Gas pipeline system and semiconductor equipment

Abstract

The utility model provides a gas pipeline system and semiconductor equipment, relates to the technical field of semiconductor device manufacturing, and is used for reducing the risk that countercurrent gas enters a vacuum chamber. The gas pipeline system comprises a vacuum pipeline, a vacuum pump, a countercurrent gas detection assembly, a first valve and a control module; the vacuum pipeline communicates with an air inlet of the vacuum pump and the vacuum chamber; the countercurrent gas detection assembly and the first valve are respectively arranged on the vacuum pipeline, and the first valve is arranged between the countercurrent gas detection assembly and the vacuum chamber; the countercurrent gas detection assembly is configured to detect the flow direction of gas in the vacuum pipeline and generate a detection result; the control module is configured to control opening and closing of the first valve according to the detection result of the countercurrent gas detection assembly. According to the gas pipeline system and the semiconductor equipment provided by the invention, the countercurrent gas in the gas pipeline can be detected, the backflow of the countercurrent gas is blocked in time, and the risk that the countercurrent gas enters the vacuum chamber is reduced.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor device manufacturing, and in particular to a gas pipeline system and semiconductor equipment. Background Art

[0002] The vacuum system is an important part of semiconductor production. The vacuum system includes a vacuum chamber and a vacuum pipeline connected to the vacuum chamber. The vacuum pipeline is set between the air inlet of the vacuum pump and the vacuum chamber. The atmospheric gas in the vacuum chamber is removed through the vacuum pipeline to provide a clean environment for chip production. However, during the chip production process, when the vacuum system is abnormal and the gas pressure in the vacuum pipeline increases, the atmospheric gas is easy to flow back to the vacuum chamber, thereby contaminating the chips or equipment components in the vacuum chamber and affecting the chip yield.

[0003] To this end, the related art sets a check valve in the vacuum pipeline. When backflow gas appears in the vacuum pipeline, the check valve is affected by the backflow gas and automatically blocks the vacuum pipeline to prevent the backflow gas from continuing to flow back. However, the closing time of the check valve is uncontrollable and the sealing degree is poor, and there is still a risk of backflow gas entering the vacuum chamber. Utility Model Content

[0004] In view of the above problems, the embodiments of the present application provide a gas pipeline system and a semiconductor device, which can detect the backflow gas in the gas pipeline and timely block the backflow of the backflow gas, thereby reducing the risk of the backflow gas entering the vacuum chamber.

[0005] In order to achieve the above objectives, the embodiments of the present application provide the following technical solutions:

[0006] A first aspect of an embodiment of the present application provides a gas pipeline system connected to a vacuum chamber; the gas pipeline system includes a vacuum pipeline, a vacuum pump, a backflow gas detection component, a first valve and a control module; the vacuum pipeline is connected to the air inlet of the vacuum pump and the vacuum chamber; the backflow gas detection component and the first valve are respectively arranged on the vacuum pipeline, and the first valve is located between the backflow gas detection component and the vacuum chamber; the backflow gas detection component is configured to detect the gas flow direction in the vacuum pipeline and generate a detection result; the control module is configured to control the switch of the first valve according to the detection result of the backflow gas detection component.

[0007] In an optional embodiment, the backflow gas detection component includes a plurality of detector groups and a detection result generation module; each of the detector groups includes a transmitter and a receiver, the transmitter is configured to transmit a detection signal, and the receiver is configured to receive the detection signal; the detection result generation module generates the detection result according to the transmission time of the detection signal between the transmitter of each detector group and the corresponding receiver.

[0008] In an optional embodiment, the transmission path of the detection signal between the transmitter of each detector group and the corresponding receiver passes through the vacuum pipeline, and the angle between the transmission direction of each detection signal and the axial direction of the vacuum pipeline is an acute angle.

[0009] In an optional embodiment, the countercurrent gas detection assembly includes two detector groups; the transmitter of one of the detector groups is arranged on the side of the receiver of the detector group close to the vacuum pump; the transmitter of the other detector group is arranged on the side of the receiver of the detection group away from the vacuum pump.

[0010] In an optional embodiment, the detection result generating module generates the detection result according to the difference in transmission time of the detection signals of the two detector groups; wherein, when the difference in transmission time of the detection signals of the two detector groups is within a preset interval, the gas in the vacuum pipeline flows backwards, and the control module controls the first valve to close.

[0011] In an optional embodiment, an angle between a transmission direction of the detection signal between the transmitter and the corresponding receiver and an axial direction of the vacuum pipeline is greater than or equal to 40° and less than 50°.

[0012] In an optional embodiment, the gas pipeline system also includes a second valve, which is located on the vacuum pipeline and arranged between the backflow gas detection component and the first valve; the control module controls the switch of the second valve according to the detection result of the backflow gas detection component.

[0013] In an optional embodiment, the gas pipeline system further includes a molecular pump, which is disposed on the vacuum pipeline and located between the first valve and the second valve.

