Dish-shaped cavity MPCVD device temperature adjusting structure

Abstract

The utility model relates to the technical field of dish-shaped cavity MPCVD devices, in particular to a dish-shaped cavity MPCVD device temperature adjusting structure which is characterized in that a bottom column is fixedly arranged below a working table, a first supporting column is fixedly arranged at the center of the upper portion of the working table, and a reaction device is fixedly arranged at the upper end of the first supporting column; a temperature adjusting part is arranged on the side wall of the reaction device, heat preservation gas in a left gas storage tank is input into a gas protection cavity through a gas conveying pipe, the reaction device is better subjected to heat preservation, heat dissipation in the reaction device can be reduced, gas in the gas protection cavity is extracted and stored into a right gas storage tank through a gas pipe, and the reaction device is more stable. The temperature regulator is used for regulating the temperature of the liquid in the cooling pipeline to a proper temperature, and the cooling pipeline and the cooling fins are used for cooling the reaction device more quickly.

Description

Technical Field

[0001] The utility model relates to the technical field of disc-shaped cavity MPCVD devices, in particular to a temperature regulating structure of a disc-shaped cavity MPCVD device. Background Art

[0002] The disc-shaped cavity MPCVD device is a device used to grow diamond and other crystalline materials. It uses microwave plasma chemical vapor deposition technology to achieve material growth. The temperature regulation structure of this device is crucial to controlling the temperature during the growth process, because it directly affects the quality and growth rate of the material. The insulation structure is to maintain the temperature difference between the inside and outside of the cavity, so as to ensure that the temperature in the cavity can reach and remain at the required level, which is crucial to the material growth process. After the material growth process is completed, the disc-shaped cavity MPCVD device needs to reduce the temperature in the cavity to room temperature in order to remove the grown material. Utility Model Content

[0003] The main purpose of the utility model is to provide a temperature regulating structure of a disc-shaped cavity MPCVD device to solve the problems of the temperature regulating structure of a disc-shaped cavity MPCVD device proposed in the related art.

[0004] In order to achieve the above-mentioned purpose, according to one aspect of the utility model, a temperature adjustment structure of a dish-shaped chamber MPCVD device is provided, including: a workbench, a bottom column is fixedly arranged below the workbench, a first support column is fixedly arranged at the center above the workbench, a reaction device is fixedly arranged on the upper end of the first support column, and a temperature adjustment part is arranged on the side wall of the reaction device.

[0005] Furthermore, the temperature regulating part comprises a second fixed shell, a gas protection chamber is opened in the second fixed shell, a gas supply pipe is fixedly arranged at the upper end of one side of the reaction device, and a left gas storage tank is fixedly arranged at one end of the gas supply pipe.

[0006] Furthermore, an exhaust pipe is fixedly provided at the upper end of the other side of the reaction device, a right gas storage tank is fixedly provided at one end of the exhaust pipe, a first fixed shell is fixedly provided on the outer wall of the second fixed shell, and a plurality of second support columns are fixedly provided below the first fixed shell.

[0007] Furthermore, a cavity is opened in the first fixed shell, a cooling pipe is fixedly arranged in the cavity, the cooling pipe is spirally wrapped around the side wall of the second fixed shell, the side wall of the cooling pipe is in contact with the outer wall of the second fixed shell, the cross-section of the cooling pipe is square, a temperature regulator is fixedly arranged at one end of the cooling pipe, and a display screen is fixedly arranged at the upper end of the temperature regulator.

[0008] Furthermore, an adjustment button is fixedly arranged below the display screen, a switch is fixedly arranged below the adjustment button, the lower end side wall of the temperature regulator is fixedly connected to the other end of the cooling pipe, and a fourth support column is fixedly arranged below the temperature regulator.

[0009] Furthermore, a plurality of heat sinks in a uniform array are fixedly disposed on the outer wall of the first fixed shell, a fixing plate is fixedly disposed at both ends of the heat sink, and a plurality of third support columns are fixedly disposed below the fixing plate.

