High-reliability bridging structure and touch screen

By setting the defiling layer of silicon oxide and silicon nitride film layers in the bypass structure, protecting the insulating bridge and eliminating the refractive index difference, the problem of decreasing adhesion and poor display effect in the conductive bridge production is solved, and the Higher stability and display effect.

CN222189865UActive Publication Date: 2024-12-17TRULY OPTO ELECTRONICS
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Patent Information

Application Number
CN202323430914.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2023-12-15
Publication Date
2024-12-17
Estimated Expiration
2033-12-15

AI Technical Summary

Technical Problem

When the existing bridge structure is made in conductive bridges, the adhesion of the OC insulating bridge becomes worse due to the strong acid etching liquid, which makes it easy to fall off, and the display effect is poor due to the difference in refractive index of different film layers.

Method used

The first detonation layer of the silicon oxide film layer and the silicon nitride film layer is arranged between the OC insulating bridge and the conductive bridge to cover the protective insulation bridge to avoid contact with the strong acid etching liquid, and to stack the provided silicon oxide and nitride The silicon film layer eliminates the difference in refractive index.

Benefits of technology

Improves the stability of the OC insulating bridge, prevents the adhesion from being reduced, eliminates the outline bottom shadow, and improves the overall display effect.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a high-reliability bridging structure, which comprises a conductive film, a first electrode layer and a second electrode layer, the OC insulation bridges are arranged at the intersections of the first touch electrodes and the second touch electrodes; the first shadow eliminating layer is arranged on the first touch electrode, the second touch electrode and the OC insulating bridge, and through holes are formed in the positions, corresponding to the first touch electrode and the second touch electrode, of the first shadow eliminating layer; the conductive bridge is arranged at the position, corresponding to the OC insulation bridge, of the first shadow eliminating layer, and the first touch electrode and the second touch electrode are connected through a through hole in the first shadow eliminating layer. The bridging structure can improve the stability and the display effect of the OC insulation bridge. The utility model further provides a touch screen which comprises the bridging structure.
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Description

Technical Field

[0001] The utility model relates to touch screen technology, in particular to a high-reliability bridge structure and a touch screen. Background Art

[0002] In GG and OGS touch screens, the conductive film and the sensor are made on the same piece of glass, and the touch electrodes in two directions are interlaced with each other in the same film layer. In order to ensure that the touch electrodes in two directions are not short-circuited, a bridging structure is generally used at the intersection of the touch electrodes in two directions. The bridging structure is used to ensure that the touch electrodes in the same direction are connected, while the touch electrodes in two directions are insulated.

[0003] The existing bridge structure is as follows Figure 1 As shown, it includes a conductive film 1', an OC insulating bridge 2', a conductive bridge 3' and a protective layer 4' which are stacked in sequence, the conductive film 1' includes a first touch electrode 11' along a first direction and a second touch electrode 12' along a second direction, the first touch electrode 11' is continuous at the intersection with the second touch electrode 12', and the second touch electrode 12' is disconnected at the intersection with the first touch electrode 11', the OC insulating bridge 2' is arranged at the intersection of the first touch electrode 11' and the second touch electrode 12' to separate the first touch electrode 11' from the second touch electrode 12', and the conductive bridge 3' is arranged on the OC insulating bridge 2' to connect the disconnected second touch electrode 12'.

[0004] However, the OC material used for the OC insulating bridge 2' is a kind of polyisoprene, which is not resistant to strong acid, and the etching solution for making the conductive bridge 3' contains hydrochloric acid or nitric acid, both of which are strong acids. Therefore, when etching to make the conductive bridge 3', the strong acid etching solution will make the adhesion of the OC insulating bridge 2' with low density worse, making it easy to fall off, and the larger the contact area between the OC insulating bridge 2' and the etching solution, the greater the impact. Utility Model Content

[0005] In order to solve the above-mentioned deficiencies in the prior art, the utility model provides a bridge structure, which can improve the stability and display effect of the OC insulation bridge.

[0006] The utility model also provides a touch screen, comprising the above-mentioned bridge structure.