[0014] In an optional embodiment, the gas pipeline system also includes a reaction gas supply pipeline and a third valve; wherein the reaction gas supply pipeline is connected to the vacuum chamber to provide reaction gas to the vacuum chamber; the third valve is arranged on the reaction gas supply pipeline, and the control module controls the switch of the third valve according to the detection result of the backflow gas detection component.

[0015] A second aspect of an embodiment of the present application provides a semiconductor device, comprising a vacuum chamber and a gas pipeline system, wherein the gas pipeline system is connected to the vacuum chamber; the gas pipeline system comprises a vacuum pipeline, a vacuum pump, a backflow gas detection component, a first valve and a control module; the vacuum pipeline is connected to the air inlet of the vacuum pump and the vacuum chamber, and the backflow gas detection component and the first valve are respectively arranged on the vacuum pipeline; the first valve is located between the backflow gas detection component and the vacuum chamber; the backflow gas detection component is configured to detect the gas flow direction in the vacuum pipeline and generate a detection result, and the control module is configured to control the switch of the first valve according to the detection result of the backflow gas detection component.

[0016] Compared with the related art, the gas pipeline system and semiconductor equipment provided by the embodiments of the present application have the following advantages:

[0017] The gas pipeline system provided in the embodiment of the present application detects the gas flow direction in the vacuum pipeline through a backflow gas detection component and generates a detection result. The detection result is transmitted to the control module. The control module controls the switching of the first valve according to the detection result, which can prevent the backflow gas from flowing into the vacuum chamber and reduce the risk of the vacuum chamber being contaminated by the backflow gas.

[0018] In the related technology, a check valve is arranged in the vacuum pipeline, and the check valve includes a spring and a valve plug, and the valve plug is arranged at the air inlet of the check valve; when backflow gas appears in the vacuum pipeline, the backflow gas pressure acts on the valve plug and makes the valve plug overcome the elastic force of the spring and be inserted into the air inlet of the check valve to seal the air inlet, thereby preventing the backflow gas from continuing to flow back.

[0019] Furthermore, the above-mentioned backflow valve requires the backflow gas pressure to reach a certain level before the valve plug can seal the vacuum pipeline. Therefore, it is affected by the size of the backflow gas pressure, and its closing time and sealing degree are uncontrollable. When backflow gas appears in the vacuum pipeline, it cannot effectively and timely prevent the backflow gas.

[0020] The gas pipeline system provided in the embodiment of the present application uses a backflow gas detection component to detect the gas flow direction in the vacuum pipeline. When backflow gas appears in the vacuum pipeline, the control module can control the first valve to close. Such a configuration can timely and effectively prevent the backflow gas from flowing into the vacuum chamber, thereby reducing the risk of the vacuum chamber being contaminated by the backflow gas.

[0021] In addition to the technical problems solved by the embodiments of the present disclosure, the technical features that constitute the technical solutions, and the beneficial effects brought about by the technical features of the technical solutions described above, other technical problems that can be solved by the gas pipeline system and semiconductor equipment provided by the embodiments of the present disclosure, other technical features included in the technical solutions, and the beneficial effects brought about by these technical features will be further described in detail in the specific implementation methods. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, a brief introduction will be given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0023] Figure 1 A schematic diagram of the arrangement of the gas pipeline system and the vacuum chamber provided in an embodiment of the present application;

[0024] Figure 2 A logical control diagram of a gas pipeline system provided in an embodiment of the present application;

[0025] Figure 3 A schematic diagram of the working state of the countercurrent gas detection assembly provided in an embodiment of the present application;

[0026] Figure 4 A second schematic diagram of the working state of the countercurrent gas detection assembly provided in an embodiment of the present application;

[0027] Figure 5 Three schematic diagrams of the working state of the countercurrent gas detection assembly provided in the embodiment of the present application;

[0028] Figure 6 Another structural schematic diagram of the countercurrent gas detection assembly provided in an embodiment of the present application.

[0029] Description of reference numerals:

[0030] 10- Vacuum pipeline;

[0031] 20-vacuum pump;

[0032] 30-backflow gas detection assembly;

[0033] 31-detector group; 311-transmitter; 312-receiver; 32-detection result generation module;

[0034] 31a - first detector group; 311a - first transmitter; 312a - first receiver;

[0035] 31b - second detector group; 311b - second transmitter; 312b - second receiver;

[0036] 40- first valve;

[0037] 50-molecular pump;

[0038] 60- second valve;

[0039] 70-actuating cylinder;

[0040] 80-control module;

[0041] 100-gas pipeline system;

[0042] 200-Vacuum chamber. DETAILED DESCRIPTION

[0043] The vacuum system is an important part of semiconductor production. The vacuum system includes a vacuum chamber and a vacuum pipeline connected to the vacuum chamber. The atmospheric gas in the vacuum chamber is removed through the vacuum pipeline to provide a clean environment for the chip manufacturing process in the vacuum chamber. As production activities proceed, byproducts of the chip manufacturing process in the vacuum chamber, such as metal particles and other pollutants, accumulate in the vacuum pipeline in large quantities. Once the vacuum system becomes abnormal, the gas in the vacuum pipeline will flow back. These byproducts will flow back to the vacuum chamber along with the atmospheric gas, seriously affecting the cleanliness of the vacuum chamber, worsening the process environment, and resulting in a reduction in chip yield.

