Photovoltaic silicon wafer soaking equipment

Abstract

The utility model relates to the technical field of photovoltaic silicon wafer soaking equipment, and discloses photovoltaic silicon wafer soaking equipment which comprises a shell, a soaking box is fixedly installed in the shell, and a soaking assembly is fixedly installed in the shell; the soaking assembly comprises a stirring part, the stirring part is located in the shell, a layered placement part is arranged in the stirring part, and an up-down reciprocating part is arranged outside the stirring part; the stirring part comprises a motor and a separation box, the separation box is placed in the soaking box, a first rotating shaft rotates through transmission of a first gear and a second gear to drive a second rotating shaft to rotate, then a reciprocating lead screw is driven to rotate, the reciprocating lead screw rotates to drive a connecting plate to reciprocate up and down, and then the separation box is driven to reciprocate up and down; and meanwhile, the separation box reciprocates up and down to drive the silicon wafer to reciprocate up and down, so that the contact degree of the silicon wafer and the soaking liquid is further increased.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic silicon wafer soaking equipment, in particular to photovoltaic silicon wafer soaking equipment. Background Art

[0002] Silicon wafers are the carriers of solar cells. The quality of silicon wafers directly determines the conversion efficiency of solar cells. Solar cells are needed in the production process of solar photovoltaic glass. However, in the production process of solar cells, silicon wafers need to be immersed in hydrofluoric acid solution through chemical etching. During the immersion, the silicon wafers need to be fully contacted with the hydrofluoric acid solution to achieve the purpose of quickly removing the phosphorus silicon glass on the surface of the silicon wafers.

[0003] The existing Chinese patent CN206806355U discloses a silicon wafer soaking device for solar photovoltaic glass production. The silicon wafer soaking device for solar photovoltaic glass production places silicon wafers in a soaking box filled with hydrofluoric acid solution, and controls the electric push rod to extend or retract to drive the soaking box to rotate alternately in the forward and reverse directions, so that the silicon wafers in the soaking box can be fully soaked;

[0004] However, when the immersion box is flipped back and forth, although it can cause the silicon wafers inside to be fully mixed with the immersion liquid, it will also cause the multiple silicon wafers placed in the immersion box to collide and squeeze each other. When the collision and squeezing are more severe, the silicon wafers are easily damaged. Utility Model Content

[0005] The purpose of the utility model is to provide a photovoltaic silicon wafer soaking device to solve the problems raised in the above background technology.

[0006] To achieve the above object, the utility model provides the following technical solutions: a photovoltaic silicon wafer soaking device, comprising a housing, a soaking box is fixedly installed inside the housing, and a soaking assembly is fixedly installed inside the housing;

[0007] The soaking assembly comprises a stirring part, the stirring part is located inside the shell, a layered placement part is arranged inside the stirring part, and an up-and-down reciprocating part is arranged outside the stirring part;

[0008] The stirring part includes a motor and a partition box, which is placed in a soaking box. Flexible filters are arranged on the four sides and the bottom of the partition box. The motor is fixedly mounted on the inner wall of the outer shell, and a rotating shaft 1 is fixedly mounted on the output end of the motor. The top end of the rotating shaft 1 passes through the bottom of the soaking box through a bearing, and a stirring blade is fixedly mounted on the outer wall of the rotating shaft 1, and a gap is left between the stirring blade and the partition box.

[0009] Furthermore, the upper and lower reciprocating parts include gear 1, which is fixedly mounted on the outer wall of rotating shaft 1, and gear 1 is meshed with gear 2. Rotating shaft 2 is fixedly mounted on the inner wall of gear 2, and the bottom end of rotating shaft 2 is rotatably connected to the inner wall of the outer shell through a bearing. A reciprocating screw is fixedly sleeved on the outer wall of rotating shaft 2, and a connecting plate is threadedly sleeved on the outer wall of the reciprocating screw, and the connecting plate is fixedly mounted on the top of the partition box, and the number of teeth of gear 2 is greater than the number of teeth of gear 1.

[0010] Furthermore, the layered placement portion includes a slide groove and a layered frame, the slide groove is opened at the top of the partition box, the layered frame is slidably set in the partition box, a flexible filter is fixedly installed in the central through groove of the layered frame, sliders are fixedly installed at the four corners of the layered frame, the slider is slidably set in the slide groove, a positioning hole is opened at the top of the slider, and a positioning hole is fixedly installed at the bottom of the slider, and a plurality of layered frames are provided and stacked in the partition box.

