Chemical cleaning corrosion monitoring device and method

By setting up independent chemical cleaning bypass and corrosion monitoring modules in the chemical cleaning corrosion monitoring device, bypass flow adjustment and Reynolds number matching technology, the problem of the impact of the corrosion test piece installation method on the fluid flow field in the existing technology is solved, and more accurate chemical cleaning effect and corrosion degree monitoring are achieved.

CN119510284APending Publication Date: 2025-02-25XIAN THERMAL POWER RES INST CO LTD
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Patent Information

Application Number
CN202411654458.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-19
Publication Date
2025-02-25

AI Technical Summary

Technical Problem

The vertical installation method of the corrosion test piece of the existing chemical cleaning corrosion monitoring device has an impact on the fluid flow field. The iso-flow velocity working conditions cannot accurately simulate the real chemical cleaning flow field environment, resulting in large errors in the calculation of chemical cleaning effect and corrosion degree.

Method used

A chemical cleaning corrosion monitoring device was designed. By setting up an independent chemical cleaning bypass and corrosion monitoring module, bypass flow regulation and Reynolds number matching technology, the real chemical cleaning flow field environment is simulated, and the chemical cleaning effect and corrosion degree of the cleaning equipment are accurately monitored.

Benefits of technology

By accurately simulating the chemical cleaning flow field environment, the calculated chemical cleaning results are more accurate, which can accurately reflect the true effect of chemical cleaning, and improve the accuracy and practicality of monitoring.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a chemical cleaning corrosion monitoring device and method, and belongs to the technical field of generator set chemical cleaning, the device comprises a chemical cleaning box, a cleaning pump, a main path isolating valve, a main path regulating valve, a main path flowmeter, a bypass isolating valve, a corrosion monitoring module, a filter screen, a bypass flowmeter and a bypass regulating valve; an outlet of the chemical cleaning box is divided into two paths after passing through a cleaning pump, wherein one path is communicated with an inlet of the chemical cleaning box after passing through a main path isolating valve, a main path regulating valve, a main path flowmeter and cleaned equipment in sequence; and the other path is communicated with the inlet of the chemical cleaning box through a bypass isolating valve, a corrosion monitoring module, a filter screen, a bypass flowmeter and a bypass regulating valve in sequence. The device and the method can accurately monitor the chemical cleaning effect and the corrosion degree of the cleaned equipment.
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Description

Technical Field

[0001] This invention belongs to the field of chemical cleaning technology for generator sets, and relates to a chemical cleaning corrosion monitoring device and method. Background Technology

[0002] Chemical cleaning has been widely used in power plant feedwater and steam pipelines. Chemical cleaning aims to remove various impurities remaining during the manufacturing, transportation, and installation processes of power plant system pipelines, and to remove deposits and oxide layers that form on the inner walls of equipment or pipelines during operation, thereby improving equipment cleanliness and heat exchange efficiency.

[0003] In chemical cleaning processes, to evaluate the effectiveness of the cleaning and the degree of corrosion on pipelines, and to obtain the optimal benefits of chemical cleaning, it is necessary to utilize a chemical cleaning corrosion monitoring device to assess the effectiveness of chemical cleaning. Due to the special nature of power plant equipment, direct measurement and calculation are not feasible. Directly cutting and sampling the equipment would be labor-intensive and could potentially negatively impact the integrity of the equipment. Therefore, a chemical cleaning corrosion monitoring device is needed to evaluate the effectiveness of chemical cleaning. This device involves installing corrosion test pieces within the chemical cleaning system and indirectly calculating the effectiveness and degree of corrosion by comparing the mass change of the test pieces before and after chemical cleaning.

[0004] Currently, there are two main installation methods for corrosion test pieces in chemical cleaning corrosion monitoring devices: one is to install them inside the equipment being cleaned; the other is to set up an independent chemical cleaning corrosion monitoring device loop. The common features of these two installation methods are: 1. The corrosion test pieces are both along the radial direction of the pipeline, i.e., perpendicular to the fluid flow direction. 2. Both employ the constant velocity method, meaning that the flow velocity in the area where the corrosion test piece is located is controlled to be the same as the flow velocity in the equipment being cleaned.

