Wastewater treatment device for semiconductor industry

Abstract

The invention discloses a wastewater treatment device for the semiconductor industry, and belongs to the technical field of wastewater treatment.The wastewater treatment device for the semiconductor industry comprises a main body, a supporting frame is fixedly connected to the outer wall of the main body, a wastewater inlet pipe is fixedly connected to one side of the top of the main body, and a driving mechanism is installed on the inner wall of a storage cavity; a spraying mechanism is mounted at the top of the main body, a stirring mechanism is mounted on the outer wall of the driving mechanism, and a wastewater outlet pipe is fixedly connected to the outer wall of the main body. By designing the driving mechanism, the spraying mechanism and the stirring mechanism, wastewater and an adsorbent can be quickly mixed, the wastewater can be treated, meanwhile, the angle of stirring blades can be selected, the treatment rate can be increased in the wastewater treatment process of different methods, in addition, the spraying mechanism can move up and down along with stirring, and the treatment efficiency is improved. Therefore, the treatment efficiency is improved, and the method has wide application prospects in the field of wastewater treatment.

Description

Technical Field

[0001] The invention belongs to the technical field of wastewater treatment, and in particular relates to a wastewater treatment device used in the semiconductor industry. Background Art

[0002] The semiconductor industry involves the use of a variety of chemical substances and water resources in the production process, and the wastewater generated often contains a variety of pollutants. These wastewaters mainly come from process links such as cleaning, etching and chemical mechanical polishing, and may contain heavy metals, organic solvents, acid and alkali waste liquids and other harmful substances. With the rapid development of the semiconductor industry, the problem of wastewater treatment has become increasingly prominent. If it is not effectively treated, it will have a serious impact on the water environment and ecology. Therefore, establishing a sound wastewater management and treatment system to ensure that wastewater meets discharge standards is a key measure to ensure environmental safety and promote sustainable development. Countries and regions are also constantly strengthening the supervision of wastewater discharge in the semiconductor industry and promoting the application of green production technologies to reduce environmental burdens.

[0003] Wastewater from the semiconductor industry generally contains more substances and usually needs to be treated before it can be discharged. The existing wastewater treatment devices used in the semiconductor industry have fixed reagent spraying devices during use and cannot be adjusted according to the wastewater content, resulting in a large amount of foam generated by the collision between the wastewater and the adsorbent, which in turn affects the wastewater treatment efficiency. Over time, it will cause corrosion to the inner wall of the wastewater treatment device. In addition, the stirring device cannot be switched according to different adsorption methods during stirring, resulting in a low mixing speed of the wastewater and the adsorbent, thereby affecting the wastewater treatment efficiency and prolonging the wastewater treatment cycle. Summary of the invention

[0004] The technical problem to be solved by the present invention is to overcome the disadvantages of the above-mentioned prior art and provide a wastewater treatment device for the semiconductor industry.

[0005] The technical solution adopted to solve the above technical problems is: a wastewater treatment device for semiconductor industry, comprising a main body, the outer wall of the main body is fixedly connected to a support frame, one side of the top of the main body is fixedly connected to a wastewater inlet pipe, and the bottom of the main body is fixedly connected to a storage cavity;

[0006] A driving mechanism is installed on the inner wall of the storage cavity, a spraying mechanism is installed on the top of the main body, a stirring mechanism is installed on the outer wall of the driving mechanism, and a wastewater outlet pipe is fixedly connected to the outer wall of the main body.

[0007] Furthermore, the driving mechanism includes a first motor fixedly connected to the inner wall of the storage cavity, the output end of the first motor is fixedly connected to a limited drive shaft, the bottom of the outer wall of the limited drive shaft is fixedly connected to a first gear, the outer wall of the first gear is meshed with a toothed belt, the inner walls of both ends of the toothed belt are meshed with second gears, the inner walls of the two second gears are fixedly connected to threaded rods, the outer walls of the two threaded rods are rotatably connected to two movable ring plates, the upper and lower ends of the two threaded rods are respectively rotatably connected to the main body and the storage cavity, and the outer walls of the two movable ring plates are slidably connected to the inner wall of the main body.

