Plasma conveying device

Abstract

The utility model discloses a plasma conveying device, and relates to the technical field of mechanical equipment. The conveying body is communicated with a reaction chamber generating plasma and used for conveying the plasma generated by the reaction chamber to the surface of a workpiece to be machined, a panel, facing one side of the workpiece to be machined, on the conveying body is an arc face, and a plurality of through holes allowing the plasma to pass through are formed in the panel. Plasma is uniformly distributed on the surface of a workpiece.

Description

Technical Field

[0001] The utility model relates to the technical field of mechanical equipment, in particular to a plasma conveying device. Background Art

[0002] Plasma etching technology is a basic and important process in semiconductor manufacturing and other surface treatment industries. Plasma etching technology uses excited gas particles, namely plasma, to remove or etch the surface of a material to form a desired structure or pattern. This process is widely used in integrated circuits (ICs), microelectromechanical systems (MEMS) and nanotechnology. In these applications, how to accurately control the distribution and concentration of plasma to achieve uniform and efficient etching has become the key to improving product quality and production efficiency.

[0003] Traditional plasma delivery equipment usually uses a showerhead with a fixed opening density distribution and a planar structure, which has limitations in delivering plasma to the surface of the workpiece being processed. However, due to the fixed opening density, this method is incapable of regulating the distribution of plasma. Especially when processing large-area workpieces or workpieces with high aspect ratio structures, the uneven distribution of plasma will cause non-uniformity in the etching process. This non-uniformity is manifested in the significant difference in the etching rate or etching depth between the center and edge areas of the workpiece. The center area has a high etching speed due to the high plasma concentration, while the edge area has a low plasma concentration due to the distance from the shower head, and the etching speed is relatively slow, which in turn affects the processing quality and consistency of the workpiece.

[0004] In addition, another drawback of the traditional shower head structure design is the fixed density and layout of the openings, which limits the ability to dynamically adjust the plasma flow. This makes it a major challenge to adjust the plasma distribution according to different processing requirements during the processing, especially in the high-end manufacturing field that requires high-precision and high-quality processing.

[0005] Therefore, how to make the plasma evenly distributed on the workpiece surface has become a technical problem that needs to be solved urgently. Utility Model Content

[0006] The main purpose of the utility model is to provide a plasma delivery device, aiming to make the plasma evenly distributed on the surface of the workpiece.

[0007] In order to achieve the above object, the utility model provides a plasma delivery device, comprising:

[0008] The conveying body is connected to the reaction chamber for generating plasma and is used to convey the plasma generated in the reaction chamber to the surface of the workpiece to be processed. The panel on the conveying body facing the workpiece to be processed is an arc surface and is provided with a plurality of through holes for plasma to pass through.

[0009] In one embodiment of the present application, the panel is circular, the plurality of through holes constitute a plurality of concentric circles with different radii, and the center of the plurality of concentric circles with different radii coincides with the center of the panel.

[0010] In one embodiment of the present application, the distance between two adjacent concentric circles decreases successively from the center of the panel to the outside.

[0011] In one embodiment of the present application, the through holes forming the same concentric circle have the same size.

[0012] In one embodiment of the present application, the sizes of the through holes in the concentric circles increase sequentially from the center of the panel to the outside.

[0013] In one embodiment of the present application, the through hole is formed by precision drilling or laser etching.

[0014] In one embodiment of the present application, the panel is a polished panel to reduce the aggregation of plasma near the through hole.

[0015] By adopting the above technical solution, the conveying body is connected to the reaction chamber that generates plasma. By designing the panel on the conveying body close to the workpiece to be processed into an arc surface, the distribution of plasma on the surface of the workpiece to be processed can be flexibly adjusted to optimize the processing effect. The structure is simple and easy to implement. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The present invention is described in detail below with reference to specific embodiments and accompanying drawings, wherein:

[0017] Figure 1 It is a side view of the first embodiment of the utility model;

[0018] Figure 2 A bottom view of the first embodiment of the utility model;

[0019] 10. Panel; 20. Through hole; 30. Conveying body. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical solution and advantages of the utility model clearer, the utility model is described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the following specific embodiments are only used to explain the utility model and do not constitute a limitation on the utility model.

