Microwave plasma vapor deposition equipment

Abstract

The utility model discloses microwave plasma vapor deposition equipment which comprises a device base, a cooling water tank, a water supplementing pipe, a water outlet pipe, a water pump, a water conveying pipe, MPCVD equipment and a return pipe and further comprises an adjusting mechanism and a gas supplementing mechanism, the cooling water tank is fixedly connected to the top of the device base, and the water supplementing pipe is fixedly installed on the inner wall of the cooling water tank. According to the microwave plasma vapor deposition equipment provided by the utility model, the fixed handle is rotated, so that the first piston descends along the fixed cylinder, the content of gas in the adjusting air bag is adjusted, the expansion degree of the adjusting air bag is further adjusted, and the flow speed of water flowing through the interior of the water conveying pipe is adjusted; the cooling intensity of the device is influenced by the flow speed of the water, so that the cooling intensity can be adjusted according to production requirements, the use flexibility of the device is improved, and the deposition effect of the device is improved by adjusting the deposition temperature of the device according to requirements.

Description

Technical Field

[0001] The utility model relates to the technical field of diamond preparation, in particular to a microwave plasma gas phase deposition device. Background Art

[0002] Polycrystalline diamond can be made from graphite using a unique directional blasting method, but the blasting method is old, so polycrystalline diamond is now mostly made through chemical vapor deposition. It is widely used in many fields as a precision abrasive, coating additive, and tool making. Polycrystalline diamond wafers require the use of microwave plasma chemical vapor deposition equipment (MPCVD equipment) when growing.

[0003] For example, a Chinese utility model patent (CN219301102U) discloses a cooling system for microwave plasma chemical vapor deposition equipment, which states: "The cooling tower and the industrial pure water machine are also connected by a water pump, which is used to pump water from the cooling tower into the industrial pure water machine. The industrial pure water machine is connected to the MPCVD equipment through a cooling water pipeline. The present application can improve the maintenance cycle of the cooling system, reduce maintenance costs, and improve cooling efficiency." It also states: "The existing cooling system has problems such as large cooling system pipeline loss and easy scale generation. Moreover, in extreme weather conditions, such as in some areas where the outdoor temperature in summer is maintained at around 45 degrees for a long time, the water temperature of the outdoor cooling tower remains high for a long time, and the cooling water cannot be effectively reduced to the required water temperature, which will have a great impact on the growth of the MPCVD equipment." Technical problems.

[0004] In summary, it can be seen that the prior art utilizes the addition of a refrigerator to improve the water cooling effect of the device. However, this method has the following technical problems: in actual use, the microwave plasma chemical vapor deposition equipment's requirements for cooling will change with different deposition processes, materials, the properties of the deposited film, and changes in equipment performance, and the device does not involve a structure for changing the degree of cooling, and thus has low applicability. For this reason, the present application proposes a microwave plasma chemical vapor deposition device to provide a new technical solution to solve the technical problems mentioned in the above patents. Utility Model Content

[0005] Based on this, it is necessary to provide a microwave plasma vapor deposition device to address the above technical problems. By rotating the fixed handle, the first piston is made to descend along the fixed cylinder, the internal gas content of the regulating airbag is adjusted, and then the expansion degree of the regulating airbag is adjusted, so that the flow rate of water flowing through the water pipe is adjusted. The speed of the water flow rate affects the cooling intensity of the device, so that it can be adjusted according to production needs, thereby improving the flexibility of the device. Adjusting the deposition temperature of the device according to demand improves the deposition effect of the device.

[0006] In order to solve the above technical problems, the utility model adopts the following technical solutions:

[0007] A microwave plasma vapor deposition device is a microwave plasma vapor deposition device used for adjusting the deposition temperature of the device and thus improving the deposition effect of the device.

