Cleaning system

Abstract

The utility model discloses a cleaning system. The cleaning system comprises cleaning equipment and a base station. The cleaning equipment comprises an equipment body, a first water tank, a cleaning assembly and a power supply assembly. The first water tank is arranged on the equipment body and provided with a first containing space used for containing clean water, and the clean water in the first containing space is used for being guided to the cleaning assembly to wet the cleaning assembly. The cleaning assembly is arranged on the equipment body and used for cleaning a to-be-cleaned area in a wet state. The power assembly is used for supplying power to the cleaning equipment. The power supply assembly is arranged on the equipment body and located outside the first containing space, and the clear water in the first containing space is further used for cooling the power supply assembly. The base station is used for being in butt joint with cleaning equipment. In this way, the working stability of the power supply assembly in the charging and discharging process can be improved.

Description

Technical Field

[0001] The present application relates to the technical field of cleaning equipment, and in particular to a cleaning system. Background Art

[0002] With the development of computer technology, smart devices have appeared in all aspects of people's lives. In life, many people will choose smart devices to make their lives more convenient. Among them, in the field of home appliances, smart cleaning equipment can save people time and energy and has entered thousands of households.

[0003] During the charging and discharging process of the cleaning equipment, an electrochemical reaction may occur in the power supply component of the cleaning equipment to generate or store electrical energy. The occurrence of the electrochemical reaction is often accompanied by the generation of heat, and the accumulation of heat is not conducive to the stable operation of the power supply component. Utility Model Content

[0004] The main technical problem solved by the present application is to provide a cleaning system that can improve the working stability of the power supply component during the charging and discharging process.

[0005] In order to solve the above technical problems, the technical solution adopted in this application is: providing a cleaning system including a cleaning device and a base station. The cleaning device includes a device body, a first water tank, a cleaning component and a power supply component. The first water tank is arranged on the device body, and the first water tank is provided with a first receiving space for receiving clean water. The clean water in the first receiving space is used to be directed to the cleaning component to wet the cleaning component. The cleaning component is arranged on the device body, and is used to clean the area to be cleaned in a wet state. The power supply component is used to power the cleaning device. The power supply component is arranged on the device body and is located outside the first receiving space. The clean water in the first receiving space is also used to cool the power supply component. The base station is used to dock with the cleaning device.

[0006] The beneficial effects of the present application are as follows: different from the prior art, the cleaning system includes a cleaning device and a base station, the cleaning device includes a device body, a first water tank, a cleaning component and a power supply component, the first water tank is arranged on the device body, the first water tank is provided with a first receiving space for receiving clean water, the clean water in the first receiving space is used to be directed to the cleaning component to wet the cleaning component, the cleaning component is arranged on the device body, and is used to clean the area to be cleaned in a wetted state, the power supply component is used to power the cleaning device, the power supply component is arranged on the device body and is located outside the first receiving space, the clean water in the first receiving space is also used to cool the power supply component, the base station is used to dock with the cleaning device, and clean water is arranged to cool the power supply component, which can improve the working stability of the power supply component during the charging and discharging process, which is beneficial to the continuous and stable operation of the cleaning device, the power supply component and the first receiving space can be isolated from each other by the first water tank, and direct contact between the clean water and the power supply component is limited, which can reduce the risk of short circuit of the power supply component. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] Figure 1 This is a schematic cross-sectional structure diagram of an embodiment of the cleaning system of the present application;

[0008] Figure 2 A schematic diagram of the structure of the cleaning equipment for this application;

[0009] Figure 3 This is a schematic diagram of the base station structure of an embodiment of the cleaning system of the present application;

[0010] Figure 4 for Figure 2 A schematic diagram of a partial structure of the cleaning equipment shown;

[0011] Figure 5 for Figure 4 A schematic cross-sectional view of a partial structure of the cleaning device shown;

[0012] Figure 6 Schematic diagram of the structure of the cleaning components and connecting shaft of the cleaning equipment of this application

[0013] Figure 7 This is a schematic diagram of the structure of the second water tank of this application;

[0014] Figure 8 This is another structural schematic diagram of the second water tank of this application;

[0015] Fig. 9 This is a schematic diagram of the structure of the three-way valve of this application. DETAILED DESCRIPTION

[0016] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0017] After long-term research, the inventors found that during the charging and discharging process of the cleaning device, an electrochemical reaction may occur in the power supply component of the cleaning device to generate or store electrical energy. The occurrence of the electrochemical reaction is often accompanied by the generation of heat, and the accumulation of heat is not conducive to the stable operation of the power supply component. In order to solve this technical problem, the present application provides the following embodiments.

[0018] like Figure 1As shown, the cleaning system 1 described in the embodiment of the cleaning system of the present application includes a cleaning device 100 and a base station 200. The cleaning device 100 may have one or more functions of sweeping, washing, mopping, and vacuuming. For example, the cleaning device 100 may be a sweeping robot, a mopping robot, a washing and mopping robot, a sweeping, washing and mopping robot, a vacuum cleaner, etc. When the cleaning device 100 performs cleaning work, the cleaning device 100 may absorb various garbage objects from the outside, such as dust particles, paper scraps, hair, etc. The following is an exemplary structure of the cleaning device 100 described in the embodiment of the cleaning system of the present application.