[0010] Compared with the prior art, the utility model has the following beneficial effects: the insulating gas in the left gas storage tank is input into the gas protection chamber through the gas transmission pipe, so as to better insulate the reaction device and reduce the heat dissipation in the reaction device; the gas in the gas protection chamber is extracted and stored in the right gas storage tank through the gas pipe, so as to facilitate the subsequent reuse; the temperature of the liquid in the cooling pipe is adjusted to a suitable temperature by the temperature regulator, and the cooling pipe and the heat sink are used to cool the reaction device faster. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0012] Figure 2 This is a schematic diagram of the overall side view structure of the utility model;

[0013] Figure 3 It is a schematic diagram of the overall cross-sectional structure of the utility model.

[0014] Illustration Description:

[0015] 1. Workbench; 11. Bottom column; 12. First support column; 13. Second support column; 14. Third support column; 15. Fourth support column; 16. Left gas tank; 17. Gas pipe; 18. Exhaust pipe; 19. Right gas tank; 20. Heat sink; 21. First fixed shell; 22. Cooling pipe; 23. Temperature regulator; 24. Display screen; 25. Adjustment button; 26. Switch; 27. Gas protection chamber; 28. Reaction device; 29. ​​Second fixed shell; 30. Fixed plate. DETAILED DESCRIPTION

[0016] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined purpose of the utility model, the specific implementation method, structure, characteristics and effects of the present invention are described in detail below in combination with the accompanying drawings and preferred embodiments.

[0017] See also Figures 1 to 3This embodiment provides a temperature adjustment structure for a dish-shaped chamber MPCVD device, including: a workbench 1, a bottom column 11 is fixedly arranged below the workbench 1, a first support column 12 is fixedly arranged at the center above the workbench 1, a reaction device 28 is fixedly arranged at the upper end of the first support column 12, and a temperature adjustment part is arranged on the side wall of the reaction device 28. The bottom column 11 is used to fix and support the workbench 1, the workbench 1 is used to fix the first support column 12, the first support column 12 is used to fix and support the reaction device 28, and the temperature adjustment part is used to better keep the reaction device 28 warm, and at the same time, the reaction device 28 can be cooled more quickly after the reaction is completed.

[0018] The temperature regulating part includes a second fixed shell 29, a gas protection chamber 27 is provided in the second fixed shell 29, a gas delivery pipe 17 is fixedly provided at the upper end of one side of the reaction device 28, and a left gas storage tank 16 is fixedly provided at one end of the gas delivery pipe 17. The gas protection chamber 27 in the second fixed shell 29 is used to introduce the heat preservation gas helium, which can minimize the heat dissipation of the reaction device 28. When the reaction device 28 needs to be kept warm for reaction, the heat preservation gas in the left gas storage tank 16 is input into the gas protection chamber 27 through the gas delivery pipe 17.

[0019] An exhaust pipe 18 is fixedly provided at the upper end of the other side of the reaction device 28, a right gas storage tank 19 is fixedly provided at one end of the exhaust pipe 18, a first fixed shell 21 is fixedly provided on the outer wall of the second fixed shell 29, and a plurality of second support columns 13 are fixedly provided below the first fixed shell 21. When the reaction is finished and heat preservation is not required, the exhaust pipe 18 is used to extract the gas in the gas protection chamber 27 and store it in the right gas storage tank 19 for later reuse, and the second support columns 13 are used to support the first fixed shell 21.

[0020] A cavity is provided in the first fixed shell 21, and a cooling pipe 22 is fixedly arranged in the cavity. The cooling pipe 22 is spirally wrapped around the side wall of the second fixed shell 29, and the side wall of the cooling pipe 22 is fitted with the outer wall of the second fixed shell 29. The cross section of the cooling pipe 22 is square, and a temperature regulator 23 is fixedly arranged at one end of the cooling pipe 22, and a display screen 24 is fixedly arranged at the upper end of the temperature regulator 23. The side wall of the cooling pipe 22 in the first fixed shell 21 is fitted with the outer wall of the second fixed shell 29, which can better reduce the heat transferred from the reaction device 28 to the second fixed shell 29. The spiral wrapping and fitting on the side wall of the second fixed shell 29 can better reduce the temperature. The display screen 24 is used to display the temperature of the liquid in the cooling pipe 22.