[0044] In the related art, a check valve is arranged in the vacuum pipeline. When backflow gas appears in the vacuum pipeline, the check valve is closed to prevent the backflow gas from continuing to flow back. The closing time of the check valve is uncontrollable and the sealing degree is poor. There is a risk of backflow gas and pollutants entering the vacuum chamber. The inventor has found that the reason for this problem is:

[0045] The check valve includes a spring and a valve plug, and the valve plug is arranged at the air inlet of the check valve; when backflow gas appears in the vacuum pipeline, the backflow gas pressure acts on the valve plug and causes it to overcome the elastic force of the spring and be inserted into the air inlet of the check valve to seal the air inlet, thereby preventing the backflow gas from continuing to flow back. However, the above-mentioned backflow valve requires the backflow gas pressure to reach a certain level before the valve plug can seal the vacuum pipeline. Therefore, it is affected by the size of the backflow gas pressure, and its closing time and sealing degree are uncontrollable. When backflow gas appears in the vacuum pipeline, it cannot effectively and timely prevent the backflow gas.

[0046] In response to the above technical problems, an embodiment of the present application provides a gas pipeline system, which detects the gas flow direction in the vacuum pipeline through a backflow gas detection component and generates a detection result. The detection result is transmitted to the control module. The control module controls the switch of the first valve according to the detection result to prevent the backflow gas from flowing into the vacuum chamber, thereby reducing the risk of the vacuum chamber being contaminated by the backflow gas.

[0047] With such an arrangement, when backflow gas appears in the vacuum pipeline, the backflow gas can be promptly and effectively stopped to prevent the backflow gas from flowing into the vacuum chamber, thereby reducing the risk of the vacuum chamber being contaminated by the backflow gas.

[0048] In order to make the above-mentioned purposes, features and advantages of the embodiments of the present application more obvious and understandable, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work belong to the scope of protection of this application.

[0049] like Figure 1 and Figure 2 As shown, the semiconductor device provided by the embodiment of the present application is used for the production of semiconductor devices (such as chips). The semiconductor device includes a vacuum chamber 200 and a gas pipeline system 100 connected to the vacuum chamber 200, wherein the gas pipeline system 100 is used to suck the atmospheric gas in the vacuum chamber 200 to remove the atmospheric gas so that the vacuum chamber 200 maintains a clean vacuum environment.

[0050] The gas pipeline system 100 in the embodiment of the present application includes a vacuum pipeline 10, a vacuum pump 20, a backflow gas detection assembly 30, a first valve 40 and a control module 80, wherein the vacuum pipeline 10 is arranged between the vacuum pump 20 and the vacuum chamber 200, and the vacuum pipeline 10 is used to connect the air inlet of the vacuum pump 20 and the vacuum chamber 200, and the vacuum pump 20 can be used to suck the atmospheric gas in the vacuum chamber 200. Furthermore, the air outlet of the vacuum pump 20 can be connected to the gas processing equipment to process the waste gas generated in the production process of semiconductor devices.

[0051] Furthermore, the backflow gas detection component 30 and the first valve 40 are respectively arranged on the vacuum pipeline 10, wherein the first valve 40 is arranged between the backflow gas detection component 30 and the vacuum chamber 200. The backflow gas detection component 30 can detect the gas flow direction in the vacuum pipeline 10 and further generate a detection result.

[0052] For example, the first valve 40 is arranged near the vacuum chamber 200, and the backflow gas detection component 30 is arranged near the air inlet of the vacuum pump 20. With such arrangement, when backflow gas is generated in the vacuum pipeline 10 due to a failure of the vacuum pump 20 or insufficient power, the backflow gas detection component 30 arranged near the vacuum pump 20 can detect the backflow gas in time, and control the first valve 40 near the vacuum chamber 200 to be closed through the control module 80, thereby preventing the backflow gas from flowing to the vacuum chamber 200 to the greatest extent.

[0053] The backflow gas detection assembly 30 is configured to detect the gas flow direction in the vacuum pipeline 10 and generate a detection result. The control module 80 receives the detection result and controls the opening and closing of the first valve 40 according to the detection result. For example, when the backflow gas detection assembly 30 detects the backflow gas in the vacuum pipeline 10, the control module 80 controls the first valve 40 to close according to the detection result to prevent the backflow gas from flowing to the vacuum chamber 200, thereby reducing the risk of the vacuum chamber 200 being contaminated by the backflow gas.

