Wafer cleaning tank

Abstract

The utility model relates to the field of wafer processing equipment, in particular to a wafer cleaning tank. The cleaning tank comprises a front plate, a back plate, guide blocks A, guide blocks B, a frame, a positioning mechanism, a bubbling connector and a cleaning liquid connector, the front plate and the back plate are fixed to the front end and the rear end of the frame respectively, and the two symmetrical guide blocks A, the two symmetrical guide blocks B and the positioning mechanism used for fixing a wafer hanging tool and blocking a conductive hole of the hanging tool are fixed between the front plate and the back plate. And the frame is provided with a bubbling joint and a cleaning fluid joint. The groove body is composed of the front plate, the back plate and the frame. And the wafer hanging tool is guided to enter the groove body in a sliding fit manner through the guide block A and the guide block B. And the wafer hanger is fixed through the positioning mechanism, and the hanger conductive hole is blocked. Nitrogen is input through the bubbling connector, and cleaning liquid is input or discharged through the cleaning liquid connector. The structure is simplified, and the cost and the size are saved.

Description

Technical Field

[0001] The utility model relates to the field of wafer processing equipment, in particular to a wafer cleaning tank. Background Art

[0002] During the production process of semiconductor wafers, the wafers need to be cleaned to remove the particle impurities and residual chemical liquid on the surface of the wafers to make the surface of the wafers clean. The existing QDR tank structure is complex, the manufacturing cost is high, and it takes up a large equipment space, which to a certain extent restricts the efficiency and revenue of enterprises. Utility Model Content

[0003] The technical problem to be solved by the present invention is: in order to solve the technical problem described in the background technology, the present invention provides a wafer cleaning tank. The tank body is composed of a front plate, a back plate, and a frame. The guide block A and the guide block B are used to guide the wafer rack to slide into the tank body. The wafer rack is fixed by a positioning mechanism, and the conductive holes of the rack are blocked. Nitrogen is input through a bubbling joint, and the cleaning liquid is input or discharged through a cleaning liquid joint. The present application simplifies the structure and saves cost and volume.

[0004] The technical solution adopted by the utility model to solve its technical problems is:

[0005] A wafer cleaning tank comprises a front plate, a back plate, a guide block A, a guide block B, a frame, a positioning mechanism, a bubbling joint, and a cleaning liquid joint. The front plate and the back plate are respectively fixed to the front and rear ends of the frame; two mutually symmetrical guide blocks A, two symmetrical guide blocks B, and a positioning mechanism for fixing a wafer hanger and blocking the conductive holes of the hanger are fixed between the front plate and the back plate; a bubbling joint and a cleaning liquid joint are provided on the frame.

[0006] Specifically, the positioning mechanism includes a single-rod cylinder and a plug, and the plug is fixed on the piston rod of the single-rod cylinder.

[0007] Specifically, the guide block A is provided with a trapezoidal groove.

[0008] Specifically, the guide block B is provided with a linear groove.

[0009] Specifically, the frame is a U-shaped frame, and an accommodation space for accommodating a wafer hanger is provided between the front plate, the back plate and the frame.

[0010] Specifically, a sealing strip is provided between the front plate and the frame.

[0011] The beneficial effects of the utility model are as follows: the utility model provides a wafer cleaning tank. The tank body is composed of a front plate, a back plate, and a frame. The guide block A and the guide block B are used to guide the wafer hanger to slide into the tank body. The wafer hanger is fixed by a positioning mechanism, and the conductive hole of the hanger is blocked. Nitrogen is input through a bubbling joint, and cleaning liquid is input or discharged through a cleaning liquid joint. The present application simplifies the structure and saves cost and volume. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] The utility model is further described below in conjunction with the accompanying drawings and embodiments.

[0013] Figure 1 It is a structural schematic diagram of the utility model;

[0014] Figure 2 It is a structural schematic diagram of the guide block A, guide block B and frame of the utility model;

[0015] In the figure, 1. front plate, 2. back plate, 3. guide block A, 4. guide block B, 5. frame, 6. positioning mechanism,

[0016] 7. Bubble joint, 8. Cleaning fluid joint, 9. Sealing strip. DETAILED DESCRIPTION

[0017] Now the utility model is further described in detail with reference to the accompanying drawings. These drawings are simplified schematic diagrams, which only illustrate the basic structure of the utility model in a schematic manner, and therefore only show the components related to the utility model.

