Metal cleaning liquid and cleaning method of gas distribution disc

Abstract

The invention relates to a metal cleaning solution and a cleaning method of a gas distribution disc, in particular to the field of cleaning, and the metal cleaning solution comprises the following components in parts by weight: 10-20 parts of organic acid salt, 10-25 parts of ethylene glycol n-butyl ether, 6-8 parts of polyol, 2-8 parts of carbonate, 10-22 parts of an ampholytic surfactant, 1-5 parts of sulfonate and 100-150 parts of a solvent. According to the cleaning solution disclosed by the invention, through reasonable design of the cleaning components and utilization of the synergistic effect of the components, stains such as dust and oil stains on the surface of a workpiece are efficiently removed, the cleanliness of the surface of the cleaned workpiece is remarkably improved, and the use effect of the workpiece is favorably ensured.

Description

Technical Field

[0001] The invention relates to the field of cleaning, and in particular to a cleaning method for a metal cleaning liquid and a gas distribution plate. Background Art

[0002] The gas distribution plate is a key component in the semiconductor manufacturing process. It plays an important role in processes such as chemical vapor deposition (CVD). The design and performance of the gas distribution plate are crucial to the semiconductor manufacturing process and directly affect the quality and production efficiency of semiconductor products.

[0003] For example, WO2021197200A1 discloses a gas distributor in a semiconductor device, in which, in a distributor body, an outlet end of a first air inlet pipeline is connected to an air inlet of a gas distribution pipeline group, and an air inlet end of a plurality of first air outlet pipelines is connected to a plurality of air outlets of the gas distribution pipeline group in a one-to-one correspondence; a gas distribution chamber in the above-mentioned distributor body is located above the gas distribution pipeline group and is arranged around the first air inlet pipeline, and a height of the gas distribution chamber gradually decreases from an inner peripheral edge close to the first air inlet pipeline to an outer peripheral edge away from the first air inlet pipeline, an outlet end of the second air inlet pipeline is connected to an air inlet of the gas distribution chamber, and an air inlet end of a plurality of second air outlet pipelines is connected to a plurality of air outlets of the gas distribution chamber in a one-to-one correspondence, the first air outlet pipeline and the second air outlet pipeline are arranged alternately, and the air outlet ends of both are located on the air outlet end surface of the distributor body.

[0004] CN220556584U discloses a semiconductor gas distribution plate, which includes a main body, a gas hole channel is formed in the main body, and both sides of the gas hole channel are respectively provided with an inlet hole and an outlet hole, a boss is formed on one side of the main body, and at least two groups of bosses are provided, and at least one group of bosses is provided with a connecting column, a diverter plate is provided on one side of the outlet hole, a through hole is formed on the diverter plate, and the connecting column is penetrated in the through hole, the diameter of the connecting column is smaller than the diameter of the through hole, and a first limiting end is installed on the top of the connecting column, and the lower side of the first limiting end abuts on the diverter plate, and an annular gap is formed between the connecting column and the inner wall of the through hole.

[0005] During the processing of the above-mentioned gas distribution plate, machining, polishing, grinding and other processing processes are usually required, which will cause stains such as dust and oil on the surface of the gas distribution plate. It is usually necessary to clean it before use. However, when cleaning the dust and oil on the surface of the gas distribution plate, there is still a defect that the cleaning is not thorough, the surface does not meet the requirements, and the use requirements cannot be met. Summary of the invention

[0006] In view of the problems existing in the prior art, the purpose of the present invention is to provide a metal cleaning liquid and a cleaning method for a gas distribution plate, so as to solve the defects of incomplete cleaning, substandard surface and inability to meet the use requirements when cleaning stains such as dust and oil on the surface of the gas distribution plate.

[0007] To achieve this object, the present invention adopts the following technical solutions:

[0008] In a first aspect, the present invention provides a metal cleaning solution, the metal cleaning solution comprising, by weight:

[0009] 10-20 parts of organic acid salt, 10-25 parts of ethylene glycol n-butyl ether, 6-8 parts of polyol, 2-8 parts of carbonate, 10-22 parts of amphoteric surfactant, 1-5 parts of sulfonate and 100-150 parts of solvent.

