Ternary precursor preparation device
By designing a ternary precursor preparation device including a reactor, self-circulation pipeline and multi-layer filter, the problem of uneven particle size of the ternary positive electrode material is solved, and the particle uniformity and circulation stability are improved. Reduces production costs and space usage.
Patent Information
- Application Number
- CN202420704733.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-08
- Publication Date
- 2024-12-10
- Estimated Expiration
- 2034-04-08
AI Technical Summary
The particles of the existing ternary positive electrode precursor are uneven in size, resulting in a degradation of cyclic performance, and the existing grading devices increase production costs and space.
A ternary precursor preparation device including a reactor, a self-circulation pipeline, a conveying pump and a small particle removal device is designed to remove small particles through circulating flow and a multi-layer filter to gradually obtain particles with narrow particle size distribution.
The particle size uniformity is achieved, cycle stability is improved, production costs are reduced, and space utilization is improved.
Smart Images
Figure CN222131909U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of lithium-ion battery positive electrode material preparation, and in particular to a ternary precursor preparation device. Background Art
[0002] Ternary cathode materials have high specific capacity and high rate performance and have always been an important member of the lithium-ion battery market. However, cycle performance is one of the main issues restricting the development of ternary cathode materials. At present, the uniformity of ternary cathode precursor particles (the width of particle size distribution) has a significant impact on the cycle performance of ternary cathode materials.
[0003] The particle size of the ternary precursor produced by the existing synthesis process (coprecipitation method) is uneven, especially when producing large-particle precursors, the problem of small particles is particularly serious. During the charging process of the lithium battery, these small particles cause structural collapse due to excessive lithium removal, and further react with the electrolyte, resulting in a decrease in cycle performance and even affecting the safety performance of the battery. The uniform particle ternary precursor material can be used to prepare a uniform ternary positive electrode material, which is conducive to the uniformity of charge and discharge, that is, the degree of lithium removal / insertion of each particle is similar, which helps to improve the cycle stability of lithium-ion batteries.
[0004] In order to solve the above problems, a particle grading device is generally used to separate large and small particles. For example, patent document CN208889768U sets a solid-solid grading device with a large-size particle outlet and a small-size particle outlet downstream of the synthesis kettle, and the small particles are connected to the seed preparation kettle, and the large particles are passed into the aging kettle; for another example, patent document CN111111593A uses the original material to produce an intermediate liquid containing tiny particles in the first reactor, and then inputs it into the second reactor to continue to react with the original material to increase the particle size of the intermediate liquid, thereby achieving the purpose of eliminating tiny particles. Then, the above method requires the addition of multiple particle grading devices, reactors or aging reactors, and various auxiliary equipment, which leads to a decrease in the utilization rate of the plant space and increases the production cost. Utility Model Content
[0005] Based on this, it is necessary to provide a ternary precursor preparation device that can prepare ternary precursor particles with narrow particle size distribution and uniform size without occupying additional space in the factory.
[0006] A ternary precursor preparation device comprises: a reactor, a first self-circulating pipeline, a second self-circulating pipeline, a delivery pump and a small particle removal device, the delivery pump having a first inlet and a first outlet, the small particle removal device having a second inlet and a second outlet, the first inlet of the delivery pump being connected to the bottom of the reactor, the first outlet of the delivery pump being connected to the first self-circulating pipeline and the second inlet of the small particle removal device, the other end of the first self-circulating pipeline being connected to the top of the reactor, the second outlet of the small particle removal device being connected to the second self-circulating pipeline, and the other end of the second self-circulating pipeline being connected to the top of the reactor.
[0007] In one embodiment, the small particle removal device includes a collector, a first filter and a second filter, the second inlet and the second outlet are respectively connected to the inner cavity of the collector, the first filter is arranged at the second inlet, the second filter is arranged at the second outlet, and the aperture of the first filter is larger than the aperture of the second filter.
[0008] In one embodiment, the collector is detachably connected to the first outlet of the delivery pump and the second self-circulating pipeline.
[0009] In one embodiment, the first filter screen is detachably disposed at the second inlet, and the second filter screen is detachably disposed at the second outlet.
