The invention belongs to the technical field of power semiconductors, and particularly relates to a monolithic integrated
CMOS circuit based on a GaN base. According to the circuit, a traditional AlGaN
barrier layer with a fixed Al component is replaced with a linear gradually-changing AlGaN
barrier layer with the Al component linearly changing gradually, specifically, the linear gradually-changing AlGaN
barrier layer with the Al component linearly changing gradually from bottom to top, 3DHG induced by polarization difference of the linear gradually-changing AlGaN barrier layer and 2DHG formed by a GaN channel and a
heterojunction interface of the linear gradually-changing AlGaN barrier layer are added, the overall concentration of hole gas is increased, and the hole gas efficiency is improved. And thus, the
conduction current density of the p-FETs is improved. According to the structure, the
conduction current density of the p-FETs can be improved, the P /
N channel compatibility can be improved, the conduction mismatch degree of the p- / n-FETs in monolithic integration can be reduced, and the development of a full GaN monolithic power
integrated circuit (IC) based on a complementary
metal oxide semiconductor (
CMOS) can be promoted.