[0010] The cleaning liquid of the present invention realizes efficient removal of stains such as dust and oil on the surface of the workpiece by rationally designing the cleaning components and utilizing the synergistic effect of each component, significantly improves the cleanliness of the workpiece surface after cleaning, and is beneficial to ensuring the use effect of the workpiece.

[0011] As a preferred technical solution of the present invention, the organic acid salt includes one or a combination of at least two of oxalate, citrate, tartrate or malate.

[0012] As a preferred technical solution of the present invention, the polyol includes one or a combination of at least two of ethylene glycol, glycerol or propylene glycol.

[0013] As a preferred technical solution of the present invention, the carbonate includes one or a combination of at least two of sodium carbonate, potassium carbonate, sodium bicarbonate or potassium bicarbonate.

[0014] As a preferred technical solution of the present invention, the amphoteric surfactant includes oleamidopropyl betaine and sulfobetaine in a mass ratio of 1:(0.2-0.5).

[0015] As a preferred technical solution of the present invention, the sulfonate includes one or a combination of at least two of sodium sulfonate, calcium sulfonate, magnesium sulfonate or barium sulfonate.

[0016] In a second aspect, the present invention provides a method for cleaning a gas distribution plate, the cleaning method comprising:

[0017] The metal cleaning liquid described in the first aspect is used to clean the gas distribution plate.

[0018] As a preferred technical solution of the present invention, the cleaning is assisted by ultrasound.

[0019] As a preferred technical solution of the present invention, the frequency of the ultrasound is 25-50kHz.

[0020] As a preferred technical solution of the present invention, the power of the ultrasound is 500-1000W.

[0021] Compared with the prior art solutions, the present invention has the following beneficial effects:

[0022] The cleaning agent provided by the present invention improves the solubilization and elution efficiency by utilizing a specific configuration system and a compounded amphoteric surfactant of oleamidopropyl betaine and sulfobetaine in a mass ratio of 1:(0.2-0.5), thereby achieving a good removal effect on dirt attached to the surface of the gas distribution disk during processing, with a descaling rate of ≥98.5%, a cleaning rate of ≥98.6%, and an oil content of ≤15.2 mg / m 2 . DETAILED DESCRIPTION

[0023] To better illustrate the present invention and facilitate understanding of the technical solution of the present invention, typical but non-limiting embodiments of the present invention are as follows:

[0024] This embodiment provides a metal cleaning liquid, which includes, by weight:

[0025] 10-20 parts of organic acid salt, 10-25 parts of ethylene glycol n-butyl ether, 6-8 parts of polyol, 2-8 parts of carbonate, 10-22 parts of amphoteric surfactant, 1-5 parts of sulfonate and 100-150 parts of solvent.

[0026] In the present invention, the organic acid salt in the metal cleaning liquid is 10-20 parts by weight, for example, it can be 10 parts, 11 parts, 12 parts, 13 parts, 14 parts, 15 parts, 16 parts, 17 parts, 18 parts, 19 parts or 20 parts, but is not limited to the listed values, and other unlisted values ​​within this range also meet the requirements.

[0027] In the present invention, the amount of ethylene glycol n-butyl ether in the metal cleaning liquid is 10-25 parts by weight, for example, it can be 10 parts, 11 parts, 12 parts, 13 parts, 14 parts, 15 parts, 16 parts, 17 parts, 18 parts, 19 parts, 20 parts, 21 parts, 22 parts, 23 parts, 24 parts or 25 parts, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0028] In the present invention, the polyol in the metal cleaning liquid is 6-8 parts by weight, for example, it can be 6 parts, 6.2 parts, 6.4 parts, 6.6 parts, 6.8 parts, 7 parts, 7.2 parts, 7.4 parts, 7.6 parts, 7.8 parts or 8 parts, but is not limited to the listed values, and other unlisted values ​​within this range also meet the requirements.

[0029] In the present invention, the carbonate in the metal cleaning liquid is 2-8 parts by weight, for example, it can be 2 parts, 2.5 parts, 3 parts, 3.5 parts, 4 parts, 4.5 parts, 5 parts, 5.5 parts, 6 parts, 6.5 parts, 7 parts, 7.5 parts or 8 parts, but is not limited to the listed values, and other unlisted values ​​within this range also meet the requirements.