[0008] Through the above technical scheme, when in use, when the wastewater is introduced into the treatment device, the driving mechanism can be used to drive the mechanism to move up and down and stir the mechanism inside. The up and down movement can prevent the sedimentation and avoid the floating of light pollutants, maintain the fluidity of the system, and ensure that the internal active mixing area of ​​the adsorbent is large enough, so that the wastewater and the adsorbent can be mixed smoothly. At the same time, a single driving component can be used to move up and down while stirring. The stirring also increases the active area, so that the overall investment is reduced and resources are used rationally. Specifically, a certain amount of wastewater from the semiconductor industry is put into the main body from the wastewater inlet pipe, and the inner wall of the placement cavity is started at this time. The first motor drives the limit drive shaft to rotate, and then the first gear on its outer wall rotates accordingly. When the first gear, the toothed belt and the two second gears are meshed, the two threaded rods are driven to rotate, and then the two movable ring plates can move up and down thereon, and sealing rings are provided at the contact between the threaded rod and the main body to avoid water leakage during movement, so that the adsorbent can be increased in the internal mixing area, and the limit drive shaft can drive other components to rotate and mix, and then a single first motor can be used to realize multiple motion operations, so that resource utilization is maximized, and by optimizing the stirring method, the adsorbent can be used more effectively and the usage can be reduced, thereby reducing costs and waste of resources.

[0009] Furthermore, the spraying mechanism includes a rotating chassis rotatably connected to the top of the main body, a medicine barrel is fixedly connected to the top of the rotating chassis, a medicine inlet pipe is fixedly connected to the outer wall of the medicine barrel, a plurality of spring-shaped pipes are fixedly connected to the bottom of the medicine barrel, a plurality of medicine barrels are each provided with a nozzle at the other end, a plurality of spring-shaped pipes are each fixedly connected to the outer walls of the plurality of spring-shaped pipes, the top of the limiting drive shaft is fixedly connected to the rotating chassis, and the output ends of the plurality of spring-shaped pipes all pass through the interior of the rotating chassis.

[0010] Through the above technical solution, as the driving mechanism is running, the spraying mechanism can rotate with it and move up and down, so that the adsorbent can be quickly distributed inside the entire wastewater device, and the mixing of the agent and the wastewater is faster, which helps to improve the reaction efficiency and shorten the processing time. At the same time, the contact between the adsorbent in the spraying mechanism and the surface of the wastewater is reduced, and the generation of internal foam is reduced, thereby reducing the corrosion of the foam to the inner wall of the main body. In addition, the up and down and rotating movements of the spraying mechanism can effectively avoid the accumulation of agents in certain dead corners or blind spots, ensuring that the entire system can be fully treated. Specifically, the adsorbent is moved from the agent to the wastewater. The agent is poured into the agent inlet pipe on the outer wall of the agent barrel, and then the adsorbent can be transmitted through multiple spring-shaped pipes and then sprayed out from the corresponding nozzle. Under the rotation of the limit drive shaft and the fixation of the pipe buckle, the nozzle can be driven to rotate, and with the up and down movement of the two movable ring plates, the multiple spring-shaped pipes can be pulled to stretch and contract, so that the adsorbent can be completely sprinkled inside the wastewater treatment device. Effective agent distribution and stirring can reduce the formation of sediment in the wastewater, thereby reducing the cleaning frequency and maintenance cost of the equipment, and good treatment effect and uniform agent distribution can reduce the wear on the equipment and extend its service life.

[0011] Furthermore, the stirring mechanism includes a limiting ring slidably connected to the outer wall of the limiting driving shaft, the outer wall of the limiting ring is rotatably connected to multiple first rotating shafts, the other ends of multiple first rotating shafts are fixedly connected to fan-shaped filter plates, the inner walls of the two movable ring plates are connected to movable ring plates, the two movable ring plates have limiting grooves on opposite sides, the inner walls of the two limiting grooves are slidably connected to a support plate, one side of the support plate is fixedly connected to a second motor, the inside of the movable ring plate is rotatably connected to multiple second rotating shafts, multiple fan-shaped filter plates are fixedly connected to a fixed column on one side close to the movable ring plate, multiple second rotating shafts are fixedly connected to the outer walls, multiple fixing bars are rotatably connected to connecting rods on one side, multiple pipe buckle outer walls are fixedly connected to the movable ring plate, one end of one of the second rotating shafts is fixedly connected to the second motor, the other ends of the multiple fixing columns are respectively fixedly connected to the corresponding second rotating shafts, and a connecting rod is rotatably connected between every two fixing bars.