[0021] like Figure 1 to Figure 2As shown, in order to achieve the above-mentioned purpose, the utility model proposes a plasma delivery device, including: a delivery body 30, which is connected to a reaction chamber that generates plasma, and is used to deliver the plasma generated in the reaction chamber to the surface of a workpiece to be processed, and the panel 10 on the delivery body 30 facing the side of the workpiece to be processed is an arc surface, and the panel 10 is provided with a plurality of through holes 20 for plasma to pass through.

[0022] Specifically, the utility model provides a plasma delivery device, which mainly includes a delivery body 30. The main body of the delivery body 30 in the present application is the same as the existing shower head. The delivery body 30 is connected to a reaction chamber for generating plasma, and is used to effectively deliver the plasma generated in the reaction chamber to the surface of the workpiece to be processed.

[0023] The conveying body 30 can be made of high temperature resistant and chemical corrosion resistant materials, such as ceramic materials, special metal materials, etc., to ensure stable and reliable operation when conveying highly active plasma. The panel 10 on the conveying body 30 facing the workpiece to be processed is designed with a curved surface, which helps to disperse the plasma at the outlet, so that the plasma acts more evenly on the surface of the workpiece to be processed. In addition, in order to allow the plasma to pass through the conveying body 30 smoothly, a plurality of through holes 20 for the plasma to penetrate are provided on the panel 10.

[0024] A plurality of through holes 20 are provided on the panel 10 of the conveying body 30 . The plurality of through holes 20 on the panel 10 of the conveying body 30 can be arranged in different ways and shapes according to actual processing requirements to meet specific distribution requirements of plasma in different applications.

[0025] By adjusting the number and positions of the through holes 20 on the panel 10, effective control of the distribution of plasma on the surface of the workpiece to be processed is achieved, which is simple and easy to operate.

[0026] By adopting the above technical solution, the conveying body 30 is connected to the reaction chamber that generates plasma. By designing the panel 10 on the conveying body 30 close to the workpiece to be processed into an arc surface, the distribution of plasma on the surface of the workpiece to be processed can be flexibly adjusted to optimize the processing effect. The structure is simple and easy to implement.

[0027] In an embodiment of the present application, the panel 10 is circular, and the plurality of through holes 20 form a plurality of concentric circles with different radii, and the center of the plurality of concentric circles with different radii coincides with the panel 10 .

[0028] Specifically, the panel 10 on the conveying body 30 facing the workpiece to be processed is designed to be circular. This design enables the plasma from the multiple through holes 20 to be evenly spread on the surface of the workpiece to be processed, further improving the processing effect.

[0029] The plurality of through holes 20 on the panel 10 are arranged to form a plurality of concentric circles of different radii. The design of these concentric circles centered on the center of the panel 10 can form a distribution effect in which the plasma is layered and gradually diffuses from the center to the outside.

[0030] The radii of the concentric circles formed by the through holes 20 are different. The through holes 20 in the concentric circles with small radii can first deliver the plasma to the center of the surface of the workpiece to be processed, and then the through holes 20 in the concentric circles with larger radii can deliver the plasma to the edge of the workpiece to be processed. This setting is conducive to the uniform distribution of plasma on the entire workpiece to be processed, avoiding the occurrence of uneven processing effects due to long processing time.

[0031] By adopting the above technical solution, the distribution of plasma on the workpiece to be processed can be changed by adjusting the position of the through hole 20 of the panel 10, thereby achieving better processing efficiency and effect, and the structure is simple and easy to implement.

[0032] In one embodiment of the present application, the distance between two adjacent concentric circles decreases gradually from the center of the panel 10 to the outside.

