Liquid supply pressure regulating system

By designing a liquid supply and pressure regulating system for semiconductor processes, and using the adjustment port to discharge liquid to adjust the liquid pressure, the problem of automatic pressure regulating when the liquid outlet is closed in the prior art is solved, and the production capacity of the equipment is improved.

CN119642112APending Publication Date: 2025-03-18KINGSEMI CO LTD
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Patent Information

Application Number
CN202411921444.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-25
Publication Date
2025-03-18

AI Technical Summary

Technical Problem

In the semiconductor process, the prior art, in the high-pressure chemical liquid liquid supply system, the pressure cannot be adjusted automatically when the liquid outlet is closed, resulting in production time and reducing equipment production capacity.

Method used

A liquid supply and pressure regulating system is designed, including a liquid supply section, a liquid outlet pipe, a high-pressure pump, a pressure regulating device and a control member. The liquid pressure is adjusted through the adjustment port to achieve automatic pressure regulation when the liquid outlet is closed.

Benefits of technology

It realizes that when the liquid outlet is closed, the increase or decrease adjustment of the pressure of high-pressure chemical liquid is automatically completed, avoiding the consumption of production time and improving the production capacity of the equipment.

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Patent Text Reader

Abstract

The invention discloses a liquid supply pressure regulating system which comprises a liquid supply part. One end of the liquid outlet pipeline is communicated with the liquid supply part, and the other end of the liquid outlet pipeline is a liquid outlet; the high-pressure pump is arranged on the liquid outlet pipeline so as to control the pressure of liquid in the liquid outlet pipeline; the pressure adjusting device is arranged on the liquid outlet pipeline in a communicating mode and arranged between the high-pressure pump and the liquid outlet, the pressure adjusting device is provided with an adjusting opening, and the adjusting opening is used for discharging liquid in the pressure adjusting device so as to adjust the pressure of the liquid; the control piece is arranged on the pressure adjusting device so as to control the opening degree of the adjusting opening. On the premise that the liquid outlet is closed, the pressure of the high-pressure chemical liquid in the liquid supply pressure regulating system can be automatically increased or decreased, when the valve needs to be opened for liquid outlet work, the pressure is adjusted, and the purpose of not influencing the productivity is achieved.
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Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and in particular to a liquid supply pressure regulating system. Background Art

[0002] In the semiconductor industry, especially in the process of degumming and stripping, there are usually photoresist and metal films on the surface of wafers or other substrates. High-pressure chemical liquids need to be sprayed onto the surface to strip the photoresist and metal films from the surface of wafers or other substrates without damaging the electronic devices on the surface, and to remove the residual photoresist on the surface. However, with the development of semiconductor technology, the diversification of substrate materials and the differentiation of structural characteristics of electronic devices, higher requirements are placed on the liquid supply system of high-pressure chemical liquids in equipment, such as automatic and rapid pressure regulation function and higher pressure stability.

[0003] The patent with publication number CN215722576U discloses a high-pressure pipeline pressure control system, which includes a liquid supply part and a pressure regulating part. The liquid supply part is composed of a liquid supply tank, a high-pressure pump, and an accumulator, and is responsible for providing high-pressure liquid with stable and constant pressure to the system. The pressure regulating part is composed of an operating system, a high-pressure pressure regulating device, a reflux pipeline diagram, and a plurality of pressure sensors. By forming a closed-loop pressure regulating pipeline, the continuous regulation and stable output of the liquid pressure at the outlet are achieved. In this system, the liquid inlet pipe of the high-pressure pump is connected to the liquid tank, and the liquid outlet pipe of the high-pressure pump is connected to the liquid inlet of the high-pressure pressure regulating device through a pressure stabilizing device and a pressure sensor. A reflux port opening control valve is installed inside the high-pressure pressure regulating device, and the reflux port pipeline is connected to the liquid supply tank. This valve is controlled by the operating system and forms a closed-loop control system with multiple pressure sensors in the system. Pressure sensors are installed on the high-pressure pressure regulating device and at the outlet of the liquid supply pipeline. When the system is working, the operating system obtains the liquid pressure value from the pressure sensor, and outputs a control signal to the reflux opening regulating valve of the high-pressure pressure regulating device according to the liquid pressure value; the valve adjusts the liquid flow rate returning through the valve according to the signal, thereby achieving the purpose of regulating the liquid pressure inside the cavity of the high-pressure pressure regulating device and in the main liquid supply path.

[0004] The existing technology can only automatically increase or decrease the liquid pressure in the high-pressure pipeline system under the premise of spraying liquid at the liquid outlet; increasing or decreasing the pressure by spraying liquid at the nozzle will take up the chip production time, that is, reduce the production capacity of the equipment. The longer the pressure adjustment time, the more the production capacity is reduced.

[0005] Therefore, it is necessary to provide a new liquid supply pressure regulating system to solve the above problems existing in the prior art. Summary of the invention

[0006] The purpose of the present invention is to provide a liquid supply and pressure regulating system for processing wafers or substrates in the semiconductor field. It can automatically increase or decrease the pressure of high-pressure chemical liquid in the liquid supply and pressure regulating system under the premise that the liquid outlet is closed. When it is necessary to open the valve to discharge the liquid, the pressure has been adjusted, thereby achieving the purpose of not affecting production capacity.

[0007] To achieve the above object, the technical solution of the present invention is as follows: A liquid supply pressure regulating system comprises a liquid supply part; A liquid outlet pipe, one end of which is connected to the liquid supply part and the other end of which is a liquid outlet; A high-pressure pump, disposed in the liquid outlet pipeline, to control the liquid pressure in the liquid outlet pipeline; A pressure regulating device, connected to the liquid outlet pipe and placed between the high-pressure pump and the liquid outlet, wherein the pressure regulating device has a regulating port, and the regulating port is used to discharge the liquid in the pressure regulating device to regulate the liquid pressure; A control component is arranged on the pressure regulating device to control the opening of the regulating port.

