Magnetron sputtering coating device

A technology of magnetron sputtering coating and driving device, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc. Effect of vacuum preparation time

Active Publication Date: 2014-05-14
高邮市汇金新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because vacuuming after cavity opening takes 57% of the total time, the utilization rate of working hours is extremely low, and a lot of energy is wasted

Method used

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  • Magnetron sputtering coating device
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  • Magnetron sputtering coating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] see Figure 2-5 In the roll-to-roll magnetron sputtering coating device shown in the figure, from left to right in the housing 100, there are feeding storage chamber 4, magnetron sputtering working chamber 5, magnetron sputtering working chamber 6, and unloading storage chamber 7. , a total of 4 vacuum chambers. A partition 12 is arranged between two adjacent vacuum chambers. A discharge roller 8 is arranged in the loading storage chamber 4 , a take-up roller 9 is arranged in the unloading storage chamber 7 , and a magnetron sputtering target machine 10 is arranged in the magnetron sputtering working chamber. The flexible transparent film 11 that needs to be coated is unwound by the unwinding roller, enters the magnetron sputtering working chamber 6 through the plate gap 13, the unloading storage chamber 7, and finally enters the unloading storage chamber 7 and is rewound by the winding roller.

[0019] Two adjacent vacuum chambers are separated by a partition 12, and...

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Abstract

The technology provides a magnetron sputtering coating device which is capable of effectively shortening the vacuumizing time, saving the energy and improving the effective utilization rate of equipment. The magnetron sputtering coating device comprises a plurality of vacuum cavities, wherein every two adjacent cavities are separated from each other by a clapboard; the two side walls of the clapboard are respectively provided with a v-shaped groove, and tops of the two v-shaped grooves are opposite to each other; a slab joint is arranged between the tops of the two v-shaped grooves; two isolating bars are arranged at each v-shaped groove and extend along the length direction of the v-shaped groove; the two isolating bars are respectively arranged at the two sides of the symmetry axis of each v-shaped groove; the surfaces of the isolating bars opposite to the inclined sides of the v-shaped grooves are inclined planes parallel to the inclined sides of the v-shaped grooves; the opposite planes of every two isolating bars are parallel to each other; along the length directions of the v-shaped grooves, the lengths of the slab joints are smaller than those of the isolating bars, and the lengths of the isolating bars are smaller than those of the v-shaped grooves; the isolating bars are connected with a driving device; the two isolating bars are driven to move by the driving device; the inclined planes of the isolating bars are contacted with the inclined sides of the v-shaped grooves, and the two isolating bars make relative motion under the guidance of the inclined sides; the opposite planes of the two isolating bars are contacted with each other.

Description

technical field [0001] The technology relates to a magnetron sputtering coating device. Background technique [0002] In the production process of flexible roll-to-roll magnetron sputtering coating, considering the requirements of the production process, two or more magnetron sputtering coating working chambers are usually set up. if figure 1 In the roll-to-roll magnetron sputtering coating device shown in the figure, from left to right in the housing 100, there are feeding storage chamber 4, magnetron sputtering working chamber 5, magnetron sputtering working chamber 6, and unloading storage chamber 7. , a total of 4 vacuum chambers. A partition 12 is arranged between two adjacent vacuum chambers, and a slit 13 is opened on the partition. A discharge roller 8 is arranged in the loading storage chamber 4 , a take-up roller 9 is arranged in the unloading storage chamber 7 , and a magnetron sputtering target machine 10 is arranged in the magnetron sputtering working chamber...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): C23C14/35
Inventor王鲁南王建华窦立峰
Owner高邮市汇金新材料科技有限公司