[0008] The microwave plasma vapor deposition equipment specifically comprises:

[0009] It includes a device base, a cooling water tank, a water supply pipe, a water outlet pipe, a water pump, a water delivery pipe, an MPCVD device, a return pipe, and also includes a regulating mechanism and an air supply mechanism. The cooling water tank is fixedly connected to the top of the device base, the water supply pipe is fixedly installed on the inner wall of the cooling water tank, the water outlet pipe is fixedly installed on the inner wall of the cooling water tank, the end of the water outlet pipe away from the cooling water tank is fixedly installed on the water inlet end of the water pump, the water delivery pipe is fixedly installed on the water outlet end of the water pump, the MPCVD device is fixedly connected to the upper surface of the device base, the water delivery pipe is fixedly connected to the inner wall of the MPCVD device, the end of the water delivery pipe away from the water pump is fixedly connected to one end of the return pipe, the return pipe is fixedly connected to the inner wall of the MPCVD device, the end of the return pipe away from the MPCVD device is fixedly connected to the inner wall of the cooling water tank, the regulating mechanism is arranged on the water delivery pipe, and the air supply mechanism is arranged outside the water delivery pipe;

[0010] The regulating mechanism comprises a supporting shell, a fixing cylinder, a limiting assembly and an adjusting assembly. The supporting shell is fixedly connected to the outer wall of the water pipe, and one end of the supporting shell away from the water pipe is fixedly connected to the bottom of the fixing cylinder.

[0011] As a preferred embodiment of the microwave plasma vapor deposition equipment provided by the utility model, the limiting component includes an adjusting airbag fixedly connected to the inner wall of the supporting shell, the adjusting airbag is fixedly connected to the inner wall of the water pipe, and the inner wall of the fixing cylinder and the inside of the adjusting airbag are fixedly connected with an air outlet pipe.

[0012] As a preferred embodiment of the microwave plasma vapor deposition equipment provided by the utility model, the adjustment component includes a first piston slidably connected to the inner wall of the fixed cylinder, the first piston is rotatably connected to a threaded tube on the side away from the adjusting airbag, the first piston is fixedly connected to a limiting rod on the side away from the adjusting airbag, the threaded tube is threadedly connected to the inner wall of the fixed cylinder, the limiting rod is slidably connected to the inner wall of the fixed cylinder, and the threaded tube is fixedly connected to a fixed handle at one end away from the first piston.

[0013] As a preferred embodiment of the microwave plasma vapor deposition equipment provided by the utility model, the gas supply mechanism includes a mounting block, a gas supply barrel, a gas filling component, and a stabilizing component. The mounting block is fixedly connected to the outer wall of the water pipe, and the side of the mounting block away from the water pipe is fixedly connected to the outer wall of the gas supply barrel, and the gas supply barrel is fixedly connected to the inner wall of the fixed cylinder.

[0014] As a preferred embodiment of the microwave plasma vapor deposition equipment provided by the utility model, the gas filling component includes a fixed plate fixedly connected to the inner wall of the gas supply barrel, the inner wall of the fixed plate is slidably connected with a sliding rod, the end of the sliding rod away from the fixed plate is fixedly connected with a pressing block adapted to the gas supply barrel, the pressing block is movably connected to the inner wall of the gas supply barrel, the outer sleeve of the sliding rod is provided with a reset spring, and the two ends of the reset spring are respectively fixedly connected to the side where the pressing block and the fixed plate are close to each other.

[0015] As a preferred embodiment of the microwave plasma vapor deposition equipment provided by the utility model, the stabilizing component includes a filter plate fixedly connected to the inner wall of the gas supply barrel, the inner wall of the filter plate is slidably connected with a connecting rod, the end of the connecting rod away from the filter plate is fixedly connected with a movable plug adapted to the fixed plate, the outer sleeve of the connecting rod is provided with a fixing spring, and the two ends of the fixing spring are respectively fixedly connected to the side where the movable plug and the filter plate are close to each other.

