High-stability reaction device for silanide production
By designing a high-stability reaction device for silane production, and using a linkage screw to control the movement of the opening and closing plates and transfer plates, the problem of unstable reaction environment in the existing silane production process is solved, and a safer and more stable production process is achieved.
Patent Information
- Application Number
- CN202510080466.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-20
- Publication Date
- 2025-02-28
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
During the existing silane production process, substances that are prone to violent reactions such as magnesium powder and silicon powder lead to unstable reaction environment and risk of explosion.
A high-stability reaction device for silane production is designed. The movement of the opening and closing plate and the transfer plate is controlled by linking screws to ensure the stable removal of magnesium silicide, reduce the residue of magnesium powder and silicon powder, and reduce the risk of violent reactions.
It effectively reduces the residue of magnesium powder and silicon powder in the reaction device, reduces the risk of violent reactions under high temperatures, and improves the safety and stability of the device operation.
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Figure CN119524739A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of monosilane production, in particular to a reaction device for producing silanes with high stability. Background Art
[0002] Monosilane, also known as tetrahydrosilane, is a colorless, flammable, toxic gas with a strong foul odor. It ignites easily in air, reacts with oxidants, is highly toxic if inhaled, and is a strong irritant to the skin, eyes, and mucous membranes. In the event of prolonged exposure to fire or heat, the container may violently rupture and explode. It is used in the production of amorphous silicon; Monosilane can be used in the semiconductor industry to prepare precursor materials, functionalized silicon materials, solar cells, nano-silicon materials, flexible electronic devices and thin-film transistors. Monosilane has broad application prospects in the semiconductor industry. At the same time, its application prospects are constantly being developed with the development of the semiconductor industry, thereby generating broader economic value.
[0003] In the existing production process of monosilane, magnesium powder and silicon powder need to be mixed, heated in an argon environment to produce magnesium silicide, and then the magnesium silicide is placed in liquid ammonia. Ammonium chloride is added with liquid ammonia as a medium to produce monosilane and other products. In the process of monosilane production, silicon powder and magnesium powder are substances that are prone to violent reactions, so a relatively stable process is required for the reaction environment of producing monosilane. Summary of the invention
[0004] The object of the present invention is to provide a highly stable reaction device for producing silane compounds, so as to solve the problems related to the stable reaction of chemical reaction products in the existing scenarios.
[0005] To solve the above problems, the present invention provides the following technical solutions: A high-stability reaction device for producing silane compounds comprises: a structural shell, a first reaction shell is hinged inside the structural shell, a transfer plate is movably connected to the bottom of the first reaction shell, a heating block is arranged at the bottom of the transfer plate, an opening and closing plate is arranged on the side of the first reaction shell, the opening and closing plate is movably connected to the first reaction shell, a plurality of first arc slide rails, a second arc slide rail and a plurality of third arc slide rails are arranged on the inner side surface of the structural shell, a first slider is slidably connected to the first arc slide rail, the first slider is connected to the second arc slide rail, the third arc slide rail is arranged above the second arc slide rail, and the The third circular arc slide rail is arranged perpendicularly to the second circular arc slide rail, a translation telescopic rod is arranged at the second circular arc slide rail, both ends of the translation telescopic rod are connected with second sliders, two second sliders are slidably connected in the second circular arc slide rail, the translation telescopic rod is connected with the transmission plate, the translation telescopic rod controls the distance between the transmission plate and the first reaction shell by telescoping, two third circular arc slide rails are arranged above the second circular arc slide rail, the two third circular arc slide rails are symmetrically arranged, a third slider is slidably connected in each of the third circular arc slide rails, one end of a connecting rope is connected to the third slider, and the other end of the connecting rope is hinged to the opening and closing plate; The second slider and the third slider are respectively provided with a second screw slider and a third screw slider, and the second screw slider and the third screw slider are both sleeved with a linkage screw, and the linkage screw is arranged in an inclined manner, and a vertical rod is vertically arranged on the side of the linkage screw, and the second screw slider and the third screw slider are controlled to move synchronously by moving along the axis of the vertical rod toward the top of the structural shell, so that the second slider controls the transfer plate to move in a direction away from the first reaction shell, and the third slider controls the opening and closing plate to swing toward the outside of the first reaction shell; A fourth circular arc slide rail is arranged above the second circular arc slide rail, and the fourth circular arc slide rail is arranged parallel to the second circular arc slide rail. A fourth slider is slidably connected in the fourth circular arc slide rail, and a scraping plate is connected to the fourth slider. The scraping plate is located above the transfer plate as a whole. When the transfer plate moves out of the bottom of the first reaction shell, the top surface of the transfer plate contacts the bottom surface of the scraping plate.