[0008] By adopting the above technical solution, there is no need to increase or decrease the pressure by spraying liquid through the liquid outlet. During the pressure regulation process, the pressure reduction process is completed by discharging liquid through the regulating port. That is, under the premise that the liquid outlet is closed, the pressure increase or decrease of the high-pressure chemical liquid in the liquid supply and pressure regulating system is automatically completed. When it is necessary to open the valve to discharge the liquid, the pressure has been adjusted, thereby achieving the purpose of not affecting the production capacity.

[0009] Optionally, a control system is also included, and the control system includes: An operating system, electrically connected to the voltage regulating device and the control element; Sensor set, including: a first pressure sensor, arranged in the liquid outlet pipe and placed between the pressure regulating device and the liquid outlet, and electrically connected to the operating system to detect the pressure of the liquid discharged from the liquid outlet; a second pressure sensor, disposed in the liquid outlet pipe and placed between the high-pressure pump and the pressure regulating device, and electrically connected to the operating system to detect the pressure of the liquid passing through the high-pressure pump; The third pressure sensor is arranged in the pressure regulating device and electrically connected to the operating system to detect the liquid pressure in the pressure regulating device.

[0010] By adopting the above technical solution, multiple sensors are set to detect the liquid pressure at different positions of the liquid pipeline respectively, and feed back to the operating system, so that the pressure regulation response is rapid, the pressure increase or decrease speed in the liquid supply pressure regulation system is fast, the adjustment time is short, and the impact on production capacity is small. It can improve the problem of the prior art that when adding a pressure stabilizing device for pressure boost regulation, it is necessary to first increase the pressure in the pressure stabilizing device to a predetermined pressure, resulting in a long pressure boost time.

[0011] Optionally, a control system is also included, and the control system includes: An operating system, electrically connected to the voltage regulating device and the control element; Sensor set, including: The first pressure sensor is arranged in the liquid outlet pipe and placed between the pressure regulating device and the liquid outlet, and is electrically connected to the operating system to detect the pressure of the liquid discharged from the liquid outlet.

[0012] By adopting the above technical solution, a first pressure sensor is provided to detect and feedback the pressure of the liquid discharged from the liquid outlet, and the operating system can control the actions of other components through the feedback of the first pressure sensor.

[0013] Optionally, a control system is also included, and the control system includes: An operating system, electrically connected to the voltage regulating device and the control element; Sensor set, including: a first pressure sensor, arranged in the liquid outlet pipe and placed between the pressure regulating device and the liquid outlet, and electrically connected to the operating system to detect the pressure of the liquid discharged from the liquid outlet; The second pressure sensor is arranged in the liquid outlet pipe and placed between the high-pressure pump and the pressure regulating device, and is electrically connected to the operating system to detect the pressure of the liquid passing through the high-pressure pump.

[0014] By adopting the above technical solution, a first pressure sensor and a second pressure sensor are set to detect and feedback the pressure of the liquid discharged from the liquid outlet and the pressure of the liquid passing through the high-pressure pump. The operating system can control the action of other components through the feedback of the first pressure sensor and the second pressure sensor.

[0015] Optionally, a control system is also included, and the control system includes: An operating system, electrically connected to the voltage regulating device and the control element; Sensor set, including: a first pressure sensor, arranged in the liquid outlet pipe and placed between the pressure regulating device and the liquid outlet, and electrically connected to the operating system to detect the pressure of the liquid discharged from the liquid outlet; The third pressure sensor is arranged in the pressure regulating device and electrically connected to the operating system to detect the liquid pressure in the pressure regulating device.

[0016] By adopting the above technical solution, a first pressure sensor and a third pressure sensor are set to detect and feedback the pressure of the liquid discharged from the liquid outlet and the liquid pressure in the pressure regulating device. The operating system can control the action of other components through the feedback of the first pressure sensor and the third pressure sensor.

[0017] Optionally, the liquid outlet pipeline is provided with a pressure stabilizing device, which is arranged between the high-pressure pump and the pressure regulating device and cooperates with the high-pressure pump to adjust the liquid pressure in the liquid outlet pipeline.

[0018] By adopting the above technical scheme, the voltage stabilizing device cooperates with the overall voltage regulating system, and the voltage stabilizing range is adjusted by controlling the opening of the regulating port, so that the overall voltage regulating system can cover the use requirements of high-pressure processes such as semiconductor stripping process and stripping process, that is, while meeting the pressure stability requirements of high-pressure processes such as semiconductor stripping process and stripping process, it can achieve the advantage of a wide controllable pressure range from high pressure to low pressure.

[0019] Optionally, the regulating port is connected to the liquid supply portion to circulate the liquid.

[0020] By adopting the above technical solution, the regulating port is connected with the liquid supply part, and the liquid discharged during the pressure regulation process can enter the liquid supply part to complete the circulation of the liquid and reduce the waste of liquid.

[0021] Optionally, the high-pressure pump is electrically connected to the operating system; In a working state, the operating system receives pressure feedback from a sensor to adjust the pressure of the high-pressure pump according to the pressure feedback.

[0022] By adopting the above technical solution, the high-pressure pump can be electrically connected to the operating system or not. When the high-pressure pump is electrically connected to the operating system, the operating system can adjust the pressure of the high-pressure pump through pressure feedback from the sensor to adjust the liquid pressure in the liquid outlet pipeline.

[0023] Optionally, a regulating cylinder is fixedly provided on the liquid outlet pipe; One end of the adjusting cylinder is communicated with the liquid outlet, and the other end is fixedly provided with an adjusting member, and the adjusting member is used to adjust the shape of the adjusting cylinder.

[0024] By adopting the above technical solution, the adjusting member adjusts the shape of the adjusting cylinder. In actual use, the shape of the adjusting cylinder can be adjusted according to use requirements.