[0016] Compared with the prior art, the utility model has the following beneficial effects:

[0017] The microwave plasma vapor deposition device provided by the utility model can adjust the internal gas content of the regulating airbag by rotating the fixed handle so that the first piston descends along the fixed cylinder, thereby adjusting the expansion degree of the regulating airbag, so that the flow rate of water flowing through the water pipe is adjusted, and the speed of the water flow rate affects the cooling intensity of the device, so that it can be adjusted according to production needs, thereby improving the flexibility of the device. The deposition temperature of the device is adjusted according to needs to improve the deposition effect of the device.

[0018] The microwave plasma vapor deposition device provided by the utility model presses the pressing block so that the pressing block enters the interior of the gas replenishing barrel, thereby compressing the gas inside the gas replenishing barrel and between the pressing block and the fixed plate. The compressed gas pushes open the movable plug and enters the interior of the fixed cylinder to replenish the gas inside the fixed cylinder, thereby avoiding the situation where the gas content inside the fixed cylinder and the regulating airbag is insufficient due to long-term use, resulting in a reduced effect on the flow rate regulation of water inside the water pipe, thereby improving the stability of the device and facilitating the later maintenance of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the scheme in the utility model, a brief introduction is given below to the drawings required for use in the description of the embodiments. Obviously, the drawings described below are some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0020] Figure 1 This is a schematic diagram of the overall structure of the microwave plasma vapor deposition equipment provided by the utility model;

[0021] Figure 2 A schematic cross-sectional view of part of the structure of the microwave plasma vapor deposition device provided by the utility model;

[0022] Figure 3 The microwave plasma vapor deposition device provided by the utility model Figure 2 A magnified view of middle;

[0023] Figure 4 A schematic diagram of the internal structure of the gas supply mechanism of the microwave plasma vapor deposition equipment provided by the utility model;

[0024] Figure 5 This is a schematic diagram of the internal structure of part of the gas replenishment mechanism of the microwave plasma vapor deposition equipment provided by the utility model.

[0025] The markings in the figure are as follows:

[0026] 1. Device base; 2. Cooling water tank; 3. Water supply pipe; 4. Water outlet pipe; 5. Water pump; 6. Water pipe; 7. MPCVD equipment; 8. Reflux pipe; 9. Adjustment mechanism; 10. Air supply mechanism; 11. Support shell; 12. Fixed cylinder; 13. Air outlet pipe; 14. Adjustment air bag; 15. First piston; 16. Threaded tube; 17. Limiting rod; 18. Fixed handle; 19. Mounting block; 20. Air supply barrel; 21. Fixed plate; 22. Sliding rod; 23. Reset spring; 24. Pressing block; 25. Filter plate; 26. Connecting rod; 27. Fixed spring; 28. Movable plug. DETAILED DESCRIPTION

[0027] In order to enable those skilled in the art to better understand the solution of the utility model, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is only a part of the embodiment of the utility model, not all of the embodiments. Based on the embodiment of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the utility model.

[0028] As described in the background art, in actual use, the microwave plasma chemical vapor deposition equipment's requirements for cooling will vary with different deposition processes, materials, properties of deposited films, and equipment performance, but the device does not involve a structure for changing the degree of cooling, and thus has low applicability.

[0029] In order to solve this technical problem, the utility model provides a microwave plasma vapor deposition device, which is a microwave plasma vapor deposition device used to adjust the deposition temperature of the device and thus improve the deposition effect of the device.

[0030] Specifically, please refer to Figure 1-Figure 3 , the microwave plasma vapor deposition equipment specifically includes:

[0031] It includes a device base 1, a cooling water tank 2, a water supply pipe 3, a water outlet pipe 4, a water pump 5, a water delivery pipe 6, an MPCVD device 7, a return pipe 8, and also includes a regulating mechanism 9 and an air supply mechanism 10. The cooling water tank 2 is fixedly connected to the top of the device base 1, the water supply pipe 3 is fixedly installed on the inner wall of the cooling water tank 2, the water outlet pipe 4 is fixedly installed on the inner wall of the cooling water tank 2, the end of the water outlet pipe 4 away from the cooling water tank 2 is fixedly installed on the water inlet end of the water pump 5, the water delivery pipe 6 is fixedly installed on the water outlet end of the water pump 5, the MPCVD device 7 is fixedly connected to the upper surface of the device base 1, the water delivery pipe 6 is fixedly connected to the inner wall of the MPCVD device 7, the end of the water delivery pipe 6 away from the water pump 5 is fixedly connected to one end of the return pipe 8, the return pipe 8 is fixedly connected to the inner wall of the MPCVD device 7, the end of the return pipe 8 away from the MPCVD device 7 is fixedly connected to the inner wall of the cooling water tank 2, the regulating mechanism 9 is arranged on the water delivery pipe 6, and the air supply mechanism 10 is arranged outside the water delivery pipe 6;

[0032] The regulating mechanism 9 includes a supporting shell 11 , a fixing cylinder 12 , a limiting assembly, and an adjusting assembly. The supporting shell 11 is fixedly connected to the outer wall of the water pipe 6 , and one end of the supporting shell 11 away from the water pipe 6 is fixedly connected to the bottom of the fixing cylinder 12 .

[0033] The microwave plasma vapor deposition device provided by the utility model, by rotating the fixed handle 18, causes the first piston 15 to descend along the fixed cylinder 12, thereby adjusting the internal gas content of the regulating airbag 14, and then adjusting the expansion degree of the regulating airbag 14, so that the flow rate of water flowing through the water pipe 6 is adjusted, and the speed of the water flow rate affects the level of cooling intensity of the device, so that it can be adjusted according to production needs, thereby improving the flexibility of the device. Adjusting the deposition temperature of the device according to needs improves the deposition effect of the device.

[0034] In order to enable those skilled in the art to better understand the solution of the utility model, the technical solution in the embodiments of the utility model will be clearly and completely described below in conjunction with the accompanying drawings.

[0035] Embodiment 1:

[0036] Please refer to Figure 2-Figure 3 , a microwave plasma vapor deposition device, comprising:

[0037] The limiting component includes an adjusting airbag 14 fixedly connected to the inner wall of the supporting shell 11, the adjusting airbag 14 is fixedly connected to the inner wall of the water pipe 6, and an air outlet pipe 13 is fixedly connected to the inner wall of the fixing cylinder 12 and located inside the adjusting airbag 14. The fixing cylinder 12 and the supporting shell 11 are in a sealed state to avoid gas leakage, thereby ensuring the stability of the device in regulating the liquid flow rate inside the water pipe 6.

[0038] The adjustment assembly includes a first piston 15 slidably connected to the inner wall of the fixed cylinder 12, and the side of the first piston 15 away from the adjusting airbag 14 is rotatably connected to a threaded tube 16, and the side of the first piston 15 away from the adjusting airbag 14 is fixedly connected to a limiting rod 17, the threaded tube 16 is threadedly connected to the inner wall of the fixed cylinder 12, the limiting rod 17 is slidably connected to the inner wall of the fixed cylinder 12, and the end of the threaded tube 16 away from the first piston 15 is fixedly connected to a fixed handle 18, and a plurality of anti-slip grooves are provided on the outside of the fixed handle 18 to facilitate the operator to rotate the fixed handle 18.

[0039] Through the above-mentioned structural design, when the cooling effect needs to be changed, the fixed handle 18 is rotated, thereby driving the threaded tube 16 to rotate accordingly, and the first piston 15 is driven to rise and fall along the inner wall of the fixed cylinder 12 under the restriction of the limiting rod 17, thereby changing the gas inside the fixed cylinder 12, and the gas is connected to the gas inside the regulating airbag 14 through the outlet pipe 13. The change of the gas inside the fixed cylinder 12 causes the gas inside the regulating airbag 14 to change accordingly, thereby causing the volume of the regulating airbag 14 to increase or decrease accordingly, thereby changing the flow rate of water inside the water pipe 6, thereby changing the cooling effect of the MPCVD equipment 7.