[0030] In the present invention, the amphoteric surfactant in the metal cleaning liquid is 10-22 parts by weight, for example, it can be 10 parts, 11 parts, 12 parts, 13 parts, 14 parts, 15 parts, 16 parts, 17 parts, 18 parts, 19 parts, 20 parts, 21 parts or 22 parts, but is not limited to the listed values, and other unlisted values ​​within this range also meet the requirements.

[0031] In the present invention, the sulfonate in the metal cleaning liquid is 1-5 parts by weight, for example, it can be 1 part, 1.5 parts, 2 parts, 2.5 parts, 3 parts, 3.5 parts, 4 parts, 4.5 parts or 5 parts, but is not limited to the listed values. Other unlisted values ​​within this range also meet the requirements.

[0032] In the present invention, the solvent in the metal cleaning liquid is 100-150 parts by weight, for example, it can be 100 parts, 105 parts, 110 parts, 115 parts, 120 parts, 125 parts, 130 parts, 135 parts, 140 parts, 145 parts or 150 parts, but is not limited to the listed values, and other unlisted values ​​within this range also meet the requirements.

[0033] The organic acid salt comprises one or a combination of at least two of oxalate, citrate, tartrate or malate.

[0034] Illustratively, the combination of organic acid salts includes: a combination of oxalate and citrate, a combination of citrate and tartrate, a combination of oxalate and malate, and the like.

[0035] In the present invention, the oxalate includes soluble salts such as sodium oxalate and potassium oxalate.

[0036] In the present invention, citrate includes soluble salts such as sodium citrate and potassium citrate.

[0037] In the present invention, tartrate includes soluble salts such as sodium tartrate and potassium tartrate.

[0038] In the present invention, malate includes soluble salts such as sodium malate and potassium malate.

[0039] Wherein, the polyol includes one or a combination of at least two of ethylene glycol, glycerol or propylene glycol.

[0040] Illustratively, the combination of polyols includes a combination of ethylene glycol and glycerol, a combination of glycerol and propylene glycol, a combination of ethylene glycol and propylene glycol, and the like.

[0041] Wherein, the carbonate includes one or a combination of at least two of sodium carbonate, potassium carbonate, sodium bicarbonate or potassium bicarbonate.

[0042] Illustratively, the combination of carbonates includes a combination of sodium carbonate and potassium carbonate, a combination of potassium carbonate and sodium bicarbonate, a combination of sodium bicarbonate and potassium bicarbonate, a combination of sodium carbonate and potassium bicarbonate, and the like.

[0043] Wherein, the amphoteric surfactant includes oleamidopropyl betaine and sulfobetaine in a mass ratio of 1:(0.2-0.5), for example, it can be 1:0.2, 1:0.22, 1:0.24, 1:0.26, 1:0.28, 1:0.3, 1:0.32, 1:0.34, 1:0.36, 1:0.38, 1:0.4, 1:0.42, 1:0.44, 1:0.46, 1:0.48 or 1:0.5, etc., but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0044] In the present invention, the sulfobetaine used includes one or a combination of at least two of dodecylhydroxypropylsulfobetaine, dodecylethoxysulfobetaine, sulfoethylbetaine and the like.

[0045] The sulfonate salt includes one or a combination of at least two of sodium sulfonate, calcium sulfonate, magnesium sulfonate or barium sulfonate.

[0046] Illustratively, the combination of sulfonates includes: a combination of sodium sulfonate and calcium sulfonate, a combination of calcium sulfonate and magnesium sulfonate, a combination of magnesium sulfonate and barium sulfonate, a combination of sodium sulfonate and barium sulfonate, and the like.

[0047] Wherein, the solvent is water.

[0048] In the present invention, the cleaning solution is prepared by mixing the ingredients according to weight.

[0049] Furthermore, the present invention provides a method for cleaning a gas distribution plate, the cleaning method comprising:

[0050] The gas distribution plate is cleaned using the metal cleaning liquid as described above.

