Method for treating a rare earth-based magnet

DE102014107564B4Active Publication Date: 2025-03-20VACUUMSCHMELZE GMBH & CO KG
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Patent Information

Application Number
DE102014107564
Authority / Receiving Office
DE · DE
Patent Type
Patents
Current Assignee / Owner
Priority Date
2013-06-10
Filing Date
2014-05-28
Publication Date
2025-03-20
Estimated Expiration
2034-05-28
Patent Text Reader

Abstract

Method for manufacturing a rare earth-based magnet, comprising: - the provision of at least one sintered precursor magnet of type R2Fe 14 B with a body, where R defines one or more rare earth elements from the group of elements consisting of the lanthanide elements of the periodic table and additionally scandium and yttrium; - the provision of a paste containing particles of a rare earth element R', wherein R' defines one or more of the rare earth elements that are to be used for diffusion along the grain boundaries of a sintered magnet of type R2Fe 14 are capable of B; - the application of the paste exclusively to one or more surfaces, excluding one surface of the body, and the formation of a layer of particles on the surface or multiple surfaces to provide a source of the rare earth element R'; wherein the sintered precursor magnet of type R2Fe 14 B no paste is applied and the surface or surfaces form part of a container, - the laying down of the sintered precursor magnet of type R2Fe 14 B into the container next to the layer; - the diffusion of the rare earth element R' into the sintered precursor magnet of type R2Fe 14 B from the source, while the sintered precursor magnet of type R2Fe 14 B lies next to the layer, and the increase in the content of the rare earth element R' at least on an outer surface of the body, and - the production of a rare earth-based magnet, wherein the sintered precursor magnet is of type R2Fe 14 B is positioned at a distance from the layer and the rare earth element R' is placed in the sintered precursor magnet of type R2Fe 14 B is diffused, while the sintered precursor magnet of type R2Fe 14 B is spaced away from the layer.
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