Glass production process improvement method

By treating electronic glass samples and spraying carbon, combining high-energy electron beam technology to detect the components of platinum defects, and adjusting glass production process parameters, the problem of inaccurate determination of defective components in electronic glass production is solved, and product quality is improved.

CN119638166APending Publication Date: 2025-03-18ZHEJIANG XINGKE OPTOELECTRONICS TECHNOLOGY CO LTD +1
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Patent Information

Application Number
CN202411972224.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-30
Publication Date
2025-03-18

AI Technical Summary

Technical Problem

During the electronic glass production process, the product quality is poor due to the inability to accurately determine the components of platinum defects.

Method used

By obtaining samples, the platinum defects are exposed, carbon spraying is performed, the specific components of the platinum defects are detected by high-energy electron beam technology, and the parameters of the glass production process are adjusted according to the inspection results.

Benefits of technology

It effectively solves the problem of poor product quality caused by the inability to accurately determine defective ingredients, and improves the quality of glass products.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention provides a glass production process improvement method which comprises the following steps: acquiring a sample with platinum defects; treating the sample to expose the platinum defect; the platinum defect exposed surface is subjected to carbon spraying treatment; detecting specific components of platinum defects by using a high-energy electron beam technology; and adjusting parameters of the glass production process according to the inspection result. According to the technical scheme, the problem that in the prior art, in the electronic glass production process, due to the fact that defect components cannot be accurately determined, the product quality is poor is effectively solved.
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Description

Technical Field

[0001] The present application relates to the technical field of glass production, and in particular to a method for improving a glass production process. Background Art

[0002] Electronic glass has very strict requirements on glass defects. The number of defects allowed on the entire large glass plate shall not exceed 2, which places extremely stringent requirements on product quality.

[0003] When using platinum-rhodium alloy as a conveying device for molten glass, the high-temperature molten glass is corrosive to the platinum-rhodium alloy material and will corrode some platinum-rhodium metal particles. On the other hand, the long-term high-temperature environment causes the platinum-rhodium alloy material to volatilize and crystallize and fall into the molten glass, resulting in platinum defects in the formed glass plate, affecting the quality of the glass.

[0004] Because some platinum defects are small in size, the general liquid phase testing method after glass melting cannot accurately test the true content of different elements in platinum defects, such as CN110849911A. Summary of the invention

[0005] A technical problem to be solved by the present application is that in the production process of electronic glass, there is a problem of poor product quality due to the inability to accurately determine defective components.

[0006] In order to solve the above technical problems, the present application provides a method for improving the glass production process.

[0007] A glass production process improvement method provided in the present application comprises the following steps:

[0008] obtaining a sample, the sample having a platinum defect;

[0009] The samples were treated to expose platinum defects;

[0010] Carbon spray treatment is performed on the exposed surface of platinum defects;

[0011] Using high-energy electron beam technology to examine the specific composition of platinum defects;

[0012] Adjust the parameters of the glass production process based on the inspection results.

[0013] In some embodiments, the method for improving the glass production process further comprises the steps of:

[0014] Observe samples with platinum defects using a microscope;

[0015] Record the location coordinates of the platinum defect (x1, x2, y1, y2, z1, z2);

[0016] Get the location and size of platinum defects;

[0017] in,

[0018] x1 is the x-axis coordinate reading of the point where the platinum defect is closest to the yoz plane;

[0019] x2 is the x-axis coordinate reading of the farthest point of the platinum defect from the yoz plane;

[0020] y1 is the y-axis coordinate reading of the point where the platinum defect is closest to the xoz plane;

[0021] y2 is the y-axis coordinate reading of the farthest point of the platinum defect from the xoz plane;

[0022] z1 is the z-axis coordinate reading of the point closest to the xoy plane where the platinum defect is located;

[0023] Z2 is the z-axis coordinate reading of the farthest point of the platinum defect from the xoy plane.

[0024] In some embodiments, the sample is treated to expose platinum defects, comprising the steps of:

[0025] When the platinum defect is located on the surface of the sample, subsequent treatment can be carried out directly;

[0026] When the platinum defect is located inside the sample, the sample needs to be processed to expose the platinum defect. In some embodiments, the sample is processed to expose the platinum defect, comprising the steps of:

[0027] When the platinum defect is located inside the sample, the sample is placed on a cutting table;

[0028] Mark the cutting points according to the position coordinates of the platinum defects;

[0029] According to the marked position, the sample is cut to expose the platinum defect;

[0030] If the cut surface has not passed through the platinum defect, grind the cut surface until the platinum defect is exposed.