[0012] Through the above technical scheme, in the process of up and down movement and rotation driven by the driving mechanism, the stirring mechanism can be used to fully mix the wastewater and the adsorbent. At the same time, in wastewater with different types of pollutants, physical, chemical and ion exchange adsorption methods are usually used. At this time, the stirring mechanism can be used to control the corresponding angle and smoothness to achieve the contact area, chemical reaction rate and contact between ions and adsorbents. In addition, after the wastewater treatment is completed, the restored disc shape can be moved above the wastewater outlet pipe, and then the wastewater is discharged, thereby avoiding impurities in the wastewater from being discharged with the treated wastewater. Specifically, when the wastewater contains different types of pollutants, the second motor on one side of the support plate can be started to drive the second motor therein. A second rotating shaft rotates, and at the same time, a fixed bar on one of the second rotating shafts starts to rotate. When the connecting rod and the fixed bar are connected up and down, multiple second rotating shafts are then driven to rotate, so that the corresponding fan-shaped filter plates on the fixed columns at the other ends of the multiple second rotating shafts rotate. When the fan-shaped filter plate is adjusted to a desired angle, the limit ring on the outer wall of the limit drive shaft starts to rotate, thereby driving the movable ring plate to slide on the two moving ring plates. The outer wall of the moving ring plate is convex to form a limit, and can drive the support plate on the second motor to slide on the two limit grooves. In addition, the fan-shaped filter plate can filter while stirring. When the wastewater treatment is completed, the multiple fan-shaped filter plates return to their original state.

[0013] The beneficial effects of the present invention are as follows: (1) The present invention designs a driving mechanism, a spraying mechanism and a stirring mechanism. During the wastewater treatment process in the semiconductor industry, the device can be rotated up and down for stirring, so that the wastewater and the adsorbent can be quickly mixed to treat the wastewater. At the same time, the stirring blade can be angled to improve the treatment rate during wastewater treatment by different methods. In addition, the spraying mechanism can move up and down following the stirring, so that the wastewater treatment is more complete and sufficient, and the adsorbent is in full contact with the wastewater, thereby improving the treatment efficiency, achieving the economy and efficiency of wastewater treatment, and having broad application prospects in the field of wastewater treatment. (2) The present invention designs a driving mechanism and a spraying mechanism. During the wastewater treatment process, the driving mechanism can be used to allow the wastewater to be quickly and fully mixed with the adsorbent in the treatment device. The up and down movement combined with the rotating stirring can achieve all-round mixing, ensuring that the wastewater and the treatment agent are evenly distributed and avoiding local uneven concentrations. It can ensure that the wastewater can be stirred to prevent coagulation, and the up and down movement can prevent the deposition of sediments, while preventing light pollutants from floating and maintaining the fluidity of the system. In addition, the driving mechanism can drive the spray head in the spray mechanism to move up and down and rotate. The dynamic movement of the spray head can ensure that the agent is evenly distributed in the wastewater, promote more effective reaction and mixing, and optimize the dosage of the agent to avoid excessive agent in some areas and insufficient agent in other areas. (3) The present invention can adjust the angle of the filter plate when treating pollutants containing different types and using different adsorption methods to treat them, change the contact area between the filter plate and the wastewater, and enhance the contact between the reactants. Moreover, after the wastewater treatment is completed, the filter plate can be restored to a disc state. The design of the filter plate can prevent the precipitated sludge or particulate matter from flowing back into the treatment system again, reducing the risk of secondary pollution. At the same time, it can be filtered again to reduce the discharge of impurities and wastewater at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a three-dimensional structural schematic diagram of the present invention;

[0015] Figure 2 It is a front view of the present invention;

[0016] Figure 3 is a cross-sectional view of the present invention from a first viewing angle;

