Polishing equipment used for quartz processing and provided with adjusting mechanism

Abstract

The utility model relates to the technical field of quartz processing, and discloses quartz processing polishing equipment with an adjusting mechanism, which comprises a base, supporting columns are fixedly mounted at four corners of the bottom of the base, a fixing plate is fixedly mounted outside the four supporting columns, and a blanking plate is fixedly mounted on the right sides of the supporting columns. A mounting frame is fixedly mounted on the left side of the base, an adjusting mechanism is arranged in the base, a polishing mechanism is arranged in the mounting frame, two clamping plates clamp a quartz stone plate, the quartz stone plate is prevented from sliding and even falling off during rotation and polishing, and a rotary disc rotates to enable the unpolished quartz stone plate to rotate to the bottom of a polishing disc. The polished quartz stone plate can slide down from the containing plate and the discharging plate, continuous polishing is completed, the working efficiency is higher, the polishing disc rotates to polish the quartz stone plate, dust generated during polishing can be sucked away by the dust collector, and the dust cover prevents the dust from scattering all around to affect the environment.

Description

Technical Field

[0001] The utility model relates to the technical field of quartz processing, in particular to a polishing device with an adjusting mechanism for quartz processing. Background Art

[0002] Quartz is a mineral that easily turns into liquid when heated or under pressure. It is also a very common rock-forming mineral, found in all three major types of rocks. Quartz is usually made into quartz slabs. When polishing it, a polishing device with an adjustment mechanism is needed for quartz processing.

[0003] According to the description of a quartz processing polishing equipment disclosed on the patent website (authorization announcement number: CN 211890352 U), "The utility model discloses a quartz processing polishing equipment, which relates to the technical field of quartz slab processing, including a frame, a processing table is arranged on the frame, a turntable is rotatably arranged on the processing table, a power structure for driving the turntable to rotate is arranged on the frame, and a positioning structure is arranged on the turntable; the positioning structure includes a connecting column arranged at the center of the turntable, a positioning plate is arranged on the upper end of the connecting column, a plurality of rotating openings are evenly arranged on the circumferential wall of the positioning plate, a rotating plate is rotatably arranged in the rotating opening, a U-shaped positioning plate is arranged on the upper surface of the rotating plate, the lower surface of the rotating plate is rotatably connected to the output shaft of the rotating cylinder, and the rotating cylinder is rotatably connected to the turntable; a polishing structure is arranged on the side wall of the processing table; the present application has the advantages of simple structure, good dust collection effect, high polishing efficiency, etc.".

[0004] In view of the above description, the applicant believes that there are the following problems:

[0005] During use, the utility model can indirectly drive the positioning plate to rotate intermittently through the arranged power structure, so that the quartz stone plate placed on the rotating plate can be moved to just under the polishing wheel, and then the quartz stone plate is polished by the polishing wheel in the polishing structure. However, in actual use, the positioning plate in the device can only make the quartz stone plate be placed more accurately, and cannot clamp quartz stone plates of various sizes. The intermittent rotation of the turntable will drive the quartz stone to rotate synchronously, and centrifugal force will be generated during rotation, causing the quartz stone to slide on the top of the turntable and become suspended, which is not convenient for subsequent polishing and may even be thrown out of the turntable, resulting in material waste and threatening the safety of the operator. In addition, when polishing, the quartz stone will also move on the top of the turntable, making polishing more inconvenient. Therefore, it is necessary to improve a polishing device with an adjustment mechanism for quartz processing to solve the above problems. Utility Model Content

[0006] The utility model aims to provide a polishing device with an adjustment mechanism for quartz processing to solve the problems raised in the above-mentioned background technology.

[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a polishing device with an adjustment mechanism for quartz processing, comprising a base, support columns are fixedly installed at the four corners of the bottom of the base, fixing plates are fixedly installed on the outside of the four support columns, a blanking plate is fixedly installed on the right side of the support column, a mounting frame is fixedly installed on the left side of the base, an adjustment mechanism is arranged inside the base, and a polishing mechanism is arranged inside the mounting frame.

[0008] The adjustment mechanism comprises a rotation adjustment component and a positioning adjustment component, and the positioning adjustment component is arranged outside the rotation adjustment component.

[0009] Preferably, the rotation adjustment component includes a motor A, which is fixedly mounted on the bottom of a fixed plate, a pulley A is fixedly mounted on the output end of the motor A, a belt is installed on the external transmission of the pulley A, a rotating shaft is rotatably mounted inside the fixed plate, a pulley B is fixedly mounted on the outside of the rotating shaft, a turntable is fixedly mounted on the outside of the rotating shaft, and a rectangular mounting plate is fixedly mounted on the top of the rotating shaft, driving the four placement plates to rotate.