[0031] In some embodiments, the method for improving the glass production process further comprises the steps of:

[0032] After the platinum defects are exposed, the end faces and cut surfaces of the samples are polished;

[0033] After polishing, the sample is placed in the carbon spraying equipment.

[0034] In some embodiments, the glass production process improvement method meets the following requirements:

[0035] The surface roughness of the polished end face and the cut surface is less than 0.1 μm.

[0036] In some embodiments, the exposed surface of the platinum defect is subjected to carbon spraying treatment, comprising the steps of:

[0037] The sample with exposed platinum defects is placed in the cabin of the carbon spraying equipment and directly below the contact point of the carbon rod;

[0038] Evacuate the cabin;

[0039] By adjusting the temperature inside the chamber and the current, carbon atoms evaporate and move to the surface of the sample, so that the defective surface of the platinum has a carbon coating.

[0040] In some embodiments, testing the specific composition of the platinum defect includes the steps of:

[0041] The carbon-coated samples were examined using a scanning electron microscope to determine the composition of the platinum defects.

[0042] In some embodiments, testing the specific composition of the platinum defect includes the steps of:

[0043] The samples with carbon coating were tested using electron probe equipment to obtain the composition of platinum defects.

[0044] In some embodiments, adjusting the process parameters according to the inspection results comprises the steps of:

[0045] The glass production process parameters are adjusted based on the composition, location and size of the platinum defects.

[0046] Through the above technical scheme, the improved method of glass production process provided by the present application cuts off the part with platinum defects on the product, obtains samples, and further processes the samples to expose the platinum defects to facilitate carbon spraying treatment of the platinum defects. After carbon spraying treatment, secondary electrons and backscattered electrons are excited by high-energy electron beams to obtain the morphological image and component composition of the platinum defects, or the platinum defects are excited to produce characteristic x-rays, and the elemental content and distribution of the platinum defects are determined by analyzing the wavelength and intensity of the rays, and the parameters of the glass production process are improved according to the specific composition of the platinum defects to avoid the generation of platinum defects. The technical scheme of the present application effectively solves the problem of poor product quality in the production process of electronic glass in the prior art due to the inability to accurately determine the defective components. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0048] Figure 1 A schematic diagram of the process of improving the glass production process of the present application is shown;

[0049] Figure 2 Shows Figure 1 Schematic diagram of platinum defects under a microscope for improving glass production process;

[0050] Figure 3 Shows Figure 1 Schematic diagram of the position coordinates of platinum defects in the glass production process improvement method;

[0051] Figure 4 Shows Figure 1 A schematic diagram of the cutting position of the glass production process improvement method;

[0052] Figure 5 Shows Figure 1 A schematic diagram of a cutting section of an improved method for glass production process;

[0053] Figure 6 A schematic diagram showing the morphology of platinum defects in Example 1 is shown;

[0054] Figure 7 A schematic diagram showing the morphology of platinum defects in Example 2 is shown;

[0055] Figure 8 A schematic diagram showing the morphology of platinum defects in Example 3 is shown;

[0056] Fig. 9 A schematic diagram of the morphology of platinum defects in Example 4 is shown.

[0057] Description of reference numerals:

[0058] 10. Sample; 11. Platinum defects. DETAILED DESCRIPTION

[0059] The following is a further detailed description of the implementation methods of the present application in conjunction with the accompanying drawings and examples. The detailed descriptions and drawings of the following examples are used to exemplarily illustrate the principles of the present application, but cannot be used to limit the scope of the present application. The present application can be implemented in many different forms and is not limited to the specific embodiments of the present application, but includes all technical solutions that fall within the scope of the claims.

[0060] The present application provides these embodiments to make the present application thorough and complete, and to fully express the scope of the present application to those skilled in the art. It should be noted that unless otherwise specifically stated, the relative arrangement of the parts and steps, the composition of the materials, the numerical expressions and the numerical values ​​set forth in these embodiments should be interpreted as being merely exemplary, and not as limiting.

[0061] It should be noted that, in the description of this application, unless otherwise specified, the meaning of "multiple" is greater than or equal to two; the terms "upper", "lower", "left", "right", "inner", "outer", etc., indicating the orientation or positional relationship, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0062] In addition, the words "first", "second" and similar words used in this application do not indicate any order, quantity or importance, but are only used to distinguish different parts. "Vertical" does not mean vertical in the strict sense, but is within the tolerance range. "Parallel" does not mean parallel in the strict sense, but is within the tolerance range. "Include" or "comprising" and similar words mean that the elements before the word include the elements listed after the word, and do not exclude the possibility of including other elements.