[0025] Optionally, the adjusting member includes: A symmetrically arranged adjusting rod, wherein the middle portion of the adjusting rod is arranged in an arc shape, and the middle portion of the adjusting rod is fixedly arranged on the side wall of the adjusting cylinder; The driving member is fixedly arranged at the end of the adjusting rod and is used for driving the adjusting rod to move so that the middle part of the adjusting rod is deformed to change the shape of the adjusting cylinder.

[0026] By adopting the above technical solution, the driving member drives the adjusting rod to move, thereby adjusting the opening shape of the adjusting cylinder to facilitate adapting to different working conditions.

[0027] The beneficial effects of the liquid supply pressure regulating system provided by the present invention include at least: 1. It can automatically increase or decrease the pressure of high-pressure chemical liquid in the liquid supply and pressure regulating system under the premise of closing the liquid outlet. When the valve needs to be opened to discharge liquid, the pressure has been adjusted, so as not to affect the production capacity; 2. Rapid pressure regulation response, fast pressure increase or decrease speed in the liquid supply pressure regulation system, short adjustment time and little impact on production capacity; 3. While meeting the pressure stability requirements of high-pressure processes such as semiconductor degumming process and stripping process, it can achieve the advantage of a wide range of controllable pressure from high pressure to low pressure. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 A schematic diagram of the main structure connection relationship of a liquid supply pressure regulating system according to an embodiment of the present invention; Figure 2 A schematic diagram of the connection relationship between a high-pressure pump and an operating system of a liquid supply pressure regulating system according to an embodiment of the present invention when they are electrically connected; Figure 3 A cross-sectional view of a regulating cylinder structure of a liquid supply pressure regulating system according to an embodiment of the present invention; Figure 4 A schematic diagram of the connection relationship when a first pressure sensor is provided in a liquid supply pressure regulating system according to an embodiment of the present invention; Figure 5 A schematic diagram of the connection relationship when a first pressure sensor and a second pressure sensor are provided in a liquid supply pressure regulating system according to an embodiment of the present invention; Figure 6 A schematic diagram of the connection relationship when a first pressure sensor and a third pressure sensor are provided in a liquid supply pressure regulating system according to an embodiment of the present invention.

[0029] Reference numerals: 100, liquid supply part; 200, liquid outlet pipe; 210, liquid outlet; 300, pressure regulating device; 400, control part; 510, operating system; 520, first pressure sensor; 530, second pressure sensor; 540, third pressure sensor; 600, pressure stabilizing device; 710, regulating cylinder; 720, regulating part; 721, regulating rod; 730, driving part; 800, high-pressure pump; 910, control valve; 920, pressure regulating pipe. DETAILED DESCRIPTION

[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with general skills in the field to which the present invention belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0031] The specific implementation modes of the present invention are further described in detail below in conjunction with the accompanying drawings.

[0032] In the semiconductor industry, especially in the degumming and stripping processes, there are usually photoresist films and metal films on the surface of wafers or other substrates. High-pressure chemical liquids need to be sprayed onto the surface to strip the photoresist films and metal films from the surface of the wafer or other substrates without damaging the electronic devices on the surface, and remove the residual photoresist on the surface. However, with the development of semiconductor technology, the diversification of substrate materials and the differentiation of structural characteristics of electronic devices, higher requirements are placed on the liquid supply system of the equipment's high-pressure chemical liquid, such as automatic and rapid pressure regulation function, higher pressure stability, etc.

[0033] The prior art can only automatically increase or decrease the liquid pressure in the high-pressure pipeline system under the premise that the liquid outlet 210 sprays liquid.

[0034] Disadvantage 1: By spraying liquid through the liquid outlet 210 to increase or decrease the pressure, it will take up the production time of the chip, that is, it will reduce the production capacity of the equipment. The longer the pressure adjustment time is, the more the production capacity will be reduced; Disadvantage 2: If the pressure stabilizing device 600 is not provided in the pipeline, the pressure fluctuation will be very large, which usually cannot meet the semiconductor production process requirements; if the pressure stabilizing device 600 is provided, when the pressure is reduced through the nozzle, the pressure reduction speed will be very slow due to the small nozzle outlet aperture, and it may even take tens of minutes, which will greatly reduce the production capacity of the equipment; Disadvantage 3: When the voltage regulator 600 is added to the prior art for pressure regulation, the pressure in the voltage regulator 600 needs to be increased to a predetermined pressure first, resulting in a long pressure increase time; and this time occupies production time, thus also reducing the production capacity of the equipment; Disadvantage 4: Because the voltage stabilizing device 600 has an applicable pressure range, but the range of a single accumulator usually cannot cover the use requirements of high-pressure processes such as semiconductor degumming process and stripping process.

[0035] Therefore, the liquid supply pressure regulating system in the present application is provided to solve the above-mentioned problems.

[0036] Embodiment 1, refer to Figure 1 , Figure 2 and Figure 3 . An embodiment of the present invention provides a liquid supply and pressure regulating system, which is used in the semiconductor field, especially in the degumming and stripping process, wherein the liquid supply and pressure regulating system includes a liquid supply part 100, a liquid outlet pipe 200, a high-pressure pump 800, a pressure regulating device 300 and a control part 400, wherein the liquid supply part 100 is a hollow cavity, the interior of which is used to store liquid, and one end of the liquid outlet pipe 200 is fixedly arranged on the liquid supply part 100, and the fixing method can be bonding, welding or threaded connection. In this embodiment, the liquid outlet pipe 200 is selected to be fixedly arranged on the side wall of the liquid supply part 100 by threaded connection, and is connected with the interior of the liquid supply part 100 at the same time, so that the liquid in the liquid supply part 100 can enter the liquid outlet pipe 200. In addition, the other end of the liquid outlet pipe 200 is defined as The liquid outlet 210 is used to spray liquid onto the surface of the wafer or other substrate surfaces; at the same time, a control valve 910 is arranged on the liquid outlet pipeline 200, and the control valve 910 is connected to the liquid outlet pipeline 200, and is used to control the on-off of the inside of the liquid outlet pipeline 200. At the same time, the control valve 910 is arranged in the liquid outlet pipeline 200 near the liquid outlet 210, so as to control the flow of liquid at the liquid outlet 210. When the control valve 910 is closed, the liquid cannot flow out through the liquid outlet 210. When the control valve 910 is opened, the liquid can flow out through the liquid outlet 210. Among them, the pressure regulating device 300 can be selected as a valve. Specifically, it can be selected as a proportional pressure regulating valve, a servo valve, an electromagnetic regulating valve or a pressure regulator, etc. In actual use, different valves can be used according to different usage conditions.