[0017] Figure 4 yes Figure 3 A partial enlarged view of the middle A;

[0018] Figure 5 is a cross-sectional view of the present invention from a second viewing angle;

[0019] Figure 6 yes Figure 5 A partial enlarged view of point B in the middle;

[0020] Figure 7 is a schematic structural diagram of a stirring mechanism of the present invention from a first viewing angle;

[0021] Figure 8 is a structural schematic diagram of the stirring mechanism of the present invention from a second viewing angle;

[0022] Fig. 9 yes Figure 8 A partial enlarged view of point C in the middle;

[0023] Fig.10 is a cross-sectional view of the stirring mechanism of the present invention;

[0024] Fig.11 yes Fig.10 A partial enlarged view of point D in the middle.

[0025] 1. Main body; 2. Support frame; 3. Wastewater inlet pipe; 4. Storage chamber; 5. Driving mechanism; 501. First motor; 502. Limit driving shaft; 503. First gear; 504. Toothed belt; 505. Second gear; 506. Threaded rod; 507. Moving ring plate; 6. Spraying mechanism; 601. Rotating chassis; 602. Medicine barrel; 603. Medicine inlet pipe; 604. Spring-shaped pipe; 605. Spray head; 606. Pipe buckle; 7. Stirring mechanism; 701. Limiting ring; 702. First rotating shaft; 703. Fan-shaped filter plate; 704. Movable ring plate; 705. Limiting groove; 706. Support plate; 707. Second motor; 708. Second rotating shaft; 709. Fixed column; 710. Fixed bar; 711. Connecting rod; 8. Wastewater outlet pipe. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0027] like Figure 1-Figure 11As shown, a wastewater treatment device for the semiconductor industry of this embodiment includes a main body 1, a support frame 2 is fixedly connected to the outer wall of the main body 1, a wastewater inlet pipe 3 is fixedly connected to one side of the top of the main body 1, a storage chamber 4 is fixedly connected to the bottom of the main body 1, a driving mechanism 5 is installed on the inner wall of the storage chamber 4, and the driving mechanism 5 includes a first motor 501 fixedly connected to the inner wall of the storage chamber 4, an output end of the first motor 501 is fixedly connected to a limited drive shaft 502, a first gear 503 is fixedly connected to the bottom of the outer wall of the limited drive shaft 502, and the outer wall of the first gear 503 is meshed with a toothed belt 504, and the inner walls of both ends of the toothed belt 504 are meshed. The second gear 505 is combined, and the inner walls of the two second gears 505 are fixedly connected with threaded rods 506. The outer walls of the two threaded rods 506 are rotatably connected with two movable ring plates 507. The upper and lower ends of the two threaded rods 506 are rotatably connected with the main body 1 and the storage cavity 4 respectively. The outer walls of the two movable ring plates 507 are slidably connected with the inner wall of the main body 1. When in use, when wastewater is introduced into the treatment device, the driving mechanism 5 can be used to drive the mechanism to move up and down and stir the mechanism inside. The up and down movement can prevent the sedimentation of sediment and prevent the floating of light pollutants, maintain the fluidity of the system, and And it can ensure that the internal active mixing area of ​​the adsorbent is large enough, so that the wastewater and the adsorbent can be mixed smoothly, and at the same time, it can be moved up and down while stirring through a single driving component, and the active area is also increased during stirring, so that the overall investment is reduced and resources are used rationally. Specifically, a certain amount of wastewater from the semiconductor industry is put into the main body 1 from the wastewater inlet pipe 3, and at this time, the first motor 501 on the inner wall of the storage cavity 4 is started to drive the limit drive shaft 502 to rotate, and then the first gear 503 on the outer wall thereof rotates accordingly, and the first gear 503, the toothed belt 504 and the two second gears are rotated. When 505 is engaged, the two threaded rods 506 are driven to rotate, and then the two movable ring plates 507 can move up and down thereon, wherein the threaded rods 506 are in contact with the main body 1 and are provided with sealing rings to avoid water leakage during movement, thereby achieving the increase of the adsorbent in the internal mixing area, and the limit drive shaft 502 can drive other components to rotate and mix, and then a single first motor 501 can be used to achieve a variety of motion operations, so that resource utilization is maximized, and by optimizing the stirring method, the adsorbent can be used more effectively, and the usage can be reduced, thereby reducing costs and waste of resources.