[0007] The technical problem to be solved by the utility model is achieved through the following technical solutions:

[0008] A high-reliability bridge structure, comprising:

[0009] A conductive film, comprising a first touch electrode along a first direction and a second touch electrode along a second direction, wherein the first touch electrode is continuous at an intersection with the second touch electrode, and the second touch electrode is disconnected at an intersection with the first touch electrode;

[0010] An OC insulating bridge is provided at the intersection of the first touch electrode and the second touch electrode to separate the first touch electrode from the second touch electrode;

[0011] A first shadow elimination layer is arranged on the first touch electrode, the second touch electrode and the OC insulating bridge, and is provided with through holes at positions corresponding to the first touch electrode and the second touch electrode respectively;

[0012] The conductive bridge is arranged at a position of the first shadow elimination layer corresponding to the OC insulating bridge, and connects the first touch electrode and the second touch electrode through a through hole in the first shadow elimination layer.

[0013] Furthermore, the material of the OC insulating bridge is polyisoprene.

[0014] Furthermore, the conductive bridge is an ITO bridge or a metal bridge.

[0015] Furthermore, the conductive film is an ITO film.

[0016] Furthermore, the first shadow elimination layer includes a silicon oxide film layer and a silicon nitride film layer, and the silicon oxide film layer and the silicon nitride film layer are stacked in sequence.

[0017] Furthermore, the bridge structure further comprises:

[0018] The protective layer is arranged on the first shadow elimination layer and the conductive bridge.

[0019] Furthermore, the bridge structure further comprises:

[0020] The second image elimination layer is arranged under the conductive film.

[0021] Furthermore, the second image elimination layer includes a silicon oxide film layer and a silicon nitride film layer, and the silicon oxide film layer and the silicon nitride film layer are stacked in sequence.

[0022] A touch screen comprises a protective cover plate and the above-mentioned bridge structure, wherein the bridge structure is arranged on the surface of the protective cover plate.

[0023] A touch screen comprises a base substrate, a protective cover plate and the above-mentioned bridge structure, wherein the base substrate and the protective cover plate are relatively fitted, and the bridge structure is arranged on a side surface of the base substrate facing the protective cover plate.

[0024] The utility model has the following beneficial effects: the bridging structure of the utility model sets the first shadow-eliminating layer between the OC insulating bridge and the conductive bridge, and uses the first shadow-eliminating layer to cover and protect the OC insulating bridge, so as to avoid the strong acid etching solution for etching the conductive bridge from contacting with the OC insulating bridge when etching the conductive bridge, and prevent the strong acid etching solution from damaging the OC insulating bridge, thereby ensuring the adhesion of the OC insulating bridge and improving the stability of the OC insulating bridge; in addition, the first shadow-eliminating layer covers the first touch electrode, the second touch electrode and the OC insulating bridge at the same time, which can eliminate the refractive index difference between different film layers, avoid the contour background formed due to the refractive index difference between different film layers, and improve the overall display effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 This is a structural diagram of the existing bridge structure.

[0026] Figure 2 This is a structural schematic diagram of the bridge structure provided by the utility model.

[0027] Figure 3 This is a structural schematic diagram of another bridge structure provided by the utility model.

[0028] Figure 4 The present invention is a schematic structural diagram of an OGS touch screen.

[0029] Figure 5 This is a schematic structural diagram of the GG touch screen provided by the utility model. DETAILED DESCRIPTION

[0030] The present invention is described in detail below in conjunction with the accompanying drawings and embodiments, examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0031] In the description of the present invention, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0032] In addition, the terms "first", "second", and "third" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first", "second", and "third" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0033] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix", "set" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0034] Embodiment 1

[0035] like Figure 2 As shown, a high reliability bridge structure includes:

[0036] A conductive film 1, comprising a first touch electrode 11 along a first direction and a second touch electrode 12 along a second direction, wherein the first touch electrode 11 is continuous at an intersection with the second touch electrode 12, and the second touch electrode 12 is disconnected at an intersection with the first touch electrode 11;

[0037] An OC insulating bridge 2 is disposed at the intersection of the first touch electrode 11 and the second touch electrode 12 to separate the first touch electrode 11 from the second touch electrode 12;

[0038] The first shadow elimination layer 5 is disposed on the first touch electrode 11, the second touch electrode 12 and the OC insulating bridge 2, and is provided with through holes 50 at positions corresponding to the first touch electrode 11 and the second touch electrode 12;

[0039] The conductive bridge 3 is disposed at a position of the first shadow elimination layer 5 corresponding to the OC insulating bridge 2 , and connects the first touch electrode 11 and the second touch electrode 12 through a through hole 50 in the first shadow elimination layer 5 .