[0021] An adjustment button 25 is fixedly arranged below the display screen 24, a switch 26 is fixedly arranged below the adjustment button 25, the side wall at the lower end of the temperature regulator 23 is fixedly connected to the other end of the cooling pipe 22, and a fourth support column 15 is fixedly arranged below the temperature regulator 23. The adjustment button 25 is used to cool down the liquid temperature in the cooling pipe 22, and can be better adjusted as the temperature of the reaction device 28 decreases, and the fourth support column 15 is used to support and fix the temperature regulator 23.

[0022] A plurality of heat sinks 20 in a uniform array are fixedly disposed on the outer wall of the first fixed shell 21, a fixing plate 30 is fixedly disposed at both ends of the heat sink 20, and a plurality of third support columns 14 are fixedly disposed below the fixing plate 30. The heat sink 20 is used to help dissipate the heat on the first fixed shell 21 better, the fixing plate 30 is used to fix the heat sink 20, and the third support columns 14 are used to fix and support the fixing plate 30.

[0023] When the reaction device 28 is reacting, the insulating gas in the left gas tank 16 is input into the gas protection chamber 27 through the gas supply pipe 17, so as to better insulate the reaction device 28 and reduce the heat dissipation in the reaction device 28. After the reaction is completed, the gas in the gas protection chamber 27 is extracted and stored in the right gas tank 19 through the exhaust pipe 18, so as to facilitate the reuse thereof. Then the temperature on the temperature regulator 23 is adjusted to a suitable temperature, and then the liquid temperature in the cooling pipe 22 is adjusted to a suitable temperature, so as to cool down the reaction device 28 faster.

[0024] The above description is only a preferred embodiment of the present invention and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as a preferred embodiment as above, it is not intended to limit the present invention. Any technical personnel in this field can make some changes or modify the technical contents disclosed above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any brief modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention are still within the scope of the technical solution of the present invention.

Claims

1. A temperature regulating structure of a dish-shaped chamber MPCVD device, comprising a workbench (1), characterized in that: A bottom column (11) is fixedly arranged below the workbench (1), a first support column (12) is fixedly arranged at the center above the workbench (1), a reaction device (28) is fixedly arranged at the upper end of the first support column (12), and a temperature regulating part is arranged on the side wall of the reaction device (28).

2. The temperature adjustment structure of the dish-shaped chamber MPCVD device according to claim 1, characterized in that: The temperature regulating part comprises a second fixed shell (29), a gas protection chamber (27) is provided in the second fixed shell (29), a gas delivery pipe (17) is fixedly provided at the upper end of one side of the reaction device (28), and a left gas storage tank (16) is fixedly provided at one end of the gas delivery pipe (17).

3. The temperature adjustment structure of the dish-shaped chamber MPCVD device according to claim 2, characterized in that: An exhaust pipe (18) is fixedly arranged at the upper end of the other side of the reaction device (28), a right gas storage tank (19) is fixedly arranged at one end of the exhaust pipe (18), a first fixed shell (21) is fixedly arranged on the outer wall of the second fixed shell (29), and a plurality of second support columns (13) are fixedly arranged below the first fixed shell (21).

4. The temperature adjustment structure of the dish-shaped chamber MPCVD device according to claim 3, characterized in that: A cavity is provided in the first fixed shell (21), a cooling pipe (22) is fixedly arranged in the cavity, the cooling pipe (22) is spirally wound around the side wall of the second fixed shell (29), the side wall of the cooling pipe (22) is in contact with the outer wall of the second fixed shell (29), the cross section of the cooling pipe (22) is square, a temperature regulator (23) is fixedly arranged at one end of the cooling pipe (22), and a display screen (24) is fixedly arranged at the upper end of the temperature regulator (23).

5. The temperature adjustment structure of the dish-shaped chamber MPCVD device according to claim 4, characterized in that: An adjustment button (25) is fixedly arranged below the display screen (24), a switch (26) is fixedly arranged below the adjustment button (25), a lower end side wall of the temperature regulator (23) is fixedly connected to the other end of the cooling pipe (22), and a fourth support column (15) is fixedly arranged below the temperature regulator (23).

6. The temperature adjustment structure of the dish-shaped chamber MPCVD device according to claim 5, characterized in that: A plurality of heat sinks (20) in a uniform array are fixedly arranged on the outer wall of the first fixed shell (21), fixed plates (30) are fixedly arranged at both ends of the heat sinks (20), and a plurality of third support columns (14) are fixedly arranged below the fixed plates (30).

Images