Wafer warm-moistening groove

Abstract

The utility model relates to the field of wafer processing equipment, in particular to a wafer warm-moistening groove. The warming and moistening tank comprises a tank body, a spraying block, a spraying block lifting mechanism, a water receiving tank and guide blocks, the spraying block is connected into the tank body in a sliding fit mode and connected with the spraying block lifting mechanism, the water receiving tank is arranged at the bottom of the tank body, and the two guide blocks which are symmetrical to each other are fixed to an opening of the tank body. According to the utility model, the wafer hanger is placed in the groove body, the spraying block is driven by the spraying block lifting mechanism to move up and down, and the moving spraying block sprays the wafer in the groove, so that impurities on the surface of the wafer are removed. The structure is simplified, and the cost is saved.

Description

Technical Field

[0001] The utility model relates to the field of wafer processing equipment, in particular to a wafer warming tank. Background Art

[0002] Before the production process of semiconductor wafers, the wafers need to be warmed up for subsequent production processes. The existing warming tank has a complex structure, high manufacturing cost, and takes up a large equipment space, which to a certain extent restricts the efficiency and revenue of enterprises. Utility Model Content

[0003] The technical problem to be solved by the utility model is: in order to solve the technical problem described in the background technology, the utility model provides a wafer warming tank. The wafer hanger is placed in the tank body, and the spray block is driven up and down by the spray block lifting mechanism, and the moving spray block sprays and warms the wafer in the tank to remove impurities on the surface of the wafer. The application simplifies the structure and saves costs.

[0004] The technical solution adopted by the utility model to solve its technical problems is:

[0005] A wafer warming tank comprises a tank body, a spray block, a spray block lifting mechanism, a water receiving tank, and a guide block. The tank body is slidably connected with the spray block, the spray block is connected to the spray block lifting mechanism, a water receiving tank is provided at the bottom of the tank body, and two mutually symmetrical guide blocks are fixed at the opening of the tank body.

[0006] Specifically, the spray block lifting mechanism includes a lifting linear module, a horizontal bracket, and a U-shaped frame. The cylinder of the lifting linear module is fixed on the back of the trough body, and the horizontal bracket is fixed on the slide seat of the lifting linear module. The two ends of the horizontal bracket are respectively fixed to the spray block through two U-shaped frames, and the two straight rods of the U-shaped frame respectively pass through the two guide holes of the trough body.

[0007] Specifically, a plurality of nozzles are distributed on the spray block.

[0008] Specifically, a water inlet is installed on the tank body, and the water inlet is connected to the spray block through a water pipe.

[0009] Specifically, a V-shaped groove is provided on the guide block.

[0010] The beneficial effects of the utility model are as follows: the utility model provides a wafer warming tank. The wafer hanger is placed in the tank body, and the spray block is driven up and down by the spray block lifting mechanism, and the moving spray block sprays and warms the wafer in the tank to remove impurities on the surface of the wafer. The application simplifies the structure and saves costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] The utility model is further described below in conjunction with the accompanying drawings and embodiments.

[0012] Figure 1 It is a structural schematic diagram of the utility model;

[0013] Figure 2 It is a structural schematic diagram of the spray block lifting mechanism of the utility model;

[0014] Figure 3 It is a structural schematic diagram of the spray block of the utility model;

[0015] In the figure, 1. tank body, 2. spray block, 3. spray block lifting mechanism, 4. water receiving tank, 5. water inlet, 6. guide

[0016] Toward block, 31. Lifting linear module, 32. Horizontal bracket, 33. U-shaped frame. DETAILED DESCRIPTION

[0017] Now the utility model is further described in detail with reference to the accompanying drawings. These drawings are simplified schematic diagrams, which only illustrate the basic structure of the utility model in a schematic manner, and therefore only show the components related to the utility model.

[0018] Figure 1 It is a structural schematic diagram of the utility model; Figure 2 The structure of the spray block lifting mechanism of the utility model

[0019] Schematic diagram; Figure 3 It is a structural schematic diagram of the spray block of the utility model.

[0020] As attached Figure 1 As shown, a wafer warming tank includes a tank body 1, a spray block 2, a spray block lifting mechanism 3, a water receiving tank 4, and a guide block 6. The tank body 1 is slidingly connected with the spray block 2, the spray block 2 is connected to the spray block lifting mechanism 3, a water receiving tank 4 is provided at the bottom of the tank body 1, and two mutually symmetrical guide blocks 6 are fixed at the opening of the tank body 1.

[0021] The spray block lifting mechanism 3 includes a lifting linear module 31, a horizontal bracket 32, and a U-shaped frame 33. The cylinder body of the lifting linear module 31 is fixed on the back of the trough body 1, and the horizontal bracket 32 ​​is fixed on the slide seat of the lifting linear module 31. The two ends of the horizontal bracket 32 ​​are respectively fixed to the spray block 2 through two U-shaped frames 33, and the two straight rods of the U-shaped frame 33 respectively pass through the two guide holes of the trough body 1.

[0022] Several nozzles are distributed on the spray block 2.

[0023] A water inlet 5 is installed on the tank body 1, and the water inlet 5 is connected to the spray block 2 through a water pipe.

[0024] The guide block 6 is provided with a V-shaped groove.

[0025] The working method of the present application is as follows: the wafer hanger is placed into the tank body 1 through the left and right guide blocks 6. The water pump delivers the cleaning liquid into the spray block 2 through the water inlet 5, and sprays the wafer through the spray block 2. The lifting linear module 31 of the spray block lifting mechanism 3 drives the spray block 2 to move up and down linearly through the horizontal bracket 32 ​​and the U-shaped frame 33, spraying the wafer comprehensively, warming the wafer, and thus cleaning the impurities on the surface of the wafer.

[0026] Based on the above ideal embodiments of the utility model, the relevant staff can make various changes and modifications without deviating from the technical concept of the utility model through the above description. The technical scope of the utility model is not limited to the content of the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A wafer warming tank, characterized in that: The invention comprises a tank body (1), a spray block (2), a spray block lifting mechanism (3), a water receiving trough (4), and a guide block (6); the tank body (1) is slidably connected with the spray block (2); the spray block (2) is connected to the spray block lifting mechanism (3); a water receiving trough (4) is provided at the bottom of the tank body (1); and two mutually symmetrical guide blocks (6) are fixed at the opening of the tank body (1).

2. The wafer warming tank according to claim 1, characterized in that: The spray block lifting mechanism (3) comprises a lifting linear module (31), a horizontal bracket (32), and a U-shaped bracket (33); the cylinder of the lifting linear module (31) is fixed on the back of the tank body (1); the horizontal bracket (32) is fixed on the slide seat of the lifting linear module (31); the two ends of the horizontal bracket (32) are respectively fixed to the spray block (2) through two U-shaped brackets (33); and the two straight rods of the U-shaped bracket (33) respectively pass through the two guide holes of the tank body (1).

3. The wafer warming tank according to claim 1, characterized in that: A plurality of nozzles are distributed on the spray block (2).

4. The wafer warming tank according to claim 1, characterized in that: The tank body (1) is provided with a water inlet (5), which is connected to the spray block (2) via a water pipe.

5. The wafer warming tank according to claim 1, characterized in that: The guide block (6) is provided with a V-shaped groove.

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