Multi-stage tail gas treatment device and chemical vapor deposition equipment

Abstract

The utility model discloses a multistage tail gas treatment device which comprises a top cover plate, a cooling device and a filtering device which are detachably stacked from top to bottom, the top cover plate is provided with an air inlet, a partition plate is arranged between the cooling device and the filtering device, and the partition plate comprises a first through hole communicated with the cooling device and the filtering device; a cooling cavity of the cooling device internally comprises an n-shaped baffle, a cooling pipeline and a hollow stand column, the baffle comprises a top plate and side plates, the top plate and the air inlet are oppositely arranged at intervals, the side plates and the partition plates are arranged at intervals, the hollow stand column is located on the inner side of the baffle, and the upper end of the hollow stand column and the lower surface of the top plate are arranged at intervals. The air outlet channel of the hollow stand column is communicated with the first through hole. The multi-stage tail gas treatment device can increase the flowing path of tail gas in the cooling device and enhance the cooling effect, and is small in occupied area and convenient to clean.

Description

Technical Field

[0001] The utility model relates to the field of tail gas treatment, and particularly relates to a multi-stage tail gas treatment device and a chemical vapor deposition device. Background Art

[0002] A chemical vapor deposition (CVD) device forms a thin film by introducing reaction gases into a reaction chamber, and the reaction gases react on the surface of a substrate. During the process of growing the thin film, a large amount of tail gas is generated in the reaction chamber, and the tail gas often contains toxic substances (such as gallium chloride) and particulate matters. Therefore, it is necessary to filter and treat the tail gas.

[0003] In the prior art, the tail gas treatment device of a chemical vapor deposition device generally includes a cooling device and a filtering device. The cooling device is used to reduce the temperature of the tail gas, so that some substances in it sublimate into solid particles, and then the particulate matters are removed through the filtering device.

[0004] However, the existing tail gas treatment device has a poor cooling effect, and the temperature distribution inside the device is uneven, resulting in that some substances in the tail gas cannot reach the sublimation temperature, and the tail gas treatment is not thorough. In addition, the existing tail gas treatment device is too large in volume and inconvenient to clean.

[0005] It should be noted that the content of the above background art is only used to more clearly elaborate the technical solution of the utility model, and does not necessarily constitute the prior art. Summary of the Utility Model

[0006] The purpose of the utility model is to provide a multi-stage tail gas treatment device and a chemical vapor deposition device to solve at least one of the above technical problems.

[0007] To achieve the above purpose, the utility model provides a multi-stage tail gas treatment device, which includes a top cover plate, a cooling device and a first filtering device that are detachably stacked from top to bottom. The top cover plate is provided with an air inlet. A partition plate is arranged between the cooling device and the first filtering device. The partition plate includes a first through hole that connects the cooling device and the first filtering device. The cooling cavity of the cooling device includes a "冂"-shaped baffle, cooling pipes and hollow columns. The baffle includes a top plate and side plates. The top plate is arranged opposite to the air inlet at an interval. The side plates are arranged at an interval from the partition plate. The hollow columns are located inside the baffle. The upper end of the hollow column is arranged at an interval from the lower surface of the top plate. The air outlet channel of the hollow column is connected to the first through hole.

[0008] Optionally, the top plate is fixed on the top cover plate through a connecting member.

[0009] Optionally, the hollow column is fixed on the partition plate.

[0010] Optionally, a circulating coolant flows through the cooling pipe, and the temperature of the circulating coolant is -25°C to 0°C.

[0011] Optionally, the temperature of the outer side wall of the cooling device is lower than 35°C.

[0012] Optionally, the cooling pipe includes at least an outer ring cooling pipe and an inner ring cooling pipe.

[0013] Optionally, the side plate is located between the outer ring cooling pipe and the inner ring cooling pipe, and the hollow column is arranged on the inner side of the inner ring cooling pipe.

[0014] Optionally, inner fins are provided on the inner side of the side plate, and outer fins are provided on the outer side of the side plate.

[0015] Optionally, column fins are provided on the outer side of the hollow column.

[0016] Optionally, fins are provided on the inner side of the outer side wall of the cooling device.

[0017] Optionally, in the horizontal direction, the minimum distance between the edge of the outer fin and the edge of the outer ring cooling pipe is D1, the minimum distance between the edge of the inner fin and the edge of the inner ring cooling pipe is D2, and the minimum distance between the edge of the column fin and the edge of the inner ring cooling pipe is D3.