[0054] In the related art, a check valve is arranged in the vacuum pipeline, and the check valve includes a spring and a valve plug, and the valve plug is arranged at the air inlet of the check valve; when backflow gas appears in the vacuum pipeline, the backflow gas pressure acts on the valve plug and causes it to overcome the elastic force of the spring and be inserted into the air inlet of the check valve to seal the air inlet and prevent the backflow gas from continuing to flow back. The above-mentioned backflow valve requires the backflow gas pressure to reach a certain level before the valve plug can seal the vacuum pipeline. Therefore, it is affected by the size of the backflow gas pressure, and its closing time and sealing degree are uncontrollable. Therefore, when backflow gas appears in the vacuum pipeline, the backflow gas cannot be stopped in time and effectively.

[0055] However, the gas pipeline system 100 provided in the embodiment of the present application uses the backflow gas detection component 30 to detect the gas flow direction in the vacuum pipeline 10. When the gas in the vacuum pipeline 10 flows back, the control module 80 can control the first valve 40 to close. In this way, the backflow gas can be blocked in time and effectively to prevent the backflow gas from flowing to the vacuum chamber 200, thereby reducing the risk of the vacuum chamber 200 being contaminated by the backflow gas.

[0056] Furthermore, in some embodiments, Figure 1 and Figure 2 As shown, the countercurrent gas detection component 30 includes a detection result generating module 32 and at least one detector group 31, each detector group 31 includes a transmitter 311 and a receiver 312 adapted thereto, the transmitter 311 is configured to transmit a detection signal, the receiver 312 is configured to receive a detection signal, the detection result generating module 32 is configured to receive the transmission time of the detection signal between the transmitter 311 of each detector group 31 and the corresponding receiver 312 and generate a detection result, for example, the detection result generating module 32 is configured to receive the transmission time and reception time of the detection signal corresponding to each detector group 31, and generate the transmission time of the detection signal according to the transmission time and reception time of the detection signal.

[0057] It is understandable that, according to actual detection needs, the backflow gas detection component 30 may include one detector group 31 or multiple detector groups 31, and the detection result generation module 32 may receive the emission time and reception time of the detection signal of one detector group 31, or receive the emission time and reception time of the detection signal corresponding to each detector group 31 respectively. The embodiment of the present application is not limited to this.

[0058] In some embodiments, the transmission path of the detection signal between the transmitter 311 of each detector group 31 and the corresponding receiver 312 passes through the vacuum pipeline 10, and the angle between the transmission direction of each detection signal and the axial direction of the vacuum pipeline 10 is an acute angle.

[0059] Further, in some specific embodiments, the angle between the transmission direction of the detection signal between the transmitter 311 of the detector group 31 and the corresponding receiver 312 and the axial direction of the vacuum pipe 10 may be greater than or equal to 40° and less than 50°, preferably, the angle may be 45°. Such a setting can improve the detection accuracy, and at the same time make the arrangement of the device compact and the spatial layout more reasonable.

[0060] In the embodiment of the present application, the detection result generation module 32 receives the transmission time and the reception time of the detection signal corresponding to each detector group 31 respectively, and the signal reception mode can be through a wired signal transmission mode or a wireless signal transmission mode. The detection result generation module 32 generates the detection result according to the transmission time of the detection signal between the transmitter 311 and the corresponding receiver 312 of each detector group 31.

[0061] like Figures 3 to 5 As shown, in some embodiments, the reverse flow gas detection assembly 30 includes a detector group 31, and along the extension direction of the vacuum pipeline 10, the transmitter 311 is located on the side of the receiver 312 away from the gas inlet of the vacuum pump 20. In other words, along the gas flow direction (see Figure 4 ), the transmitter 311 and the receiver 312 may be arranged alternately, and the transmitter 311 is located on the upstream side of the receiver 312, that is, the transmitter 311 is located on the side of the receiver 312 away from the vacuum pump 20.

[0062] In this embodiment and the following embodiments, the gas downstream direction refers to the flow direction of the gas in the vacuum pipeline 10 of the gas pipeline system 100 under normal working conditions, that is, the flow direction from the vacuum chamber 200 toward the vacuum pump 20 is the downstream direction; correspondingly, the countercurrent direction refers to the flow direction of the gas in the vacuum pipeline 10 from the vacuum pump 20 toward the vacuum chamber 200. The countercurrent flow of the gas in the vacuum pipeline 10 will cause the countercurrent gas and pollutants to enter the vacuum chamber 200, thereby reducing the chip yield.