[0006] Optionally, it is characterized in that an absorption rod is arranged in the first reaction shell, the top of the absorption rod is connected to the outside, a plurality of absorption through holes are arranged on the side of the absorption rod, a partition rod is arranged inside the absorption rod, and a partition block matching the number of the absorption through holes is arranged on the outside of the partition rod, and the partition block can cover and separate the absorption through holes by rotation, thereby controlling the connection between the absorption through holes and the inner and outer sides of the absorption rod.
[0007] Optionally, a plurality of discharge pipes are provided on the outer side of the partition rod, and two ends of the discharge pipes are connected to the inside of the first reaction shell and the outside respectively.
[0008] Optionally, the bottom of the absorption rod is movably connected to a uniform distribution disk, which is composed of a plurality of arc disks and guide disks rotating around the axis of the absorption rod. A guide disk is provided at the bottom of the arc disk. The absorption rod drives the guide disk to rotate accordingly by rotating, and the absorption rod adjusts the distance between the bottom of the guide disk and the top of the transfer plate by moving up and down along the axis.
[0009] Optionally, a plurality of evenly distributed grooves are provided at the bottom of the guide plate, and the guide plate can guide and mix the magnesium powder and silicon powder on the top surface of the transfer plate by controlling the evenly distributed grooves during rotation.
[0010] Optionally, the scraper plate is arranged in an arc shape on a side closest to the first reaction shell, and a plurality of scraper blocks are arranged on the arc-shaped side of the scraper plate, each of the scraper blocks is hinged to the scraper plate, and the scraper blocks can scrape the magnesium silicide on the surface of the transfer plate by cyclically swinging relative to the scraper plate, and can guide the magnesium silicide to fall into the receiving block while the transfer plate is constantly moving.
[0011] Optionally, a second reaction shell is provided at the bottom of the scraper plate, a material collecting block is provided at the top of the second reaction shell, air supply pipes and air suction pipes are provided on both sides of the material collecting block and are connected to the top of the second reaction shell, and a material pipe is provided at the bottom of the second reaction shell and is connected to the outside.
[0012] Optionally, a symmetrically arranged closing plate is provided on the inner side of the receiving block, and the closing plate is swung relative to the inner side of the receiving block, so as to control the closing plate to block the connection between the receiving block and the second reaction shell.
[0013] Optionally, a dust removal block is provided above the arc-shaped side surface of the scraping plate, and the dust removal block absorbs magnesium silicide dust floating in the air when the scraping plate scrapes off the magnesium silicide on the surface of the transfer plate.
[0014] Beneficial effects: 1. The present invention can jointly control the opening and closing of the opening and closing plate and the removal of the transfer plate by directly moving the linkage screw rod, so as to control the magnesium silicide on the top of the transfer plate to be smoothly moved out of the first reaction shell, thereby effectively reducing the residual magnesium powder and silicon powder in the first reaction shell, and reducing the risk of subsequent violent reactions of magnesium powder and silicon powder inside and outside the first reaction shell under high temperature conditions, and can effectively improve the safety of the operation of the device.
[0015] 2. The position adjustment of the arc disk and the guide disk of the present invention can realize the connection and closure of the top and bottom of the uniform distribution disk, and can prevent magnesium powder and silicon powder from overflowing above the uniform distribution disk, thereby causing the reaction products to remain above the uniform distribution disk.
[0016] 3. The scraping block and dust removal block of the present invention can effectively reduce the floating dust of magnesium silicide generated when the magnesium silicide is separated from the transfer plate when scraping the magnesium silicide on the surface of the transfer plate, and can effectively reduce the escape of magnesium silicide and reduce the risks generated by the operation of the device. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 It is a schematic diagram of the three-dimensional isometric view of the present invention as a whole; Figure 2 It is a connection schematic diagram of the internal structure of the present invention; Figure 3 It is a connection schematic diagram of the linkage screw rod of the present invention; Figure 4 This is a schematic diagram of the connection of the first reaction shell of the present invention; Figure 5 It is a schematic diagram of the connection of the scraper plate of the present invention; Figure 6 It is a connection schematic diagram of the second reaction shell of the present invention.