[0019] The cleaning device 100 may include a device body 110 and a dust box. The dust box is detachably connected to the device body 110. Specifically, the dust box can be installed on the device body 110 by insertion, assembly, combination, etc. The function of the dust box is to collect various garbage objects absorbed by the cleaning device 100 when performing external cleaning work, such as dust particles, paper scraps, hair, etc. The cleaning device 100 may have a cleaning function or a dust collection function. Of course, it can have both a cleaning function and a dust collection function, and can also have other cleaning functions.

[0020] The device body 110 may further include a main housing, a traveling assembly, and a cleaning assembly.

[0021] The main shell can serve as the overall structural frame of the device body 110, and can include an outer shell and an inner shell, etc. The main shell can be used to accommodate multiple functional components, electrical devices and other components to protect the internal components and structures of the cleaning device 100. The peripheral side of the main shell can be partially surrounded to form an accommodating area, and the accommodating area is used to accommodate the dust box so that the dust box can be assembled with the device body 110. The bottom of the main shell facing the working surface (such as the ground) of the cleaning device 100 can be provided with a dust suction port, which is connected to the inside of the dust box, and garbage on the ground can be sucked through the dust suction port.

[0022] The walking assembly can be mainly arranged in the main shell, and the walking assembly can make the cleaning device 100 movable. The walking assembly includes a driving wheel and a universal wheel, and the universal wheel is driven by the driving wheel to move. The cleaning assembly may include a roller brush, and the roller brush can be arranged at the bottom of the main shell, which is used to provide a cleaning function when the cleaning device 100 is working, and clean the working surface of the cleaning device 100. The first fan 101 can be arranged in the main shell, and is used to suck dust, debris and other garbage objects on the working surface into the dust box.

[0023] like Figure 2 As shown, the device body 110 may include a first fan 101. The cleaning component and the first fan 101 may cooperate with each other and work together. For example, the dust suction port may be arranged adjacent to the roller brush, so that the garbage or dust swept out during the rotation of the roller brush can be sucked into the dust box by the first fan 101.

[0024] The above-mentioned structure of the cleaning device 100 is only for illustrative purposes and is not limited to the above-mentioned exemplary structure.

[0025] Alternatively, if Figure 3 As shown, the base station 200 may include a base station body 210 and a base 30. The base station body 210 is connected to the base 30. For example, the base station body 210 may be disposed on one side of the base 30, or the base station body 210 may be disposed above the base 30. The base 30 may be used to carry the cleaning device 100. For example, the cleaning device 100 may walk to the base 30 and stay on the base 30. The base station body 210 may suck garbage objects in the cleaning device 100 carried on the base 30.

[0026] Optionally, the base station 200 may have a dust box 23, a sewage tank 24, a second fan 220, a pumping mechanism 26, a liquid supply mechanism 27 and an air supply mechanism 28. Specifically, the base station body 210 has a dust box 23, a second water tank 21, a sewage tank 24, a second fan 220, a pumping mechanism 26, a liquid supply mechanism 27 and an air supply mechanism 28. Further, the base station body 210 may also have a first shell 29. The second water tank 21, the dust box 23, the sewage tank 24 and the air supply mechanism 28 may be arranged in the first shell 29 and spaced apart from each other. The second fan 220 is used to suck the garbage objects in the cleaning device 100 into the dust box 23. The dust box 23 is used to retain the garbage objects sucked from the cleaning device 100. The second water tank 21 can supply water to the cleaning device 100 for consumption and utilization by the cleaning device 100. The sewage tank 24 is used to hold the sewage or waste liquid generated after cleaning the cleaning device 100. The second water tank 21 can also supply water for washing the cleaning device 100. The pumping mechanism 26 is used to pump the sewage generated after washing the cleaning device 100 into the sewage tank 24. The liquid supply mechanism 27 is used to transport or pump the cleaning liquid to the cleaning device 100. The gas supply mechanism 28 is used to provide drying gas, so as to dry the corresponding area of ​​the cleaning device 100 after washing.

[0027] In some embodiments, the base station 200 is not provided with a sewage tank 24 , and the pumping mechanism 26 can be connected to the floor drain 400 in the scene to be cleaned to automatically pump the sewage to the floor drain 400 .

[0028] The above-mentioned structure of the base station 200 is only for illustrative purposes and is not limited to the above-mentioned example structure.

[0029] like Figure 1 , Figure 2 and Figure 4As shown, the cleaning system 1 includes a cleaning device 100 and a base station 200. The cleaning device 100 includes a device body 110, a first water tank 111, a cleaning component 130 and a power supply component 160. The first water tank 111 is arranged on the device body 110, and the first water tank 111 is provided with a first accommodating space 112 for accommodating clean water. The clean water in the first accommodating space 112 is used to be directed to the cleaning component 130 to wet the cleaning component 130. The cleaning component 130 is arranged on the device body 110, and is used to clean the area to be cleaned in a wet state. The power supply component 160 is used to supply power to the cleaning device 100. The power supply component 160 is arranged on the device body 110 and is located outside the first accommodating space 112. The clean water in the first accommodating space 112 is also used to cool the power supply component 160. The base station 200 is used to dock with the cleaning device 100.

