Probe station cavity automatic cleaning device for wafer production

By setting up an FFU fan unit and a removable filter in the probe cavity, the pollution problem in wafer testing is solved, automatic cleaning and efficient protection of the cavity are achieved, and the internal cleanliness and output efficiency of the equipment are improved.

CN222153335UActive Publication Date: 2024-12-13ACETEC (SHANGHAI) SEMICON CO LTD
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Patent Information

Application Number
CN202420152350.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-01-22
Publication Date
2024-12-13
Estimated Expiration
2034-01-22

AI Technical Summary

Technical Problem

During the test of the probe, wafers are easily contaminated by external dust and internal particulate matter, which affects quality, and manual cleaning is difficult to completely solve, which wastes time and affects equipment output.

Method used

Design an automatic cleaning device for the probe cavity including an FFU fan unit and a removable air inlet filter. The particulate matter in the cavity is sucked away through the FFU fan unit, and the air inlet filter and air outlet filter are used to prevent the entry of external particles. The overall structure is removable for easy cleaning.

Benefits of technology

Effectively prevent external dust and internal particles from entering the cavity, maintain the cleanliness of the cavity, simplify the cleaning process, and improve the output efficiency of the equipment.

✦ Generated by Eureka AI based on patent content.

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    Figure CN222153335U_ABST
Patent Text Reader

Abstract

The utility model discloses an automatic cleaning device for a cavity of a probe station for wafer production, which comprises a probe station body, a cavity for testing a wafer is arranged in the probe station body, an air inlet is arranged at the front side end of the probe station body, a detachable air inlet filter screen is arranged at the air inlet, and an air outlet is arranged at the front side end of the probe station body. And an FFU fan unit is correspondingly arranged at the rear side end of the probe station body. According to the device, particulate matters in air entering from the outside are blocked by the air inlet filter screen, and the particulate matters in the outside air cannot enter the cavity; particulate matters generated by each part in the cavity are sucked to the middle filter screen under the action of the FFU, do not float in the cavity and do not influence wafer testing, and do not enter the cavity at the rear side under the action of the middle filter screen and the air outlet filter screen, and the FFU is integrally detachable, so that the assembly and disassembly are convenient. And the whole structure is reasonable, and the cleanliness of the interior of the cavity is kept.
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