The invention discloses a CoCrPt series
alloy sputtering target and film and a preparation method thereof. The CoCrPt series
alloy sputtering target comprises an element B, wherein the content of the element B is 0-20 atomic percent; the
alloy target comprises a Co-enriched phase and a B-enriched phase; the B-enriched phase is uniformly distributed in the Co-enriched phase; the average grain size of the Co-enriched phase is 20-50mu m; and the average grain size of the B-enriched phase is 0-20mu m. The method for preparing the CoCrPt series alloy
sputtering target comprises the following steps: (1) performing vacuum melting; (2) performing hot isostatic pressure; (3) performing thermal
machining; and (4) performing cold
machining. The invention also discloses a magnetic recording medium prepared by using the CoCrPt series alloy sputtering target. The magnetic recording medium comprises a substrate layer, an
adhesive layer, a soft
magnetic layer, an intermediate layer and a magnetic
recording layer, wherein the coercive force of the magnetic recording medium is 3000-5000Oe; and the squareness is 0.80-0.95. The CoCrPt series alloy sputtering target is uniform in chemical components and small in deviated nominal composition, and the technical problems in a conventional preparation process that rolling
cracking is caused, the yield is low, the
mount of deviated nominal composition of the chemical components of the alloy target is large, the content of harmful impurities is extremely high are solved.