[0030] During the charging and discharging process of the power assembly 160, an electrochemical reaction may occur in the power assembly 160 to generate or store electrical energy. The process of the electrochemical reaction is often accompanied by the generation of heat, and the accumulation of heat is not conducive to the stable operation of the power assembly 160. By setting clean water to cool the power assembly 160, the working stability of the power assembly 160 during the charging and discharging process can be improved, which is conducive to the continuous and stable operation of the cleaning device 100 and can also increase the service life of the power assembly 160.

[0031] By providing the first accommodation space 112 to accommodate clean water, it is convenient to adjust and control the clean water. By isolating the power supply assembly 160 and the first accommodation space 112 from each other, the clean water is restricted from directly contacting the power supply assembly 160, and the short circuit risk of the power supply assembly 160 can be reduced. For example, the power supply assembly 160 can be sealed around to prevent clean water from intruding.

[0032] When the cooling effect of the clean water in the first storage space 112 is insufficient due to the increase in temperature, the cleaning device 100 can discharge the clean water with higher temperature in the first storage space 112 and obtain clean water with lower temperature to inject into the first storage space 112, so that the clean water in the first storage space 112 maintains a lower temperature.

[0033] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the device body 110 includes a first water tank 111 , and the power supply assembly 160 is disposed on the first water tank 111 . The first accommodating space 112 is opened in the first water tank 111 .

[0034] For example, the power supply assembly 160 may be disposed outside the first water tank 111 and contact the outer wall of the first receiving space 112. For another example, the power supply assembly 160 may be at least partially disposed inside the first water tank 111 and contact the peripheral wall of the first receiving space 112.

[0035] By providing the first water tank 111 , it is convenient to assemble the power supply assembly 160 close to the first accommodation space 112 .

[0036] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the first water tank 111 further has a second accommodation space 113 adjacent to and isolated from the first accommodation space 112 , and the power supply assembly 160 is accommodated in the second accommodation space 113 .

[0037] The second accommodation space 113 may be disposed adjacent to the first accommodation space 112. By disposing the second accommodation space 113, it is convenient to assemble the power supply assembly 160 close to the first accommodation space 112.

[0038] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the first accommodation space 112 is configured to surround at least a portion of the second accommodation space 113 , so that the clean water surrounds at least a portion of the power source assembly 160 .

[0039] Such a configuration is beneficial to increasing the area of ​​the heat exchange between the clean water and the power supply assembly 160 , improving the heat exchange efficiency, and thus improving the cooling effect of the clean water on the power supply assembly 160 .

[0040] For example, the first accommodation space 112 is configured to completely surround the second accommodation space 113. For another example, the first accommodation space 112 is configured to surround the peripheral side and bottom 142 of the second accommodation space 113, and the power supply assembly 160 can enter the accommodation space through the top 141 of the second accommodation space 113 during assembly.

[0041] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the first water tank 111 includes an outer shell 114 and an inner shell 115, wherein the outer shell 114 is located outside the inner shell 115. A first accommodation space 112 is formed between the outer shell 114 and the inner shell 115, and the inner shell 115 is surrounded to form a second accommodation space 113.

[0042] By arranging the outer shell 114 to be located outside the inner shell 115, the first accommodation space 112 can surround the second accommodation space 113. Such an arrangement is conducive to simplifying the structure of the first water tank 111, facilitating the assembly of the first water tank 111, and improving assembly efficiency.

[0043] Alternatively, if Figure 2 , Figure 4 and Figure 5As shown, the first water tank 111 includes an upper cover 123. The inner shell 115 includes an inner side wall 1151 and an inner bottom wall 1152 connected to each other, and the inner shell 115 is also formed with an inner opening 1153 opposite to the inner bottom wall 1152. The outer shell 114 includes an outer side wall 1141 and an outer bottom wall 1142 connected to each other, and the outer shell 114 is also formed with an outer opening 1143 opposite to the outer bottom wall 1142. The outer side wall 1141 is arranged around the inner side wall 1151 and the inner bottom wall 1152, and the inner bottom wall 1152 is spaced apart from the outer bottom wall 1142. The upper cover 123 is simultaneously covered on the inner opening 1153 and the outer opening 1143 to block the inner opening 1153 and the outer opening 1143.

[0044] Furthermore, the inner top wall and the outer top wall are integrally formed and connected, and the outer side wall 1141 and the outer bottom wall 1142 are integrally formed and connected.

[0045] Alternatively, if Figure 2 , Figures 4 to 6 As shown, the first water tank 111 is further provided with a lower liquid port 116 communicating with the first accommodation space 112, and the lower liquid port 116 is used to guide the clean water in the first accommodation space 112 to the cleaning assembly 130. In this way, the internal structural arrangement of the cleaning device 100 is highly flexible, thereby facilitating assembly.