[0018] Optionally, D2 is equal to D1, or D2 is greater than D1.

[0019] Optionally, D3 is equal to D2, or D3 is smaller than D2.

[0020] Optionally, the first filtering device includes a filter element bottom plate and at least one filter element, the filter element is fixed on the filter element bottom plate, and the filter element bottom plate is provided with a third through hole communicating with the central channel of the filter element.

[0021] Optionally, the first filter device further includes a pressure plate, and the filter element is sandwiched between the pressure plate and the filter element bottom plate.

[0022] Optionally, the filter element bottom plate is provided with a support, the pressure plate is provided with a through hole corresponding to the support, and the support is further provided with a nut located above the pressure plate for locking the filter element.

[0023] Optionally, there are multiple filter elements, and the pressure plate is provided with at least one second through hole, and the second through hole is located above the gaps between the multiple filter elements.

[0024] Optionally, the top cover plate is in the shape of a flat plate, or in the shape of a dome that bends upward.

[0025] Optionally, the multi-stage tail gas treatment device further includes a cavity located below the first filtration device and detachably installed with the first filtration device, and the cavity includes an exhaust port.

[0026] Optionally, a second filtration device is also detachably provided between the top cover plate and the cooling device.

[0027] Optionally, the top plate is fixed on the filter element bottom plate of the second filtration device through a connecting member.

[0028] The present utility model also provides a chemical vapor deposition device, and the chemical vapor deposition device includes the multi-stage tail gas treatment device as described above.

[0029] The beneficial effects of the present utility model at least include:

[0030] (1) Adopting a top-down detachable laminated structure can reduce the floor area and is convenient for cleaning.

[0031] (2) Through the cooperation of the "冂"-shaped baffle and the hollow column in the cooling device, the flow path of the tail gas in the cooling device can be increased, and the cooling effect can be enhanced.

[0032] (3) By arranging fins on the side plates of the baffle, the inner side of the outer wall of the cooling device, and the outer side of the hollow column, the flow resistance of the tail gas in the cooling device can be increased, and it is also helpful to radiate the heat of the baffle to the cooling pipeline, improving the heat exchange efficiency.

[0033] (4) In addition, by setting the distance between the fins and the cooling pipeline, an environment with a more uniform temperature distribution can be obtained. Description of the Drawings

[0034] Figure 1 It is a cross-sectional view of the multi-stage tail gas treatment device proposed by the present utility model;

[0035] Figure 2 It is a partial cross-sectional view of the cooling device;

[0036] Figure 3-4 It is a partial three-dimensional schematic diagram of the cooling device;

[0037] Figure 5 It is a schematic diagram of the spacing between components in the cooling device;

[0038] Figure 6 It is a cross-sectional view of the filtration device;

[0039] Figure 7-8 It is a partial three-dimensional schematic diagram of the filtration device;

[0040] Figure 9 It is a three-dimensional schematic diagram of the filter element bottom plate;

[0041] Figure 10 It is a three-dimensional schematic diagram of a multi-stage exhaust gas treatment device in another embodiment.

[0042] 10-cooling device; 110-air inlet; 111-top cover plate; 112-connecting piece; 113-top plate; 114-side plate; 115-inner fins; 116-outer fins; 120-outer wall of cooling device; 121-cooling pipe; 1211-outer ring cooling pipe; 1212-inner ring cooling pipe; 122-liquid inlet; 123-liquid outlet; 130-column; 131-air outlet channel; 132-column fins; 133-partition; 20-filter device; 210-outer wall of filter device; 220-pressing plate; 221-second through hole; 230-filter element; 231-center channel; 240-filter element bottom plate; 241-third through hole; 30-cavity; 310-exhaust port. DETAILED DESCRIPTION

[0043] The following is a clear and complete description of the technical solution of the present invention in conjunction with the accompanying drawings. Obviously, the embodiments described are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts are within the scope of protection of the present invention.

[0044] In the description of this utility model, it should be noted that the terms "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings and are intended solely to facilitate the description of this utility model and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific direction, be constructed, or operate in a specific direction. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0045] In the description of this utility model, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to mechanical connections; they can refer to direct connections, indirect connections through an intermediate medium, or internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.

[0046] like Figure 1As shown in the figure, the utility model provides a two-stage tail gas treatment device 1, which includes a cooling device 10, a filtering device 20 and a cavity 30 that are detachably stacked from top to bottom. The detachable stacked structure can reduce the floor area and is convenient for cleaning. In some embodiments, the filtering device can be directly connected to the subsequent pipeline without providing the cavity 30.

