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38results about "Magnetic field orientation" patented technology

CoCrPt series alloy sputtering target and film and preparation method thereof

The invention discloses a CoCrPt series alloy sputtering target and film and a preparation method thereof. The CoCrPt series alloy sputtering target comprises an element B, wherein the content of the element B is 0-20 atomic percent; the alloy target comprises a Co-enriched phase and a B-enriched phase; the B-enriched phase is uniformly distributed in the Co-enriched phase; the average grain size of the Co-enriched phase is 20-50mu m; and the average grain size of the B-enriched phase is 0-20mu m. The method for preparing the CoCrPt series alloy sputtering target comprises the following steps: (1) performing vacuum melting; (2) performing hot isostatic pressure; (3) performing thermal machining; and (4) performing cold machining. The invention also discloses a magnetic recording medium prepared by using the CoCrPt series alloy sputtering target. The magnetic recording medium comprises a substrate layer, an adhesive layer, a soft magnetic layer, an intermediate layer and a magnetic recording layer, wherein the coercive force of the magnetic recording medium is 3000-5000Oe; and the squareness is 0.80-0.95. The CoCrPt series alloy sputtering target is uniform in chemical components and small in deviated nominal composition, and the technical problems in a conventional preparation process that rolling cracking is caused, the yield is low, the mount of deviated nominal composition of the chemical components of the alloy target is large, the content of harmful impurities is extremely high are solved.
Owner:YUNNAN PRECIOUS METALS LAB CO LTD
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