Solid nanopore preparation device based on dielectric breakdown method
By using dielectric breakdown method and high-precision program-controlled voltage source and digital amperometer in solid-state nanopore preparation, the problems of high equipment cost and inaccurate preparation in the prior art are solved, and low-cost and high-efficiency nanopore preparation is achieved.
CN119574254APending Publication Date: 2025-03-07HENAN HUAZHIYUAN INTELLIGENT MANUFACTURING TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202411782994.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-06
- Publication Date
- 2025-03-07
AI Technical Summary
Technical Problem
The prior art when preparing solid-state nanopores, the equipment cost is high, it is difficult to produce on a large scale, and there is a lack of high-precision and controllable preparation device.
Method used
A solid-state nanopore preparation device based on dielectric breakdown method is adopted, and a high-precision program-controlled voltage source and digital amperometer are used to accurately control voltage and measure current to achieve accurate preparation of nanopores.
Benefits of technology
It realizes the preparation of solid nanopores with a minimum scale of 5nm with sub-nano precision under wet conditions, and has the advantages of low cost, high efficiency and easy industrial production.
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Figure CN119574254A_ABST
Abstract
The invention relates to the technical field of solid-state nanopore preparation, in particular to a solid-state nanopore preparation device based on a dielectric breakdown method, which comprises a hardware structure and a software structure, the hardware structure comprises a program control voltage source, a digital galvanometer, a sample to be processed, a reaction tank and a microcontroller used for controlling the program control voltage source and reading the current value of the galvanometer, and the microcontroller is connected to a computer through a signal cable. According to the method, the process of preparing the nanopore through dielectric breakdown is completely carried out in a solution environment, and compared with a method for preparing the nanopore through an ion beam or an electron beam, the occupied area is small, the equipment price is low, and the operation time is short; by means of a high-precision and high-stability program-controlled voltage source, the voltages on the two sides of the nano-film are precisely controlled, and the erosion rate of ions in a solution to the nano-film is precisely controlled; through a high-precision and high-stability digital galvanometer, the magnitude of current passing through the nano-film is precisely measured, and the dielectric breakdown process is monitored online in real time.
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