[0046] Alternatively, if Figure 2 , Figures 4 to 6 As shown, the first water tank 111 is provided with a transition chamber 120 communicating with the first accommodation space 112 and a lower liquid port 116 communicating with the transition chamber 120. The cleaning assembly 130 is arranged on the side of the first water tank 111 facing the area to be cleaned. The cleaning device 100 includes a lower liquid pump 150, which is used to transport the clean water in the first accommodation space 112 to the transition chamber 120, and the lower liquid port 116 is used to guide the clean water in the transition chamber 120 to the cleaning assembly 130 to wet the cleaning assembly 130.

[0047] The cleaning work of the cleaning device 100 on the area to be cleaned is performed by the cleaning component 130. During the cleaning process, the cleaning component 130 can contact the area to be cleaned and then apply pressure, and move relative to the area to be cleaned, so as to achieve cleaning of the area to be cleaned.

[0048] The clean water is directed to the cleaning assembly 130 through the lower liquid port 116 to wet the cleaning assembly 130, which can improve the cleaning effect of the cleaning assembly 130. By enriching the functions of the clean water, the cleaning device 100 is structurally compact.

[0049] The lower liquid port 116 is in communication with the transition chamber 120 and is in communication with the first accommodation space 112 through the transition chamber 120. By providing the lower liquid pump 150, the flow rate of the clean water flowing out to the cleaning assembly 130 can be regulated to improve the cleaning effect. By providing the transition chamber 120, the clean water can flow out from the lower liquid port 116 evenly and smoothly to improve the cleaning effect.

[0050] Optionally, the lower liquid port 116 and the transition cavity 120 are arranged on a side of the outer bottom wall 1142 away from the first accommodating space 112 .

[0051] Optionally, the lower liquid port 116 is opened toward the cleaning component 130 .

[0052] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the cleaning device 100 may include two cleaning components 130. The two cleaning components 130 may perform the same cleaning action on the area to be cleaned, or the two cleaning components 130 may perform different cleaning actions on the area to be cleaned. Accordingly, the first water tank 111 is provided with two lower liquid ports 116 connected to the first accommodating space 112. The two lower liquid ports 116 guide clean water to the two cleaning components 130 respectively.

[0053] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the device body 110 also includes a driving motor 131 and a transmission mechanism 132, and the transmission mechanism 132 is connected between the driving motor 131 and the cleaning component 130. The driving motor 131 is used to drive the transmission mechanism 132 to rotate, and the cleaning component 130 is driven to rotate through the transmission mechanism 132. The cleaning device 100 has a top 141 and a bottom 142, and the first water tank 111 is located between the top 141 and the bottom 142. The first water tank 111 is provided with a step surface 117 facing the top 141. The driving motor 131 and / or the transmission mechanism 132 are mounted on the step surface 117. The cleaning component 130 is located on the side of the first water tank 111 facing the bottom 142.

[0054] The cleaning assembly 130 can clean the area to be cleaned by rotating relative to the area to be cleaned. By arranging the drive motor 131 and / or the transmission mechanism 132 on the step surface 117, the first water tank 111 can support the drive motor 131 and / or the transmission mechanism 132, so that the cleaning device 100 can be compact and the space utilization rate of the cleaning device 100 can be improved. By arranging the cleaning assembly 130 on the side of the first water tank 111 facing the bottom 142, it is convenient to use gravity to guide clean water to the cleaning assembly 130.

[0055] Optionally, the cleaning device 100 may include two cleaning components 130 , two driving motors 131 and two transmission mechanisms 132 in one-to-one correspondence.

[0056] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the first water tank 111 includes a first receiving portion 118 and a second receiving portion 119. The first receiving portion 118 is protrudingly disposed on the side of the second receiving portion 119 facing the top 141, so that the side of the second receiving portion 119 facing the top 141 forms a step surface 117. The cleaning assembly 130 is located on the side of the second receiving portion 119 facing the bottom 142.

[0057] Alternatively, if Figures 4 to 6 As shown, the device body 110 also includes a connecting shaft 136, which is transmission-connected between the cleaning assembly 130 and the transmission mechanism 132. The cleaning assembly 130 can be driven by the connecting shaft 136 to rotate relative to the area to be cleaned to clean the area to be cleaned. The second accommodating portion 119 can be configured to avoid the connecting shaft 136, so that the connecting shaft 136 can be connected to the transmission mechanism 132 and the cleaning assembly 130 on both sides of the second accommodating portion 119.

[0058] Optionally, the transmission mechanism 132 may include a gear pair and a worm gear pair.

[0059] Alternatively, if Figure 2 , Figure 4 and Figure 5 As shown, the step surface 117 is formed on the outer shell 114. The outer contour of the outer shell 114 can match the outer contour of the driving motor 131 and / or the transmission mechanism 132.

[0060] Alternatively, if Figures 4 to 6 As shown, the cleaning assembly 130 includes a connecting seat 133 and a mop 134, and the mop 134 is connected to the side of the connecting seat 133 facing the bottom 142. The connecting seat 133 is provided with an avoidance hole 135, and the avoidance hole 135 is arranged opposite to the lower liquid port 116. The connecting seat 133 avoids the clean water flowing out of the lower liquid port 116 through the avoidance hole 135, so that the clean water flows onto the mop 134 to wet the mop 134.