[0063] It should also be noted that in the description of this application, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances. When a specific device is described as being located between a first device and a second device, there may or may not be an intermediate device between the specific device and the first device or the second device.

[0064] All terms used in this application have the same meaning as those understood by those of ordinary skill in the art to which this application belongs, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries, such as general dictionaries, should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and should not be interpreted in an idealized or extremely formal sense, unless explicitly defined herein.

[0065] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.

[0066] like Figures 1 to 9 As shown, the glass production process improvement method disclosed in the present application comprises the following steps:

[0067] Obtaining a sample 10, the sample 10 having a platinum defect 11;

[0068] The sample 10 is processed to expose the platinum defect 11;

[0069] Carbon spray treatment is performed on the exposed surface of the platinum defect 11;

[0070] Using high-energy electron beam technology to examine the specific composition of platinum defects 11;

[0071] Adjust the parameters of the glass production process based on the inspection results.

[0072] By using the improved glass production process method of the present application, the part with the platinum defect 11 on the product is cut off to obtain a sample 10, and the sample 10 is further processed to expose the platinum defect 11 to facilitate carbon spraying treatment at the platinum defect 11. After the carbon spraying treatment, the secondary electrons and backscattered electrons are excited by a high-energy electron beam to obtain the morphological image and component composition of the platinum defect 11, or the platinum defect 11 is excited to generate characteristic x-rays, and the elemental content and distribution of the platinum defect 11 are determined by analyzing the wavelength and intensity of the rays, and the parameters of the glass production process are improved according to the specific composition of the platinum defect 11 to avoid the generation of the platinum defect 11. The technical solution of the present application effectively solves the problem of poor product quality in the production process of electronic glass in the prior art due to the inability to accurately determine the defective components.

[0073] like Figures 1 to 3 As shown, in the technical solution of the present application, the method for improving the glass production process also includes the steps of:

[0074] Observing a sample 10 with a platinum defect 11 using a microscope;

[0075] Record the position coordinates x1, x2, y1, y2, z1, z2 of the platinum defect 11;

[0076] Obtaining the position and size of the platinum defect 11;

[0077] in,

[0078] x1 is the x-axis coordinate reading of the point closest to the platinum defect 11 from the yoz plane;

[0079] x2 is the x-axis coordinate reading of the farthest point of the platinum defect 11 from the yoz plane;

[0080] y1 is the y-axis coordinate reading of the point closest to the xoz plane of the platinum defect 11;

[0081] y2 is the y-axis coordinate reading of the farthest point of the platinum defect 11 from the xoz plane;

[0082] z1 is the z-axis coordinate reading of the point closest to the xoy plane of the platinum defect 11;

[0083] z2 is the z-axis coordinate reading of the farthest point of platinum defect 11 from the xoy plane.

[0084] A rectangular sample 10 containing a platinum defect 11 is cut from the glass product. A spatial rectangular coordinate system is established with one of the vertices of the sample 10 as the coordinate origin and the three edges intersecting the vertex as axes to obtain the position coordinates x1, x2, y1, y2, z1, z2 of the platinum defect 11. The specific position of the platinum defect 11 in the product is calculated based on the position of the sample 10 on the glass product. The microscope is a "super-depth three-dimensional microscope VHX-5000". The sample 10 is placed on the stage of the microscope. The x-axis and y-axis coordinates can be read through the scale on the stage. The microscope barrel can be adjusted to read the z-axis coordinate. The scale of the stage is a movable transparent scale to avoid blocking the sample 10 during observation.

[0085] like Figure 1 As shown, in the technical solution of the present application, the sample 10 is processed to expose the platinum defect 11, including the steps of:

[0086] When the platinum defect 11 is located on the surface of the sample 10, subsequent processing can be performed directly;

[0087] When the platinum defect 11 is located inside the sample 10 , the sample 10 needs to be processed to expose the platinum defect 11 .

[0088] The coordinates of the origin of sample 10 are (0,0,0), and the coordinates of the vertex opposite to the origin are (X,Y,Z). When any of the position coordinates x1, x2, y1, y2, z1, z2 of the platinum defect 11 has a reading of 0, any of x1, x2 is equal to X, any of y1, y2 is equal to Y, and any of z1, z2 is equal to Z, and any one of these four conditions is satisfied, it means that the platinum defect 11 is located on the surface of sample 10, and no additional treatment is required to expose the platinum defect.