[0063] Since the transmitter 311 is arranged on the side of the receiver 312 away from the air inlet of the vacuum pump 20, when there is no gas flowing in the vacuum pipeline 10, such as Figure 3 As shown in FIG. 1 , the actual transmission time of the detection signal in this case is T0. When there is downstream gas in the vacuum pipeline 10, as shown in FIG. Figure 4 As shown, the detection signal is affected by the downstream gas, and the detection signal is accelerated to be transmitted toward the receiver. In this case, the actual transmission time of the detection signal is T1, T1<T0. When there is a countercurrent gas in the vacuum pipeline 10, such as Figure 5 As shown, the detection signal is affected by the countercurrent gas, and the transmission of the detection signal is hindered in the reverse direction. In this case, the actual transmission time of the detection signal is T2, and T2>T0.

[0064] Therefore, the detection result generation module 32 can record the time point of emitting the detection signal and the time point of receiving the detection signal, and calculate the actual transmission time of the detection signal. Further, the detection result generation module 32 is preset with the above-mentioned time T0, and the actual transmission time is recorded as T and compared with the time T0. When the backflow gas appears in the pipe, the actual transmission time T of the detection signal of the detector group 31 received by the detection result generation module 32 is greater than T0, and it is judged that the backflow gas appears in the vacuum pipeline 10, and a detection result is generated. The detection result is further transmitted to the control module 80, and the control module 80 can control the first valve 40 to close according to the detection result.

[0065] In some embodiments, the reverse flow gas detection assembly 30 is configured as an ultrasonic flow meter, which includes a transmitter 311 and a receiver 312. The transmitter 311 can be a sound wave transmitter, and the receiver 312 can be a sound wave receiver. Along the downstream direction of the gas, the sound wave transmitter is arranged on the upstream side of the sound wave receiver, and the two are tilted relative to each other.

[0066] In other embodiments, the backflow gas detection component 30 is configured as an electromagnetic flowmeter, its transmitter 311 can be an electromagnetic transmitter, and its receiver 312 can be an electromagnetic receiver. The detection principle of the electromagnetic flowmeter is the same as the detection principle of the ultrasonic flowmeter, which will not be repeated here.

[0067] like Figure 6 As shown, in some embodiments, the countercurrent gas detection assembly 30 provided in the embodiment of the present application includes two detector groups 31. To facilitate description of the arrangement of the two detector groups 31 on the vacuum pipeline 10, the embodiment of the present application defines the two detector groups 31 as a first detector group 31a and a second detector group 31b, respectively. The first detector group 31a includes a first transmitter 311a and a first receiver 312a, and the second detector group 31b includes a second transmitter 311b and a second receiver 312b.

[0068] Specifically, the first transmitter 311a and the first receiver 312a are arranged in cooperation, and the first transmitter 311a and the first receiver 312a are arranged relatively to each other at an angle along the downstream direction of the gas, and form a first detector group 31a, wherein the first transmitter 311a is arranged on the side of the first receiver 312a away from the vacuum pump 20; the second transmitter 311b and the second receiver 312b are arranged in cooperation, and the second transmitter 311b and the second receiver 312b are arranged relatively to each other at an angle along the downstream direction of the gas, and form a second detector group 31b, wherein the second transmitter 311b is arranged on the side of the second receiver 312b close to the vacuum pump 20; the detection result generating module 32 receives the emission time and the reception time of the detection signals corresponding to the first detector group 31a and the second detector group 31b, and generates the detection result according to the difference between the transmission time of the detection signal of the first detector group 31a and the transmission time of the detection signal of the second detector group 31b. Such a configuration can further improve the accuracy of the backflow gas detection component 30 in detecting the backflow gas, and prevent the backflow gas from contaminating the vacuum chamber.

[0069] Furthermore, the detection result generation module 32 is provided with a preset interval. When the difference between the detection signal transmission times of the two detector groups 31a and 31b is within the preset interval, the detection result generation module 32 determines that the gas in the vacuum pipeline 10 is backflowing or is about to backflow, and then the control module 80 controls the first valve 40 to close to prevent the backflow gas from entering the vacuum chamber 200.

[0070] For example, the first transmitter 311a and the second transmitter 311b provided in the embodiment of the present application are both sound wave transmitters, and the first receiver 312a and the second receiver 312b are both sound wave receivers. The embodiment of the present application takes this as an example to illustrate the gas backflow detection scheme of the two groups of detector groups 31.

[0071] See also Figure 6 The first transmitter 311a and the second transmitter 311b are arranged in sequence along the gas flow direction, and both are located on the first side of the vacuum pipeline 10. The second receiver 312b and the first receiver 312a are arranged in sequence along the gas flow direction, and both are located on the second side of the vacuum pipeline 10.

[0072] In other words, the first transmitter 311a is located on the first side, the first receiver 312a is located on the second side, and along the downstream direction of the gas, the first transmitter 311a is located upstream of the first receiver 312a. The detection signal emitted by the first transmitter 311a is transmitted obliquely toward the first receiver 312a along the downstream direction of the gas. The second transmitter 311b is located on the first side, the second receiver 312b is located on the second side, and along the downstream direction of the gas, the second transmitter 311b is located downstream of the second receiver 312b, and the detection signal emitted by the second transmitter 311b is transmitted obliquely toward the second receiver 312b along the countercurrent direction of the gas. In this embodiment, the first transmitter 311a can be arranged relative to the second receiver 312b in a direction perpendicular to the axis of the vacuum pipeline 10, and the second transmitter 311b can be arranged relative to the first receiver 312a in a direction perpendicular to the axis of the vacuum pipeline 10, such as Figure 6 As shown, they can also be staggered in a direction inclined to the axis of the vacuum pipeline 10, and this embodiment does not impose too many restrictions on this.