[0010] Preferably, the bottom of the turntable fits with the top of the base, the rotating shaft is rotatably installed inside the base, and the end of the belt away from the pulley A is transmission-installed on the outside of the pulley B. The diameter of the pulley B is larger than the diameter of the pulley A, so that the turntable rotates more slowly and steadily, and the rotation angle is more precise.

[0011] Preferably, the positioning and adjustment assembly includes four placement plates, and the four placement plates are rotatably mounted inside the rectangular mounting plate, and a rotating cylinder is rotatably mounted on the bottom of the four placement plates, a baffle is fixedly mounted on the top of the placement plate, and a motor B is fixedly mounted on the outside of the placement plate, and a bidirectional threaded rod is fixedly mounted on the output end of the motor B, and two sliders are mounted on the external threads of the bidirectional threaded rod, and a clamp is fixedly mounted on the top of the two sliders, and an anti-sliding block is fixedly mounted on the inner side of the two clamps to make the clamping tighter.

[0012] Preferably, the clamping plate and the anti-sliding block are both slidably installed on the top of the placing plate, the sliding block is slidably installed inside the placing plate, the bidirectional threaded rod is rotatably installed inside the placing plate, and the rotating cylinder is rotatably installed inside the turntable at one end away from the placing plate, so that the inclination angle of the placing plate can be adjusted to facilitate automatic unloading.

[0013] Preferably, the polishing mechanism includes two lifting cylinders, both of which are fixedly installed inside the mounting frame, a lifting plate is fixedly installed on the output end of the lifting cylinder, a motor C is fixedly installed on the top of the lifting plate, a polishing disk is fixedly installed on the output end of the motor C, a dust cover is fixedly installed on the bottom of the lifting plate, a vacuum cleaner is provided on the top of the mounting frame, and a dust hood is provided on the bottom of the lifting plate to prevent dust from scattering and affecting the environment.

[0014] Preferably, the dust hood is fixedly mounted on the vacuum cleaner, and the dust hood is arranged inside the dustproof cover to absorb dust generated by polishing.

[0015] Compared with the prior art, the utility model provides a polishing device with an adjustment mechanism for quartz processing, which has the following beneficial effects:

[0016] 1. The quartz processing polishing equipment has an adjustment mechanism. Through the set adjustment mechanism, during use, the bidirectional threaded rod drives the two clamps to clamp the quartz slab. The anti-sliding block makes the clamping tighter to avoid the quartz slab sliding or even falling off during rotation and polishing, which is not conducive to polishing. The rotation of the turntable makes the unpolished quartz slab turn to the bottom of the polishing plate, and the polished quartz slab can slide down from the placement plate and the unloading plate to complete automatic unloading, completing continuous polishing and higher work efficiency.

[0017] 2. The polishing equipment with an adjustment mechanism for quartz processing has a polishing mechanism that is set up. During use, the polishing disc is rotated by the lifting cylinder, lifting plate and motor C to polish the quartz slab. The dust generated by polishing will be sucked away by the vacuum cleaner, and the dust cover prevents the dust from scattering and affecting the environment. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative labor:

[0019] Figure 1 This is a schematic diagram of the appearance structure of the utility model;

[0020] Figure 2 This is a schematic diagram of the cross-sectional structure of the utility model;

[0021] Figure 3 This is a schematic diagram of the structure of the adjustment mechanism of the utility model;

[0022] Figure 4 This is a schematic diagram of the exploded structure of the rectangular mounting plate and its connected mechanism of the utility model;

[0023] Figure 5 This is a schematic diagram of the exploded structure of the placement plate and its connected mechanism of the utility model;

[0024] Figure 6 It is a schematic diagram of the exploded structure of the polishing mechanism of the utility model.

[0025] In the figure: 1. base; 2. support column; 3. fixed plate; 4. unloading plate; 5. mounting frame; 6. adjustment mechanism; 61. rotation adjustment component; 611. motor A; 612. pulley A; 613. belt; 614. rotating shaft; 615. pulley B; 616. turntable; 617. rectangular mounting plate; 62. positioning adjustment component; 621. placement plate; 622. rotating cylinder; 623. baffle; 624. motor B; 625. bidirectional threaded rod; 626. slider; 627. splint; 628. anti-sliding block; 7. polishing mechanism; 71. lifting cylinder; 72. lifting plate; 73. motor C; 74. polishing disc; 75. dust cover; 76. vacuum cleaner; 77. dust cover. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0027] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances. Example

[0028] See also Figure 1-5 The utility model provides a technical solution: a polishing device with an adjustment mechanism for quartz processing, comprising a base 1, support columns 2 are fixedly installed at the four corners of the bottom of the base 1, fixed plates 3 are fixedly installed outside the four support columns 2, a blanking plate 4 is fixedly installed on the right side of the support columns 2, a mounting frame 5 is fixedly installed on the left side of the base 1, an adjustment mechanism 6 is arranged inside the base 1, and a polishing mechanism 7 is arranged inside the mounting frame 5.