[0037] Reference Figure 1 , Figure 2 and Figure 3 The high-pressure pump 800 is fixedly arranged on the liquid outlet pipe 200, and its arrangement method can be clamping, welding or flange connection, etc. In this embodiment, the two are connected by flange connection, and the high-pressure pump 800 is communicated with the liquid outlet pipe 200 to increase the pressure of the liquid in the liquid outlet pipe 200 after passing through the high-pressure pump 800; in addition, the pressure regulating device 300 is arranged on the liquid outlet pipe 200 and communicated with the liquid outlet pipe 200 to adjust the liquid pressure in the liquid outlet pipe 200. The pressure regulating device 300 is arranged between the high-pressure pump 800 and the liquid outlet 210. At the same time, the pressure regulating device 300 has a regulating port, which is used to discharge the liquid in the pressure regulating device 300, thereby adjusting the pressure of the liquid. Specifically in this embodiment, the pressure regulating device 300 has a regulating port. A pressure regulating tube 920 is connected by a threaded connection, and one end of the pressure regulating tube 920 is connected to the regulating port, so that the liquid in the pressure regulating device 300 can enter the pressure regulating tube 920 through the regulating port; at the same time, a control component 400 is provided on the pressure regulating device 300. Specifically in this embodiment, the control component 400 is a pressure regulating valve, which is fixedly arranged on the pressure regulating tube 920 and connected to the pressure regulating tube 920, and is used to control the on and off of the pressure regulating tube 920, thereby controlling the opening at the regulating port to control the liquid flow at the pressure regulating tube 920, so as to facilitate the liquid pressure regulation process in the liquid outlet pipeline 200. At the same time, the inner diameter of the pressure regulating tube 920 is much larger than the inner diameter of the liquid outlet 210, so the pressure reduction speed is much larger than the pressure reduction speed in the prior art, which greatly improves the pressure reduction efficiency.

[0038] Reference Figure 1 , Figure 2 and Figure 3The liquid supply pressure regulating system also includes a control system and a sensor group, wherein the control system includes an operating system 510. In this embodiment, the operating system 510 is selected as a host computer, that is, it can be understood that the operating system 510 is selected as a computer control center. The operating system 510 is electrically connected to the pressure regulating device 300 and the control element 400. At the same time, the operating system 510 is used to control the pressure regulating range of the pressure regulating device 300 and the opening of the control element 400, thereby adjusting the liquid flow in the pressure regulating pipe 920; the sensor group includes a first pressure sensor 520, wherein the first pressure sensor 520 is arranged on the liquid outlet pipe 200, and is arranged between the pressure regulating device 300 and The first pressure sensor 520 is disposed between the control valve 910 and the liquid outlet 210, and is electrically connected to the operating system 510. The first pressure sensor 520 is mainly used to detect the pressure of the liquid discharged from the liquid outlet 210, and to feed back the detection result to the operating system 510. The operating system 510 can adjust the pressure of the liquid in the liquid outlet pipe 200 according to the feedback from the first pressure sensor 520. In addition, during the adjustment process, there is no need to open the control valve 910, that is, the entire adjustment process will not take up the time of wafer processing or substrate processing, that is, the production capacity of the equipment will not be reduced.

[0039] Reference Figure 1 , Figure 2 and Figure 3 The sensor group also includes a second pressure sensor 530 and a third pressure sensor 540, wherein the second pressure sensor 530 is arranged in the liquid outlet pipeline 200 and is placed between the high-pressure pump 800 and the pressure regulating device 300, and the second pressure sensor 530 is electrically connected to the operating system 510, and the second pressure sensor 530 is used to detect the pressure of the liquid that has passed through the high-pressure pump 800 but has not been regulated by the pressure regulating device 300; the third pressure sensor 540 is arranged in the pressure regulating device 300 and is electrically connected to the operating system 510, and the third pressure sensor 540 is used to detect the pressure of the liquid in the pressure regulating device 300. In the actual control process, the operating system 510 adjusts the high-pressure pump 800, the pressure regulating device 300 and the control component 400 according to the feedback of the first pressure sensor 520, the second pressure sensor 530 and the third pressure sensor 540, thereby adjusting the liquid pressure in the liquid outlet pipeline 200.