[0073] In the embodiment of the present application, the actual transmission time of the detection signal of the first detector group 31a can be defined as T a , the actual transmission time of the detection signal of the second detector group 31b is T b , the method for generating the detection result in the embodiment of the present invention will be described below according to specific circumstances.

[0074] When the gas in the vacuum pipe 10 is in a static state or there is no gas, record T at this time. a As T A , that is, the signal transmission time of the first detector group 31a when there is no gas flow in the vacuum pipeline. At the same time, T b As T B , that is, the signal transmission time of the second detector group 31b when there is no gas flow in the vacuum pipeline.

[0075] When the gas in the vacuum pipeline 10 flows in the downstream direction, that is, from the vacuum chamber 200 to the vacuum pump 20, the detection signal of the first detector group 31a is accelerated by the airflow in the vacuum pipeline 10. At this time, the actual transmission time T of the detection signal of the first detector group 31a is a <T A At the same time, the detection signal of the second detector group 31b is slowed down, and the actual transmission time T of the detection signal of the second detector group 31b is b >T B .

[0076] When the gas in the vacuum pipeline 10 flows in the countercurrent direction, that is, from the vacuum pump 20 to the vacuum chamber 200, the detection signal of the first detector group 31a is affected by the airflow in the vacuum pipeline 10 and is decelerated. At this time, the actual transmission time T of the detection signal of the first detector group 31a is a >T A At the same time, the detection signal of the second detector group 31b is accelerated, and the actual transmission time T of the detection signal of the second detector group 31b is b <T B .

[0077] Therefore, when the gas in the vacuum pipe 10 flows downstream, T a -T b <T A -T B The detection result generating module 32 can be set according to the numerical interval (T a -T b <T A -T B ) determines that the gas in the vacuum pipeline 10 flows forward; when the gas in the vacuum pipeline 10 flows backward, T a -T b >T A -T B The detection result generating module 32 can be set according to the numerical interval (T a -T b >T A -T B ) determines whether the gas in the vacuum pipeline 10 is backflowing, and further controls the control module 80 to close the first valve 40 according to the detection result.

[0078] Furthermore, in order to better prevent backflow of gas from entering the reaction chamber 200, the detection result generation module 32 can be set with a preset interval. When the difference in transmission time of the detection signals of the two detector groups 31 is within the preset interval, the detection result generation module 32 determines that the gas in the vacuum pipeline 10 is backflowing or is about to backflow.

[0079] For example, you can set a warning value T H , the warning value T H <T A -T B , when T H <T a -T b <T A -T B Although the gas in the vacuum pipeline 10 is still in a downstream state, the gas flow rate is low at this time, which is easy to cause a backflow accident. Therefore, a preset interval is preset in the detection result generation module 32 so that Ta -T b >T H When the detection result generating module 32 determines that the gas in the vacuum pipeline 10 is backflowing or about to backflow and controls the control module 80 to control the first valve 40 to close, the ability of the gas pipeline system of this embodiment to prevent backflow of gas can be further enhanced, and the risk of contamination inside the vacuum chamber can be reduced.

[0080] Continue reading Figure 1 and Figure 2 The gas pipeline system 100 provided in the embodiment of the present application further includes a second valve 60; the second valve 60 is disposed on the vacuum pipeline 10, and the second valve 60 is located between the backflow gas detection component 30 and the first valve 40. The second valve 60 receives a signal from the control module 80 and is controlled thereby, and the control module 80 can control the switch of the second valve 60 according to the detection result of the backflow gas detection component 30.

[0081] For example, the second valve 60 can be arranged close to the vacuum pump 20 and located on the side of the backflow gas detection assembly 30 away from the vacuum pump 20. When the backflow gas detection assembly 30 detects the backflow of gas in the vacuum pipeline 10, the second valve 60 can be controlled to close. Such an arrangement can further improve the reliability of preventing the backflow gas from entering the vacuum chamber 200 and enhance the protection effect.

[0082] On the basis of the above-mentioned embodiment, the gas pipeline system 100 provided in the embodiment of the present application further includes a molecular pump 50, which is arranged on the vacuum pipeline 10 and located between the first valve 40 and the second valve 60. The molecular pump 50 can be arranged close to the first valve 40. In this way, the second valve 60 is arranged on one side of the gas outlet of the molecular pump 50, which can effectively prevent the backflow gas from entering the molecular pump 50, thereby preventing the molecular pump 50 from being contaminated and damaged by the backflow gas.