[0018] In the figure: 1, structural housing; 11, first reaction housing; 111, transfer plate; 112, heating block; 113, opening and closing plate; 12, second reaction housing; 13, first arc slide rail; 131, first slider; 14, second arc slide rail; 141, second slider; 142, translation telescopic rod; 143, second screw slider; 15, third arc slide rail; 151, third slider; 152, connecting rope; 153, third screw slider ; 16. Fourth circular arc slide rail; 161. Fourth slider; 17. Linked screw rod; 18. Vertical rod; 2. Absorption rod; 21. Absorption through hole; 22. Partition rod; 23. Partition block; 24. Discharge pipe; 25. Uniform distribution disk; 251. Arc disk; 252. Guide disk; 26. Uniform distribution grooves; 3. Scraping plate; 31. Scraping block; 4. Material collecting block; 41. Closing plate; 5. Air supply pipe; 6. Air suction pipe; 7. Material pipe; 8. Dust removal block. DETAILED DESCRIPTION
[0019] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention. All other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0020] A reaction device for producing highly stable silane compounds, comprising: Figure 1 , Figure 2 and Figure 3As shown, a structural shell 1 is hinged with a first reaction shell 11 in the structural shell 1, a transfer plate 111 is movably connected to the bottom of the first reaction shell 11, a heating block 112 is arranged at the bottom of the transfer plate 111, and an opening and closing plate 113 is arranged on the side of the first reaction shell 11, and the opening and closing plate 113 is movably connected to the first reaction shell 11.
[0021] A first arc rail 13, a second arc rail 14, a third arc rail 15 and a fourth arc rail 16 are arranged on the inner side of the structural housing 1. The axis of the first arc rail 13 coincides with the structural housing 1. A first slider 131 is arranged in each first arc rail 13. Each first slider 131 is connected to the second arc rail 14. The second arc rail 14 can slide on the first arc rail 13 to achieve the up and down displacement of the second arc rail 14. In the channel, a translation telescopic rod 142 is provided, and the two ends of the translation telescopic rod 142 are connected to the second sliders 141. The translation telescopic block can be extended and retracted according to the corresponding position of the second slider 141. The translation telescopic block is connected to the transfer plate 111. When the translation telescopic rod 142 changes with the position of the two second sliders 141, the movement of the translation telescopic rod 142 drives the transfer plate 111 to move relative to the first reaction shell 11, thereby driving the magnesium silicide on the top of the transfer plate 111 to move out of the first reaction shell 11; Two third circular arc slide rails 15 are arranged above the second circular arc slide rail 14. The third circular arc slider is arranged perpendicular to the second circular arc slide rail 14. A third slider 151 is arranged in each third circular arc slide rail 15. One end of a connecting rope 152 is connected to the two third sliders 151. The other end of the connecting rope 152 is hinged to the opening and closing plate 113, so that the third slider 151 can control the opening and closing plate 113 to swing relative to the first reaction shell 11 through the movement in the up and down directions. The opening and closing plate 113 can swing relative to the first reaction shell 11. After the opening and closing plate 113 swings, a gap appears at the first reaction shell 11 due to the swinging of the opening and closing plate 113. Therefore, when the transfer plate 111 is moved out of the first reaction shell 11, the magnesium silicide on the top surface of the transfer plate 111 will not contact the first reaction shell 11, thereby realizing the stable removal of the magnesium silicide on the top surface of the transfer plate 111; A second screw slider 143 and a third screw slider 153 are respectively provided at the second slider 141 and the third slider 151. A linkage screw 17 is sleeved in the second screw slider 143 and the third screw slider 153. The linkage screw 17 is inclined. A vertical rod 18 is vertically provided on the outer side of the linkage screw 17. By controlling the vertical rod 18 to move along the axis of the vertical rod 18, when the vertical rod 18 moves along the axis of the vertical rod 18 toward the bottom of the structural shell 1, the connecting rope 152 connected to the second slider 141 can be controlled to move downward as a whole, so that the opening and closing plate 113 loses the tension of the connecting rope 152, and the third slider 151 can be controlled to connect the translation telescopic rod 142 to drive the transfer plate 111 to move toward the bottom of the first reaction shell 11; On the contrary, when the vertical rod 18 moves along the axis of the vertical rod 18 toward the top of the structural shell 1, the connecting rope 152 connected to the second slider 141 can be controlled to move upward as a whole, so that the opening and closing plate 113 is driven to swing upward by the tension provided by the connecting rope 152, and the third slider 151 connected to the translation telescopic rod 142 can be controlled to drive the transfer plate 111 to move in a direction away from the bottom of the first reaction shell 11.