[0005] In reality, the vertical installation of the corrosion test piece in the aforementioned chemical cleaning corrosion monitoring device has a significant impact on the fluid flow field. The constant flow velocity condition cannot effectively simulate the real chemical cleaning flow field environment, resulting in a large error in the calculated chemical cleaning effect and corrosion degree. Summary of the Invention

[0006] The purpose of this invention is to overcome the shortcomings of the prior art and provide a chemical cleaning corrosion monitoring device and method that can more accurately monitor the chemical cleaning effect and corrosion degree of the cleaned equipment.

[0007] To achieve the above objectives, the present invention discloses a chemical cleaning corrosion monitoring device, comprising a chemical cleaning tank, a cleaning pump, a main line isolation valve, a main line regulating valve, a main line flow meter, a bypass isolation valve, a corrosion monitoring module, a filter screen, a bypass flow meter, and a bypass regulating valve;

[0008] The outlet of the chemical cleaning tank is divided into two paths after passing through the cleaning pump. One path connects to the inlet of the chemical cleaning tank via the main isolation valve, the main regulating valve, the main flow meter, and the equipment being cleaned. The other path connects to the inlet of the chemical cleaning tank via the bypass isolation valve, the corrosion monitoring module, the filter screen, the bypass flow meter, and the bypass regulating valve.

[0009] A further improvement to the chemical cleaning corrosion monitoring device of the present invention is as follows:

[0010] Furthermore, the outlet of the bypass isolation valve is connected to the inlet of the corrosion monitoring module via an upstream pipeline of the corrosion monitoring module.

[0011] Furthermore, the outlet of the corrosion monitoring module is connected to the filter screen via a downstream pipeline of the corrosion monitoring module.

[0012] Furthermore, the corrosion monitoring module includes a housing and a plurality of corrosion test pieces disposed within the housing, wherein each corrosion test piece is installed within the housing via a corrosion test piece bracket and a corrosion test piece connecting rope.

[0013] Furthermore, the corrosion test piece support is radially mounted at the center of the housing and perpendicular to the direction of fluid flow.

[0014] Furthermore, the equivalent diameter d inside the shell is less than or equal to 20% of the equivalent diameter D inside the equipment being cleaned.

[0015] Furthermore, the corrosion test piece is made of the same material as the equipment being cleaned.

[0016] The thickness of the corrosion test piece is 1–3 mm, and the width of the corrosion test piece is equal to the equivalent diameter d inside the shell. The length of the corrosion test piece is equal to the length of the shell.

[0017] This invention discloses a chemical cleaning corrosion monitoring method, comprising the following steps:

[0018] 1) Detect the cleaning flow rate of the equipment being cleaned by the main flow meter, and adjust the cleaning flow rate of the equipment being cleaned to the preset cleaning flow rate Q0 by the main flow regulating valve;

[0019] 2) Determine the target value Q1 for the bypass flow rate;

[0020] 3) The bypass flow is detected by a bypass flow meter, and the bypass flow is adjusted by a bypass regulating valve so that the bypass flow measured by the bypass flow meter is equal to Q1;

[0021] 4) Calculate the corrosion rate and surface corrosion thickness of each corrosion test piece based on its original weight, the average weight reduction after chemical cleaning, and its surface area.

[0022] 5) Evaluate the chemical cleaning effect and corrosion degree of the equipment being cleaned based on the corrosion rate and corrosion thickness of each corrosion test piece.

[0023] A further improvement to the chemical cleaning corrosion monitoring method described in this invention is as follows:

[0024] Furthermore, step 2) is as follows:

[0025] Based on the fact that the Reynolds number Re0 of the fluid flow in the main pipeline being cleaned is equal to the Reynolds number Re1 of the fluid flow in the corrosion monitoring module, the target value Q1 of the bypass flow rate is determined.