[0028] like Figure 5-Figure 6As shown, a spraying mechanism 6 is installed on the top of the main body 1, and the spraying mechanism 6 includes a rotating chassis 601 rotatably connected to the top of the main body 1, a medicine barrel 602 is fixedly connected to the top of the rotating chassis 601, a medicine inlet pipe 603 is fixedly connected to the outer wall of the medicine barrel 602, and a plurality of spring-shaped pipes 604 are fixedly connected to the bottom of the medicine barrel 602, and the other ends of the plurality of medicine barrels 602 are each provided with a nozzle 605, and the outer walls of the plurality of spring-shaped pipes 604 are each fixedly connected with a pipe buckle 606, the top of the limiting driving shaft 502 is fixedly connected to the rotating chassis 601, and the output ends of the plurality of spring-shaped pipes 604 are all penetrated into the rotating chassis 601. With the operation of the driving mechanism 5, the spraying mechanism 6 can rotate with it and move up and down, so that the adsorbent can be quickly distributed inside the entire wastewater device, and the mixing of the medicine and the wastewater is faster, which helps to improve the reaction efficiency and shorten the processing time, while reducing the contact between the adsorbent in the spraying mechanism 6 and the surface of the wastewater, thereby reducing Less internal foam is generated, thereby reducing the corrosion of the foam on the inner wall of the main body 1. In addition, the up and down and rotational movements of the spraying mechanism 6 can effectively avoid the accumulation of the agent in certain dead corners or blind spots, ensuring that the entire system can be fully treated. Specifically, the adsorbent is poured into the agent inlet pipe 603 on the outer wall of the agent barrel 602, and then the adsorbent can be transmitted through a plurality of spring-shaped pipes 604 and then sprayed out from the corresponding nozzle 605. Under the rotation of the limit drive shaft 502 and the fixation of the pipe buckle 606, the nozzle 605 can be driven to rotate, and with the up and down movement of the two movable ring plates 507, the plurality of spring-shaped pipes 604 can be pulled to straighten and retract, so that the adsorbent can be completely sprinkled inside the wastewater treatment device. Effective agent distribution and stirring can reduce the formation of sediment in the wastewater, thereby reducing the cleaning frequency and maintenance cost of the equipment, and good treatment effect and uniform agent distribution can reduce the wear on the equipment and extend its service life.

[0029] like Figure 7-Figure 11As shown, a stirring mechanism 7 is installed on the outer wall of the driving mechanism 5, a wastewater outlet pipe 8 is fixedly connected to the outer wall of the main body 1, the stirring mechanism 7 includes a limiting ring 701 slidably connected to the outer wall of the limiting driving shaft 502, the outer wall of the limiting ring 701 is rotatably connected to multiple first rotating shafts 702, the other ends of the multiple first rotating shafts 702 are fixedly connected to fan-shaped filter plates 703, the inner walls of the two movable ring plates 507 are connected to movable ring plates 704, the two movable ring plates 507 are provided with limiting grooves 705 on opposite sides, the inner walls of the two limiting grooves 705 are slidably connected to support plates 706, one side of the support plate 706 is fixedly connected to a second motor 707, the movable ring plate 704 is rotatably connected to multiple second rotating shafts 708, Each fan-shaped filter plate 703 is fixedly connected to a fixed column 709 on one side close to the movable ring plate 704, and a plurality of second rotating shafts 708 are fixedly connected to fixed bars 710 on the outer walls. A plurality of fixed bars 710 are rotatably connected to a connecting rod 711 on one side. The outer walls of a plurality of pipe buckles 606 are fixedly connected to the movable ring plate 704, one end of one second rotating shaft 708 is fixedly connected to the second motor 707, and the other ends of a plurality of fixed columns 709 are respectively fixedly connected to the corresponding second rotating shaft 708. A connecting rod 711 is rotatably connected between every two fixed bars 710. In the process of up and down movement and rotation driven by the driving mechanism 5, the stirring mechanism 7 can be used to fully mix the wastewater and the adsorbent, and at the same time, different types of pollutants can be mixed. In the wastewater, physical, chemical and ion exchange adsorption methods are usually used. At this time, the stirring mechanism 7 can be used to control the corresponding angle and smoothness to achieve the contact area, chemical reaction rate and contact between ions and adsorbents. In addition, after the wastewater treatment is completed, the recovery disc shape can be moved above the wastewater outlet pipe 8, and then the wastewater is discharged, thereby preventing impurities in the wastewater from being discharged with the treated wastewater. Specifically, when the wastewater contains different types of pollutants, the second motor 707 on one side of the support plate 706 can be started to drive one of the second rotating shafts 708 to rotate. At the same time, the fixed bar 710 on one of the second rotating shafts 708 starts to rotate, and the connecting rod 711 and the fixed bar 710 are connected. When 710 is connected up and down, it then drives multiple second rotating shafts 708 to rotate, so that the corresponding fan-shaped filter plates 703 on the fixed columns 709 at the other end of the multiple second rotating shafts 708 rotate. When the fan-shaped filter plates 703 are adjusted to a desired angle, the limiting ring 701 on the outer wall of the limiting drive shaft 502 starts to rotate, thereby driving the movable ring plate 704 to slide on the two movable ring plates 507. The outer wall of the movable ring plate 507 is convex to form a limit, and can drive the support plate 706 on the second motor 707 to slide on the two limiting grooves 705. In addition, the fan-shaped filter plates 703 can filter while stirring. When the wastewater treatment is completed, the multiple fan-shaped filter plates 703 return to their original state.

