase in the microcrystalline glass respectively, and by precisely controlling the cleaning time, it is ensured that the glass phase and microcrystalline phase are etched in equal amounts, thereby obtaining a microcrystalline glass surface with low roughness. In addition, since the alkaline cleaning agent has a strong decontamination ability, this method can also significantly improve the cleanliness of the microcrystalline glass surface. This scheme has no requirements for the material of the microcrystalline glass and is highly applicable.

[0045] As described in Table 1 below, it is a comparison table of the effects of three different cleaning methods. The qualified standard for the dynamic friction coefficient of the microcrystalline glass surface of the microcrystalline glass terminal product is: dynamic friction coefficient ≤ 0.04. The dynamic friction coefficient is related to the roughness. The smaller the roughness value, the smaller the dynamic friction coefficient value. In serial number 1, an alkaline cleaning agent with a pH value of 12 is first used for cleaning, and then an acidic cleaning agent with a pH value of 3 is used for cleaning. The roughness of the obtained microcrystalline glass surface is 0.6nm and the dynamic friction coefficient is 0.03. In serial numbers 2 and 3, only an alkaline cleaning agent with a pH value of 12 or an acidic cleaning agent with a pH value of 3 is used for cleaning, respectively. The roughness of the obtained microcrystalline glass surface is 0.9nm, and the dynamic friction coefficient is 0.08, which does not meet the qualified standard of the microcrystalline glass terminal.

[0046] Table 1 Comparison of the effects of different cleaning methods

[0047]

[0048] In the embodiment of the present invention, there is no special requirement for the cleaning temperature in steps S1-S2, and the commonly used temperature in the industry, 55±15°C, can be used.

[0049] Step S3, using a neutral detergent to clean the microcrystalline glass. After the alkaline cleaning and acid cleaning in step S1 and step S2, the dirt on the surface of the microcrystalline glass has been removed, and a microcrystalline glass surface with high cleanliness and low roughness is obtained. In step S3, the purpose of using a neutral detergent to clean is to remove the alkaline detergent or acid detergent remaining on the surface of the microcrystalline glass.

[0050] Step S4, using pure water to clean the microcrystalline glass to wash away the neutral cleaning agent remaining on the surface of the microcrystalline glass.

[0051] Step S5, wind shearing and drying the glass-ceramics. After drying, other post-processing steps can be continued.

[0052] The present invention provides an innovative method for cleaning microcrystalline glass, which can significantly improve the cleaning effect and maintain the surface quality of microcrystalline glass by sequentially using strong acid and strong alkali to clean the microcrystalline glass. Specifically, this solution has the following features:

[0053] Beneficial effects:

[0054] 1. High cleanliness: This solution first uses a strong alkali to etch the glass phase in the microcrystalline glass, and then uses a strong acid to etch the microcrystalline phase in the microcrystalline glass, or first cleans with a strong acid and then with a strong alkali. Strong alkali cleaning agents have strong decontamination capabilities and can effectively remove organic pollutants and other stubborn stains, thereby significantly improving the cleanliness of the microcrystalline glass surface.

[0055] 2. Low roughness: By precisely controlling the reaction time, the etching depth of the glass phase and the microcrystalline phase is ensured to be consistent, avoiding uneven surface etching caused by a single cleaning agent. This method can effectively reduce the roughness of the microcrystalline glass surface, making it smoother and flatter.

[0056] 3. Comprehensive cleaning effect: This solution combines the advantages of strong acid and strong alkali, using both the efficient etching ability of strong alkali on the glass phase and the selective etching ability of strong acid on the microcrystalline phase. This two-step cleaning method not only improves the cleaning effect, but also ensures the quality of the microcrystalline glass surface.

[0057] 4. Controllability and consistency: By precisely controlling the reaction time, the consistency and repeatability of each cleaning process can be ensured. This makes this solution suitable for large-scale production and can stably provide high-quality microcrystalline glass products.

[0058] 5. Wide application scope: This solution is applicable to various types of microcrystalline glass, regardless of its material, and can effectively remove stubborn stains on the surface and maintain good surface quality. This makes this method have broad application prospects in the fields of mobile phone covers, smart wearable devices, car displays, smart homes, etc.

[0059] In summary, the present invention uses strong acid and strong alkali to clean the microcrystalline glass in sequence, which can not only obtain a microcrystalline glass surface with high cleanliness and low roughness, but also maintain the quality of the microcrystalline glass surface, which has significant technical advantages and application value.

[0060] The above are only specific implementations of the present invention, which cannot be used to limit the scope of the present invention. Equivalent changes made by ordinary technicians in this technical field based on this creation, as well as changes known to technicians in this field, should still fall within the scope of the present invention.

Claims

1. A method for cleaning and thinning microcrystalline glass, used for cleaning or thinning microcrystalline glass, characterized in that: The method comprises the following steps: Step S1, cleaning the glass-ceramics with an alkaline cleaning agent; Step S2, cleaning the glass-ceramics with an acidic cleaning agent; Step S3, cleaning the glass-ceramics with a neutral cleaning agent; Step S4, washing the glass-ceramics with pure water; Step S5, wind-cutting and drying the glass-ceramics; In the step S1, the etching depth of the surface of the microcrystalline glass by the alkaline cleaning agent is a first depth, and in the step S2, the etching depth of the surface of the microcrystalline glass by the acidic cleaning agent is a second depth, and the cleaning time of the microcrystalline glass in the alkaline cleaning agent and the acidic cleaning agent is controlled so that the second depth is equal to the first depth; The order of step S1 and step S2 can be interchanged.

2. The method for cleaning and thinning microcrystalline glass according to claim 1, characterized in that: The alkaline cleaning agent comprises a strong base and a complexing agent.

3. The method for cleaning and thinning microcrystalline glass according to claim 2, characterized in that: In terms of weight percentage, the content of the strong base is 10-50%, the content of the complexing agent is 1-40%, and the rest is water.

4. The method for cleaning and thinning microcrystalline glass according to claim 2, characterized in that: The strong base includes one or more of potassium hydroxide, sodium hydroxide, and rubidium hydroxide, and the complexing agent includes one or more of gluconate, sodium citrate, sodium alginate, sodium tartrate, and potassium tartrate.

5. The method for cleaning and thinning microcrystalline glass according to claim 1, characterized in that: The acid cleaning agent comprises hydrofluoric acid, the weight percentage of which is 1-10%.

6. The method for cleaning and thinning microcrystalline glass according to claim 5, characterized in that: The acid cleaning agent also includes auxiliary agents, the weight percentage of which is 1-5%, and the auxiliary agents include one or more of nitric acid, citric acid, and hydrochloric acid.

7. The method for cleaning and thinning microcrystalline glass according to claim 1, characterized in that: The step between step S1 and step S2 generally includes: using pure water to clean the microcrystalline glass to wash away the cleaning agent remaining on the surface of the microcrystalline glass in the previous step.