[0010] In one embodiment, the pore size of the first filter is 1 μm to 7 μm, and the porosity is 40% to 70%.
[0011] In one embodiment, the thickness of the first filter screen is 0.5 mm to 10 mm.
[0012] In one embodiment, the pore size of the second filter is 0.1 μm to 0.5 μm, and the porosity is 40% to 70%.
[0013] In one embodiment, the thickness of the second filter screen is 0.1 mm to 1 mm.
[0014] In one embodiment, the small particle removal device also includes an ultrasonic generator and a transducer, wherein the ultrasonic generator and the transducer are electrically connected, and the ultrasonic generator and the transducer are used to generate ultrasonic waves, and the coverage range of the ultrasonic waves includes the pipeline between the first outlet and the second inlet of the delivery pump, the second inlet and the second outlet.
[0015] In one embodiment, the ratio of the inner diameters of the first self-circulating pipe and the second self-circulating pipe is 0.5 to 1.0.
[0016] Compared with the prior art, the ternary precursor preparation device provided by the present application can discharge the material in the reactor from the bottom of the reactor and enter the first self-circulating pipeline and the second self-circulating pipeline under the action of the delivery pump, and flow back to the reactor from the top of the reactor. Since the first self-circulating pipeline is provided, the material in the reactor can circulate, and since a small particle removal device is provided upstream of the second self-circulating pipeline, the small particle removal device can remove the small particles of the ternary precursor in the material and return the material to the reactor. After multiple cycles, the small particles in the reactor are gradually removed, so that ternary precursor particles with uniform size and narrow particle size distribution can be obtained. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the conventional technology, the drawings required for use in the embodiments or the conventional technology descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0018] Figure 1 This is a schematic structural diagram of a ternary precursor preparation device according to an embodiment of the present application.
[0019] Figure numerals: 10, reactor; 20, first self-circulation pipeline; 30, second self-circulation pipeline; 40, delivery pump; 41, first inlet; 42, first outlet; 50, small particle removal device; 51, collector; 511, second inlet; 512, second outlet; 52, first filter; 53, second filter; 54, ultrasonic generator; 55, transducer. DETAILED DESCRIPTION
[0020] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.
[0021] It should be noted that when a component is referred to as being "fixed to" or "disposed on" another component, it may be directly on the other component or there may also be a central component. When a component is considered to be "connected to" another component, it may be directly connected to the other component or there may be a central component at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in the specification of this application are for illustrative purposes only and do not represent the only implementation method.
[0022] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.
[0023] In the present application, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may mean that the first feature is directly in contact with the second feature, or the first feature and the second feature are indirectly in contact through an intermediate medium. Moreover, a first feature being “above”, “above” or “above” a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being “below”, “below” or “below” a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.
[0024] Unless otherwise defined, all technical and scientific terms used in the specification of this application have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used in the specification of this application includes any and all combinations of one or more related listed items.
[0025] See also Figure 1The present application provides a ternary precursor preparation device, comprising: a reactor 10, a first self-circulating pipeline 20, a second self-circulating pipeline 30, a delivery pump 40, and a small particle removal device 50. The delivery pump 40 has a first inlet 41 and a first outlet 42, and the small particle removal device 50 has a second inlet 511 and a second outlet 512. The first inlet 41 of the delivery pump 40 is connected to the bottom of the reactor 10, the first outlet 42 of the delivery pump 40 is connected to the first self-circulating pipeline 20 and the second inlet 511 of the small particle removal device 50, the other end of the first self-circulating pipeline 20 is connected to the top of the reactor 10, the second outlet 512 of the small particle removal device 50 is connected to the second self-circulating pipeline 30, and the other end of the second self-circulating pipeline 30 is connected to the top of the reactor 10. In this way, under the action of the delivery pump 40, the material in the reactor 10 can be discharged from the bottom of the reactor 10 and enter the first self-circulating pipeline 20 and the second self-circulating pipeline 30, and flow back to the reactor 10 from the top of the reactor 10. Since the first self-circulation pipeline 20 is provided, the material in the reactor 10 can circulate, and since the small particle removal device 50 is provided upstream of the second self-circulation pipeline 30, the small particle removal device 50 can remove the small particles of the ternary precursor in the material and return the material to the reactor 10. After multiple cycles, the small particles in the reactor 10 are gradually removed, so that ternary precursor particles with uniform size and narrow particle size distribution can be obtained.