[0030] The working principle of this embodiment is as follows. When in use, a certain amount of wastewater from the semiconductor industry is put into the main body 1 from the wastewater inlet pipe 3. First, when the wastewater contains different types of pollutants, the second motor 707 on the side of the support plate 706 can be started to drive one of the second rotating shafts 708 to rotate. At the same time, the fixing bar 710 on one of the second rotating shafts 708 starts to rotate. When the connecting rod 711 is connected to the fixing bar 710 up and down, the multiple second rotating shafts 708 are then driven to rotate, so that the multiple second rotating shafts 708 8 The corresponding fan-shaped filter plate 703 on the fixed column 709 at the other end rotates. When the fan-shaped filter plate 703 is adjusted to a desired angle, the limit ring 701 on the outer wall of the limit drive shaft 502 starts to rotate, thereby driving the movable ring plate 704 to slide on the two movable ring plates 507. The outer wall of the movable ring plate 507 is convex to form a limit, and can drive the support plate 706 on the second motor 707 to slide on the two limit grooves 705. At this time, the first motor 501 on the inner wall of the storage cavity 4 is started to drive the limit drive shaft 502 to rotate. Then the first gear 503 on its outer wall rotates accordingly, and when the first gear 503, the toothed belt 504 and the two second gears 505 are meshed, the two threaded rods 506 are driven to rotate, and then the two movable ring plates 507 can move up and down thereon. At the same time, the adsorbent is poured into the medicine inlet pipe 603 on the outer wall of the medicine barrel 602, and then the adsorbent can be transmitted through a plurality of spring-shaped pipes 604, and then sprayed out from the corresponding nozzle 605. Under the rotation of the limit drive shaft 502 and the fixation of the pipe buckle 606, it can The nozzle 605 is driven to rotate, and with the up and down movement of the two movable ring plates 507, the multiple spring-shaped pipes 604 can be pulled to straighten and expand. Finally, the fan-shaped filter plate 703 can filter while stirring. When the wastewater treatment is completed, the multiple fan-shaped filter plates 703 are restored to their original state, and the two movable ring plates 507 and related components are driven by the limiting drive shaft 502 to move to the top of the wastewater outlet pipe 8. Then the mixed wastewater passes through the multiple fan-shaped filter plates 703 and flows out of the wastewater outlet pipe 8. At this point, the entire semiconductor industry wastewater treatment process is completed.

[0031] The above description is only a preferred embodiment of the present invention and is not intended to limit the protection scope of the present invention.