[0040] Embodiment 2:

[0041] The microwave plasma vapor deposition equipment provided in Example 1 is further optimized, specifically, as follows: Figure 4-Figure 5 As shown, the air replenishing mechanism 10 includes a mounting block 19, an air replenishing barrel 20, an air filling component, and a stabilizing component. The mounting block 19 is fixedly connected to the outer wall of the water pipe 6, and the side of the mounting block 19 away from the water pipe 6 is fixedly connected to the outer wall of the air replenishing barrel 20. The air replenishing barrel 20 is fixedly connected to the inner wall of the fixed cylinder 12, and the connection between the air replenishing barrel 20 and the fixed cylinder 12 is a sealed and airtight fixed connection.

[0042] The gas filling component includes a fixed plate 21 fixedly connected to the inner wall of the gas filling barrel 20, and the inner wall of the fixed plate 21 is slidably connected to a sliding rod 22. The end of the sliding rod 22 away from the fixed plate 21 is fixedly connected to a pressing block 24 adapted to the gas filling barrel 20. The pressing block 24 is movably connected to the inner wall of the gas filling barrel 20. A return spring 23 is sleeved on the outside of the sliding rod 22. The length of the sliding rod 22 is long enough to avoid the situation where the pressing block 24 is separated from the fixed plate 21 under the action of the elastic force of the return spring 23. The two ends of the return spring 23 are respectively fixedly connected to the side where the pressing block 24 and the fixed plate 21 are close to each other.

[0043] The stabilizing component includes a filter plate 25 fixedly connected to the inner wall of the air supply barrel 20. The filter plate 25 serves to filter dust contained in the external air to prevent dust from entering the interior of the fixed cylinder 12, thereby extending the service life of the device. The inner wall of the filter plate 25 is slidably connected with a connecting rod 26. One end of the connecting rod 26 away from the filter plate 25 is fixedly connected with a movable plug 28 adapted to the fixed plate 21. A fixed spring 27 is sleeved on the outside of the connecting rod 26. The two ends of the fixed spring 27 are respectively fixedly connected to the side where the movable plug 28 and the filter plate 25 are close to each other.

[0044] With the above structural design, when it is necessary to replenish air inside the fixed cylinder 12, the pressing block 24 is pressed, so that the pressing block 24 enters the interior of the air replenishing barrel 20 under the restriction of the sliding rod 22. In this process, the return spring 23 is compressed by force. As the pressing block 24 continues to approach the fixed plate 21 inside the air replenishing barrel 20, the gas inside the air replenishing barrel 20 and between the pressing block 24 and the fixed plate 21 is compressed. After a certain degree, the movable plug 28 is pushed open, so that the connecting rod 26 slides inside the filter plate 25. The fixed spring 27 is compressed, and the gas originally compressed between the fixed plate 21 and the pressing block 24 enters the fixed tube 12 to a certain extent through the fixed plate 21 along the air replenishing barrel 20. Then, under the action of the elastic force of the fixed spring 27, the movable plug 28 is pushed back into the fixed plate 21. At this time, the pressing block 24 is released, and under the action of the elastic force of the return spring 23, the pressing block 24 is ejected from the outside of the air replenishing barrel 20. The external air circulates into the interior of the air replenishing barrel 20 and is located in the space on the side of the fixed plate 21 close to the pressing block 24, completing an air replenishment.