[0011] Furthermore, a shielding cover is fixedly mounted on the inner wall of the shell, and the shielding cover shields the reciprocating screw rod and the connecting plate.

[0012] Furthermore, a drainage pipe is connected to the bottom of the immersion box, a valve is provided at the front end port of the drainage pipe, a standing platform is fixedly installed on the back of the shell, and anti-slip grooves are provided on the upper surface of the standing platform.

[0013] Furthermore, a U-shaped baffle is slidably sleeved on the top frame of the partition box, one end of the U-shaped baffle extends into the slide groove, an anti-slip protrusion is fixedly provided on the top inner wall of the U-shaped baffle, and an anti-slip depression corresponding to the anti-slip protrusion is opened on the top of the partition box.

[0014] Compared with the prior art, the beneficial effects of the utility model are:

[0015] The motor drives the rotating shaft to rotate, which in turn drives the stirring blades to rotate, so that the soaking liquid in the soaking box flows quickly and contacts the silicon wafers fully. The partition box with flexible filter screens on all five sides is used to place the silicon wafers, so as to avoid the rotating stirring blades contacting the silicon wafers, and also avoid the silicon wafers being damaged by collision with the flexible filter screen when driven by water flow. The layered frame is used to place multiple silicon wafers in layers, which, on the one hand, avoids the problem that the contact surfaces between the silicon wafers cannot contact the soaking liquid fully due to the stacking of silicon wafers, and on the other hand, avoids the collision of the stacked silicon wafers when the silicon wafers move up and down and float when impacted by the soaking liquid. And because there are flexible filter screens on the upper and lower sides of the silicon wafers, the silicon wafers will not be damaged when colliding with the filter screen.

[0016] Through the transmission of gear one and gear two, the rotation of shaft one can drive the rotation of shaft two, and then drive the reciprocating screw to rotate. The rotation of the reciprocating screw drives the connecting plate to move back and forth up and down, and then drives the partition box to move back and forth up and down, further increasing the tumbling degree of the immersion liquid. At the same time, the up and down reciprocating movement of the partition box drives the silicon wafer to move back and forth up and down, further increasing the contact degree between the silicon wafer and the immersion liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the structure of the top plan view of the housing of the utility model;

[0019] Figure 3 It is a structural schematic diagram of the immersion component of the utility model;

[0020] Figure 4 It is a structural schematic diagram of an exploded view of the layered placement part of the utility model;

[0021] Figure 5 It is a structural schematic diagram of the bottom upward view of the layered frame and the U-shaped baffle of the utility model.

[0022] In the figure: 1. shell; 2. immersion box; 3. drain pipe; 4. immersion assembly; 41. stirring part; 411. motor; 412. shaft 1; 413. stirring blade; 414. partition box; 42. up and down reciprocating part; 421. gear 1; 422. gear 2; 423. shaft 2; 424. reciprocating screw rod; 425. connecting plate; 43. layered placement part; 431. slide groove; 432. layered frame; 433. slider; 434. positioning rod; 435. positioning hole; 5. shielding cover; 6. anti-slip depression; 7. U-shaped baffle; 8. anti-slip protrusion; 9. standing platform. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0024] See also Figure 1-Figure 5 The utility model provides a technical solution: a photovoltaic silicon wafer soaking device, comprising a housing 1, a soaking box 2 is fixedly installed inside the housing 1, and a soaking component 4 is fixedly installed inside the housing 1;

[0025] The soaking assembly 4 includes a stirring portion 41, which is located inside the housing 1, a layered placement portion 43 is provided inside the stirring portion 41, and an up-and-down reciprocating portion 42 is provided outside the stirring portion 41;

[0026] The stirring part 41 includes a motor 411 and a partition box 414. The partition box 414 is placed in the soaking box 2. Flexible filter screens are arranged on the four sides and the bottom of the partition box 414. The motor 411 is fixedly mounted on the inner wall of the housing 1. A rotating shaft 412 is fixedly mounted on the output end of the motor 411. The top of the rotating shaft 412 passes through the bottom of the soaking box 2 through a bearing. A stirring blade 413 is fixedly mounted on the outer wall of the rotating shaft 412. A gap is left between the stirring blade 413 and the partition box 414. The rotating shaft 412 is driven to rotate by the motor 411, and then the stirring blade 413 is driven to rotate, so that the soaking liquid in the soaking box 2 flows quickly and contacts the silicon wafers fully. The partition box 414 with flexible filter screens on five sides is used to place the silicon wafers, so as to avoid the rotating stirring blade 413 from contacting the silicon wafers, and also to avoid the silicon wafers from being damaged due to collision with the flexible filter screen when the water flow drives the silicon wafers to flow.

