28results about How to "Improve exposure efficiency" patented technology

The invention relates to the technical field of pressure-sensitive adhesives, in particular to a preparation method of a UV (ultraviolet) viscosity-reducing adhesive tape, which comprises the following steps: taking 100g of polymer, adding 10-80g of ethyl acetate, an isocyanate curing agent and a photoinitiator, then uniformly stirring, standing and defoaming to obtain an adhesive, uniformly coating a PET (polyethylene terephthalate) release film with the standing adhesive, putting into a drying oven to bake and dry, then attaching to a PO (polyolefin) base film, and drying to obtain the UV viscosity-reducing adhesive tape. And putting the adhesive tape process product into an aging room, and placing the adhesive tape process product at normal temperature for 7 days to obtain the UV viscosity-reducing adhesive tape of the PO base material. The UV viscosity-reducing adhesive tape disclosed by the invention can realize the performance that a common UV viscosity-reducing adhesive tape cannot be balanced in a severe environment, has the general characteristics of high adhesive force at an initial stage and extremely low adhesive force after UV treatment in the aspect of performance, can resist strong acid corrosion before UV treatment, can be applied to acid etching protection of glass, can be subjected to viscosity-reducing stripping through UV irradiation after an etching process is completed, and is low in adhesive force and high in adhesive force. And automatic operation is easy, and no adhesive residue risk exists.

The utility model discloses a one-way movement exposure mechanism of a double-sided exposure machine, which comprises a fixed plate and is characterized in that the upper end and the lower end of the front side of the fixed plate are respectively and fixedly connected with a limiting groove rod, one end of a sliding rod is arranged in a sliding groove of each limiting groove rod, and each sliding rod is respectively matched with the sliding groove of the corresponding limiting groove rod; the outer end of each sliding rod is fixedly connected with one end of an extending arm, and the other end of each extending arm is fixedly connected with the center of one side of a supporting rod. And a group of uniformly distributed LED lamps are fixed in the center of the other side of the supporting rod. The utility model relates to the technical field of photoetching equipment, in particular to a one-way moving exposure mechanism of a double-sided exposure machine, which is convenient for moving and adjusting an LED (light-emitting diode) lamp for exposure of the exposure machine.

The invention belongs to the technical field of PI glue patterns, and particularly relates to a method for changing the appearance of a PI glue side wall. The surface of a wafer is coated with PI glue, the obtained wafer coated with the PI glue is baked, then the wafer with a PI glue layer is subjected to first exposure with a mask and second exposure without the mask, and the dosage of the second exposure accounts for less than or equal to 10% of the dosage of the first exposure; and finally, developing the wafer after the secondary exposure, and obtaining a PI glue pattern on the surface of the wafer. According to the method provided by the invention, smoother PI glue side wall morphology and inclination angles can be obtained, stress concentration of metal connecting wires is reduced, the problems of metal wire breakage and open circuit are reduced, and the yield and reliability of chips are improved; meanwhile, the equipment investment cost is low, and the exposure efficiency is high.

The invention discloses a data generation method of a photoetching pattern, an electron beam exposure system, a medium and a product, which are applied to the technical field of photoetching. The method is applied to an electron beam exposure system comprising an upper computer and a lower computer. The method comprises the following steps: receiving first original coordinate data and second original coordinate data of a layout transmitted by the upper computer; performing linear interpolation based on the first original coordinate data and the second original coordinate data to obtain a plurality of pieces of original intermediate coordinate data; respectively mapping the first original coordinate data, the second original coordinate data and each piece of original intermediate coordinate data into first mapping coordinate data, second mapping coordinate data and each piece of mapping intermediate coordinate data of a lower computer; and performing exposure operation based on the first mapping coordinate data, the second mapping coordinate data and the mapping intermediate coordinate data. The data transmission quantity between the upper computer and the lower computer can be reduced, the bandwidth occupation and delay of data transmission are reduced, and the exposure efficiency is improved while the exposure precision is guaranteed.