[0026] The present invention has the following beneficial effects:

[0027] In specific operation, the chemical cleaning corrosion monitoring device and method described in this invention sets up an independent chemical cleaning bypass to accommodate the corrosion monitoring device. It also includes a filter, a bypass flow meter, and a bypass regulating valve. Since the Reynolds number of the fluid flow in the cleaned equipment is the same as the Reynolds number of the fluid flow in the corrosion monitoring module, the chemical cleaning effect and corrosion degree of the cleaned equipment can be obtained based on the corrosion rate and surface corrosion thickness of the corrosion test piece. This further accurately simulates the real chemical cleaning flow field environment, resulting in more precise chemical cleaning results that accurately reflect the true effect of chemical cleaning and are highly practical.

[0028] Furthermore, the corrosion monitoring module includes a housing and several corrosion test pieces disposed within the housing. Each corrosion test piece is installed within the housing via a corrosion test piece bracket and a corrosion test piece connecting rope, and is suspended in a way that allows for the overall corrosion of the corrosion test pieces. Attached Figure Description

[0029] The accompanying drawings, which form part of this specification, are used to provide a further understanding of the invention. The illustrative embodiments of the invention and their descriptions are used to explain the invention and do not constitute an undue limitation of the invention. In the drawings:

[0030] Figure 1 This is a structural diagram of the present invention;

[0031] Figure 2 This is a distribution diagram of the corrosion test pieces when there are three corrosion test pieces.

[0032] Figure 3 This is a side view showing the distribution of three corrosion test pieces.

[0033] Figure 4 This is a distribution diagram of five corrosion test pieces.

[0034] The components include: 1. Chemical cleaning tank; 2. Cleaning pump; 3. Main line isolation valve; 4. Main line regulating valve; 5. Main line flow meter; 6. Equipment to be cleaned; 7. Bypass isolation valve; 8. Corrosion monitoring module; 81. Corrosion test piece support; 82. Corrosion test piece; 83. Corrosion test piece connecting rope; 84. Upstream pipeline of corrosion monitoring module; 85. Downstream pipeline of corrosion monitoring module; 9. Filter screen; 10. Bypass flow meter; 11. Bypass regulating valve. Detailed Implementation

[0035] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0036] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0037] The accompanying drawings illustrate various structural schematic diagrams according to embodiments disclosed in this invention. These drawings are not to scale, and some details have been enlarged for clarity, and some details may have been omitted. The shapes of the various regions and layers shown in the drawings, as well as their relative sizes and positional relationships, are merely exemplary and may deviate from reality due to manufacturing tolerances or technical limitations. Furthermore, those skilled in the art can design regions / layers with different shapes, sizes, and relative positions as needed.

[0038] Example 1

[0039] refer to Figure 1The chemical cleaning corrosion monitoring device of the present invention includes a chemical cleaning tank 1, a cleaning pump 2, a main line isolation valve 3, a main line regulating valve 4, a main line flow meter 5, a device to be cleaned 6, a bypass isolation valve 7, a corrosion monitoring module 8, a corrosion test piece support 81, a corrosion test piece 82, a corrosion test piece connecting rope 83, an upstream pipeline of the corrosion monitoring module 84, a downstream pipeline of the corrosion monitoring module 85, a filter screen 9, a bypass flow meter 10, and a bypass regulating valve 11;

[0040] The outlet of the chemical cleaning tank 1 is divided into two paths after passing through the cleaning pump 2. One path is connected to the inlet of the chemical cleaning tank 1 via the main isolation valve 3, the main regulating valve 4, the main flow meter 5, and the equipment being cleaned 6 in sequence. The other path is connected to the inlet of the chemical cleaning tank 1 via the bypass isolation valve 7, the corrosion monitoring module 8, the filter screen 9, the bypass flow meter 10, and the bypass regulating valve 11 in sequence.

[0041] In this embodiment, the outlet of the bypass isolation valve 7 and the inlet of the corrosion monitoring module 8 are connected through the upstream pipeline 84 of the corrosion monitoring module.

[0042] In this embodiment, the outlet of the corrosion monitoring module 8 is connected to the filter screen 9 via a downstream pipe 85 of the corrosion monitoring module.