[0061] During the cleaning process, the mop 134 can be wetted with clean water to improve the cleaning effect of the mop 134. The mop 134 can be located at the bottom 142 of the cleaning device 100. The connecting seat 133 can be used to fix the mop 134. By providing the avoidance hole 135, the mop 134 can be exposed relative to the lower liquid port 116, so that the clean water flowing out of the lower liquid port 116 can be directed to the mop 134.

[0062] Specifically, if Figures 4 to 6 As shown, the mop 134 is connected to one side of the connection seat 133, and one end of the connection shaft 136 is detachably connected to the side of the connection seat 133 away from the mop 134. The cleaning assembly 130 can contact the area to be cleaned through the mop 134. During the cleaning process, the connection shaft 136 drives the connection seat 133 to rotate, and the connection seat 133 drives the mop 134 to rotate synchronously. The mop 134 cleans the area to be cleaned by rotating relative to the area to be cleaned.

[0063] Optionally, the material of the mop 134 may include a soft material that can absorb water.

[0064] Alternatively, if Figures 1 to 3 As shown, the base station 200 is provided with a second water tank 21. Further, the base station 200 includes a base station body 210 and a second water tank 21, and the second water tank 21 is detachably arranged on the base station body 210. The second water tank 21 is used to communicate with the first accommodating space 112 to receive the clean water output from the first accommodating space 112 and / or provide clean water to the first accommodating space 112.

[0065] Clean water may be stored in the second water tank 21. When the first accommodation space 112 lacks clean water or requires clean water with a lower temperature, the clean water in the second water tank 21 may enter the first accommodation space 112, so that the first accommodation space 112 has enough clean water.

[0066] Alternatively, if Figure 1 , Figure 2 and Figure 7 As shown, the second water tank 21 includes two sub-boxes 22 arranged at intervals, one of which is used to receive clean water output from the first accommodating space 112, and the other sub-box 22 is used to provide clean water to the first accommodating space 112. One of the sub-boxes 22 can be connected to the second liquid inlet 21b, and the other sub-box 22 can be connected to the second liquid outlet 21a.

[0067] The clean water output from the first storage space 112 has a higher temperature, while the clean water provided into the first storage space 112 has a lower temperature. This arrangement can easily isolate the clean water with a higher temperature from the clean water with a lower temperature, which is beneficial to maintaining a lower temperature of the clean water provided into the first storage space 112.

[0068] Alternatively, if Figure 1 , Figure 2 and Figure 8As shown, the second water tank 21 is provided with two sub-spaces 23 isolated from each other, wherein one sub-space 23 is used to receive the clean water output from the first accommodation space 112, wherein the other sub-space 23 is used to provide clean water to the first accommodation space 112. One sub-space 23 can be connected to the second liquid inlet 21b, wherein the other sub-space 23 can be connected to the second liquid outlet 21a. Such a configuration can facilitate the isolation of clean water with a higher temperature from clean water with a lower temperature, and at the same time facilitate the assembly of the second water tank 21.

[0069] Alternatively, if Figures 1 to 3 As shown, the second water tank 21 is provided with a third accommodating space 24, which is used to receive the clean water output from the first accommodating space 112 and to provide clean water to the first accommodating space 112. The third accommodating space 24 can be connected to the second liquid outlet 21a and the second liquid inlet 21b. Such a configuration is conducive to reducing the volume of the second water tank 21, and is convenient for molding and assembling the second water tank 21.

[0070] Alternatively, if Figures 1 to 3 As shown, the first water tank 111 is provided with a first liquid outlet 121 and a first liquid inlet 122 communicating with the first accommodation space 112. The second water tank 21 is provided with a second liquid outlet 21a and a second liquid inlet 21b, the second liquid outlet 21a is used to communicate with the first liquid inlet 122, and the second liquid inlet 21b is used to communicate with the first liquid outlet 121.

[0071] Specifically, clean water may be stored in the second water tank 21. The first liquid inlet 122 is used to communicate with the second water tank 21 of the base station 200 to receive the clean water in the second water tank 21. The first liquid outlet 121 is used to communicate with the second water tank 21 to deliver clean water to the second water tank 21.

[0072] When there is a lack of clean water in the first accommodation space 112 , the clean water in the second water tank 21 can enter the first accommodation space 112 through the second liquid outlet 21 a and the first liquid inlet 122 , so that the first accommodation space 112 has enough clean water.

[0073] When the clean water in the first storage space 112 has insufficient cooling effect due to the increase in temperature, the clean water in the second water tank 21 can enter the first storage space 112 through the second liquid outlet 21a and the first liquid inlet 122, and the clean water in the first storage space 112 can enter the second water tank 21 through the first liquid outlet 121 and the second liquid inlet 21b, so that the clean water circulates between the second water tank 21 and the first storage space 112, so that the clean water in the first storage space 112 maintains a relatively low temperature. It is worth mentioning here that, in some embodiments, the first storage space 112 receives the clean water output by the base station 200 and discharges the clean water to the base station 200. In other embodiments, the first storage space 112 first discharges the clean water to the base station 200, and then receives the clean water output by the base station 200.