Claims

1. A microwave plasma vapor deposition device, comprising a device base (1), a cooling water tank (2), a water supply pipe (3), a water outlet pipe (4), a water pump (5), a water delivery pipe (6), an MPCVD device (7), and a reflux pipe (8), characterized in that: The device also includes a regulating mechanism (9) and an air supply mechanism (10), wherein the cooling water tank (2) is fixedly connected to the top of the device base (1), the water supply pipe (3) is fixedly installed on the inner wall of the cooling water tank (2), the water outlet pipe (4) is fixedly installed on the inner wall of the cooling water tank (2), the end of the water outlet pipe (4) away from the cooling water tank (2) is fixedly installed on the water inlet end of the water pump (5), the water delivery pipe (6) is fixedly installed on the water outlet end of the water pump (5), and the MPCVD device (7) is fixedly connected to the device base (1). ), the water pipe (6) is fixedly connected to the inner wall of the MPCVD device (7), the end of the water pipe (6) away from the water pump (5) is fixedly connected to one end of the return pipe (8), the return pipe (8) is fixedly connected to the inner wall of the MPCVD device (7), the end of the return pipe (8) away from the MPCVD device (7) is fixedly connected to the inner wall of the cooling water tank (2), the regulating mechanism (9) is arranged on the water pipe (6), and the air supply mechanism (10) is arranged outside the water pipe (6); The regulating mechanism (9) comprises a supporting shell (11), a fixing cylinder (12), a limiting assembly, and an adjusting assembly; the supporting shell (11) is fixedly connected to the outer wall of the water pipe (6); and one end of the supporting shell (11) away from the water pipe (6) is fixedly connected to the bottom of the fixing cylinder (12).

2. The microwave plasma vapor deposition equipment according to claim 1, characterized in that: The limiting component comprises an adjusting airbag (14) fixedly connected to the inner wall of the supporting shell (11), the adjusting airbag (14) fixedly connected to the inner wall of the water pipe (6), and an air outlet pipe (13) fixedly connected to the inner wall of the fixing cylinder (12) and located inside the adjusting airbag (14).

3. The microwave plasma vapor deposition equipment according to claim 1, characterized in that: The adjustment assembly comprises a first piston (15) slidably connected to the inner wall of a fixed cylinder (12); a side of the first piston (15) away from the regulating airbag (14) is rotatably connected to a threaded tube (16); a side of the first piston (15) away from the regulating airbag (14) is fixedly connected to a limiting rod (17); the threaded tube (16) is threadedly connected to the inner wall of the fixed cylinder (12); the limiting rod (17) is slidably connected to the inner wall of the fixed cylinder (12); and an end of the threaded tube (16) away from the first piston (15) is fixedly connected to a fixed handle (18).

4. The microwave plasma vapor deposition equipment according to claim 1, characterized in that: The air replenishing mechanism (10) comprises a mounting block (19), an air replenishing barrel (20), an air filling component, and a stabilizing component. The mounting block (19) is fixedly connected to the outer wall of the water pipe (6). The side of the mounting block (19) away from the water pipe (6) is fixedly connected to the outer wall of the air replenishing barrel (20). The air replenishing barrel (20) is fixedly connected to the inner wall of the fixing cylinder (12).

5. The microwave plasma vapor deposition equipment according to claim 4, characterized in that: The gas filling component comprises a fixed plate (21) fixedly connected to the inner wall of the gas filling barrel (20), the inner wall of the fixed plate (21) is slidably connected to a sliding rod (22), one end of the sliding rod (22) away from the fixed plate (21) is fixedly connected to a pressing block (24) adapted to the gas filling barrel (20), the pressing block (24) is movably connected to the inner wall of the gas filling barrel (20), the outer part of the sliding rod (22) is sleeved with a return spring (23), and the two ends of the return spring (23) are respectively fixedly connected to the side where the pressing block (24) and the fixed plate (21) are close to each other.

6. The microwave plasma vapor deposition equipment according to claim 4, characterized in that: The stabilizing component comprises a filter plate (25) fixedly connected to the inner wall of the air replenishing barrel (20), the inner wall of the filter plate (25) is slidably connected to a connecting rod (26), one end of the connecting rod (26) away from the filter plate (25) is fixedly connected to a movable plug (28) adapted to the fixed plate (21), the outer portion of the connecting rod (26) is sleeved with a fixing spring (27), and the two ends of the fixing spring (27) are respectively fixedly connected to the side where the movable plug (28) and the filter plate (25) are close to each other.

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