[0089] like Figure 1 , Figure 4 and Figure 5 As shown, in the technical solution of the present application, the sample 10 is processed to expose the platinum defect 11, including the steps of:

[0090] When the platinum defect 11 is located inside the sample 10, the sample 10 is placed on a cutting table;

[0091] Mark the cutting point according to the position coordinates of the platinum defect 11;

[0092] According to the marked position, the sample 10 is cut to expose the platinum defect 11;

[0093] If the cutting surface does not pass through the platinum defect 11, the cutting surface is polished until the platinum defect 11 is exposed. When the platinum defect 11 is located inside the sample 10, the sample 10 is moved to the cutting workbench, which is made of marble and has a smooth surface. The cutting workbench also includes an observation lamp and a mounting frame, which is fixed on the workbench. The mounting frame also includes a vertical guide rail module and a horizontal guide rail module. The vertical guide rail module is connected to the output end of the horizontal guide rail module. The observation lamp is rotatably connected to the vertical guide rail module. Through the coordinated control of the vertical guide rail module and the horizontal guide rail module, the irradiation position of the observation lamp can be changed. Rotating the observation lamp can also change the illumination angle, which is suitable for the observation of platinum defects 11 of different sizes, positions and shapes. Mark the glass surface according to the position coordinates x1, x2, y1, y2, z1, z2 of the platinum defect 11, and cut the sample 10 with a diamond glass knife according to the marked position to expose the platinum defect 11 located inside. Since the platinum defect 11 is small in size, it is easy for the platinum defect 11 to fail to be exposed due to position observation errors, crooked cutting by the cutting knife, etc. When this problem occurs, select an end face closest to the platinum defect 11 and polish the end face with sandpaper or the like until the platinum defect 11 is exposed.

[0094] like Figure 1 As shown, in the technical solution of the present application, the method for improving the glass production process also includes the steps of:

[0095] After the platinum defect 11 is exposed, the end face and the cut surface of the sample 10 are polished;

[0096] After polishing, the sample 10 is placed in a carbon spraying device.

[0097] like Figure 1 As shown, in the technical solution of this application, the glass production process improvement method meets the following requirements:

[0098] The surface roughness of the polished end face and the cut surface is less than 0.1 μm.

[0099] When the roughness of the end face and the cut surface is greater than 0.1 μm, the surface of the sample 10 is uneven, and a large number of carbon atoms adhere to the surface of the end face and the cut surface during carbon spraying, which is not conducive to subsequent observation and causes waste of carbon spraying raw materials.

[0100] like Figure 1 As shown, in the technical solution of the present application, the exposed surface of the platinum defect 11 is subjected to carbon spraying treatment, including the steps of:

[0101] The sample 10 with the exposed platinum defect 11 is placed in the cabin of the carbon spraying equipment and directly below the contact point of the carbon rod;

[0102] Evacuate the cabin;

[0103] The temperature inside the chamber and the current are adjusted to cause carbon atoms to evaporate and move to the surface of the sample 10, so that the surface of the platinum defect 11 has a carbon coating.

[0104] The carbon spraying equipment is "Zhongke Keyi SBC-2-1", turn on the "power" and "deflate" buttons on the carbon spraying equipment, and when the vacuum degree is 10×105Pa, open the glass cover; prepare the sample to be sprayed on the sample table according to the requirements of the test equipment, and place it directly below the contact point of the two carbon rods; turn on the "low vacuum" button, then the mechanical pump works and evacuates to 5Pa; turn on the "high vacuum" button, then the molecular pump works, the maximum speed reaches 704r / s, and the vacuum is evacuated to 8×10-4Pa; turn on the "evaporation 1" button; adjust the "current" knob to 8~10A, observe the decrease in vacuum degree, and carbon spraying can be carried out only when it stabilizes at n×10-3Pa. ; Adjust the "current" knob to increase the value until ion radiation occurs. When the film layer reaches the required thickness, adjust the "current" knob to zero; turn off the "evaporation 1" button; turn off the "high vacuum" button until the mechanical pump is turned off; after the mechanical pump stops working, turn on the "deflate" button, and when the vacuum degree reaches 10×105Pa, open the glass cover, take out the sample coated with carbon film for subsequent testing, remove the used carbon rod, and grind the tip and the bevel plane to meet the spraying requirements; put the glass cover back on the platform, confirm that the position is centered, turn on the "low vacuum" button, and evacuate to 5Pa; when the vacuum degree reaches 5Pa, turn off the "low vacuum" and "power" buttons in turn to complete a spraying. Both carbon spraying and gold spraying techniques can coat the sample surface with a layer of conductive material. It is very important to process the surface conductivity of non-conductive samples, thereby improving the quality of subsequent images.