[0018] Figure 1 It is a structural schematic diagram of the utility model; Figure 2 The utility model is a guide block A, a guide block B, a frame

[0019] Schematic diagram of the structure of the rack.

[0020] Combined with Figure 1 and attached Figure 2 As shown, a wafer cleaning tank includes a front plate 1, a back plate 2, a guide block A3, a guide block B4, a frame 5, a positioning mechanism 6, a bubbling joint 7, and a cleaning liquid joint 8. The front plate 1 and the back plate 2 are respectively fixed at the front and rear ends of the frame 5, and two mutually symmetrical guide blocks A3, two symmetrical guide blocks B4, and a positioning mechanism 6 for fixing a wafer hanger and blocking the conductive holes of the hanger are fixed between the front plate 1 and the back plate 2. A bubbling joint 7 and a cleaning liquid joint 8 are provided on the frame 5.

[0021] The positioning mechanism 6 comprises a single-rod cylinder and a plug, and the plug is fixed on the piston rod of the single-rod cylinder.

[0022] A trapezoidal groove is provided on the guide block A3.

[0023] A linear groove is provided on the guide block B4.

[0024] The frame 5 is a U-shaped frame, and an accommodation space for accommodating a wafer hanger is provided between the front plate 1 , the back plate 2 , and the frame 5 .

[0025] A sealing strip 9 is provided between the front plate 1 and the frame 5 .

[0026] The working method of the present application is as follows: first, insert the wafer hanger from the top opening of the cleaning tank, and guide the wafer hanger to the correct position along the guide blocks A3 and B4 on both sides of the left and right sides of the wafer hanger. Then the single-rod cylinder of the positioning mechanism 6 drives the plug to fix the wafer hanger in the accommodating space, and the plug can prevent the liquid from entering the conductive hole of the wafer hanger. Then the pump body sends the cleaning liquid into the cleaning tank through the cleaning liquid connector 8 at the bottom, and the nitrogen is sent into the cleaning tank through the bubbling connector 7 to clean the surface of the wafer, remove the particulate impurities and residual chemical liquid on the surface of the wafer, and after the cleaning is completed, the cleaning liquid connector 8 quickly removes the cleaning liquid.

[0027] Based on the above ideal embodiments of the utility model, the relevant staff can make various changes and modifications without deviating from the technical concept of the utility model through the above description. The technical scope of the utility model is not limited to the content of the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A wafer cleaning tank, characterized in that: The invention comprises a front plate (1), a back plate (2), a guide block A (3), a guide block B (4), a frame (5), a positioning mechanism (6), a bubbling joint (7), and a cleaning liquid joint (8); the front plate (1) and the back plate (2) are respectively fixed to the front and rear ends of the frame (5); two mutually symmetrical guide blocks A (3), two symmetrical guide blocks B (4), and a positioning mechanism (6) for fixing a wafer hanger and blocking the conductive holes of the hanger are fixed between the front plate (1) and the back plate (2); and a bubbling joint (7) and a cleaning liquid joint (8) are provided on the frame (5).

2. The wafer cleaning tank according to claim 1, characterized in that: The positioning mechanism (6) comprises a single-rod cylinder and a plug, wherein the plug is fixed on the piston rod of the single-rod cylinder.

3. The wafer cleaning tank according to claim 1, characterized in that: The guide block A (3) is provided with a trapezoidal groove.

4. The wafer cleaning tank according to claim 1, characterized in that: The guide block B (4) is provided with a linear groove.

5. The wafer cleaning tank according to claim 1, characterized in that: The frame (5) is a U-shaped frame, and a storage space for accommodating a wafer hanger is provided between the front plate (1), the back plate (2) and the frame (5).

6. The wafer cleaning tank according to claim 1, characterized in that: A sealing strip (9) is provided between the front plate (1) and the frame (5).

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