[0022] like Figure 4 As shown, an absorption rod 2 is arranged in the first reaction shell 11, a symmetrical absorption through hole 21 is arranged on the side of the absorption rod 2, a partition rod 22 is arranged inside the absorption rod 2, and a symmetrical partition block 23 is arranged on the side of the partition rod 22. The partition block 23 covers and separates the absorption through hole 21 as the partition rod 2 rotates. A plurality of discharge pipes 24 are arranged on the side of the partition rod 2. A uniform distribution disk 25 is arranged at the bottom of the absorption rod 2. The uniform distribution disk 25 includes an arc disk 251 and a guide disk 252. The two arc disks 251 are symmetrically arranged at the bottom of the absorption rod 2 with the absorption rod 2 as the center, and the two guide disks 252 are symmetrically arranged at the bottom of the two arc disks 251 with the absorption rod 2 as the center. The arc disk 251 and the guide disk 252 are both arc-shaped in shape. The absorption rod 2 can drive the uniform distribution disk 25 to move up and down, and can drive the guide disk 252 to rotate when the absorption rod 2 rotates. When the guide disk 252 rotates, it can control The positional relationship between the guide disk 252 and the arc disk 251, the change of the positional relationship between the guide disk 252 and the arc disk 251 can realize the connection between the top and the bottom of the uniformly distributed disk 25. The guide disk 252 and the arc disk 251 in the first reaction shell 11 are both provided with a connecting port that is not covered by the arc disk 251 and the guide disk 252 in the same plane. The rotation of the guide disk 252 can make the connecting port of the arc disk 251 and the guide disk 252 in the same plane be compensated by the arc disk 251 and the guide disk 252, thereby realizing the isolation of the top and the bottom of the uniformly distributed disk 25 with the uniformly distributed disk 25 as the boundary. When gas absorption and supply are being performed, the partition block 23 is moved out of the absorption through hole 21, and when gas absorption and supply are not being performed, the partition block 23 covers the absorption through hole 21. The relative position change of the absorption through hole 21 and the partition block 23 inside the absorption rod 2 can absorb and supply the airflow in the top area of the uniform distribution plate 25, so that the isolation of the area inside the first reaction shell 11 by the uniform distribution plate 25 can reduce the absorption of magnesium powder and silicon powder at the bottom of the uniform distribution plate 25 while absorbing the floating silicon powder dust and magnesium powder dust in the top area of the uniform distribution plate 25 when the absorption through hole 21 absorbs the airflow, thereby reducing the waste of raw materials. When the first reaction shell 11 needs to be supplied with gas, the connection of the uniform distribution plate 25 to the area inside the first reaction shell 11 can facilitate the gas to flow into the bottom of the uniform distribution plate 25, so that the magnesium powder and silicon powder can react under heating; The discharge pipe 24 connected inside the absorption rod 2 can input raw materials from the outside into the top of the transfer plate 111 at the bottom of the first reaction shell 11. At the same time, the rotation of the absorption rod 2 can achieve a certain degree of uniform arrangement of magnesium powder and silicon powder. A uniformly distributed groove 26 is provided at the bottom of the guide plate 252. When the guide plate 252 is close to the top of the transfer plate 111, the magnesium powder and silicon powder on the top of the transfer plate 111 can enter the uniformly distributed groove 26 while the guide plate 252 rotates. When the guide plate 252 rotates, different raw materials can change their relative positions in the uniformly distributed groove 26, thereby further achieving the mixing of the magnesium powder and silicon powder on the top of the transfer plate 111, so that the magnesium powder and silicon powder can react more evenly during the reaction, thereby obtaining the target product to the greatest extent.