The present application provides a large-format sub-pixel micro-scanning printing method, including: determining the periodic unit size of the metamaterial used for the model to be printed, wherein the metamaterial has a plurality of periodically arranged pattern units, and the diameter and / or side length of each pattern unit is the periodic unit size; adjusting the optical imaging size according to the periodic unit size of the metamaterial; slicing the model to be printed to obtain two or more layers of slices, and calculating a plurality of scanning position coordinates on each layer of slices; and traversing the plurality of scanning position coordinates on each layer of slices and performing exposure and curing. The large-format sub-pixel micro-scanning printing method, printing device, and printing control system of the present application can realize high-precision and high-efficiency three-dimensional printing of metamaterials.

The present invention belongs to the technical field of polymer materials, and specifically relates to a photosensitive adhesive liquid, a preparation method thereof and an application thereof. The photosensitive adhesive liquid of the present invention comprises, by weight, 48-65 parts of a polymer, 36-50 parts of a monomer, 1-4 parts of a powder, 0.1-4 parts of an additive, and 5-25 parts of a solvent. The present invention can improve the exposure resolution of a photosensitive dry film, improve the substrate adhesion of the photosensitive dry film, reduce exposure energy, improve the exposure efficiency of the dry film, reduce the film removal time of the substrate surface, and avoid dry film residue in small holes.

The embodiment of the invention provides Zn-based organic coordination nanoparticles and a preparation method thereof, a photoresist composition and application thereof, the Zn-based organic coordination nanoparticles are obtained by mixing and stirring a zinc-containing compound, a nitrogen-containing organic ligand and a compound A in an organic solvent and then performing post-treatment, and the compound A is benzoylformic acid and a derivative thereof. According to the Zn-based organic coordination nanoparticle photoresist provided by the embodiment of the invention, under the condition of no photoinitiator, benzoylformic acid in the photoresist structure absorbs photons for self-initiation, and an exposure pattern is directly obtained, so that the exposure efficiency is improved.

The present application proposes a neural network-based image evaluation method, which relates to the field of image processing technology, wherein the method comprises: obtaining a pre-exposure image of a target object; pre-processing the pre-exposure image, inputting the pre-processed pre-exposure image into a pre-trained first neural network, and obtaining a first target parameter in the pre-exposure image; updating the initial exposure parameter according to the first target parameter to obtain a target exposure parameter, and obtaining a formal exposure image of the target object according to the target exposure parameter; pre-processing the formal exposure image, inputting the pre-processed formal exposure image into a pre-trained second neural network, and obtaining a second target parameter in the formal exposure image. The present invention adopting the above scheme improves the image exposure efficiency, and improves the image evaluation accuracy while ensuring the image quality.

The utility model relates to a solar cell exposure streamline, and relates to the technical field of solar cell production, the solar cell exposure streamline comprises two exposure units, the two exposure units are connected end to end, and each exposure unit comprises two feeding and discharging streamlines; each feeding and discharging streamline comprises a feeding machine, a feeding and discharging gantry module and a discharging machine which are sequentially connected, and an exposure machine is arranged between the two feeding and discharging streamlines. The solar cell exposure flow line has the advantages that the two feeding and discharging flow lines and the two exposure units are arranged, so that the solar cell conveying efficiency of the solar cell exposure flow line is improved, the exposure machine exposes the two feeding and discharging flow lines in turn, and the exposure efficiency of large-scale production can be improved.

The invention discloses an exposure machine with a multi-station switching mechanism, and belongs to the technical field of exposure machines. An exposure machine with a multi-station switching mechanism comprises a rack and an electric cabinet mounted on the rack, and further comprises an X-axis moving mechanism mounted at the top of the rack, a first moving seat is mounted at the moving end of the X-axis moving mechanism, and the X-axis moving mechanism is used for driving the first moving seat to move; a connecting plate is fixedly connected to the outer side wall of the first moving seat, the Z-axis moving mechanism is installed on the side, away from the first moving seat, of the connecting plate, and a second moving seat is installed at the moving end of the Z-axis moving mechanism; the Y-axis moving mechanism is mounted at the moving end of the Z-axis moving mechanism; the exposure area is defined by the multiple exposure pieces, the double-face exposure function of the multiple sets of exposure pieces is achieved, meanwhile, the occupied space of equipment is saved through the storage type mask mechanism, and the occupied area of the equipment is reduced.