[0040] Reference Figure 1 , Figure 2 and Figure 3, a pressure stabilizing device 600 is provided on the side wall of the liquid outlet pipe 200, wherein the pressure stabilizing device 600 can be an accumulator or a pressure stabilizer. In the present embodiment, the pressure stabilizing device 600 is preferably selected as a pressure stabilizer, which plays a role in buffering the liquid pressure value output by the high-pressure pump 800, and can also achieve the effect of stabilizing the entire liquid supply pressure regulating system to prevent the pressure of the liquid supply pressure regulating system from rising rapidly in a short period of time, thereby causing damage to components, vibration, noise and other undesirable problems. At the same time, the pressure stabilizing device 600 and the high-pressure pump 800 cooperate to jointly regulate the liquid pressure in the liquid outlet pipe 200 to stabilize the liquid pressure in the liquid outlet pipe 200; in addition, the other end of the pressure regulating pipe 920 can be connected to the liquid supply part 100, or it can not be connected to the liquid supply part 100, as long as it can discharge liquid to regulate the liquid pressure in the liquid outlet pipe 200, in the present embodiment. In the embodiment, the other end of the pressure regulating tube 920 is connected to the liquid supply part 100 so that the discharged liquid can be recirculated into the liquid supply part 100 to reduce the waste of liquid. At the same time, the high-pressure pump 800 can be electrically connected to the operating system 510, or it can not be electrically connected to the operating system 510. When the high-pressure pump 800 is electrically connected to the operating system 510, in the working state, the operating system 510 in the control system receives the pressure feedback of the sensor. Specifically, the operating system 510 receives the pressure feedback of the first pressure sensor 520, the second pressure sensor 530 and the third pressure sensor 540, and adjusts the output pressure of the high-pressure pump 800 by adjusting the input gas source pressure or input current of the high-pressure pump 800 according to the pressure feedback, and at the same time adjusts the pressure regulating device 300 and the control component 400 to cooperate with the high-pressure pump 800 to jointly adjust the liquid pressure in the liquid outlet pipe 200.

[0041] Reference Figure 1 , Figure 2 and Figure 3, an adjusting cylinder 710 is fixedly provided on the liquid outlet pipe 200, and the fixing method thereof can be bonding, clamping or bolting, etc. In the present embodiment, the adjusting cylinder 710 is fixedly provided on the liquid outlet pipe 200 by clamping, and one end of the adjusting cylinder 710 is communicated with the liquid outlet 210, and an adjusting member 720 is fixedly provided on the other end, and the adjusting member 720 is used to adjust the opening shape of the adjusting cylinder 710, wherein the adjusting cylinder 710 is elastic. Specifically in the present embodiment, the adjusting cylinder 710 can be made of silicone material, or other materials that will not affect the wafer processing or the substrate processing, and the adjusting cylinder 710 is connected to the liquid outlet pipe 200 by interference fit; specifically, the adjusting member 720 includes a symmetrically arranged adjusting member. Rod 721, the middle part of the adjusting rod 721 is arranged in an arc shape, and its shape is a semicircular arc. The middle parts of the symmetrically arranged adjusting rods 721 fit together to form a circular area. At the same time, the middle part of the adjusting rod 721 is fixedly arranged on the side wall of the adjusting cylinder 710. Specifically, a connecting hole is opened on the side wall of the adjusting cylinder 710, and the connecting hole surrounds the side wall of the adjusting cylinder 710 for half a circle. At the same time, two connecting holes are provided, and the two connecting holes are respectively used to penetrate the adjusting rod 721, so as to fix the adjusting rod 721 to the connecting cylinder. When the adjusting rod 721 is penetrated into the connecting hole, the middle part of the adjusting rod 721 has a supporting force, so that the adjusting cylinder 710 is circular. At the same time, the ends of the adjusting rod 721 are arranged horizontally, and the symmetrically arranged adjusting rods 721 are installed to the connecting holes After the adjustment, the horizontal part of the end of the adjusting rod 721 is fitted; the adjusting member 720 also includes a driving member 730, which can be selected as a cylinder or an electric cylinder. In the present embodiment, an electric cylinder is selected. The driving member 730 is fixedly arranged at the end of the adjusting rod 721 to drive the adjusting rod 721 to move, so that the middle part of the adjusting rod 721 is deformed, thereby changing the shape of the adjusting cylinder 710. Specifically, the driving member 730 is arranged in the process chamber of the semiconductor equipment by means of a clamping or bolt fixing method, and at the same time, the end of the adjusting rod 721 is fixedly arranged at the end of the piston rod of the driving member 730 by means of a bolt fixing method. There are two driving members 730, which correspond to the two ends of the adjusting rod 721 respectively. During use, the driving member 730 starts The adjusting tube 710 is configured to move in a rectangular shape so that the contact area between the ejected liquid and the wafer surface or the substrate surface is increased, so that the shape of the adjusting tube 710 can be adjusted according to the usage. In addition, in order to facilitate the shape restoration of the adjusting tube 710, the adjusting tube 721 can be made of spring steel or memory alloy, etc. When the driving member 730 drives the adjusting tube 721 to reset, the middle part of the adjusting rod 721 can be restored to its original state, thereby driving the shape restoration of the adjusting tube 710.

[0042] During the operation of the equipment, the liquid is supplied from the liquid supply part 100 to the high-pressure pump 800 through the liquid outlet pipe 200. After the high-pressure pump 800 pressurizes and the pressure stabilizer 600 stabilizes the liquid pressure in the liquid outlet pipe 200 at a pressure value M. After the high-pressure liquid passes through the second pressure sensor 530, it enters the pressure regulating device 300. During this process, the operating system 510 monitors the liquid pressure and its fluctuation range in the liquid outlet pipe 200 in real time through the second pressure sensor 530, and monitors whether it is normal through the third pressure sensor on the pressure regulating device 300. 540, real-time monitoring of the liquid pressure inside the pressure regulating device 300; when the equipment starts to work, that is, wafer processing or substrate processing begins, when the liquid outlet 210 needs to spray liquid, the pressure value of the liquid outlet 210 is set, the operating system 510 receives the set pressure value of the liquid outlet 210, and starts to adjust the control component 400, thereby adjusting the opening size of the regulating port on the pressure regulating device 300, that is, adjusting the flow rate of the refluxed liquid, until the absolute value of the difference between the pressure value fed back by the third pressure sensor 540 and the set pressure value of the liquid outlet 210 reaches the set deviation range. At this time, the control valve 910 is opened, and the high-pressure liquid inside the pressure regulating device 300 is supplied to the liquid outlet 210 through the control valve 910 and the first pressure sensor 520; at the same time, the operating system 510 monitors the liquid pressure value at the liquid outlet 210 in real time through the first pressure sensor 520, and compares this value with the set pressure value of the liquid outlet 210, adjusts the opening of the regulating port, and the stroke closed loop feedback.