[0043] In this embodiment, reference Figure 2 The corrosion monitoring module 8 includes a housing and a plurality of corrosion test pieces 82 disposed within the housing. Each corrosion test piece 82 is installed within the housing via a corrosion test piece bracket 81 and a corrosion test piece connecting rope 83.

[0044] In this embodiment, the corrosion test piece support 81 is radially mounted at the center of the housing and perpendicular to the direction of fluid flow.

[0045] In this embodiment, the equivalent diameter d inside the housing is less than or equal to 20% of the equivalent diameter D inside the device 6 being cleaned.

[0046] In this embodiment, the length of the upstream pipe 84 of the corrosion monitoring module exceeds 30 times the equivalent internal diameter of the upstream pipe 84. The length of the downstream pipe 85 of the corrosion monitoring module exceeds 30 times the equivalent internal diameter of the downstream pipe 85.

[0047] In this embodiment, the corrosion test piece 82 is made of the same material as the equipment 6 being cleaned.

[0048] In this embodiment, the thickness of the corrosion test piece 82 is 1–3 mm, and the width of the corrosion test piece 82 is equal to the equivalent diameter d inside the shell. The length of corrosion test piece 82 is equal to the length of the shell.

[0049] In this embodiment, the number of corrosion test pieces 82 is greater than or equal to 3. Preferably, the number of corrosion test pieces 82 is 3 or 5, and they are arranged symmetrically. The corrosion test pieces 82 are installed parallel to the inner wall of the pipe along the fluid flow direction. Figure 3 and Figure 4 .

[0050] In this embodiment, the connecting rope 83 for the corrosion test piece is a non-conductive, corrosion-resistant non-metallic material, generally nylon thread, high-strength polyethylene fiber, or polyester fiber.

[0051] In this embodiment, the pore size of the filter screen 9 is smaller than the width of the corrosion test piece 82.

[0052] In this embodiment, a controller is also included. The controller is connected to the cleaning pump 2, the main isolation valve 3, the main regulating valve 4, the main flow meter 5, the bypass isolation valve 7, the bypass flow meter 10, and the bypass regulating valve 11. The controller controls the cleaning pump 2, the main isolation valve 3, the main regulating valve 4, the main flow meter 5, the bypass isolation valve 7, the bypass flow meter 10, and the bypass regulating valve 11.

[0053] Example 2

[0054] Accordingly, refer to Figure 1 This embodiment discloses a chemical cleaning corrosion monitoring method. The chemical cleaning corrosion monitoring is implemented based on a chemical cleaning corrosion monitoring system. Specifically, the chemical cleaning corrosion monitoring method includes the following steps:

[0055] 1) The cleaning flow rate of the equipment 6 being cleaned is detected by the main flow meter 5, and the cleaning flow rate of the equipment 6 being cleaned is adjusted to the preset cleaning flow rate Q0 by the main regulating valve 4.

[0056] 2) Determine the target value of bypass flow rate Q1. Specifically, based on the fact that the Reynolds number Re0 of the fluid flow in the main pipeline cleaning equipment 6 is equal to the Reynolds number Re1 of the fluid flow in the corrosion monitoring module 8, determine the target value of bypass flow rate Q1.

[0057] 3) The bypass flow is detected by the bypass flow meter 10, and the bypass flow is adjusted by the bypass regulating valve 11 so that the bypass flow measured by the bypass flow meter 10 is equal to Q1;

[0058] 4) Based on the original weight of each corrosion test piece 82, the average weight reduction of each corrosion test piece 82 after chemical cleaning, and the surface area of ​​each corrosion test piece 82, calculate the corrosion rate and corrosion thickness of each corrosion test piece 82.

[0059] 5) Evaluate the chemical cleaning effect and corrosion degree of the equipment 6 to be cleaned based on the corrosion rate and corrosion thickness of each corrosion test piece 82. Specifically, the higher the corrosion rate and the thicker the corrosion thickness, the better the chemical cleaning effect and the deeper the corrosion degree.