[0074] Furthermore, the first liquid outlet 121 and the first liquid inlet 122 are opened on the outer side wall 1141 described below.

[0075] Alternatively, if Figure 1 , Figure 2 and Fig. 9 As shown, the cleaning device 100 includes a three-way valve 180, which has a water inlet 181, a first water outlet 182 and a second water outlet 183. The first liquid outlet 121 is connected to the water inlet 181, the first water outlet 182 is used to connect with the second liquid inlet 21b, and the second water outlet 183 is used to transport the clean water flowing out through the first liquid outlet 121 to the cleaning component 130.

[0076] By providing the three-way valve 180, the number of openings on the first water tank 111 can be reduced, and the number of water pumps 230 can be reduced. For example, the water pump 230 can transport clean water from the first liquid outlet 121 to the water inlet 181, and then the clean water can flow from the water inlet 181 to the first water outlet 182 and the second water outlet 183 in the three-way valve 180. Furthermore, the three-way valve 180 is provided with a first valve 184 for blocking the first water outlet 182 and a second valve 185 for blocking the second water outlet 183.

[0077] Alternatively, if Figure 1 and Figure 3 As shown, a water pump 230 is provided on the base station 200 or the cleaning device 100. The water pump 230 is used to transport clean water from the second liquid outlet 21a to the first liquid inlet 122, and is also used to transport clean water from the first liquid outlet 121 to the second liquid inlet 21b. It should be emphasized that the water pump 230 mentioned here does not specifically refer to a water pump 230 that can realize the operation of the second water tank 21 supplying water to the first accommodating space 112, and the operation of the first accommodating space 112 draining water into the second water tank 21. The number of water pumps 230 can be one or two.

[0078] The water pump 230 can provide power for the circulation of clean water between the second water tank 21 and the first accommodating space 112. In this way, it is helpful to reduce the number of water pumps 230. For example, the water pump 230 is an air pump. In some embodiments, when the cleaning device 100 is provided with a water pump 230, the water pump 230 can also be used to transport the clean water flowing out through the first liquid outlet 121 to the cleaning component 130. In other embodiments, a lower liquid pump 150 can be additionally provided on the cleaning device 100, and the lower liquid pump 150 is used to transport the clean water flowing out through the first liquid outlet 121 to the cleaning component 130.

[0079] Optionally, the cleaning system 1 may also be provided with two water pumps 230, one of the two water pumps 230 is used to transport clean water from the second liquid outlet 21a to the first liquid inlet 122, and the other of the two water pumps 230 is used to transport clean water from the first liquid outlet 121 to the second liquid inlet 21b. The two water pumps 230 may be provided on the base station 200 at the same time, or may be provided on the cleaning device 100 at the same time, or one of the water pumps 230 may be provided on the base station 200 and the other on the cleaning device 100.

[0080] In this way, the internal structural arrangement of the cleaning device 100 can be made highly flexible, thereby facilitating assembly. For example, the water pump 230 is an air pump or a peristaltic pump. In some embodiments, when the cleaning device 100 is provided with at least one water pump 230, the water pump 230 is also used to transport the clean water flowing out through the first liquid outlet 121 to the cleaning assembly 130. In other embodiments, a lower liquid pump 150 may be additionally provided, and the lower liquid pump 150 is used to transport the clean water flowing out through the first liquid outlet 121 to the cleaning assembly 130.

[0081] Alternatively, if Figure 1 and Figure 2 As shown, the cleaning device 100 includes an electrically connected processor 170 and a temperature sensor 161. The temperature sensor 161 is arranged on the power supply component 160. The temperature sensor 161 is used to detect the temperature of the power supply component 160. The processor 170 is used to control the docking of the cleaning device 100 with the base station 200 when the temperature exceeds a preset threshold value, so that the first accommodating space 112 can receive the clean water output by the base station 200 and discharge the clean water to the base station 200.

[0082] Before the cleaning device 100 leaves the base station 200, the base station 200 may pass enough clean water through the first accommodation space 112, and then the cleaning device 100 leaves the base station 200 to perform cleaning work. During the operation of the cleaning device 100, when the clean water level is lower than the preset liquid level threshold, the cleaning device 100 may return to the base station 200 to obtain clean water. During the operation of the cleaning device 100, the processor 170 of the cleaning device 100 may monitor the temperature of the power supply assembly 160 in real time through the temperature sensor 161. When the temperature of the power supply assembly 160 reaches the preset threshold value T, the cleaning device 100 may return to the base station 200, obtain clean water with a lower temperature from the second water tank 21, and output the clean water heated by the power supply assembly 160 through the base station 200, thereby improving the cooling effect of the power supply assembly 160.

[0083] Alternatively, if Figure 1 and Figure 2 As shown, the cleaning device 100 includes an electrically connected processor 170 and a temperature sensor 161. The temperature sensor 161 is arranged on the power supply component 160. The temperature sensor 161 is used to detect the temperature of the power supply component 160. When the cleaning device 100 is docked with the base station 200 and the power supply component 160 is in a charging mode, the processor 170 is used to control the first accommodating space 112 to discharge clean water to the base station 200 and receive the clean water output by the base station 200 when the temperature exceeds a preset threshold.