[0043] For example, if the value fed back by the first pressure sensor 520 is higher than the set value, the operating system 510 sends an instruction to the pressure regulating device 300 to increase the opening of the regulating port, that is, to control the control component 400 to increase the opening inside the pressure regulating tube 920. At this time, more liquid flows back to the liquid supply part 100 through the regulating port, and less liquid flows through the pressure regulating liquid outlet 210, the control valve 910, and the first pressure sensor 520. The liquid pressure supplied to the liquid outlet 210 will be reduced, and the feedback value of the first pressure sensor 520 will become smaller, until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range; on the contrary, If the value fed back by the first pressure sensor 520 is lower than the set value, the operating system 510 sends an instruction to the high-pressure pressure regulating device 300 to reduce the opening of the regulating port, that is, to control the control component 400 to reduce the opening inside the pressure regulating tube 920. At this time, less liquid flows back to the liquid supply part 100 through the regulating port, and more liquid is supplied to the liquid outlet 210 through the pressure regulation through the control valve 910, the first pressure sensor 520 and the liquid outlet 210. The liquid pressure of this path will increase, and the feedback value of the first pressure sensor 520 will increase until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range.

[0044] Embodiment 2, The difference between Example 2 of the present application and Example 1 is that, referring to Figure 4 In this embodiment, the sensor group only includes the first pressure sensor 520. During the control process of the control system, the high-pressure pump 800, the pressure regulating device 300 and the control component 400 are adjusted only through the feedback of the first pressure sensor 520, so that the pressure of the liquid discharged from the liquid outlet 210 is the set pressure value.

[0045] During the operation of the equipment, the liquid is supplied from the liquid supply unit 100 to the high-pressure pump 800 through the liquid outlet pipe 200. After being pressurized by the high-pressure pump 800 and stabilized by the pressure stabilizing device 600, the liquid pressure in the liquid outlet pipe 200 is stabilized at a pressure value M, and the high-pressure liquid enters the pressure regulating device 300. When the equipment starts to work, that is, wafer processing or substrate processing begins, and the liquid outlet 210 needs to spray liquid, the pressure value of the liquid outlet 210 is set, and the operating system 510 receives the set pressure value of the liquid outlet 210 and starts The control component 400 is adjusted to adjust the opening size of the regulating port on the pressure regulating device 300, that is, to adjust the reflux liquid flow rate, and the control valve 910 is opened. The high-pressure liquid inside the pressure regulating device 300 is supplied to the liquid outlet 210 through the control valve 910 and the first pressure sensor 520; at the same time, the operating system 510 monitors the liquid pressure value at the liquid outlet 210 in real time through the first pressure sensor 520, and compares this value with the set pressure value of the liquid outlet 210, and adjusts the opening of the regulating port, and performs a closed-loop feedback of the stroke.

[0046] For example, if the value fed back by the first pressure sensor 520 is higher than the set value, the operating system 510 sends an instruction to the pressure regulating device 300 to increase the opening of the regulating port, that is, to control the control component 400 to increase the opening inside the pressure regulating tube 920. At this time, more liquid flows back to the liquid supply part 100 through the regulating port, and less liquid flows through the pressure regulating liquid outlet 210, the control valve 910, and the first pressure sensor 520. The liquid pressure supplied to the liquid outlet 210 will be reduced, and the feedback value of the first pressure sensor 520 will become smaller, until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range; on the contrary, If the value fed back by the first pressure sensor 520 is lower than the set value, the operating system 510 sends an instruction to the high-pressure pressure regulating device 300 to reduce the opening of the regulating port, that is, to control the control component 400 to reduce the opening inside the pressure regulating tube 920. At this time, less liquid flows back to the liquid supply part 100 through the regulating port, and more liquid passes through the control valve 910, the first pressure sensor 520 and the liquid outlet 210 through the pressure regulation and is supplied to the liquid outlet 210. The liquid pressure of this path will increase, and the feedback value of the first pressure sensor 520 will increase until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range.

[0047] Embodiment 3, The difference between Example 3 of the present application and Example 1 is that, referring to Figure 5 In this embodiment, the sensor group includes a first pressure sensor 520 and a second pressure sensor 530. During the control process of the control system, the high-pressure pump 800, the pressure regulating device 300 and the control component 400 are adjusted through feedback from the first pressure sensor 520 and the second pressure sensor 530, so that the pressure of the liquid discharged from the liquid outlet 210 is the set pressure value.

[0048] During the operation of the equipment, the liquid is supplied from the liquid supply part 100 to the high-pressure pump 800 through the liquid outlet pipe 200. After the high-pressure pump 800 pressurizes and the pressure stabilizer 600 stabilizes the liquid pressure in the liquid outlet pipe 200 at a stable pressure value M. After the high-pressure liquid passes through the second pressure sensor 530, it enters the pressure regulating device 300. During this process, the operating system 510 monitors the liquid pressure and its fluctuation range in the liquid outlet pipe 200 in real time through the second pressure sensor 530 to see if they are normal. When the equipment starts to work, i.e., wafer processing or substrate processing begins, and the liquid outlet 210 needs to spray liquid, the liquid outlet 210 is set. 210, the operating system 510 receives the set pressure value of the liquid outlet 210, and starts to adjust the control component 400, thereby adjusting the opening size of the regulating port on the pressure regulating device 300, that is, adjusting the reflux liquid flow, opening the control valve 910, and the high-pressure liquid inside the pressure regulating device 300 is supplied to the liquid outlet 210 through the control valve 910 and the first pressure sensor 520; at the same time, the operating system 510 monitors the liquid pressure value at the liquid outlet 210 in real time through the first pressure sensor 520, and compares this value with the set pressure value of the liquid outlet 210, and adjusts the opening of the regulating port, and the stroke closed-loop feedback.