[0029] The adjustment mechanism 6 includes a rotation adjustment component 61 and a positioning adjustment component 62 . The positioning adjustment component 62 is arranged outside the rotation adjustment component 61 .

[0030] Furthermore, the rotation adjustment component 61 includes a motor A611, which is fixedly installed at the bottom of the fixed plate 3. A pulley A612 is fixedly installed at the output end of the motor A611, and a belt 613 is installed on the external transmission of the pulley A612. A rotating shaft 614 is installed inside the fixed plate 3, a pulley B615 is fixedly installed outside the rotating shaft 614, a turntable 616 is fixedly installed outside the rotating shaft 614, and a rectangular mounting plate 617 is fixedly installed on the top of the rotating shaft 614, which drives the four placement plates 621 to rotate.

[0031] Furthermore, the bottom of the turntable 616 is fitted with the top of the base 1, the shaft 614 is rotatably installed inside the base 1, and the end of the belt 613 away from the pulley A612 is transmission-installed on the outside of the pulley B615. The diameter of the pulley B615 is larger than the diameter of the pulley A612, so that the turntable 616 rotates more slowly and steadily, and the rotation angle is more precise.

[0032] Furthermore, the positioning and adjustment component 62 includes four placement plates 621, and the four placement plates 621 are rotatably installed inside the rectangular mounting plate 617. The bottom of the four placement plates 621 is rotatably installed with a rotating cylinder 622, the top of the placement plates 621 is fixedly installed with a baffle 623, the outside of the placement plates 621 is fixedly installed with a motor B624, the output end of the motor B624 is fixedly installed with a bidirectional threaded rod 625, the external threads of the bidirectional threaded rod 625 are installed with two sliders 626, the tops of the two sliders 626 are fixedly installed with clamps 627, and the inner sides of the two clamps 627 are fixedly installed with anti-sliding blocks 628 to make the clamping tighter.

[0033] Furthermore, the clamping plate 627 and the anti-sliding block 628 are both slidably installed on the top of the placing plate 621, the sliding block 626 is slidably installed inside the placing plate 621, the bidirectional threaded rod 625 is rotatably installed inside the placing plate 621, and the end of the rotating cylinder 622 away from the placing plate 621 is rotatably installed inside the turntable 616, so that the inclination angle of the placing plate 621 can be adjusted to facilitate automatic unloading. Example

[0034] See also Figure 6, and combined with Example 1, it is further obtained that the polishing mechanism 7 includes two lifting cylinders 71, the two lifting cylinders 71 are fixedly installed inside the mounting frame 5, the output end of the lifting cylinder 71 is fixedly installed with a lifting plate 72, the top of the lifting plate 72 is fixedly installed with a motor C73, the output end of the motor C73 is fixedly installed with a polishing disc 74, the bottom of the lifting plate 72 is fixedly installed with a dust cover 75, the top of the mounting frame 5 is provided with a dust collector 76, and the bottom of the lifting plate 72 is provided with a dust cover 77 to prevent dust from scattering and affecting the environment.

[0035] Furthermore, the dust hood 77 is fixedly installed with the dust collector 76, and the dust hood 77 is arranged inside the dustproof cover 75 to absorb the dust generated by polishing.

[0036] In actual operation, when the device is used, the operator stands on the back of the base 1 and places the quartz slab on the top of the placement plate 621, with one side of the quartz slab in contact with the baffle 623 and flush, and starts the motor B624 to drive the bidirectional threaded rod 625 to rotate, so that the two sliders 626 are threadedly installed on the outside of the bidirectional threaded rod 625, driving the two clamping plates 627 to approach and clamp the quartz slab, and starts the motor A611 to drive the pulley A612 to rotate, so that the belt 613 drives the pulley B615 to rotate, so that the shaft 614 drives the turntable 616 and the rectangular mounting plate 617 to rotate, so that the placement plate 621 drives the quartz slab to rotate ninety degrees, so that the clamped quartz slab moves to the bottom of the polishing plate 74, and the diameter of the pulley A612 is smaller than the diameter of the pulley B615, so that the turntable 616 rotates more slowly and steadily, and the rotation angle is more precise, and the lifting cylinder 71 is started to drive the lifting plate 72 to descend, so that the polishing plate 74 is polished. The disk 74 contacts the top of the quartz slab, and the starting motor C73 can drive the polishing disk 74 to rotate to polish the quartz slab. The dust generated by polishing will be sucked away by the vacuum cleaner 76. In the process of polishing, the rotating cylinder 622 connected to the placement plate 621 closest to the unloading plate 4 is started, driving the placement plate 621 to rotate. After the placement plate 621 is docked with the unloading plate 4, the starting motor B624 drives the two clamping plates 627 away from the quartz slab and no longer clamps it. At this time, the polished quartz slab can slide from the placement plate 621 and the unloading plate 4 to complete automatic unloading. Then the rotating cylinder 622 drives the placement plate 621 to reset. At this time, the polishing of the quartz slab on the leftmost placement plate 621 is completed, and the starting motor A611 drives the turntable 616 to rotate ninety degrees again, so that the empty placement plate 621 is turned to the operator for loading. The placement plate 621 that has completed loading is turned to the bottom of the polishing disk 74, completing continuous polishing, and the work efficiency is higher.