Claims

1. A wastewater treatment device for the semiconductor industry, comprising a main body (1), characterized in that: The outer wall of the main body (1) is fixedly connected to a support frame (2), a wastewater inlet pipe (3) is fixedly connected to one side of the top of the main body (1), and a storage cavity (4) is fixedly connected to the bottom of the main body (1); A driving mechanism (5) is installed on the inner wall of the storage cavity (4), a spraying mechanism (6) is installed on the top of the main body (1), a stirring mechanism (7) is installed on the outer wall of the driving mechanism (5), and a wastewater outlet pipe (8) is fixedly connected to the outer wall of the main body (1).

2. The wastewater treatment device for semiconductor industry according to claim 1, characterized in that: The driving mechanism (5) comprises a first motor (501) fixedly connected to the inner wall of the storage cavity (4); the output end of the first motor (501) is fixedly connected to a limited drive shaft (502); the bottom of the outer wall of the limited drive shaft (502) is fixedly connected to a first gear (503); the outer wall of the first gear (503) is meshed with a toothed belt (504); the inner walls of both ends of the toothed belt (504) are meshed with second gears (505); the inner walls of two second gears (505) are fixedly connected to threaded rods (506); and the outer walls of the two threaded rods (506) are rotatably connected to two movable ring plates (507).

3. The wastewater treatment device for semiconductor industry according to claim 2, characterized in that: The upper and lower ends of the two threaded rods (506) are rotatably connected to the main body (1) and the storage cavity (4) respectively, and the outer walls of the two movable ring plates (507) are slidably connected to the inner wall of the main body (1).

4. The wastewater treatment device for semiconductor industry according to claim 2, characterized in that: The spraying mechanism (6) comprises a rotating chassis (601) rotatably connected to the top of the main body (1); a medicine barrel (602) is fixedly connected to the top of the rotating chassis (601); a medicine inlet pipe (603) is fixedly connected to the outer wall of the medicine barrel (602); a plurality of spring-shaped pipes (604) are fixedly connected to the bottom of the medicine barrel (602); a nozzle (605) is provided at the other end of each of the plurality of medicine barrels (602); and a pipe buckle (606) is fixedly connected to the outer wall of each of the plurality of spring-shaped pipes (604).

5. The wastewater treatment device for semiconductor industry according to claim 4, characterized in that: The top of the position-limiting driving shaft (502) is fixedly connected to the rotating chassis (601), and the output ends of the plurality of spring-shaped pipes (604) all pass through the interior of the rotating chassis (601).

6. The wastewater treatment device for semiconductor industry according to claim 4, characterized in that: The stirring mechanism (7) comprises a limiting ring (701) slidably connected to the outer wall of the limiting driving shaft (502); the outer wall of the limiting ring (701) is rotatably connected to a plurality of first rotating shafts (702); the other ends of the plurality of first rotating shafts (702) are fixedly connected to a fan-shaped filter plate (703); the inner walls of the two movable ring plates (507) are connected to movable ring plates (704); the two movable ring plates (507) are provided with limiting grooves (705) on opposite sides; the inner surfaces of the two limiting grooves (705) are fixed to the inner surfaces of the two movable ring plates (507); The walls are slidably connected to a support plate (706), one side of the support plate (706) is fixedly connected to a second motor (707), the movable ring plate (704) is internally rotatably connected to a plurality of second rotating shafts (708), a plurality of fan-shaped filter plates (703) are fixedly connected to a fixed column (709) on one side close to the movable ring plate (704), the outer walls of the plurality of second rotating shafts (708) are fixedly connected to a fixed bar (710), and one side of the plurality of fixed bars (710) is rotatably connected to a connecting rod (711).

7. The wastewater treatment device for semiconductor industry according to claim 6, characterized in that: The outer walls of the plurality of tube buckles (606) are all fixedly connected to the movable ring plate (704).

8. The wastewater treatment device for semiconductor industry according to claim 6, characterized in that: One end of one of the second rotating shafts (708) is fixedly connected to the second motor (707), the other ends of the plurality of fixed columns (709) are respectively fixedly connected to the corresponding second rotating shafts (708), and a connecting rod (711) is rotatably connected between every two of the fixed bars (710).

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