The present invention discloses a fully automatic double-sided exposure machine, which includes a loading device, an unloading device, a first table, a second table, at least one transfer and handling component and a flipping and handling component, an exposure system located between the first table and the second table, the first table and the second table are respectively moved to the exposure system on both sides of the exposure system for exposure operation, and the transfer and handling component and the flipping and handling component are fixedly installed by a bracket. The present invention adopts a double table, shares an exposure system, cooperates with the flipping and handling component and the transfer and handling component, and performs alignment exposure on the double tables respectively. The two tables can respectively perform alignment exposure on the two exposure surfaces of the base member without interfering with each other, and the exposure efficiency is high.

The invention discloses a process for improving the exposure efficiency of a circuit board, and relates to the related field of circuit board technologies, and the process structurally comprises a base, a box body fixedly connected to the upper end face of the base, a movable door arranged at the front end of the box body, and discharge ports formed in the left end face and the right end face of the box body. When exposure is completed, a small motor is started to drive a placement plate to move, meanwhile, a clamping block is clamped into the inner side of a clamping opening to fix a first connecting column, and when the placement plate continues to move, due to the fact that the placement plate is blocked by a support plate, the placement plate is relatively supported by the support plate; and meanwhile, compared with a first connecting column, rotation is conducted, a second bevel gear is driven by a first bevel gear to oppositely drive a clamping plate to be opened, limiting on the circuit board is disengaged, and the circuit board falls into the inner side of a discharging opening to be collected.

The invention discloses an exposure device and method, and the device comprises an exposure platform which is used for bearing and fixing an exposure product, and is provided with a light transmitting part; the first exposure assembly is used for exposing the first surface of the exposure product; the second exposure assembly is used for exposing the second surface of the exposure product; the controller is in communication connection with the first exposure assembly and the second exposure assembly and is used for controlling the first exposure assembly and the second exposure assembly to be opened and closed; in the working state, the second face of the exposure product faces the light-transmitting part and is arranged on the exposure platform, the first exposure assembly can expose the first face of the exposure product, and light projected by the second exposure assembly can penetrate through the light-transmitting part to expose the second face of the exposure product. According to the exposure device, double-sided exposure of the exposure product can be synchronously realized on the same station, the exposure time is saved, and the exposure efficiency is improved.

The utility model discloses an exposure device which comprises an exposure platform used for bearing and fixing an exposure product, a first exposure assembly used for exposing a first surface of the exposure product, and a second exposure assembly used for exposing a second surface of the exposure product, the controller is used for controlling the first exposure assembly and the second exposure assembly to be opened and closed and is in communication connection with the first exposure assembly and the second exposure assembly respectively; in a working state, the exposure product is fixedly arranged on the exposure platform, the first exposure assembly can expose the first surface of the exposure product, and the second exposure assembly can expose the second surface of the exposure product; wherein the first surface and the second surface are two opposite surfaces on the exposure product. According to the exposure device, double-sided exposure of the exposure product can be synchronously realized on the same station, the exposure time is saved, and the exposure efficiency is improved.

According to the exposure equipment, a light source module used for forming at least two paths of exposure light beams is arranged, a baffle and a mask plate are sequentially arranged in the transmission direction of any path of exposure light beam, at least two to-be-exposed areas of a waveguide plate are exposed at the same time, and the light source module is arranged along the transmission direction of any path of exposure light beam. The projection contour of the light-transmitting area of the baffle on the plane where the waveguide sheet is located covers at least part of the corresponding to-be-exposed area, and the projection contour of the mask on the plane where the waveguide sheet is located covers the corresponding to-be-exposed area. Therefore, multiple exposure paths are arranged at the same time, multiple to-be-exposed areas on the waveguide sheet can be exposed at the same time, and the exposure efficiency is improved. Besides, each to-be-exposed area can correspond to a plurality of baffles and one mask plate, so that the utilization rate of the baffles and the mask plates is increased, and the preparation cost of the baffles and the mask plates is reduced.