[0051] In the present invention, the material of the gas distribution plate includes aluminum alloys, such as 6000 series aluminum alloys, such as A6061 aluminum alloy and other aluminum alloys commonly used in the art.

[0052] Wherein, the cleaning is assisted by ultrasound.

[0053] The frequency of the ultrasound is 25-50kHz, for example, it can be 25kHz, 26kHz, 28kHz, 30kHz, 32kHz, 34kHz, 36kHz, 38kHz, 40kHz, 42kHz, 44kHz, 46kHz, 48kHz or 50kHz, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0054] The power of the ultrasound is 500-1000W, for example, it can be 500W, 550W, 600W, 650W, 700W, 750W, 800W, 850W, 900W, 950W or 1000W, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0055] Further, in order to illustrate the cleaning effect that can be achieved by the metal cleaning liquid provided by the present invention, the following actual examples are used for exemplary description, as follows:

[0056] Example 1

[0057] This embodiment provides a metal cleaning liquid, which includes, by weight:

[0058] 15 parts of sodium citrate, 15 parts of ethylene glycol n-butyl ether, 7 parts of ethylene glycol, 6 parts of sodium carbonate, 15 parts of amphoteric surfactant (oleamidopropyl betaine and dodecyl hydroxypropyl sulfobetaine in a mass ratio of 1:0.3), 3 parts of calcium sulfonate and 130 parts of water.

[0059] The cleaning process using the metal cleaning liquid is as follows:

[0060] The gas distribution plate is cleaned; the cleaning is assisted by ultrasound, the frequency of the ultrasound is 30kHz, and the power is 1000W.

[0061] Example 2

[0062] This embodiment provides a metal cleaning liquid, which includes, by weight:

[0063] 16 parts of sodium tartrate, 20 parts of ethylene glycol n-butyl ether, 7.5 parts of glycerol, 4 parts of sodium bicarbonate, 20 parts of amphoteric surfactant (oleamidopropyl betaine and dodecylethoxy sulfobetaine in a mass ratio of 1:0.4), 4 parts of sodium sulfonate and 120 parts of water.

[0064] The cleaning process using the metal cleaning liquid is as follows:

[0065] The gas distribution plate is cleaned; the cleaning is assisted by ultrasound, the frequency of the ultrasound is 40kHz, and the power is 500W.

[0066] Example 3

[0067] This embodiment provides a metal cleaning liquid, which includes, by weight:

[0068] 20 parts of sodium malate, 10 parts of ethylene glycol n-butyl ether, 8 parts of ethylene glycol, 2 parts of ammonium bicarbonate, 10 parts of amphoteric surfactant (oleamidopropyl betaine and sulfoethyl betaine in a mass ratio of 1:0.2), 5 parts of magnesium sulfonate and 150 parts of water.

[0069] The cleaning process using the metal cleaning liquid is as follows:

[0070] The gas distribution plate is cleaned; the cleaning is assisted by ultrasound, the frequency of the ultrasound is 50kHz, and the power is 1000W.

[0071] Example 4

[0072] This embodiment provides a metal cleaning liquid, which includes, by weight:

[0073] 10 parts of sodium oxalate, 25 parts of ethylene glycol n-butyl ether, 6 parts of glycerol, 8 parts of potassium carbonate, 22 parts of amphoteric surfactant (oleamidopropyl betaine and dodecyl hydroxypropyl sulfobetaine in a mass ratio of 1:0.5), 1 part of barium sulfonate and 100 parts of water.

[0074] The cleaning process using the metal cleaning liquid is as follows:

[0075] The gas distribution plate is cleaned; the cleaning is assisted by ultrasound, the frequency of the ultrasound is 25kHz, and the power is 500W.

[0076] Example 5

[0077] The only difference from Example 1 is that sodium citrate is replaced by an equal amount of sodium oxalate.

[0078] Example 6

[0079] The only difference from Example 1 is that the amphoteric surfactant is replaced by oleamidopropyl betaine and sulfobetaine in a mass ratio of 1:5.

[0080] Comparative Example 1

[0081] The only difference from Example 1 is that no sodium citrate is added.

[0082] Comparative Example 2

[0083] The only difference from Example 1 is that no ethylene glycol is added.