[0040] The bridging structure of this embodiment arranges the first shadow-eliminating layer 5 between the OC insulating bridge 2 and the conductive bridge 3, and uses the first shadow-eliminating layer 5 to cover and protect the OC insulating bridge 2, so as to avoid the strong acid etching solution for etching the conductive bridge 3 from contacting with the OC insulating bridge 2 when etching the conductive bridge 3, thereby preventing the strong acid etching solution from damaging the OC insulating bridge 2, ensuring the adhesion of the OC insulating bridge 2, and improving the stability of the OC insulating bridge 2; in addition, the first shadow-eliminating layer 5 covers the first touch electrode 11, the second touch electrode 12 and the OC insulating bridge 2 at the same time, which can eliminate the refractive index difference between different regions, avoid the contour background formed between different regions due to the refractive index difference, and improve the overall display effect.

[0041] In this embodiment, the material of the OC insulating bridge 2 may be, but is not limited to, polyisoprene, and may also be other insulating materials that are not acid-resistant or not strong acid-resistant.

[0042] The conductive bridge 3 is an ITO bridge or a metal bridge. When the conductive bridge 3 is an ITO bridge, the etching solution for etching the ITO bridge contains hydrochloric acid. When the conductive bridge 3 is a metal bridge, the etching solution for etching the metal bridge contains nitric acid.

[0043] In this embodiment, the conductive film 1 may be but is not limited to an ITO film, the first touch electrode 11 and the second touch electrode 12 may be but are not limited to ITO electrodes, the first touch electrode 11 and the second touch electrode 12 may be but are not limited to rectangular electrodes, strip electrodes or prism electrodes, etc.; multiple first touch electrodes 11 and multiple second touch electrodes 12 are crisscrossed to form a touch sensor array.

[0044] The first shadow elimination layer 5 includes a silicon oxide film layer and a silicon nitride film layer, which are stacked in sequence; the thickness of the first shadow elimination layer 5 is 30-65nm, the thickness of the silicon oxide film layer is 10-40nm, and the thickness of the silicon nitride film layer is 10-40nm.

[0045] The silicon oxide film layer and the silicon nitride film layer have different refractive indices. Light will be emitted and refracted at the interface of the silicon oxide film layer and the silicon nitride film layer due to the sudden change in refractive index. The emitted and refracted light will cancel each other out due to coherent diffraction, thereby eliminating the refractive index difference between different regions of the bridge structure due to the different number of film layers and film layer materials. At the same time, the silicon oxide film layer and the silicon nitride film layer are both dense inorganic oxide films, which can well isolate the OC insulating glue from the outside world and prevent the OC insulating glue from being damaged by strong acid etching liquid.

[0046] The bridge structure further comprises:

[0047] The protective layer 4 is arranged on the first shadow elimination layer 5 and the conductive bridge 3 .

[0048] The protective layer 4 may be, but is not limited to, an OC insulating film layer or an inorganic oxide film layer, and its main function is to provide protection for the outermost layer of the bridging structure and to make the outermost layer of the bridging structure flat to facilitate bonding with other devices.

[0049] Embodiment 2

[0050] As an optimization solution of the first embodiment, in this embodiment, if Figure 3 As shown, the bridge structure also includes:

[0051] The second image elimination layer 6 is arranged under the conductive film 1 .

[0052] The bridge structure of this embodiment adds the second shadow-eliminating layer 6 under the conductive film 1, so that the first shadow-eliminating layer 5 and the second shadow-eliminating layer 6 can jointly eliminate the refractive index difference between different areas, thereby further improving the overall display effect.

[0053] The first shadow elimination layer 5 includes a silicon oxide film layer and a silicon nitride film layer, which are stacked in sequence; the thickness of the first shadow elimination layer 5 is 30-65nm, the thickness of the silicon oxide film layer is 10-40nm, and the thickness of the silicon nitride film layer is 10-40nm.