[0060] Example 3

[0061] A computer device includes a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, it implements the steps of the chemical cleaning corrosion monitoring method, for example, including: 1) detecting the cleaning flow rate of the equipment being cleaned 6 using a main flow meter 5, and adjusting the cleaning flow rate of the equipment being cleaned 6 to a preset cleaning flow rate Q0 using a main regulating valve 4; 2) determining a bypass flow rate target value Q1, specifically, determining the bypass flow rate target value Q1 based on the fact that the Reynolds number Re0 of the fluid flow in the main cleaning equipment 6 is equal to the Reynolds number Re1 of the fluid flow in the corrosion monitoring module 8; 3) The bypass flow rate is detected by the bypass flow meter 10, and the bypass flow rate is adjusted by the bypass regulating valve 11 so that the bypass flow rate measured by the bypass flow meter 10 is equal to Q1; 4) The corrosion rate and corrosion thickness of each corrosion test piece 82 are calculated based on the original weight of each corrosion test piece 82, the average weight reduction of each corrosion test piece 82 after chemical cleaning, and the surface area of ​​each corrosion test piece 82; 5) The chemical cleaning effect and corrosion degree of the cleaned equipment 6 are evaluated based on the corrosion rate and corrosion thickness of each corrosion test piece 82. Specifically, the higher the corrosion rate and the thicker the corrosion thickness, the better the chemical cleaning effect and the deeper the corrosion degree. The memory may include RAM, such as high-speed random access memory, and may also include non-volatile memory, such as at least one disk storage device; the processor, network interface, and memory are interconnected via an internal bus, which can be an industry standard architecture bus, a peripheral component interconnection standard bus, an extended industry standard architecture bus, etc. The bus can be divided into address bus, data bus, control bus, etc. The memory is used to store programs; specifically, the program may include program code, which includes computer operation instructions. The memory may include main memory and non-volatile memory, and provides instructions and data to the processor.

[0062] Example 4

[0063] A computer-readable storage medium storing a computer program, which, when executed by a processor, implements the steps of the chemical cleaning corrosion monitoring method, for example including: 1) detecting the cleaning flow rate of the equipment being cleaned 6 using a main flow meter 5, and adjusting the cleaning flow rate of the equipment being cleaned 6 to a preset cleaning flow rate Q0 using a main regulating valve 4; 2) determining a bypass flow rate target value Q1, specifically, determining the bypass flow rate target value Q1 based on the fact that the Reynolds number Re0 of the fluid flow in the main cleaning equipment 6 is equal to the Reynolds number Re1 of the fluid flow in the corrosion monitoring module 8; 3) adjusting the bypass flow rate... The bypass flow meter 10 detects the bypass flow rate and adjusts the bypass flow rate through the bypass regulating valve 11 so that the bypass flow rate measured by the bypass flow meter 10 is equal to Q1; 4) Calculate the corrosion rate and surface corrosion thickness of each corrosion test piece 82 based on the original weight of each corrosion test piece 82, the average weight reduction of each corrosion test piece 82 after chemical cleaning, and the surface area of ​​each corrosion test piece 82; 5) Evaluate the chemical cleaning effect and corrosion degree of the cleaned equipment 6 based on the corrosion rate and surface corrosion thickness of each corrosion test piece 82. Specifically, a higher corrosion rate and a thicker corrosion thickness indicate a better chemical cleaning effect and a deeper corrosion degree. Specifically, the computer-readable storage medium includes, but is not limited to, volatile memory and / or non-volatile memory. The volatile memory may include random access memory and / or cache memory, etc. The non-volatile memory may include read-only memory, hard disk, flash memory, optical disk, magnetic disk, etc.

[0064] Those skilled in the art will understand that embodiments of the present invention can be provided as methods, systems, or computer program products. Therefore, the present invention can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention can take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, optical storage, etc.) containing computer-usable program code.

[0065] This invention is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of the invention. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart illustrations and / or block diagrams. Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0066] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0067] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.