[0033] Specifically, the distance between two adjacent concentric circles is gradually reduced. By gradually reducing the distance, the plasma distribution near the edge of the panel 10 can be more dense, while the plasma distribution near the center is relatively sparse.

[0034] Since the plasma density may gradually decrease as the distance increases after it comes out of the conveying body 30 through the through hole 20 of the panel 10 and diffuses outward, by adjusting the spacing between two adjacent concentric circles so that it decreases in the outward direction, the decrease in plasma density caused by diffusion can be effectively compensated to ensure that the entire surface of the workpiece to be processed can be evenly covered by plasma.

[0035] By adopting the above technical solution, the distance between two adjacent concentric circles gradually decreases from the center of the panel 10 to the outside, so that the plasma delivery device can more effectively control the distribution of plasma on the workpiece to be processed, thereby improving the processing efficiency and processing quality.

[0036] In one embodiment of the present application, the through holes 20 forming the same concentric circle have the same size.

[0037] Specifically, the diameters of the through holes 20 within a concentric circle on the panel 10 remain the same, so that the plasma output area generated by the through holes 20 can be consistent.

[0038] By adopting the above technical solution, the plasma output area generated by the through hole 20 is made consistent, which effectively improves the processing quality and efficiency.

[0039] In one embodiment of the present application, the size of each of the concentric through holes 20 increases sequentially from the center of the panel 10 to the outside.

[0040] Specifically, the size of each of the concentric through holes 20 increases from the center to the outside of the panel 10. In the process of ensuring that the plasma is transmitted from the center to the periphery of the panel 10, the size of the through holes 20 increases from the center to the outside of the panel 10 to increase the output of the plasma, thereby offsetting the density reduction that may be caused by the diffusion of the plasma.

[0041] By adopting the above technical solution, due to the incremental design of the size of the through hole 20, the device can better cope with large-scale workpieces or workpieces that require large-area processing, so that the processing effect of each area of ​​the device is more uniform and the processing performance is higher.

[0042] In an embodiment of the present application, the through hole 20 is formed by precision drilling or laser etching.

[0043] By adopting the above technical solution, precision drilling and laser etching technology can control the size and shape of the through hole 20 with micron or even nanometer accuracy, ensuring the consistency of each through hole 20 and the accuracy of the layout of the through holes 20 of the entire panel 10, thus ensuring high-quality processing results.

[0044] In an embodiment of the present application, the panel 10 is a polished panel 10 to reduce the aggregation of plasma near the through hole 20 .

[0045] By adopting the above technical solution, the polished surface is smoother, the adhesion of particles and other substances on the surface is reduced, and the diffusion of plasma is further facilitated.

[0046] The above description is only a preferred embodiment of the utility model, and does not limit the patent scope of the utility model. All equivalent structural changes made by using the contents of the utility model specification and drawings under the utility model concept, or directly / indirectly used in other related technical fields are included in the patent protection scope of the utility model.

Claims

1. A plasma delivery device, characterized in that: include: The conveying body is connected to the reaction chamber for generating plasma, and is used to convey the plasma generated in the reaction chamber to the surface of the workpiece to be processed. The panel on the conveying body facing the side of the workpiece to be processed is an arc surface, and the panel is provided with a plurality of through holes for plasma to pass through; the panel is circular, and the plurality of through holes constitute a plurality of concentric circles with different radii, and the plurality of concentric circles with different radii coincide with the center of the panel.

2. The plasma delivery device according to claim 1, characterized in that: The distance between two adjacent concentric circles decreases gradually from the center of the panel to the outside.

3. The plasma delivery device according to claim 1, characterized in that: The through holes forming the same concentric circle have the same size.

4. The plasma delivery device according to claim 1, characterized in that: The sizes of the through holes in the concentric circles increase sequentially from the center of the panel to the outside.

5. The plasma delivery device according to claim 1, characterized in that: The through holes are formed by precision drilling or laser etching.

6. The plasma delivery device according to claim 1, characterized in that: The panel is a polished panel to reduce the accumulation of plasma near the through-holes.

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