[0105] like Figure 1 As shown, in the technical solution of the present application, the specific composition of the platinum defect 11 is inspected, including the steps of:

[0106] The sample 10 with the carbon coating was examined by scanning electron microscopy to obtain the composition of the platinum defect 11.

[0107] According to actual needs, if only an approximate composition is needed, a scanning electron microscope can be used to detect the composition of the platinum defect 11. Usually, a scanning electron microscope can meet production needs.

[0108] like Figure 6 The figures show the microscope morphology and secondary electron morphology of the platinum defect 11 in Example 1. Table 1 shows the composition analysis results of the platinum defect 11 in Example 1.

[0109] Table 1

[0110]

[0111] like Figure 7The figures show the microscope morphology and secondary electron morphology of the platinum defect 11 in Example 2. Table 2 shows the composition analysis results of the platinum defect 11 in Example 2.

[0112] Table 2

[0113]

[0114] like Figure 1 As shown, in the technical solution of the present application, the specific composition of the platinum defect 11 is inspected, including the steps of:

[0115] The sample 10 with the carbon coating is detected by an electron probe device to obtain the composition of the platinum defects 11.

[0116] Compared with scanning electron microscope, the detection results of electron probe equipment are more accurate. After qualitative scanning with electron probe equipment, the electron probe is used to quantitatively and accurately test the content of each element in the defect.

[0117] like Figure 8 The figures show the microscope morphology and secondary electron morphology of the platinum defect 11 in Example 3. Table 3 shows the composition analysis results of the platinum defect 11 in Example 3.

[0118] Table 3

[0119]

[0120] like Fig. 9 Shown are the microscope morphology and secondary electron morphology of the platinum defect 11 of Example 4.

[0121] Table 4 is the composition analysis result of the platinum defect 11 in Example 4. Table 4

[0122]

[0123] like Figure 1 As shown, in the technical solution of the present application, adjusting the process parameters according to the inspection results includes the steps of:

[0124] Adjust the glass production process parameters based on the composition, position and size of the platinum defect 11. According to the composition of the platinum defect 11, the position coordinates of the platinum defect 11, and the position coordinates, the specific position of the platinum defect 11 in the product and the morphological characteristics of the product can be calculated, and the approximate size of the platinum defect can be calculated based on the morphological characteristics and position coordinates. Combined with the above data, the specific parameters in the process parameters that cause the appearance of the platinum defect 11 are analyzed and changed to improve the process.

[0125] Based on the above, the application steps include:

[0126] After receiving the defective sample, use a microscope to observe the defect type and defect depth: adjust the microscope magnification, observe the morphological characteristics of the defect to be detected, determine the specific XY axis position of the defect in the glass according to the scale on the microscope stage, and adjust the microscope barrel to determine the position of the defect in the Z axis direction;

[0127] The ruler on the stage is a transparent ruler with a movable slot, which does not affect the observation of the sample under the transmission microscope;

[0128] According to the defect position tested by the microscope, mark it, place it on the marble platform, turn on the observation light, and use a diamond glass knife to cut the marked XY position from the surface far from the Z axis position of the defect, cutting the defect position or the near defect position;

[0129] A battery-powered observation lamp is installed on the marble platform to facilitate the clear observation of the marking position and the cutting of defective samples;

[0130] According to the defect cutting situation, use coarse / fine sandpaper for grinding, determine the grinding time according to the size of the cutting surface from the defect, and observe the exposure of the grinding defect in real time. After the grinding defect is exposed, polish it with a polishing disc to ensure that there is no grinding mark (traces left by sandpaper grinding) on ​​the cross section and the cross section is smooth and flat;

[0131] Observe the defect position under a microscope, locate the cross section, and perform carbon spraying on the sample;

[0132] Place it in a scanning electron microscope or electron probe equipment to test the defective components and determine the defective components;

[0133] Feedback the test results to the process personnel to determine the location of the defects, take corresponding process countermeasures, solve the defects, and improve the product yield;

[0134] This sample preparation method is suitable for the preparation and testing of solid defects inside and near the surface of glass.