[0047] The multi-stage tail gas treatment device 1 further includes a detachably installed top cover plate 111 and a partition plate 133. The top cover plate 111 is located above the cooling device 10 and serves as the upper cover of the multi-stage tail gas treatment device 1. The partition plate 133 is used to separate the cooling device 10 and the filtering device 20, and the partition plate 133 includes a first through hole. The top cover plate 111 can be in the shape of a flat plate or a dome that curves upward to increase its strength. An air inlet 110 is provided on the top cover plate 111, and the cavity 30 includes an exhaust port 310. The tail gas of the chemical vapor deposition equipment enters the cooling device 10 from the air inlet 110, cools down to a certain temperature in the cooling device 10, then enters the filtering device 20 through the first through hole of the partition plate 133, is filtered by the filtering device 20, enters the cavity 30, and is discharged from the exhaust port 310 of the multi-stage tail gas treatment device 1.

[0048] As Figure 1-5 shown, the cooling device 10 includes an outer wall 120 of the cooling device. The top cover plate 111, the outer wall 120 of the cooling device and the partition plate 133 form a cooling cavity of the cooling device 10. The cooling cavity includes a "冂"-shaped baffle, cooling pipes 121 and hollow columns 130. The baffle includes a top plate 113 (such as a circular top plate) and side plates 114 (such as annular side plates). The top plate 113 is spaced relative to the air inlet 110. Most of the tail gas entering from the air inlet 110 impacts on the top plate 113 and then spreads radially along the top plate 113. The side plates 114 are spaced from the partition plate 133, and the tail gas can flow in the gap between the side plates 114 and the partition plate 133. In this embodiment, the top plate 113 is fixed to the top cover plate 111 by a connecting member 112 (such as a screw); however, in other embodiments, the top plate 113 can be connected to the outer wall 120 of the cooling device or the partition plate 133 by a connecting member.

[0049] The hollow columns 130 are located inside the baffle. The upper end of the hollow columns 130 is spaced from the lower surface of the top plate 113, and the tail gas can flow in the gap between the two. The hollow columns 130 are fixed to the partition plate 133, and the air outlet channel 131 of the hollow columns 130 is communicated with the first through hole of the partition plate 133. By providing the baffle and the hollow columns 130, the tail gas input from the air inlet 110 flows along the Figure 1 direction indicated by the arrow in the figure, which can increase the flow path of the tail gas in the cooling device and enhance the cooling effect.

[0050] The cooling pipe 121 includes a liquid inlet 122 and a liquid outlet 123. Circulating coolant is fed into the cooling pipe 121 from the liquid inlet 122 and discharged from the liquid outlet 123. The temperature of the circulating coolant is between -25°C and 0°C. The inventors have discovered that to ensure adequate cooling performance of the cooling device 10, the circulating coolant must be able to keep the temperature of the cooling device outer wall 120 below 35°C.

[0051] Cooling duct 121 includes an outer ring cooling duct 1211 and an inner ring cooling duct 1222. Side plate 114 is disposed between outer ring cooling duct 1211 and inner ring cooling duct 1222, and hollow column 130 is disposed inside inner ring cooling duct 1222. This ensures a more uniform temperature distribution within the cooling cavity along the exhaust gas flow path, thereby enhancing the exhaust gas cooling effect. In other embodiments, cooling duct 121 may include a single ring of cooling ducts or more than two rings of cooling ducts.

[0052] Optionally, inner fins 115 are provided on the inner side of side plate 114, and outer fins 116 are provided on the outer side. These fins can increase the flow resistance of the exhaust gas, extend the time the exhaust gas stays in the cooling device, and enhance the cooling effect. Optionally, fins (not shown) are provided on the inner side of the cooling device outer wall 120. Optionally, column fins 132 are provided on the outer side of hollow column 130.

[0053] In addition to appropriately increasing the flow resistance of the exhaust gas in the cooling device 10, the fins also help radiate the heat of the baffle to the cooling pipe 121. The closer the distance between the fins and the cooling pipe 121, the higher the heat exchange efficiency between the two. Figure 5 As shown, in the horizontal direction, the minimum distance between the edge of the outer fin 116 and the edge of the outer ring cooling pipe 1211 is D1, the minimum distance between the edge of the inner fin 115 and the edge of the inner ring cooling pipe 1212 is D2, and the minimum distance between the edge of the column fin 132 and the edge of the inner ring cooling pipe 1212 is D3.