[0054] Embodiment 2

[0055] like Figure 4 As shown, a touch screen includes a protective cover plate 300 and the bridge structure 200 described in the first or second embodiment, wherein the bridge structure 200 is arranged on the surface of the protective cover plate 300 .

[0056] The touch screen of this embodiment adopts an OGS structure, that is, the first touch electrode 11 and the second touch electrode 12 of the conductive film 1, and the bridging structure 200 bridging the first touch electrode 11 and the second touch electrode 12 are directly manufactured on the protective cover plate 300 of the electronic device to reduce the overall thickness of the product and reduce light loss.

[0057] The protective cover plate 300 may be, but is not limited to, a plastic cover plate, a glass cover plate, or a sapphire cover plate.

[0058] Embodiment 3

[0059] like Figure 5As shown, a touch screen includes a base substrate 100, a protective cover plate 300 and the above-mentioned bridge structure 200, wherein the base substrate 100 is relatively fitted with the protective cover plate 300, and the bridge structure 200 is arranged on a side surface of the base substrate 100 facing the protective cover plate 300.

[0060] The touch screen of this embodiment adopts a GG structure, that is, the first touch electrode 11 and the second touch electrode 12 of the conductive film 1, and the bridging structure 200 bridging the first touch electrode 11 and the second touch electrode 12 are first manufactured on the base substrate 100, and then the base substrate 100 is bonded to the protective cover 300 of the electronic device through OCA optical glue to reduce the difficulty of the process.

[0061] The protective cover plate 300 may be, but is not limited to, a plastic cover plate, a glass cover plate, or a sapphire cover plate, and the base substrate 100 may be, but is not limited to, a plastic substrate, a glass substrate, or a sapphire substrate, and the like.

[0062] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the embodiments of the utility model rather than to limit them. Although the embodiments of the utility model are described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the embodiments of the utility model can still be modified or replaced by equivalents, and these modifications or equivalent replacements cannot cause the modified technical solutions to deviate from the scope of the technical solutions of the embodiments of the utility model.

Claims

1. A high reliability bridge structure, characterized in that: include: A conductive film, comprising a first touch electrode along a first direction and a second touch electrode along a second direction, wherein the first touch electrode is continuous at an intersection with the second touch electrode, and the second touch electrode is disconnected at an intersection with the first touch electrode; An OC insulating bridge is provided at the intersection of the first touch electrode and the second touch electrode to separate the first touch electrode from the second touch electrode; A first shadow elimination layer is arranged on the first touch electrode, the second touch electrode and the OC insulating bridge, and is provided with through holes at positions corresponding to the first touch electrode and the second touch electrode respectively; The conductive bridge is arranged at a position of the first shadow elimination layer corresponding to the OC insulating bridge, and connects the first touch electrode and the second touch electrode through a through hole in the first shadow elimination layer.

2. The high reliability bridge structure according to claim 1, characterized in that: The material of the OC insulating bridge is polyisoprene.

3. The high reliability bridge structure according to claim 1, characterized in that: The conductive bridge is an ITO bridge or a metal bridge.

4. The high reliability bridge structure according to claim 1, characterized in that: The conductive film is an ITO film.

5. The high reliability bridge structure according to claim 1, characterized in that: The first shadow elimination layer includes a silicon oxide film layer and a silicon nitride film layer, and the silicon oxide film layer and the silicon nitride film layer are stacked in sequence.

6. The high reliability bridge structure according to claim 1, characterized in that: The bridge structure further comprises: The protective layer is arranged on the first shadow elimination layer and the conductive bridge.

7. The high reliability bridge structure according to claim 1, characterized in that: The bridge structure further comprises: The second image elimination layer is arranged under the conductive film.

8. The high reliability bridge structure according to claim 7, characterized in that: The second image elimination layer includes a silicon oxide film layer and a silicon nitride film layer, and the silicon oxide film layer and the silicon nitride film layer are stacked in sequence.

9. A touch screen, characterized in that: It comprises a protective cover plate and the bridging structure described in any one of claims 1 to 8, wherein the bridging structure is arranged on the surface of the protective cover plate.

10. A touch screen, characterized in that: It comprises a base substrate, a protective cover plate and the bridge structure described in any one of claims 1 to 8, wherein the base substrate is relatively fitted with the protective cover plate, and the bridge structure is arranged on a side surface of the base substrate facing the protective cover plate.