[0084] Comparative Example 3

[0085] The only difference from Example 1 is that ethylene glycol n-butyl ether is not added.

[0086] Comparative Example 4

[0087] The only difference from Example 1 is that no sodium carbonate is added.

[0088] Comparative Example 5

[0089] The only difference from Example 1 is that no amphoteric surfactant (oleamidopropyl betaine and dodecyl hydroxypropyl sulfobetaine in a mass ratio of 1:0.3) is added.

[0090] Comparative Example 6

[0091] The only difference from Example 1 is that no calcium sulfonate is added.

[0092] Comparative Example 7

[0093] The only difference from Example 1 is that the amphoteric surfactant (oleamidopropyl betaine and dodecyl hydroxypropyl sulfobetaine in a mass ratio of 1:0.3) is replaced by an equal amount of sodium lauryl sulfate.

[0094] Comparative Example 8

[0095] The only difference from Example 1 is that the amphoteric surfactant (oleamidopropyl betaine and dodecyl hydroxypropyl sulfobetaine in a mass ratio of 1:0.3) is replaced by an equal amount of dodecyl trimethyl ammonium chloride.

[0096] Comparative Example 9

[0097] The only difference from Example 1 is that the amphoteric surfactant (oleamidopropyl betaine and dodecyl hydroxypropyl sulfobetaine in a mass ratio of 1:0.3) is replaced by an equal amount of polysorbate-20.

[0098] The cleaning effect of the gas distribution plate after cleaning in the above embodiment was evaluated according to HGT2387-2007 "Quality Standard for Chemical Cleaning of Industrial Equipment", and the results are shown in Table 1 below.

[0099] Table 1

[0100]

[0101]

[0102] As shown in Table 1, the cleaning agent provided by the present invention has a good effect of removing dirt on the surface of the gas distribution plate, with a descaling rate of ≥98.5%, a cleaning rate of ≥98.6%, and an oil content of ≤15.2 mg / m 2 .

[0103] The preferred embodiments of the present invention are described in detail above. However, the present invention is not limited to the specific details in the above embodiments. Within the technical concept of the present invention, a variety of simple modifications can be made to the technical solution of the present invention, and these simple modifications all belong to the protection scope of the present invention.

[0104] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further describe various possible combinations.

[0105] In addition, various embodiments of the present invention may be arbitrarily combined, and as long as they do not violate the concept of the present invention, they should also be regarded as the contents disclosed by the present invention.

Claims

1. A metal cleaning liquid, characterized in that: The metal cleaning solution comprises, by weight: 10-20 parts of organic acid salt, 10-25 parts of ethylene glycol n-butyl ether, 6-8 parts of polyol, 2-8 parts of carbonate, 10-22 parts of amphoteric surfactant, 1-5 parts of sulfonate and 100-150 parts of solvent.

2. The metal cleaning liquid according to claim 1, characterized in that: The organic acid salt includes one or a combination of at least two of oxalate, citrate, tartrate or malate.

3. The metal cleaning liquid according to claim 1, characterized in that: The polyol includes one or a combination of at least two of ethylene glycol, glycerol or propylene glycol.

4. The metal cleaning liquid according to claim 1, characterized in that: The carbonate includes one or a combination of at least two of sodium carbonate, potassium carbonate, sodium bicarbonate or potassium bicarbonate.

5. The metal cleaning liquid according to claim 1, characterized in that: The amphoteric surfactant comprises oleamidopropyl betaine and sulfobetaine in a mass ratio of 1:(0.2-0.5).

6. The metal cleaning liquid according to claim 1, characterized in that: The sulfonate includes one or a combination of at least two of sodium sulfonate, calcium sulfonate, magnesium sulfonate or barium sulfonate.

7. A method for cleaning a gas distribution plate, characterized in that: The cleaning method comprises: The gas distribution plate is cleaned using the metal cleaning liquid as described in any one of claims 1 to 6.

8. The cleaning method according to claim 7, characterized in that: The cleaning is assisted by ultrasound.

9. The cleaning method according to claim 8, characterized in that: The frequency of the ultrasound is 25-50 kHz.

10. The cleaning method according to claim 8, characterized in that: The power of the ultrasound is 500-1000W.

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