[0023] like Figure 5 As shown, a fourth arc slide rail 16 is arranged above the second arc slide rail 14, and the fourth arc slide rail 16 is arranged parallel to the second arc slide rail 14. A fourth slider 161 is arranged in the fourth arc slide rail 16, and a scraper plate 3 is connected to the fourth slider 161. The side of the scraper plate 3 closest to the first reaction shell 11 is arranged in an arc shape, and a scraper block 31 is arranged on the arc-shaped side of the scraper plate 3 and is hinged to the arc-shaped side of the scraper plate 3. The scraper block 31 can swing relative to the scraper plate 3, so that when the bottom surface of the scraper plate 3 contacts the magnesium silicide on the top surface of the transfer plate 111, the swing of the scraper block 31 can more effectively scrape the magnesium silicide on the top surface of the transfer plate 111, so as to better realize the cleaning of the top surface of the transfer plate 111, and at the same time ensure that as much magnesium silicide as possible is obtained and the loss of magnesium silicide is reduced; A dust removal block 8 is provided on the top surface of the scraping plate 3, and the dust removal block 8 corresponds to one side of the scraping block 31 of the scraping plate 3. When the scraping plate 3 and the scraping block 31 jointly scrape the magnesium silicide on the top surface of the transfer plate 111, the dust removal block 8 starts to work and absorbs the magnesium silicide dust floating in the air that may be generated during the scraping process, thereby avoiding the escape of magnesium silicide, thereby effectively reducing the potential risks caused by the floating precipitation of magnesium silicide, and effectively improving the safety and stability of the operation of the device.
[0024] like Figure 6 As shown, a material collecting block 4 is arranged below the scraper plate 3, the bottom of the material collecting block 4 is connected to the top surface of the second reaction shell 12, air supply pipes 5 and air suction pipes 6 are arranged on both sides of the material collecting block 4, a material pipe 7 is arranged at the bottom of the second reaction shell 12, and a closing plate 41 is symmetrically arranged on the inner side of the material collecting block 4. The closing plate 41 can swing relative to the inner side of the material collecting block 4. The swinging of the closing plate 41 can stop the communication between the material collecting block 4 and the second reaction shell 12. When the closing plate 41 swings, the magnesium silicide attached to the surface of the closing plate 41 can be affected by vibration and gravity changes so that it can smoothly enter the second reaction shell 12, thereby reducing the loss caused during the transmission of magnesium silicide and reducing production costs.
[0025] In this embodiment, the working scenario of a high-stability silane production reaction device is as follows: Solid dry ammonium chloride necessary for the reaction is added into the second reaction shell 12 through the material pipe 7 in advance.
[0026] A plurality of discharge pipes 24 respectively transfer the external magnesium powder and silicon powder to the top of the transfer plate 111. During the transfer process, the absorption rod 2 rotates. After the magnesium powder and silicon powder are transferred, when the top and bottom of the uniform distribution plate 25 are connected, the absorption rod 2 controls the uniform distribution plate 25 to move downward until it stops moving at the mixed raw materials close to the top surface of the transfer plate 111. Then, the top and bottom of the uniform distribution plate 25 are controlled to be isolated, and the partition block 23 moves out of the absorption through hole 21. The absorption rod 2 absorbs gas from the area on the top of the uniform distribution plate 25 through the absorption through hole 21. After the raw material dust floating on the top of the uniform distribution disk 25 is absorbed, the bottom surface of the guide disk 252 is controlled to contact the raw material on the top surface of the transfer plate 111, and then the guide disk 252 is rotated, so that the raw materials are mixed and evenly distributed in the uniform distribution groove 26. After the mixing is completed, the position of the uniform distribution disk 25 is lifted, and the top and bottom of the uniform distribution disk 25 are controlled to be connected. Then, argon gas is supplied to the first reaction shell 11 through the absorption through hole 21, and at the same time, the heating block 112 located at the bottom of the transfer plate 111 begins to heat up, and then the corresponding chemical reaction is carried out in the first reaction shell 11.