[0084] When the cleaning device 100 returns to the base station 200 to prepare for charging after completing the work or during the charging process, when the temperature of the power supply component 160 reaches the preset threshold value T, the cleaning device 100 can obtain clean water with a lower temperature from the second water tank 21, and output the clean water heated by the power supply component 160 through the base station 200, which is conducive to quickly reducing the temperature of the power supply component 160 so that the power supply component 160 can be charged normally.

[0085] Alternatively, if Figures 1 to 3 As shown, the base station 200 is provided with a cleaning tank 201, a liquid replenishing port 202 and a liquid discharge port 203. The base station also includes a second water tank 21. The liquid replenishing port 202 is used to communicate with the second liquid outlet 21a of the second water tank 21, and is also used to communicate with the first liquid inlet 122. The clean water output by the second water tank 21 can enter the first accommodating space 112 through the liquid replenishing port 202 and the first liquid inlet 122. The cleaning tank 201 is used to accommodate the cleaning component 130 and provide space for cleaning the cleaning component 130. When the base station 200 and the cleaning device 100 are docked, the cleaning component 130 is in the cleaning tank 201, and the first water tank 111 can also discharge the clean water with a higher temperature into the cleaning tank 201 or onto the cleaning component 130, so that the cleaning component 130 can be cleaned. The liquid discharge port 203 is used to communicate with the cleaning tank 201 and the sewage tank 24. The wastewater generated by cleaning the cleaning assembly 130 in the cleaning tank 201 can be discharged to the wastewater tank 24 through the drain port 203 .

[0086] Optionally, in some embodiments, the base station 200 is an automatic water supply and discharge base station, that is, the second water tank 21 and the sewage tank 24 can be omitted. The base station 200 can obtain low-temperature clean water from outside the cleaning system 1 to meet the clean water demand of the cleaning device 100. The base station 200 can also discharge high-temperature clean water to the outside of the cleaning system 1.

[0087] In some embodiments, Figures 1 to 3 As shown, the liquid replenishing port 202 is used to communicate with the external faucet 300, and the liquid discharging port 203 is used to communicate with the cleaning tank 201 and the floor drain 400. The first water tank 111 is provided with a first liquid inlet 122 and a first liquid outlet 121 that are connected to the first accommodating space 112. The first liquid inlet 122 is used to communicate with the external faucet 300 through the base station 200, and the first liquid outlet 121 is used to communicate with the cleaning tank 201.

[0088] When the base station 200 is docked with the cleaning device 100, the first water tank 111 can obtain the low-temperature clean water output by the external faucet 300 through the base station 200. The clean water output by the external faucet 300 can enter the first accommodation space 112 through the liquid replenishment port 202 and the first liquid inlet 122. In some embodiments, the first water tank 111 can also discharge the clean water with a higher temperature into the cleaning tank 201 through the first liquid outlet 121 or discharge it to the cleaning component 130 through the additional lower liquid port 116 for cleaning the cleaning component 130, and then discharge it to the floor drain 400 through the drain port 203. The clean water with a higher temperature is also conducive to improving the cleaning effect of the cleaning component 130.

[0089] Alternatively, in other embodiments, Figures 1 to 3 as well as Fig. 9 As shown, the cleaning device 100 includes a three-way valve 180, which has a water inlet 181, a first water outlet 182 and a second water outlet 183. The first liquid outlet 121 is connected to the water inlet 181, the first water outlet 182 is used to communicate with the cleaning tank 201, and the second water outlet 183 is used to transport the clean water flowing out through the first liquid outlet 121 to the cleaning component 130. The first water tank 111 can discharge the clean water with a higher temperature into the cleaning tank 201 through the first water outlet 182 or discharge it to the cleaning component 130 through the second water outlet 183.

[0090] Alternatively, if Figure 3 and Figure 4 As shown, the base station 200 is provided with a cleaning port 204 connected to the cleaning tank 201 , and the cleaning port 204 is used to input clean water for cleaning the cleaning component 130 into the cleaning tank 201 .

[0091] Clean water outputted from the second water tank 21 or the external faucet 300 can enter the cleaning tank 201 through the cleaning port 204 to clean the cleaning assembly 130. Waste water generated by cleaning the cleaning assembly 130 can be discharged from the cleaning tank 201 to the floor drain 400 through the drain port 203.

[0092] In summary, the present embodiment can realize setting clean water to cool the power supply component 160, which can improve the working stability of the power supply component 160 during the charging and discharging process. By setting the power supply component 160 and the first accommodating space 112 to be isolated from each other and limiting direct contact between clean water and the power supply component 160, the risk of short circuit of the power supply component 160 can be reduced.