[0083] The gas pipeline system 100 provided in the embodiment of the present application also includes a reaction gas supply pipeline (not shown in the figure) and a third valve (not shown in the figure), wherein the reaction gas supply pipeline is connected to the vacuum chamber 200, and the reaction gas can be provided to the vacuum chamber 200 based on the reaction gas supply pipeline; the third valve is arranged on the reaction gas supply pipeline, and the third valve receives the signal of the control module 80 and is controlled by it; the control module 80 controls the switch of the third valve according to the detection result of the backflow gas detection component 30. For example, when the gas in the vacuum pipeline 10 flows back, the control module 80 can control the third valve to close, thereby shutting off the supply of the reaction gas.

[0084] It should be noted that when the gas in the vacuum pipeline 10 flows backward, not only the first valve 40, the second valve 60 and the third valve are controlled to be closed, but also the safety lock (not shown) of the vacuum chamber 200 can be triggered to stop the process of each component of the vacuum chamber 200. Such an arrangement can prevent the backward gas from entering the vacuum chamber 200 and contaminating the vacuum chamber 200, the chip and each component.

[0085] On the basis of the above-mentioned embodiment, the gas pipeline system provided in the embodiment of the present application further includes an actuating cylinder 70 cooperating with the second valve, wherein the actuating cylinder 70 is in transmission connection with the second valve 60, and the second valve 60 can control the on-off of the gas passage of the vacuum pipeline 10. Further, the solenoid valve of the actuating cylinder 70 receives and is controlled by the signal of the control module 80, and the control module 80 controls the actuating cylinder 70 according to the detection result of the backflow gas detection component 30, so that the actuating cylinder 70 is actuated, and the switch of the second valve 60 can be controlled.

[0086] In one embodiment, the actuating cylinder 70 is configured as a swing cylinder, and the second valve 60 is configured as a ball valve, the ball valve is arranged in the vacuum pipeline 10 to control the on-off of the gas passage; the swing cylinder is arranged outside the vacuum pipeline 10, and the swing arm of the swing cylinder is in driving connection with the valve handle of the ball valve. The solenoid valve of the swing cylinder receives the signal of the control module 80 and is controlled by it. When there is gas backflow in the vacuum pipeline 10, when the solenoid valve receives the control instruction of the control module 80, the solenoid valve opens, and the external gas swings the cylinder, then the swing cylinder is actuated, and the valve handle is driven to swing, thereby changing the state of the ball valve in the vacuum pipeline 10, so that the ball valve blocks the gas passage of the vacuum pipeline 10, and prevents the backflow gas from entering the vacuum chamber 200.

[0087] When a check valve is provided in a vacuum pipeline in the related art, the valve plug of the check valve occupies part of the flow cross-sectional area of ​​the vacuum pipeline, and the contact area between the valve plug and the manufactured gas is large, which is easy to deposit on the surface of the valve plug, causing blockage in the vacuum pipeline. However, in the embodiment of the present application, a ball valve is provided in the vacuum pipeline 10, which has little effect on the flow cross-sectional area of ​​the vacuum pipeline 10, and the contact area with the manufactured gas is small, which can avoid blockage in the vacuum pipeline 10. Of course, the actuator cylinder 70 in the embodiment of the present application can also be configured as a guide cylinder, and accordingly, the second valve 60 is configured as a flat valve, which is transmission-connected to the guide cylinder, and the embodiment of the present application is not limited to this.

[0088] Furthermore, the flat valve includes a valve plate, and the moving direction of the valve plate is consistent with the actuation direction of the guide cylinder. The guide cylinder is arranged outside the vacuum pipeline 10, and the valve plate is located inside the vacuum pipeline 10. The solenoid valve of the guide cylinder receives the signal of the backflow gas detection component 30 and is controlled by it. When there is gas backflow in the vacuum pipeline 10, when the solenoid valve receives the control instruction of the control module 80, the solenoid valve opens, and the external gas guides the guide cylinder, then the guide cylinder is actuated and drives the valve plate to move, so that the valve plate blocks the gas passage of the vacuum pipeline 10 to prevent the backflow gas from entering the vacuum chamber 200.

[0089] It should be noted that the second valve 60 can be an electric valve as required, and the electric valve receives and is controlled by the signal of the control module 80. When the gas in the vacuum pipeline 10 flows backward, the reverse flow gas detection component 30 sends the detection result to the control module 80, and the control module 80 controls the electric valve to close according to the detection result, thereby closing the gas passage in the vacuum pipeline and preventing the reverse flow gas from entering the vacuum chamber 200; the embodiment of the present application is not limited to this.

[0090] The various embodiments or implementation methods in this specification are described in a progressive manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the various embodiments can be referenced to each other.