[0027] After the reaction in the first reaction shell 11 is completed, the partition block 23 covers the absorption through hole 21, controls the vertical rod 18 to move along the axis of the vertical rod 18 toward the top of the structural shell 1, and at the same time, the vertical rod 18 drives the linkage screw rod 17 to move accordingly. When the linkage screw rod 17 moves accordingly, it will drive the second slider 141 away from the first reaction shell 11 and drive the third slider 151 to move upward, so that the connecting rope 152 can drive the opening and closing plate 113 to swing upward while the translation telescopic rod 142 drives the transfer plate 111 away from the first reaction shell 11.
[0028] After the transfer plate 111 moves out of the first reaction housing 11, until the top surface of the transfer plate 111 contacts the bottom surface of the scraper plate 3, the scraper block 31 hinged to the scraper plate 3 and the dust removal block 8 on the top surface of the scraper plate 3 start working at the same time. At this time, when the scraper plate 3 and the scraper block 31 separate the magnesium silicide on the surface of the transfer plate 111 from the transfer plate 111, the floating magnesium silicide dust is absorbed by the dust removal block 8, and the translation telescopic rod 142 is continuously moved until the scraper plate 3 and the scraper block 31 push the magnesium silicide to the receiving block 4, and then the receiving block 4 transports the magnesium silicide to the second reaction housing 12. After the magnesium silicide enters the receiving block 4, the closing plate 41 swings to allow part of the magnesium silicide attached to the closing plate 41 to enter the second reaction shell 12. After all the magnesium silicide has entered, the closing plate 41 swings to close the communicating area between the receiving block 4 and the second reaction shell 12. Then, the gas supply pipe 5 inputs liquid ammonia into the second reaction shell 12, so that the ammonium chloride and magnesium silicide in the second reaction shell 12 react in the liquid ammonia to generate monosilane, magnesium chloride and ammonia gas. Then, the gas is drawn out from the suction pipe 6, and the solid and liquid are drawn out from the material pipe 7.
[0029] The above shows and describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited by the above embodiments. The above embodiments and descriptions are only preferred examples of the present invention and are not intended to limit the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.
Claims
1. A highly stable silane production reaction device, characterized in that: include: A structural shell (1), wherein a first reaction shell (11) is hingedly connected inside the structural shell (1), a transfer plate (111) is movably connected to the bottom of the first reaction shell (11), a heating block (112) is arranged at the bottom of the transfer plate (111), an opening and closing plate (113) is arranged on the side of the first reaction shell (11), the opening and closing plate (113) is movably connected to the first reaction shell (11), a plurality of first circular arc slide rails (13), a second circular arc slide rail (14) and a plurality of third circular arc slide rails (15) are arranged on the inner side surface of the structural shell (1), a first slider (131) is slidably connected to the first circular arc slide rail (13), the first slider (131) is connected to the second circular arc slide rail (14), the third circular arc slide rail (15) is arranged above the second circular arc slide rail (14), and the third circular arc slide rail (15) is movably connected to the second circular arc slide rail (14). 14) is vertically arranged, a translation telescopic rod (142) is arranged at the second circular arc slide rail (14), both ends of the translation telescopic rod (142) are connected to second sliders (141), the two second sliders (141) are slidably connected in the second circular arc slide rail (14), the translation telescopic rod (142) is connected to the transmission plate (111), the translation telescopic rod (142) controls the distance between the transmission plate (111) and the first reaction shell (11) by telescoping, two third circular arc slide rails (15) are arranged above the second circular arc slide rail (14), the two third circular arc slide rails (15) are symmetrically arranged, each of the third circular arc slide rails (15) is slidably connected to a third slider (151), one end of a connecting rope (152) is connected to the third slider (151), and the other end of the connecting rope (152) is hinged to the opening and closing plate (113); A second screw slider (143) and a third screw slider (153) are respectively arranged at the second slider (141) and the third slider (151), and the second screw slider (143) and the third screw slider (153) are both sleeved with a linkage screw (17), the linkage screw (17) being arranged in an inclined manner, and a vertical rod (18) being arranged vertically on the side of the linkage screw (17), and the second screw slider (143) and the third screw slider (153) are controlled to move synchronously by moving along the axis of the vertical rod (18) toward the top of the structural housing (1), so that the second slider (141) controls the transfer plate (111) to move in a direction away from the first reaction housing (11), and at the same time, the third slider (151) controls the opening and closing plate (113) to swing toward the outside of the first reaction housing (11); A fourth circular arc slide rail (16) is arranged above the second circular arc slide rail (14); the fourth circular arc slide rail (16) is arranged parallel to the second circular arc slide rail (14); a fourth sliding block (161) is slidably connected inside the fourth circular arc slide rail (16); a scraping plate (3) is connected to the fourth sliding block (161); the scraping plate (3) is located above the transfer plate (111) as a whole; when the transfer plate (111) moves out of the bottom of the first reaction housing (11), the top surface of the transfer plate (111) contacts the bottom surface of the scraping plate (3).
