Double-side exposure machine with cantilever-type double-tables and double-side exposure method

Abstract

Provided are a double-sided exposure machine and a double-sided exposure method. The double-sided exposure machine comprises: a mounting frame; a first exposure component (210) and a second exposure component (220) provided at two sides of the mounting frame, respectively; a first loading table (310) and a second loading table (320); and a driving mechanism, the driving mechanism comprising a driving assembly, the first loading table (310) and the second loading table (320) passing through an exposure area in a first motion state and a second motion state, respectively. During exposure, the first loading platform (310) moves along a first circular path and passes through the exposure area in the first motion state, so as to expose a first member to be exposed (410), and the second loading platform (320) moves along a second circular path and passes through the exposure area in the second motion state, so as to expose a second member to be exposed (420). Both the first loading platform (310) and the second loading platform (320) are in circular motion, and while said second member (420) is being exposed, the unloading of a first exposed finished product or the loading of a next first member to be exposed can also be performed, thereby having high exposure efficiency. Compared with the traditional double-sided exposure method by means of flipping, the present invention has high exposure precision.

Description

technical field [0001] The invention relates to the technical field of double-side exposure, in particular to a cantilever double-table double-side exposure machine and a double-side exposure method. Background technique [0002] Traditional double-sided exposure machines usually use film transfer printing to expose double-sided circuit boards. Before exposure, it is necessary to make the film with the pattern to be transferred; then, fix the film with the pattern on both sides on the upper and lower glass respectively; then, sandwich the circuit board with the pattern to be transferred between the upper and lower glass, use The blue-violet high-brightness light source is used for exposure, and the circuit pattern is transferred to the circuit board to complete the double-sided exposure. For laser direct writing exposure machines, single-side exposure is usually used. Firstly expose one side of the circuit board, turn it over after the exposure is completed, then expose th...

AI Technical Summary

Problems solved by technology

[0003] However, when the laser direct writing exposure machine performs double-sided exposure, it needs to perform flipping operation, and the flipping operation will inevitably cause the problem of alignment after flipping, which not only increases the exposure process, but also affects the exposure accuracy due to the alignment accuracy problem. thus affecting the final exposure effect

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