[0054] The exhaust gas entering the cooling device 10 is a high-temperature gas. The exhaust gas first contacts the outer side of the side plate 114. The outer side temperature of the side plate 114 is higher than the inner side temperature. Therefore, D2 is set to be no less than D1. Preferably, D2 is greater than D1. This is more conducive to forming an environment with uniform temperature distribution in the cooling device 10. In addition, the temperature of the top plate 113 hit by the exhaust gas is higher. Figure 1 As shown, after the exhaust gas flows upward between the inner side of the baffle and the outer side of the hollow pillar 130, there will be a lateral flow path. This lateral flow path causes the exhaust gas to contact the high-temperature top plate 113, resulting in a higher temperature of the gas entering the outlet channel 131. To efficiently radiate the heat transferred by the exhaust gas to the outlet channel 131, D3 is set to be no greater than D2, and preferably, D3 is less than D2.

[0055] like Figure 6-9 As shown, the filter device 20 includes a filter device outer wall 210 and a filter element bottom plate 240. The partition plate 133, the filter device outer wall 210, and the filter element bottom plate 240 form a filter chamber of the filter device 20. A pressure plate 220 and a filter element 230 are disposed within the filter chamber, with the filter element 230 sandwiched between the pressure plate 220 and the filter element bottom plate 240. The filter element bottom plate 240 is provided with a support, and the pressure plate 220 is provided with a corresponding through-hole. The support passes through the through-hole. The support is also provided with a nut located above the pressure plate for locking the filter element 230.

[0056] The filter device 20 is provided with one or more filter elements 230, each filter element 230 includes a central channel 231, and the filter element bottom plate 240 is provided with one or more third through holes 241, and the central channel 231 is connected to the third through holes 241. Figure 1 As shown by the arrow in , the exhaust gas filtered by the filter element 230 enters the cavity 30 through the third through hole 241 .

[0057] When multiple filter elements 230 are provided, the pressure plate 220 is provided with a second through hole 221, which corresponds to the gaps between the multiple filter elements 230, so that part of the exhaust gas entering the filter device 20 can enter the gaps between the second through holes on the pressure plate 220 and contact the surface of the filter element, while the rest of the exhaust gas diffuses along the radial direction of the pressure plate 220 and contacts the surface of the filter element 230. Figure 7-8 As shown, the filter device 20 is provided with a filter element 230 located at the center and eight filter elements 230 distributed in a ring shape. A gap is formed between the eight filter elements 230 distributed in the ring shape and the filter element 230 at the center, and the second through hole 221 on the pressure plate 220 is located above the gap.

[0058] In another embodiment, Figure 10 As shown, the three-stage exhaust treatment device 2 includes a filter device 30, a cooling device 10, and a filter device 20 stacked from top to bottom. The addition of filter device 30 above the cooling device 10 effectively filters particulate matter from the exhaust gas, reduces particulate matter in filter device 20 located below the cooling device 10, and reduces maintenance cycles. The structure of filter device 30 can be the same as that of filter device 20, and the baffle in the cooling device 10 can be fixed to the filter element base of filter device 30.

[0059] The present invention also provides a chemical vapor deposition apparatus, which includes the multi-stage exhaust gas treatment device provided by the present invention. It should be noted that the multi-stage exhaust gas treatment device provided by the present invention is not limited to chemical vapor deposition equipment, but can be applied to any equipment that requires exhaust gas cooling and filtration.

[0060] In summary, the utility model adopts a top-down detachable stacked structure, which can reduce the floor area and is convenient for cleaning. In the cooling device, through the cooperation of the "冂"-shaped baffle and the hollow column, the flow path of the tail gas in the cooling device can be increased, and the cooling effect can be enhanced. Fins are arranged on the side plates of the baffle, the inner side of the outer wall of the cooling device and the outer side of the hollow column, which can increase the flow resistance of the tail gas in the cooling device, and also help to radiate the heat of the baffle to the cooling pipeline, improving the heat exchange efficiency. In addition, by setting the distance between the fins and the cooling pipeline, an environment with a more uniform temperature distribution can be obtained.

[0061] Although the content of the utility model has been introduced in detail through the above preferred embodiments, it should be recognized that the above description should not be considered as a limitation of the utility model. After those skilled in the art have read the above content, various modifications and substitutions of the utility model will be obvious. Therefore, the protection scope of the utility model should be defined by the appended claims.