2. A reaction device for producing a highly stable silane compound according to claim 1, characterized in that: An absorption rod (2) is arranged inside the first reaction shell (11), the top of the absorption rod (2) is connected to the outside, a plurality of absorption through holes (21) are arranged on the side of the absorption rod (2), a partition rod (22) is arranged inside the absorption rod (2), and partition blocks (23) matching the number of the absorption through holes (21) are arranged on the outside of the partition rod (22), and the partition blocks (23) can cover and separate the absorption through holes (21) by rotating, thereby controlling the connection between the absorption through holes (21) and the inner and outer sides of the absorption rod (2).
3. A reaction device for producing a highly stable silane compound according to claim 2, characterized in that: A plurality of discharge pipes (24) are provided on the outer side surface of the partition rod (22), and two ends of the discharge pipes (24) are connected to the inside of the first reaction shell (11) and the outside, respectively.
4. A reaction device for producing a highly stable silane compound according to claim 3, characterized in that: The bottom of the absorption rod (2) is movably connected to a uniform distribution disk (25), the uniform distribution disk (25) comprising a plurality of circular arc disks (251) and guide disks (252) that rotate around the axis of the absorption rod (2), the guide disk (252) being arranged at the bottom of the circular arc disk (251), the absorption rod (2) drives the guide disk (252) to rotate accordingly by rotating, and the absorption rod (2) adjusts the distance between the bottom of the guide disk (252) and the top of the transfer plate (111) by moving up and down along the axis.
5. A reaction device for producing a highly stable silane compound according to claim 4, characterized in that: A plurality of evenly distributed grooves (26) are provided at the bottom of the guide plate (252), and the guide plate (252) can guide and mix the magnesium powder and silicon powder on the top surface of the transfer plate (111) by controlling the evenly distributed grooves (26) during rotation.
6. A reaction device for producing a highly stable silane compound according to claim 1, characterized in that: The scraping plate (3) is arranged in an arc shape on a side surface closest to the first reaction shell (11), and a plurality of scraping blocks (31) are arranged on the arc-shaped side surface of the scraping plate (3). Each of the scraping blocks (31) is hinged to the scraping plate (3). The scraping blocks (31) scrape off the magnesium silicide on the surface of the transfer plate (111) by cyclically swinging relative to the scraping plate (3), and can guide the magnesium silicide to fall into the receiving block (4) when the transfer plate (111) is continuously moved.
7. A reaction device for producing highly stable silane compounds according to claim 6, characterized in that: A second reaction shell (12) is arranged at the bottom of the scraper plate (3), a material receiving block (4) is arranged at the top of the second reaction shell (12), air supply pipes (5) and air suction pipes (6) are arranged on both sides of the material receiving block (4) and are connected to the top of the second reaction shell (12), and a material pipe (7) is arranged at the bottom of the second reaction shell (12) and is connected to the outside.
8. A reaction device for producing a highly stable silane compound according to claim 7, characterized in that: A symmetrically arranged closing plate (41) is provided on the inner side of the material receiving block (4), and the closing plate (41) is swung relative to the inner side of the material receiving block (4), thereby controlling the closing plate (41) to block the connection between the material receiving block (4) and the second reaction shell (12).
9. A reaction device for producing highly stable silane compounds according to claim 7, characterized in that: A dust removal block (8) is provided above the arc-shaped side surface of the scraping plate (3), and the dust removal block (8) absorbs magnesium silicide dust floating in the air when the scraping plate (3) scrapes magnesium silicide on the surface of the transfer plate (111).
Citation Information
Patent Citations
Continuous preparation device for high-purity silane gas
CN102092720A
Method and device for producing magnesium silicide
CN102452653A
Automatic calcium hydroxide batching system
CN214287935U
System for continuously producing disilane
CN214570782U