[0037] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "comprise a ..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

Claims

1. A polishing device with an adjustment mechanism for quartz processing, comprising a base (1), characterized in that: Support columns (2) are fixedly mounted at the four corners of the bottom of the base (1); fixing plates (3) are fixedly mounted on the outside of the four support columns (2); a blanking plate (4) is fixedly mounted on the right side of the support column (2); a mounting frame (5) is fixedly mounted on the left side of the base (1); an adjusting mechanism (6) is arranged inside the base (1); and a polishing mechanism (7) is arranged inside the mounting frame (5); The adjustment mechanism (6) comprises a rotation adjustment component (61) and a positioning adjustment component (62); the positioning adjustment component (62) is arranged outside the rotation adjustment component (61).

2. A polishing device with an adjustment mechanism for quartz processing according to claim 1, characterized in that: The rotation adjustment assembly (61) comprises a motor A (611), wherein the motor A (611) is fixedly mounted on the bottom of the fixed plate (3), a pulley A (612) is fixedly mounted on the output end of the motor A (611), a belt (613) is installed on the external transmission of the pulley A (612), a rotating shaft (614) is rotatably mounted inside the fixed plate (3), a pulley B (615) is fixedly mounted on the outside of the rotating shaft (614), a rotating disk (616) is fixedly mounted on the outside of the rotating shaft (614), and a rectangular mounting plate (617) is fixedly mounted on the top of the rotating shaft (614).

3. A polishing device with an adjustment mechanism for quartz processing according to claim 2, characterized in that: The bottom of the turntable (616) is fitted with the top of the base (1); the rotating shaft (614) is rotatably mounted inside the base (1); one end of the belt (613) away from the pulley A (612) is transmission-mounted outside the pulley B (615); and the diameter of the pulley B (615) is greater than the diameter of the pulley A (612).

4. A polishing device with an adjustment mechanism for quartz processing according to claim 2, characterized in that: The positioning adjustment assembly (62) comprises four placement plates (621), the four placement plates (621) are rotatably mounted inside a rectangular mounting plate (617), a rotating cylinder (622) is rotatably mounted on the bottom of the four placement plates (621), a baffle (623) is fixedly mounted on the top of the placement plates (621), a motor B (624) is fixedly mounted on the outside of the placement plates (621), a bidirectional threaded rod (625) is fixedly mounted on the output end of the motor B (624), two sliders (626) are mounted on the external threads of the bidirectional threaded rod (625), a clamping plate (627) is fixedly mounted on the top of the two sliders (626), and an anti-sliding plate (628) is fixedly mounted on the inner side of the two clamping plates (627).

5. A polishing device with an adjustment mechanism for quartz processing according to claim 4, characterized in that: The clamping plate (627) and the anti-sliding block (628) are both slidably mounted on the top of the placement plate (621), the sliding block (626) is slidably mounted inside the placement plate (621), the bidirectional threaded rod (625) is rotatably mounted inside the placement plate (621), and the end of the rotating cylinder (622) away from the placement plate (621) is rotatably mounted inside the turntable (616).

6. A polishing device with an adjustment mechanism for quartz processing according to claim 1, characterized in that: The polishing mechanism (7) comprises two lifting cylinders (71), the two lifting cylinders (71) are fixedly mounted inside the mounting frame (5), a lifting plate (72) is fixedly mounted on the output end of the lifting cylinder (71), a motor C (73) is fixedly mounted on the top of the lifting plate (72), a polishing disc (74) is fixedly mounted on the output end of the motor C (73), a dust cover (75) is fixedly mounted on the bottom of the lifting plate (72), a dust collector (76) is arranged on the top of the mounting frame (5), and a dust cover (77) is arranged on the bottom of the lifting plate (72).

7. A polishing device with an adjustment mechanism for quartz processing according to claim 6, characterized in that: The dust hood (77) is fixedly mounted on the dust collector (76), and the dust hood (77) is arranged inside the dustproof hood (75).

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