[0135] So far, the embodiments of the present application have been described in detail. In order to avoid obscuring the concept of the present application, some details known in the art are not described. Based on the above description, those skilled in the art can fully understand how to implement the technical solution of the present application.

[0136] Although some specific embodiments of the present application have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present application. It should be understood by those skilled in the art that the above embodiments may be modified or some technical features may be replaced by equivalents without departing from the scope and spirit of the present application. In particular, the various technical features mentioned in the various embodiments may be combined in any manner as long as there is no structural conflict.

Claims

1. A method for improving glass production process, characterized in that: The glass production process improvement method comprises the following steps: Obtaining a sample (10), wherein the sample (10) has a platinum defect (11); Treating the sample (10) to expose the platinum defect (11); Carburizing the exposed surface of the platinum defect (11); Using high energy electron beam technology to examine the specific composition of the platinum defect (11); Adjust the parameters of the glass production process based on the inspection results.

2. The glass production process improvement method according to claim 1, characterized in that: The glass production process improvement method further comprises the steps of: Observing the sample (10) with the platinum defect (11) using a microscope; Recording the position coordinates (x1, x2, y1, y2, z1, z2) of the platinum defect (11); Obtaining the position and size of the platinum defect (11); in, x1 is the x-axis coordinate reading of the point closest to the platinum defect (11) from the yoz plane; x2 is the x-axis coordinate reading of the farthest point of the platinum defect (11) from the yoz plane; y1 is the y-axis coordinate reading of the point closest to the platinum defect (11) from the xoz plane; y2 is the y-axis coordinate reading of the farthest point of the platinum defect (11) from the xoz plane; z1 is the z-axis coordinate reading of the point closest to the platinum defect (11) on the xoy plane; z2 is the z-axis coordinate reading of the farthest point of the platinum defect (11) from the xoy plane.

3. The method for improving glass production process according to claim 2, characterized in that: The sample (10) is processed to expose the platinum defect (11), comprising the steps of: When the platinum defect (11) is located on the surface of the sample (10), subsequent processing can be directly performed; When the platinum defect (11) is located inside the sample (10), the sample (10) needs to be processed to expose the platinum defect (11).

4. The method for improving glass production process according to claim 2, characterized in that: The sample (10) is processed to expose the platinum defect (11), comprising the steps of: When the platinum defect (11) is located inside the sample (10), placing the sample (10) on a cutting table; Marking the cutting point according to the position coordinates of the platinum defect (11); According to the marked position, cutting the sample (10) to expose the platinum defect (11); If the cutting surface does not pass through the platinum defect (11), the cutting surface is polished until the platinum defect (11) is exposed.

5. The method for improving glass production process according to claim 4, characterized in that: The glass production process improvement method further comprises the steps of: After the platinum defect (11) is exposed, the end face and the cut surface of the sample (10) are polished; After polishing, the sample (10) is placed in a carbon spraying device.

6. The method for improving glass production process according to claim 5, characterized in that: The glass production process improvement method meets the following requirements: The surface roughness of the polished end face and the cut face is less than 0.1 μm.

7. The method for improving glass production process according to claim 2, characterized in that: The exposed surface of the platinum defect (11) is subjected to carbon spraying treatment, comprising the steps of: The sample (10) with the exposed platinum defect (11) is placed in the cabin of the carbon spraying equipment and is located directly below the contact point of the carbon rod; Vacuuming the cabin; The temperature inside the chamber and the current are adjusted to cause carbon atoms to evaporate and move to the surface of the sample (10), so that the surface of the platinum defect (11) has a carbon coating.

8. The method for improving glass production process according to claim 7, characterized in that: Checking the specific composition of the platinum defect (11) comprises the steps of: The sample (10) with the carbon coating is detected by a scanning electron microscope to obtain the composition of the platinum defect (11).

9. The method for improving glass production process according to claim 7, characterized in that: Checking the specific composition of the platinum defect (11) comprises the steps of: The sample (10) with the carbon coating is detected by an electron probe device to obtain the composition of the platinum defect (11).

10. The method for improving glass production process according to claim 8, characterized in that: Adjust the process parameters according to the inspection results, including the following steps: The glass production process parameters are adjusted based on the composition, position and size of the platinum defect (11).

Citation Information

Patent Citations

  • Glass defect image acquisition device, glass defect detection equipment and detection method

    CN110849911A