[0026] The small particle removal device 50 includes a collector 51, a first filter 52 and a second filter 53. The second inlet 511 and the second outlet 512 are respectively connected to the inner cavity of the collector 51. The first filter 52 is arranged at the second inlet 511, and the second filter 53 is arranged at the second outlet 512. The aperture of the first filter 52 is larger than the aperture of the second filter 53. In this way, large particles with a particle size larger than the first filter 52 are intercepted upstream of the second inlet 511 and cannot enter the collector 51. The large particles return to the reactor 10 with the flow of liquid in the first self-circulating pipeline 20; small particles with a particle size smaller than the aperture of the first filter 52 and larger than the aperture of the second filter 53 will enter the collector 51 and cannot pass through the second filter 53, so they are collected by the collector 51. Particles within the target particle size range can be obtained by setting the first filter 52 and the second filter 53 with appropriate apertures.
[0027] Furthermore, the collector 51 is detachably connected to the first outlet 42 of the delivery pump 40 and the second self-circulating pipeline 30. In this way, it is convenient to recycle the small particles of the ternary precursor collected by the collector 51. The recovered small particles can be put into the next round of synthesis reaction as raw materials, thereby saving production costs.
[0028] The first filter screen 52 is detachably provided at the second inlet 511, and the second filter screen 53 is detachably provided at the second outlet 512, so that it is convenient to replace the first filter screen 52 and the second filter screen 53. By replacing the first filter screen 52 and the second filter screen 53 with different pore sizes and porosities, the requirements of different products for removing small particles can be met.
[0029] Further, the pore size of the first filter 52 is 1 μm to 7 μm. Large particles generally refer to particles with a particle size of 9 μm or more. The present application sets the pore size of the first filter 52 to 1 μm to 7 μm to ensure that large particles do not enter the collector 51, while small particles can smoothly pass through the first filter 52 and enter the collector 51. Specifically, the pore size of the first filter 52 can be 1 μm, 1.5 μm, 2 μm, 2.5 μm, 3 μm, 3.5 μm, 4 μm, 4.5 μm, 5 μm, 5.5 μm, 6 μm, 6.5 μm, 7 μm, or any other value within the range of 1 μm to 7 μm.
[0030] Furthermore, the porosity of the first filter screen 52 is 40% to 70%, which ensures that large particles will not clog the first filter screen 52, and the liquid can pass through smoothly, with high filtration efficiency and good filtration effect.
[0031] Furthermore, the thickness of the first filter screen 52 is 0.5 mm to 10 mm. In this way, the thickness is moderate, can withstand a certain pressure, and is not easy to be blocked, and the filtering effect can be guaranteed. Specifically, the thickness of the first filter screen 52 can be 0.5 mm, 1 mm, 1.5 mm, 2 mm, 2.5 mm, 3 mm, 3.5 mm, 4 mm, 4.5 mm, 5 mm, 5.5 mm, 6 mm, 6.5 mm, 7 mm, 7.5 mm, 8 mm, 8.5 mm, 9 mm, 9.5 mm, 10 mm, or any other value within the range of 0.5 mm to 10 mm.
[0032] Further, the pore size of the second filter 53 is 0.1 μm to 0.5 μm, ensuring that small particles do not pass through the second filter 53 and are retained in the collector 51, thereby ensuring the removal effect of small particles by the small particle removal device 50. Specifically, the pore size of the second filter 53 can be 0.1 μm, 0.15 μm, 0.2 μm, 0.25 μm, 0.3 μm, 0.35 μm, 0.4 μm, 0.45 μm, 0.5 μm, or any other value within the range of 0.1 μm to 0.5 μm.
[0033] Furthermore, the porosity of the second filter screen 53 is 40% to 70%, which ensures that small particles will not clog the second filter screen 53, and the liquid can pass through smoothly, with high filtration efficiency and good filtration effect.