Claims

1. A multi-stage tail gas treatment device, characterized in that: The multi-stage tail gas treatment device includes a top cover plate, a cooling device, and a first filtering device that are detachably stacked from top to bottom. The top cover plate is provided with an air inlet. A partition plate is provided between the cooling device and the first filtering device. The partition plate includes a first through hole that communicates the cooling device and the first filtering device. The cooling chamber of the cooling device includes a "冂”-shaped baffle, cooling pipes, and a hollow column. The baffle includes a top plate and side plates. The top plate is disposed opposite to the air inlet at an interval. The side plates are disposed at an interval from the partition plate. The hollow column is located inside the baffle. The upper end of the hollow column is disposed at an interval from the lower surface of the top plate. The air outlet channel of the hollow column communicates with the first through hole.

2. The multi-stage tail gas treatment device according to claim 1, characterized in that: The top plate is fixed to the top cover plate through a connecting member.

3. The multi-stage tail gas treatment device according to claim 1, characterized in that: The hollow column is fixed to the partition plate.

4. The multi-stage tail gas treatment device according to claim 1, characterized in that: A circulating coolant flows through the cooling pipes, and the temperature of the circulating coolant is -25°C to 0°C.

5. The multi-stage tail gas treatment device according to claim 4, characterized in that: The temperature of the outer side wall of the cooling device of the cooling device is lower than 35°C.

6. The multi-stage tail gas treatment device according to claim 1, characterized in that: The cooling pipes at least include an outer ring cooling pipe and an inner ring cooling pipe.

7. The multi-stage tail gas treatment device according to claim 6, characterized in that: The side plates are located between the outer ring cooling pipe and the inner ring cooling pipe. The hollow column is disposed inside the inner ring cooling pipe.

8. The multi-stage tail gas treatment device according to claim 7, characterized in that: Inner fins are provided on the inner side of the side plates, and outer fins are provided on the outer side of the side plates.

9. The multi-stage tail gas treatment device according to claim 8, characterized in that: Column fins are provided on the outer side of the hollow column.

10. The multi-stage tail gas treatment device according to claim 9, characterized in that: Fins are provided on the inner side of the outer side wall of the cooling device of the cooling device.

11. The multi-stage tail gas treatment device according to claim 9, characterized in that: In the horizontal direction, the minimum distance between the edge of the outer fin and the edge of the outer ring cooling pipe is D1, the minimum distance between the edge of the inner fin and the edge of the inner ring cooling pipe is D2, and the minimum distance between the edge of the column fin and the edge of the inner ring cooling pipe is D3.

12. The multi-stage tail gas treatment device according to claim 11, characterized in that: D2 is equal to D1, or D2 is greater than D1.

13. The multi-stage tail gas treatment device according to claim 11, characterized in that: D3 is equal to D2, or D3 is less than D2.

14. The multi-stage tail gas treatment device according to claim 1, characterized in that: The first filtering device includes a filter element bottom plate and at least one filter element. The filter element is fixed to the filter element bottom plate. The filter element bottom plate is provided with a third through hole that communicates with the central channel of the filter element.

15. The multi-stage tail gas treatment device according to claim 14, characterized in that: The first filtering device further includes a pressing plate. The filter element is clamped between the pressing plate and the filter element bottom plate.

16. The multi-stage tail gas treatment device according to claim 15, characterized in that: The filter element bottom plate is provided with columns. The pressing plate is provided with through holes corresponding to the columns. Nuts for locking the filter element are further provided on the columns above the pressing plate.

17. The multi-stage tail gas treatment device according to claim 15, characterized in that: The number of filter elements is multiple. The pressing plate is provided with at least one second through hole, and the second through hole is located above the gap between the multiple filter elements.

18. The multi-stage tail gas treatment device according to claim 1, characterized in that: The top cover plate is in a flat shape or in a dome shape that is bent upward.

19. The multi-stage tail gas treatment device according to claim 1, characterized in that: The multi-stage tail gas treatment device further includes a cavity that is detachably installed below the first filtering device and is detachably installed with the first filtering device. The cavity includes an exhaust port.

20. The multi-stage tail gas treatment device according to any one of claims 1 to 19, characterized in that: A second filtering device is further detachably provided between the top cover plate and the cooling device.

21. The multi-stage tail gas treatment device according to claim 20, characterized in that: The top plate is fixed to the filter element bottom plate of the second filtering device through a connecting member.

22. A chemical vapor deposition device, characterized in that: The chemical vapor deposition equipment includes the multi-stage tail gas treatment device according to any one of claims 1-21.

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