[0049] For example, if the value fed back by the first pressure sensor 520 is higher than the set value, the operating system 510 sends an instruction to the pressure regulating device 300 to increase the opening of the regulating port, that is, to control the control component 400 to increase the opening inside the pressure regulating tube 920. At this time, more liquid flows back to the liquid supply part 100 through the regulating port, and less liquid flows through the pressure regulating liquid outlet 210, the control valve 910, and the first pressure sensor 520. The liquid pressure supplied to the liquid outlet 210 will be reduced, and the feedback value of the first pressure sensor 520 will become smaller, until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range; on the contrary, If the value fed back by the first pressure sensor 520 is lower than the set value, the operating system 510 sends an instruction to the high-pressure pressure regulating device 300 to reduce the opening of the regulating port, that is, to control the control component 400 to reduce the opening inside the pressure regulating tube 920. At this time, less liquid flows back to the liquid supply part 100 through the regulating port, and more liquid passes through the control valve 910, the first pressure sensor 520 and the liquid outlet 210 through the pressure regulation and is supplied to the liquid outlet 210. The liquid pressure of this path will increase, and the feedback value of the first pressure sensor 520 will increase until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range.

[0050] Embodiment 4, The difference between Example 4 of the present application and Example 1 is that, referring to Figure 6 In this embodiment, the sensor group includes a first pressure sensor 520 and a third pressure sensor 540. During the control process of the control system, the high-pressure pump 800, the pressure regulating device 300 and the control component 400 are adjusted through feedback from the first pressure sensor 520 and the third pressure sensor 540, so that the pressure of the liquid discharged from the liquid outlet 210 is the set pressure value.

[0051] During the operation of the equipment, liquid is supplied from the liquid supply part 100 to the high-pressure pump 800 through the liquid outlet pipe 200. After being pressurized by the high-pressure pump 800 and stabilized by the pressure stabilizing device 600, the liquid pressure in the liquid outlet pipe 200 is stabilized at a pressure value M, and the high-pressure liquid enters the pressure regulating device 300. During this process, the operating system 510 monitors the liquid pressure inside the pressure regulating device 300 in real time through the third pressure sensor 540 on the pressure regulating device 300. When the equipment starts to work formally, that is, wafer processing or substrate processing starts, when the liquid outlet 210 needs to spray liquid, the pressure value of the liquid outlet 210 is set, and the operating system 510 receives the set pressure value of the liquid outlet 210 and starts to adjust the control component 400, thereby adjusting the opening size of the regulating port on the pressure regulating device 300, that is, adjusting the reflux liquid flow rate, until the absolute value of the difference between the pressure value fed back by the third pressure sensor 540 and the set pressure value of the liquid outlet 210 reaches within the set deviation range. At this time, the control valve 910 is opened, and the high-pressure liquid in the pressure regulating device 300 is supplied to the liquid outlet 210 through the control valve 910 and the first pressure sensor 520; at the same time, the operating system 510 monitors the liquid pressure value at the liquid outlet 210 in real time through the first pressure sensor 520, and compares this value with the set pressure value of the liquid outlet 210, and adjusts the opening of the regulating port to provide closed-loop feedback.

[0052] For example, if the value fed back by the first pressure sensor 520 is higher than the set value, the operating system 510 sends an instruction to the pressure regulating device 300 to increase the opening of the regulating port, that is, to control the control component 400 to increase the opening inside the pressure regulating tube 920. At this time, more liquid flows back to the liquid supply part 100 through the regulating port, and less liquid flows through the pressure regulating liquid outlet 210, the control valve 910, and the first pressure sensor 520. The liquid pressure supplied to the liquid outlet 210 will be reduced, and the feedback value of the first pressure sensor 520 will become smaller, until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range; on the contrary, If the value fed back by the first pressure sensor 520 is lower than the set value, the operating system 510 sends an instruction to the high-pressure pressure regulating device 300 to reduce the opening of the regulating port, that is, to control the control component 400 to reduce the opening inside the pressure regulating tube 920. At this time, less liquid flows back to the liquid supply part 100 through the regulating port, and more liquid is supplied to the liquid outlet 210 through the pressure regulation through the control valve 910, the first pressure sensor 520 and the liquid outlet 210. The liquid pressure of this path will increase, and the feedback value of the first pressure sensor 520 will increase until the absolute value of the difference between the pressure value fed back by the first pressure sensor 520 and the set pressure value of the liquid outlet 210 reaches within the set deviation range.

[0053] The implementation principle of a liquid supply and pressure regulating system of the present application is as follows: the liquid supply part 100 is connected to the high-pressure pump 800 through the liquid outlet pipe 200, and the high-pressure pump 800 is connected to the pressure stabilizing device 600 and the second pressure sensor 530 in sequence, and then connected to the pressure regulating device 300. This high-pressure pressure regulating device 300 has a regulating port, and a pressure regulating pipe 920 is arranged at this regulating port and connected to the liquid supply part 100; at the same time, the control component 400 can control the increase or decrease of the opening at the regulating port according to the operating system 510, so as to achieve the purpose of controlling the liquid to flow back to the liquid supply part 100; at the same time, the pressure regulating device 300 has a third pressure sensor 540 for detecting the liquid pressure inside the pressure regulating device 300; the liquid after pressure regulation passes through the control valve 910 and the first pressure sensor 520 in sequence, and finally reaches the liquid outlet 210; the pressure at the pressure regulating device 300 The opening of the regulating port is controlled by the operating system 510, that is, the opening of the control element 400 is controlled by the operating system 510. The opening of the regulating port can be adjusted by adjusting the opening of the control element 400. At the same time, the detection data of all pressure sensors are fed back to the operating system 510. After the operating system 510 compares and judges with the set value, the next adjustment instruction is issued, thereby realizing the closed-loop pressure regulation of the system; that is, at least the following technical problems are solved: the problem of reducing the equipment production capacity during the normal operation of the equipment and the pressure increase and pressure reduction adjustment operations in the high-pressure liquid supply and pressure regulation system is solved. The problem of slow pressure reduction speed of the pipeline through the liquid outlet 210, resulting in extended downtime, is solved when the equipment needs to perform maintenance or repair operations on the high-pressure liquid supply system. The technical problem of slow pressure increase adjustment speed in the high-pressure liquid supply system equipped with a pressure stabilizing device 600 is solved when the pressure stability requirements of the high-pressure liquid supply system are met.