[0034] Furthermore, the thickness of the second filter screen 53 is 0.1 mm to 1 mm. In this way, the thickness is moderate, can withstand a certain pressure, and is not easy to be blocked, and the filtering effect can be guaranteed. Specifically, the thickness of the second filter screen 53 can be 0.1 mm, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1 mm, or any other value within the range of 0.1 mm to 1 mm.
[0035] Furthermore, the inner diameter ratio of the first self-circulating pipeline 20 and the second self-circulating pipeline 30 is 0.5 to 1.0. In this way, more fluid can be ensured to pass through the second self-circulating pipeline 30, thereby ensuring the removal effect of small particles. Specifically, the inner diameter ratio of the first self-circulating pipeline 20 and the second self-circulating pipeline 30 can be 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, or any other value within the range of 0.5 to 1.0.
[0036] Furthermore, the small particle removal device 50 also includes an ultrasonic generator 54 and a transducer 55, which are electrically connected and used to generate ultrasonic waves, and the coverage of the ultrasonic waves includes the pipeline between the first outlet 42 of the delivery pump 40 and the second inlet 511, the second inlet 511 and the second outlet 512. In this way, the cavitation effect of the ultrasonic waves can make the small particles adhered to the surface of the large particles fall out, thereby enhancing the separation effect of the large particles and the small particles; the oscillation effect of the ultrasonic waves can make the particles embedded in the first filter screen 52 and the second filter screen 53 fall out, thereby preventing the first filter screen 52 and the second filter screen 53 from being blocked and reducing the efficiency of the filtration separation.
[0037] In this embodiment, the ultrasonic generator 54 and the transducer 55 are disposed below the collector 51 , but not limited thereto. In other embodiments, the ultrasonic generator 54 and the transducer 55 may also be disposed near the side wall of the collector 51 .
[0038] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0039] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the scope of patent protection of the present application shall be subject to the attached claims.
Claims
1. A ternary precursor preparation device, characterized in that: include: A reaction kettle, a first self-circulating pipeline, a second self-circulating pipeline, a delivery pump and a small particle removal device, wherein the delivery pump has a first inlet and a first outlet, and the small particle removal device has a second inlet and a second outlet, The first inlet of the delivery pump is connected to the bottom of the reactor, the first outlet of the delivery pump is connected to the first self-circulation pipeline and the second inlet of the small particle removal device, the other end of the first self-circulation pipeline is connected to the top of the reactor, the second outlet of the small particle removal device is connected to the second self-circulation pipeline, and the other end of the second self-circulation pipeline is connected to the top of the reactor.
2. The ternary precursor preparation device according to claim 1, characterized in that: The small particle removal device includes a collector, a first filter and a second filter. The second inlet and the second outlet are respectively connected to the inner cavity of the collector. The first filter is arranged at the second inlet, and the second filter is arranged at the second outlet. The aperture of the first filter is larger than that of the second filter.
3. The ternary precursor preparation device according to claim 2, characterized in that: The collector is detachably connected to the first outlet of the delivery pump and the second self-circulation pipeline.
4. The ternary precursor preparation device according to claim 2, characterized in that: The first filter screen is detachably arranged at the second inlet, and the second filter screen is detachably arranged at the second outlet.
5. The ternary precursor preparation device according to claim 2, characterized in that: The pore size of the first filter screen is 1 μm to 7 μm, and the porosity is 40% to 70%.
6. The ternary precursor preparation device according to claim 5, characterized in that: The thickness of the first filter screen is 0.5 mm to 10 mm.
7. The ternary precursor preparation device according to claim 2, characterized in that: The pore size of the second filter screen is 0.1 μm to 0.5 μm, and the porosity is 40% to 70%.
8. The ternary precursor preparation device according to claim 7, characterized in that: The thickness of the second filter screen is 0.1 mm to 1 mm.
9. The ternary precursor preparation device according to claim 3, characterized in that: The small particle removal device also includes an ultrasonic generator and a transducer, which are electrically connected to each other and are used to generate ultrasonic waves. The coverage range of the ultrasonic waves includes the pipeline between the first outlet and the second inlet of the delivery pump, the second inlet and the second outlet.
10. The ternary precursor preparation device according to any one of claims 1 to 9, characterized in that: The inner diameter ratio of the first self-circulation pipe and the second self-circulation pipe is 0.5 to 1.0.