[0027] The upper and lower reciprocating part 42 includes a gear 1 421, which is fixedly mounted on the outer wall of the rotating shaft 1 412, and the gear 1 421 is meshed with a gear 2 422, and the inner wall of the gear 2 422 is fixedly mounted with a rotating shaft 2 423, and the bottom end of the rotating shaft 2 423 is rotatably connected to the inner wall of the housing 1 through a bearing, and the outer wall of the rotating shaft 2 423 is fixedly sleeved with a reciprocating screw rod 424, and the outer wall of the reciprocating screw rod 424 is threadedly sleeved with a connecting plate 425, and the connecting plate 425 is fixedly mounted on the top of the partition box 414, and the gear 2 The number of teeth of gear 422 is greater than that of gear 1 421. Through the transmission of gear 1 421 and gear 2 422, the rotation of shaft 1 412 can drive shaft 2 423 to rotate, thereby driving the reciprocating screw 424 to rotate. The rotation of reciprocating screw 424 drives connecting plate 425 to move up and down, thereby driving partition box 414 to move up and down, further increasing the tumbling degree of the soaking liquid. At the same time, the up and down reciprocating movement of partition box 414 drives the silicon wafer to move up and down, further increasing the contact degree between the silicon wafer and the soaking liquid.

[0028] The layered placement part 43 includes a slide groove 431 and a layered frame 432. The slide groove 431 is opened at the top of the partition box 414. The layered frame 432 is slidably arranged in the partition box 414. A flexible filter is fixedly installed in the central through groove of the layered frame 432. Slide blocks 433 are fixedly installed at the four corners of the layered frame 432. The slide blocks 433 are slidably arranged in the slide groove 431. A positioning hole 435 is opened at the top of the slider 433. A positioning hole 435 is fixedly installed at the bottom of the slider 433. A plurality of layered frames 432 are provided and stacked in the partition box 414. The layered frames 432 are used to place a plurality of silicon wafers in layers. On the one hand, the problem that the contact surfaces between the silicon wafers cannot fully contact with the immersion liquid due to the stacking of the silicon wafers is avoided. On the other hand, the silicon wafers are prevented from colliding with each other when they move up and down and float when impacted by the immersion liquid. Because the silicon wafers are covered with flexible filter screens on the top and bottom, the silicon wafers will not be damaged when they collide with the filter screen. Positioning rods 434 and positioning holes 435 are provided to position the stacked layered frames 432.

[0029] A shielding cover 5 is fixedly installed on the inner wall of the housing 1, and the shielding cover 5 shields the reciprocating screw rod 424 and the connecting plate 425, shielding the reciprocating screw rod 424 and the connecting plate 425 exposed to the outside, making the whole device more beautiful;

[0030] The bottom of the immersion box 2 is connected to a drain pipe 3, a valve is provided at the front end of the drain pipe 3, a standing platform 9 is fixedly installed on the back of the housing 1, and the upper surface of the standing platform 9 is provided with anti-slip grooves, and the setting of the standing platform 9 can facilitate workers to take and place silicon wafers;

[0031] A U-shaped baffle plate 7 is slidably sleeved on the top frame of the partition box 414, and one end of the U-shaped baffle plate 7 extends into the slide groove 431. An anti-slip protrusion 8 is fixedly provided on the top inner wall of the U-shaped baffle plate 7. An anti-slip depression 6 corresponding to the anti-slip protrusion 8 is opened on the top of the partition box 414. The U-shaped baffle plate 7 is set to block the slide groove 431 to prevent the slider 433 from escaping from the slide groove 431. The U-shaped baffle plate 7 is fixed by the anti-slip depression 6 and the anti-slip protrusion 8 to ensure that the U-shaped baffle plate 7 can limit the slider 433 during the immersion process. After the immersion is completed, the U-shaped baffle plate 7 can be pulled hard to move and stagger with the slide groove 431.