[0068] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that modifications or equivalent substitutions can still be made to the specific implementation of the present invention. Any modifications or equivalent substitutions that do not depart from the spirit and scope of the present invention should be covered within the scope of the present invention.

Claims

1. A chemical cleaning corrosion monitoring device, characterized in that: It comprises a chemical cleaning box (1), a cleaning pump (2), a main line isolation valve (3), a main line regulating valve (4), a main line flow meter (5), a bypass isolation valve (7), a corrosion monitoring module (8), a filter (9), a bypass flow meter (10) and a bypass regulating valve (11); The outlet of the chemical cleaning box (1) is divided into two paths after passing through a cleaning pump (2), one of which is connected to the inlet of the chemical cleaning box (1) via a main path isolation valve (3), a main path regulating valve (4), a main path flow meter (5) and a cleaned device (6) in sequence; the other path is connected to the inlet of the chemical cleaning box (1) via a bypass isolation valve (7), a corrosion monitoring module (8), a filter (9), a bypass flow meter (10) and a bypass regulating valve (11) in sequence.

2. The chemical cleaning corrosion monitoring device according to claim 1, characterized in that: The outlet of the bypass isolation valve (7) is connected to the inlet of the corrosion monitoring module (8) via a corrosion monitoring module upstream pipeline (84).

3. The chemical cleaning corrosion monitoring device according to claim 1, characterized in that: The outlet of the corrosion monitoring module (8) is connected to the filter screen (9) via a corrosion monitoring module downstream pipeline (85).

4. The chemical cleaning corrosion monitoring device according to claim 1, characterized in that: The corrosion monitoring module (8) comprises a shell and a plurality of corrosion test pieces (82) arranged in the shell, wherein each corrosion test piece (82) is installed in the shell via a corrosion test piece bracket (81) and a corrosion test piece connecting rope (83).

5. The chemical cleaning corrosion monitoring device according to claim 4, characterized in that: The corrosion test piece bracket (81) is radially installed at the center of the shell and perpendicular to the direction of fluid flow.

6. The chemical cleaning corrosion monitoring device according to claim 4, characterized in that: The equivalent diameter d inside the shell is less than or equal to 20% of the equivalent diameter D inside the cleaned equipment (6).

7. The chemical cleaning corrosion monitoring device according to claim 4, characterized in that: The corrosion test piece (82) is made of the same material as the equipment to be cleaned (6).

8. The chemical cleaning corrosion monitoring device according to claim 4, characterized in that: The thickness of the corrosion test piece (82) is 1 mm to 3 mm, and the width of the corrosion test piece (82) is equal to the equivalent diameter d inside the shell. The length of the corrosion test piece (82) is the length of the shell.

9. A chemical cleaning corrosion monitoring method, characterized in that: The chemical cleaning corrosion monitoring device according to claim 4 comprises the following steps: 1) detecting the cleaning flow rate of the cleaned equipment (6) by means of a main flow meter (5), and adjusting the cleaning flow rate of the cleaned equipment (6) to a preset cleaning flow rate Q0 by means of a main regulating valve (4); 2) Determine the bypass flow target value Q1; 3) detecting the bypass flow rate by means of a bypass flow meter (10), and regulating the bypass flow rate by means of a bypass regulating valve (11) so that the bypass flow rate measured by the bypass flow meter (10) is equal to Q1; 4) calculating the corrosion rate of each corrosion test piece (82) and the corrosion thickness of its surface according to the original weight of each corrosion test piece (82), the average weight reduction of each corrosion test piece (82) after chemical cleaning, and the surface area of ​​each corrosion test piece (82); 5) Evaluate the chemical cleaning effect and corrosion degree of the cleaned equipment (6) based on the corrosion rate and surface corrosion thickness of each corrosion test piece (82).

10. The chemical cleaning corrosion monitoring method according to claim 9, characterized in that: The process of step 2) is: The bypass flow target value Q1 is determined based on the Reynolds number Re0 of the fluid flowing in the main cleaning device (6) being equal to the Reynolds number Re1 of the fluid flowing in the corrosion monitoring module (8).