The embodiment of the invention provides a flexible circuit board production exposure method and device and a storage medium. Controlling the coiled circuit board to enter the fixing module from an inlet of the flexible circuit board production exposure equipment; controlling a fixing module to identify the positioning points of the coiled circuit board, and sequentially fixing the plurality of flexible circuit boards on the coiled circuit board in the exposure area according to the positioning points; controlling an exposure module to expose the flexible circuit board to obtain an exposed circuit board; and outputting the exposure circuit board. The coiled circuit board is placed in the fixing module to fix the multiple flexible circuit boards in sequence, so that the multiple flexible circuit boards on the coiled circuit board are exposed in sequence through the exposure module, the multiple flexible circuit boards on the coiled circuit board can be exposed in sequence, the exposure efficiency of the flexible circuit boards is effectively improved, and the exposure efficiency of the flexible circuit boards is improved. The flexible circuit board can be widely applied to the technical field of exposure equipment.

The invention discloses an exposure assembly and photoetching equipment with the same, the exposure assembly comprises a light source, a beam splitter, a bearing part and detection equipment, the beam splitter and the light source are oppositely arranged, and the beam splitter is configured to decompose and guide passing light; the bearing part and the beam splitter are oppositely arranged, and the bearing part is used for bearing parts; the detection equipment and the beam splitter are oppositely arranged, and the detection equipment is arranged on the side, away from the bearing piece, of the beam splitter; and the light penetrates through the beam splitter and then enters the detection equipment for sensing analysis. The beam splitter is arranged in the exposure assembly and can reflect and decompose the passing light, so that the detection equipment can detect the light reflected by the bearing part to monitor and feed back the use condition of the exposure assembly in real time, and the exposure performance of the exposure assembly is adjusted according to the current detection structure; therefore, the output performance of the exposure assembly in the using process can meet the current requirement, and the exposure effect and the exposure efficiency are improved.

The utility model provides silicon wafer processing equipment which comprises a silicon wafer conveying device which comprises a conveying driving module and a bearing mechanism, the conveying driving module is connected with the bearing mechanism to drive the bearing mechanism to move, and a silicon wafer receiving position, a screen printing position and an exposure position are sequentially arranged along the movement track of the bearing mechanism; the silicon wafer screen printing device is used for finishing screen printing operation on the silicon wafer to be processed on the bearing mechanism at the screen printing position; the silicon wafer exposure device is used for completing exposure operation on the silicon wafer to be processed on the bearing mechanism at the exposure position, through the setting mode, both silk-screen operation and exposure operation can be directly completed on the bearing mechanism, the silicon wafer does not need to be transferred to other places, the transfer operation on the silicon wafer to be processed is reduced, and the production efficiency is improved. And the screen printing efficiency and the exposure efficiency are improved.

The utility model provides a maskless exposure system which is characterized in that in the maskless exposure system, a beam expander is used for expanding a light beam emitted by an ultraviolet laser light source to form an exposure field with uniformly distributed light intensity; the polarizer processes the exposure field to form linearly polarized light; the linearly polarized light is modulated by a liquid crystal spatial light modulator to form parallel light which is uniformly distributed; the digital microlens array processes the phase and the amplitude of the parallel light, so that the processed parallel light forms a to-be-exposed pattern on the wafer surface of the wafer workpiece table; the control unit controls the wafer stage to move so as to expose the wafer. According to the exposure mode, the digital pattern to be exposed can be directly transmitted to the photoresist on the surface of the wafer without a mask plate, an infinite exposure area can be realized through the movement of the wafer workpiece table, the exposure efficiency and the exposure precision are improved, and the digital micro lens unit is adopted to replace a traditional shaping light path, so that the system structure is simplified.