[0032] Working principle: when in use, place the silicon wafer flat on the layering frame 432. After placing a layer of silicon wafers, place a layering frame 432. After placing multiple layers of silicon wafers, pull the U-shaped baffle 7 into the slide groove 431, turn on the motor 411 to drive the rotating shaft 412 to rotate, the rotating shaft 412 rotates to drive the stirring blade 413 and the gear 1 421 to rotate, the stirring blade 413 rotates to stir the soaking liquid in the soaking box 2, so that the flowing soaking liquid flushes the silicon wafer, the rotation of the gear 1 421 drives the gear 2 422 to rotate, the rotation of the gear 2 422 drives the rotating shaft 2 423 to rotate, and then drives the reciprocating screw 424 to rotate, the reciprocating screw 424 rotates to drive the connecting plate 425 to move back and forth up and down, and then drives the partition box 414 to move back and forth up and down, further increasing the tumbling degree of the soaking liquid, and at the same time, the up and down reciprocating movement of the partition box 414 drives the silicon wafer to move back and forth up and down, further increasing the contact degree between the silicon wafer and the soaking liquid.

[0033] Based on the embodiments of the present utility model, all other embodiments obtained by ordinary technicians in the field without making any creative work shall fall within the scope of protection of the present utility model.

Claims

1. A photovoltaic silicon wafer soaking device, comprising a housing (1), characterized in that: A soaking box (2) is fixedly installed inside the shell (1), and a soaking assembly (4) is fixedly installed inside the shell (1); The soaking assembly (4) comprises a stirring portion (41), the stirring portion (41) being located inside the housing (1), a layered placement portion (43) being provided inside the stirring portion (41), and an up-and-down reciprocating portion (42) being provided outside the stirring portion (41); The stirring portion (41) comprises a motor (411) and a partition box (414); the partition box (414) is placed in the soaking box (2); four side surfaces and the bottom of the partition box (414) are provided with flexible filter screens; the motor (411) is fixedly mounted on the inner wall of the housing (1); a rotating shaft (412) is fixedly mounted on the output end of the motor (411); the top end of the rotating shaft (412) passes through the bottom of the soaking box (2) via a bearing; a stirring blade (413) is fixedly mounted on the outer wall of the rotating shaft (412); a gap is left between the stirring blade (413) and the partition box (414).

2. A photovoltaic silicon wafer soaking device according to claim 1, characterized in that: The upper and lower reciprocating part (42) comprises a gear 1 (421), wherein the gear 1 (421) is fixedly mounted on the outer wall of the rotating shaft 1 (412), the gear 1 (421) is meshed with a gear 2 (422), the inner wall of the gear 2 (422) is fixedly mounted with a rotating shaft 2 (423), the bottom end of the rotating shaft 2 (423) is rotatably connected to the inner wall of the housing (1) via a bearing, a reciprocating screw rod (424) is fixedly sleeved on the outer wall of the rotating shaft 2 (423), a connecting plate (425) is threadedly sleeved on the outer wall of the reciprocating screw rod (424), and the connecting plate (425) is fixedly mounted on the top of the partition box (414), and the number of teeth of the gear 2 (422) is greater than the number of teeth of the gear 1 (421).

3. The photovoltaic silicon wafer soaking device according to claim 1, characterized in that: The layered placement portion (43) comprises a slide groove (431) and a layered frame (432); the slide groove (431) is provided at the top of the partition box (414); the layered frame (432) is slidably arranged in the partition box (414); a flexible filter is fixedly installed in the central through groove of the layered frame (432); sliders (433) are fixedly installed at the four corners of the layered frame (432); the slider (433) is slidably arranged in the slide groove (431); a positioning hole (435) is provided at the top of the slider (433); a positioning hole (435) is fixedly installed at the bottom of the slider (433); a plurality of layered frames (432) are provided and are stacked in the partition box (414).

4. The photovoltaic silicon wafer soaking device according to claim 1, characterized in that: A shielding cover (5) is fixedly mounted on the inner wall of the housing (1), and the shielding cover (5) shields the reciprocating screw rod (424) and the connecting plate (425).

5. The photovoltaic silicon wafer soaking device according to claim 1, characterized in that: The bottom of the soaking box (2) is connected to a drainage pipe (3), a valve is provided at the front end of the drainage pipe (3), and a standing platform (9) is fixedly mounted on the back of the housing (1), and the upper surface of the standing platform (9) is provided with anti-slip grooves.

6. The photovoltaic silicon wafer soaking device according to claim 1, characterized in that: A U-shaped baffle (7) is slidably sleeved on the top frame of the partition box (414), one end of the U-shaped baffle (7) extends into the slide groove (431), an anti-slip protrusion (8) is fixedly provided on the top inner wall of the U-shaped baffle (7), and an anti-slip depression (6) corresponding to the anti-slip protrusion (8) is opened on the top of the partition box (414).

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