[0054] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways.

Claims

1. A liquid supply pressure regulating system, characterized in that: It comprises a liquid supply part (100); A liquid outlet pipe (200), one end of which is connected to the liquid supply portion (100) and the other end of which is a liquid outlet (210); A high-pressure pump (800) is disposed in the liquid outlet pipeline (200) to control the liquid pressure in the liquid outlet pipeline (200); a pressure regulating device (300) connected to the liquid outlet pipe (200) and disposed between the high-pressure pump (800) and the liquid outlet (210); the pressure regulating device (300) having a regulating port, the regulating port being used to discharge the liquid in the pressure regulating device (300) to regulate the liquid pressure; A control component (400) is arranged on the pressure regulating device (300) to control the opening of the regulating port.

2. The liquid supply pressure regulating system according to claim 1, characterized in that: Also included is a control system, the control system comprising: An operating system (510) electrically connected to the voltage regulating device (300) and the control element (400); Sensor set, including: A first pressure sensor (520), arranged in the liquid outlet pipe (200) and placed between the pressure regulating device (300) and the liquid outlet (210), and electrically connected to the operating system (510) to detect the pressure of the liquid discharged from the liquid outlet (210); A second pressure sensor (530), arranged in the liquid outlet pipe (200) and placed between the high-pressure pump (800) and the pressure regulating device (300), and electrically connected to the operating system (510) to detect the pressure of the liquid passing through the high-pressure pump (800); A third pressure sensor (540) is disposed in the pressure regulating device (300) and is electrically connected to the operating system (510) to detect the liquid pressure in the pressure regulating device (300).

3. The liquid supply pressure regulating system according to claim 1, characterized in that: Also included is a control system, the control system comprising: An operating system (510) electrically connected to the voltage regulating device (300) and the control element (400); Sensor set, including: A first pressure sensor (520) is arranged in the liquid outlet pipe (200) and placed between the pressure regulating device (300) and the liquid outlet (210), and is electrically connected to the operating system (510) to detect the pressure of the liquid discharged from the liquid outlet (210).

4. The liquid supply pressure regulating system according to claim 1, characterized in that: Also included is a control system, the control system comprising: An operating system (510) electrically connected to the voltage regulating device (300) and the control element (400); Sensor set, including: A first pressure sensor (520), arranged in the liquid outlet pipe (200) and placed between the pressure regulating device (300) and the liquid outlet (210), and electrically connected to the operating system (510) to detect the pressure of the liquid discharged from the liquid outlet (210); A second pressure sensor (530) is arranged in the liquid outlet pipe (200) and placed between the high-pressure pump (800) and the pressure regulating device (300), and is electrically connected to the operating system (510) to detect the pressure of the liquid passing through the high-pressure pump (800).

5. The liquid supply pressure regulating system according to claim 1, characterized in that: Also included is a control system, the control system comprising: An operating system (510) electrically connected to the voltage regulating device (300) and the control element (400); Sensor set, including: A first pressure sensor (520), arranged in the liquid outlet pipe (200) and placed between the pressure regulating device (300) and the liquid outlet (210), and electrically connected to the operating system (510) to detect the pressure of the liquid discharged from the liquid outlet (210); A third pressure sensor (540) is disposed in the pressure regulating device (300) and is electrically connected to the operating system (510) to detect the liquid pressure in the pressure regulating device (300).

6. The liquid supply pressure regulating system according to any one of claims 1 to 5, characterized in that: The liquid outlet pipeline (200) is provided with a pressure stabilizing device (600), and the pressure stabilizing device (600) is arranged between the high-pressure pump (800) and the pressure regulating device (300), and cooperates with the high-pressure pump (800) to regulate the liquid pressure in the liquid outlet pipeline (200).

7. The liquid supply pressure regulating system according to any one of claims 1 to 5, characterized in that: The regulating port is in communication with the liquid supply portion (100) to circulate liquid.

8. The liquid supply pressure regulating system according to any one of claims 2 to 5, characterized in that: The high-pressure pump (800) is electrically connected to the operating system (510); In the working state, the operating system (510) receives pressure feedback from the sensor to adjust the pressure of the high-pressure pump (800) according to the pressure feedback.

9. The liquid supply pressure regulating system according to claim 1, characterized in that: An adjusting cylinder (710) is fixedly arranged on the liquid outlet pipe (200); One end of the adjusting cylinder (710) is in communication with the liquid outlet (210), and the other end is fixedly provided with an adjusting member (720), wherein the adjusting member (720) is used to adjust the shape of the adjusting cylinder (710).

10. The liquid supply pressure regulating system according to claim 9, characterized in that: The adjusting member (720) comprises: A symmetrically arranged adjustment rod (721), wherein the middle portion of the adjustment rod (721) is arranged in an arc shape, and the middle portion of the adjustment rod (721) is fixedly arranged on the side wall of the adjustment cylinder (710); The driving member (730) is fixedly arranged at the end of the adjusting rod (721) and is used to drive the adjusting rod (721) to move, so that the middle part of the adjusting rod (721) is deformed to change the shape of the adjusting cylinder (710).

Citation Information

Patent Citations

  • High-pressure pipeline pressure control system, degumming machine and stripping machine

    CN215722576U