[0091] It should be noted that the phrases "one embodiment", "an embodiment", "an exemplary embodiment", "some embodiments", etc. mentioned in the specification indicate that the described embodiments may include certain features, structures or characteristics, but not every embodiment may include the certain features, structures or characteristics. In addition, such phrases do not necessarily refer to the same embodiment. In addition, when describing certain features, structures or characteristics in conjunction with an embodiment, it is within the knowledge of those skilled in the art to implement such features, structures or characteristics in conjunction with other embodiments, whether explicitly or not explicitly described.

[0092] In general, terms should be understood, at least in part, by the context in which they are used. For example, the term "one or more" as used herein may be used to describe any feature, structure, or characteristic in a singular sense, or may be used to describe a combination of features, structures, or characteristics in a plural sense, depending, at least in part, on the context. Similarly, terms such as "a," "an," or "the" may also be understood to convey singular usage or to convey plural usage, depending, at least in part, on the context.

[0093] It should be easily understood that “on,” “above,” and “over” in the present disclosure should be interpreted in the broadest manner, so that “on” not only means “directly on something,” but also includes the meaning of “on something” with intervening features or layers therebetween, and “above” or “over” not only includes the meaning of “above” or “over,” but also may include the meaning of “above” or “over something” with no intervening features or layers therebetween (i.e., directly on something).

[0094] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A gas pipeline system connected to a vacuum chamber; characterized in that: The gas pipeline system includes a vacuum pipeline, a vacuum pump, a backflow gas detection component, a first valve and a control module; The vacuum pipeline is connected to the air inlet of the vacuum pump and the vacuum chamber; The backflow gas detection assembly and the first valve are respectively arranged on the vacuum pipeline, and the first valve is located between the backflow gas detection assembly and the vacuum chamber; The backflow gas detection component is configured to detect the gas flow direction in the vacuum pipeline and generate a detection result; the control module is configured to control the switch of the first valve according to the detection result of the backflow gas detection component.

2. The gas pipeline system according to claim 1, characterized in that: The counter-flow gas detection assembly includes a plurality of detector groups and a detection result generation module; Each of the detector groups comprises a transmitter and a receiver, wherein the transmitter is configured to transmit a detection signal and the receiver is configured to receive the detection signal; The detection result generating module generates the detection result according to the transmission time of the detection signal between the transmitter of each detector group and the corresponding receiver.

3. The gas pipeline system according to claim 2, characterized in that: The transmission path of the detection signal between the transmitter of each detector group and the corresponding receiver passes through the vacuum pipeline, and the angle between the transmission direction of each detection signal and the axial direction of the vacuum pipeline is an acute angle.

4. The gas pipeline system according to claim 3, characterized in that: The reverse flow gas detection assembly includes two of the detector groups; The transmitter of one of the detector groups is arranged on a side of the receiver of the detector group close to the vacuum pump; the transmitter of the other detector group is arranged on a side of the receiver of the detection group far from the vacuum pump.

5. The gas pipeline system according to claim 4, characterized in that: The detection result generating module generates the detection result according to the difference in transmission time of the detection signals of the two detector groups; When the difference in transmission time of the detection signals of the two detector groups is within a preset interval, the gas in the vacuum pipeline flows backwards, and the control module controls the first valve to close.

6. The gas pipeline system according to claim 3, characterized in that: The angle between the transmission direction of the detection signal between the transmitter and the corresponding receiver and the axial direction of the vacuum pipeline is greater than or equal to 40° and less than 50°.

7. The gas pipeline system according to any one of claims 1 to 6, characterized in that: The gas pipeline system further includes a second valve, which is disposed on the vacuum pipeline and located between the backflow gas detection assembly and the first valve; The control module controls the switch of the second valve according to the detection result of the backflow gas detection component.

8. The gas pipeline system according to claim 7, characterized in that: The gas pipeline system further includes a molecular pump, which is disposed on the vacuum pipeline and located between the first valve and the second valve.

9. The gas pipeline system according to any one of claims 1 to 6, characterized in that: The gas pipeline system also includes a reaction gas supply pipeline and a third valve; Wherein, the reaction gas supply pipeline is communicated with the vacuum chamber to provide reaction gas to the vacuum chamber; The third valve is disposed on the reaction gas supply pipeline, and the control module controls the switch of the third valve according to the detection result of the backflow gas detection component.

10. A semiconductor device, characterized in that: It includes a vacuum chamber and a gas pipeline system, wherein the gas pipeline system is connected to the vacuum chamber; The gas pipeline system includes a vacuum pipeline, a vacuum pump, a backflow gas detection component, a first valve and a control module; The vacuum pipeline is connected to the air inlet of the vacuum pump and the vacuum chamber, the backflow gas detection component and the first valve are respectively arranged on the vacuum pipeline; the first valve is located between the backflow gas detection component and the vacuum chamber; The backflow gas detection component is configured to detect the gas flow direction in the vacuum pipeline and generate a detection result, and the control module is configured to control the switch of the first valve according to the detection result of the backflow gas detection component.

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