[0093] The above descriptions are merely embodiments of the present application and are not intended to limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A cleaning system, characterized in that: include: A cleaning device, comprising a device body, a first water tank, a cleaning component and a power supply component; The first water tank is arranged on the main body of the device, and the first water tank is provided with a first accommodating space for accommodating clean water, and the clean water in the first accommodating space is used to be directed to the cleaning component to wet the cleaning component; the cleaning component is arranged on the main body of the device, and is used to clean the area to be cleaned in a wet state; the power supply component is used to supply power to the cleaning device; the power supply component is arranged on the main body of the device and is located outside the first accommodating space, and the clean water in the first accommodating space is also used to cool the power supply component; A base station is used to connect with the cleaning device.

2. The cleaning system according to claim 1, characterized in that The base station includes a base station body and a second water tank, wherein the second water tank is detachably arranged on the base station body, and the second water tank is used to connect to the first accommodating space to receive clean water output from the first accommodating space and / or provide clean water to the first accommodating space.

3. The cleaning system according to claim 2, characterized in that: The first water tank is provided with a first liquid outlet and a first liquid inlet connected to the first accommodating space; the second water tank is provided with a second liquid outlet and a second liquid inlet, the second liquid outlet is used to be connected to the first liquid inlet, and the second liquid inlet is used to be connected to the first liquid outlet; The cleaning equipment includes a three-way valve, which has a water inlet, a first water outlet and a second water outlet, the first water outlet is connected to the water inlet, the first water outlet is used to communicate with the second water inlet, and the second water outlet is used to transport the clean water flowing out through the first liquid outlet to the cleaning component; or, the first water tank is also provided with a lower liquid outlet connected to the first storage space, and the lower liquid outlet is used to divert the clean water in the first storage space to the cleaning component.

4. The cleaning system according to claim 3, characterized in that: The base station or the cleaning device is provided with a water pump; the water pump is used to transport clean water from the second liquid outlet to the first liquid inlet, and is also used to transport clean water from the first liquid outlet to the second liquid inlet; or The cleaning system is provided with two water pumps, one of which is used to transport clean water from the second liquid outlet to the first liquid inlet, and the other of which is used to transport clean water from the first liquid outlet to the second liquid inlet.

5. The cleaning system according to claim 2, characterized in that: The second water tank comprises two sub-boxes arranged at intervals, wherein one sub-box is used to receive the clean water output from the first containing space, and the other sub-box is used to provide clean water to the first containing space; or The second water tank is provided with two sub-spaces isolated from each other, wherein one sub-space is used to receive the clean water outputted from the first containing space, and the other sub-space is used to provide clean water into the first containing space; or The second water tank is provided with a third accommodating space, and the third accommodating space is used to receive the clean water outputted from the first accommodating space, and is also used to provide clean water to the first accommodating space.

6. The cleaning system according to claim 1, characterized in that The cleaning device includes an electrically connected processor and a temperature sensor, wherein the temperature sensor is disposed on the power supply component and is used to detect the temperature of the power supply component. The processor is used to control the cleaning device to dock with the base station when the temperature exceeds a preset threshold value, so that the first accommodating space can receive the clean water output by the base station and discharge the clean water to the base station.

7. The cleaning system according to claim 1, characterized in that The cleaning device includes an electrically connected processor and a temperature sensor, wherein the temperature sensor is disposed on the power supply component and is used to detect the temperature of the power supply component. When the cleaning device is docked with the base station and the power supply component is in a charging mode, the processor is used to control the first accommodating space to discharge clean water to the base station and receive the clean water output by the base station when the temperature exceeds a preset threshold.

8. The cleaning system according to claim 1, characterized in that The first water tank also has a second accommodation space adjacent to and isolated from the first accommodation space, and the power supply assembly is accommodated in the second accommodation space.

9. The cleaning system according to claim 1, characterized in that: The base station is provided with a cleaning tank, a liquid replenishing port and a liquid draining port, the liquid replenishing port is used to communicate with an external faucet, the liquid draining port is used to communicate with the cleaning tank and a floor drain, the cleaning tank is used to accommodate the cleaning component and provide a space for cleaning the cleaning component, the first water tank is provided with a first liquid inlet and a first liquid outlet communicated with the first accommodating space, the first liquid inlet is used to communicate with the external faucet through the base station; The cleaning equipment includes a three-way valve, which has a water inlet, a first water outlet and a second water outlet. The first water outlet is connected to the water inlet, the first water outlet is used to connect with the cleaning tank, and the second water outlet is used to transport the clean water flowing out through the first water outlet to the cleaning component.

10. The cleaning system according to claim 1, characterized in that The base station is provided with a cleaning tank, a liquid replenishing port and a liquid draining port, the liquid replenishing port is used to communicate with an external water tap, the liquid draining port is used to communicate with the cleaning tank and a floor drain, the cleaning tank is used to accommodate the cleaning component and provide a space for cleaning the cleaning component, the first water tank is provided with a first liquid inlet and a first liquid outlet communicated with the first accommodating space, the first liquid inlet is used to communicate with the external water tap through the base station, and the first liquid outlet is used to communicate with the cleaning tank; The first water tank is further provided with a lower liquid port connected to the first accommodating space, and the lower liquid port is used to guide the clean water in the first accommodating space to the cleaning component.

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