The invention discloses a two-in-two-out double-station exposure machine, comprising a frame, a loading and unloading manipulator, an assembly line mechanism, a double-carrier platform, a three-axis compensation module, a carrier body, a shading plate CCD positioning module, a shading plate lifting module, an exposure light source module and an incoming material CCD positioning module. The four ends of the bottom surface of the frame are fixedly connected with tripods. The beneficial effects of the invention are as follows: after the parallel light source passes through the shading plate, the shading plate will cover the places that do not need to be exposed, and the light of the places not covered will shine on the products, and the energy of the light will be used to expose the products. By setting up the double-carrier platform, multiple products can be exposed at the same time, and the production efficiency is greatly improved. At the same time, Teflon roller conveying is used to better ensure the cleanliness inside the machine and protect the products. A set of CCD is equipped with an adjustment platform and a scale to facilitate camera adjustment. The flatness between the light source, the carrier and the shading plate can be freely adjusted, and the exposure efficiency is improved.

The present invention relates to the field of circuit printing, and in particular to an exposure machine with a suction cup mechanism. The technical problem to be solved is that the exposure machine can only illuminate a single circuit board plane. The technical solution is: it includes a shell, an extreme purple lamp is installed on the top of the shell, an exposure template is fixedly connected to one side of the shell, the exposure template is located directly below the extreme purple lamp, a feed port and a discharge port are respectively opened on both sides of the shell, a conveyor belt is installed on the feed port and the discharge port, and an exposure platform is fixedly connected to one side of the shell. The present invention controls the horizontal flipping of the circuit board in the exposure machine through a flipping mechanism, thereby avoiding the problem that the existing exposure machine can only process a single plane, improving the exposure efficiency of the exposure machine, and avoiding the problem of the circuit board being exposed to ambient light during the transmission process.

The utility model relates to the technical field of exposure machines, and provides an exposure machine for producing a copper-clad ceramic substrate, which comprises a telescopic mechanism, the telescopic mechanism comprises a bearing block, a horizontally arranged driving screw penetrates through the bearing block and is in threaded matching with the driving screw, one end of the driving screw is rotatably connected with a fixed block, and the other end of the driving screw is rotatably connected with a movable block. Two positioning blocks are symmetrically distributed on the two sides of the bearing block, each positioning block is provided with a guide rod in a penetrating mode, one end of each guide rod is fixed to the corresponding fixing block, and a positioning plate is fixed to the upper portions of the positioning blocks. A connecting rod is further fixedly arranged on the bearing block in a penetrating mode, and the two ends of the connecting rod penetrate into the two positioning blocks respectively and are connected with the positioning blocks in a sliding mode; and the driving screw rod is driven by a driving device to rotate. The utility model has the beneficial effects that the target substrate can be automatically brought into the exposure position and fixed, the operation steps and the operation difficulty of workers are reduced, and the exposure efficiency is improved.

The embodiment of the application provides a communication package recommendation method, system, device and storage medium, the method comprises: calculating the activity value based on the page access time length, the page access times and the recent access time; in the case where the activity value is greater than the first preset threshold, query whether there is a package change record in the historical package information; in the case where there is no package change record in the historical package information, respectively, the statistical feature of the historical call information and the historical traffic information is calculated to obtain the call feature value and the traffic feature value; in the case where the call feature value is greater than the first threshold, and the traffic feature value is greater than the second threshold, the exposure weight of the communication package corresponding to the comprehensive package type in the exposure weight list is increased; at least one target communication package in the adjusted exposure weight list whose exposure weight is greater than the preset weight threshold is exposed in the preset network page. The scheme can adapt to different needs of users for personalized exposure of communication packages.

The invention relates to a negative developing photoresist containing hydrophobic resin as well as a preparation method and application of the negative developing photoresist. When the photoresist composition containing the hydrophobic resin is used for forming a film, the hydrophobic resin can be automatically separated to the surface of the film to form a protective layer. A photoresist film formed by the photoresist composition has low surface energy, a high receding contact angle (for example, greater than or equal to 85 degrees), a low sliding angle (for example, less than 15 degrees) and an advancing contact angle not exceeding 100 degrees, and is beneficial to reduction of exposure defects and improvement of exposure efficiency.

The invention discloses a parallel electron beam imaging photoetching system based on a micro electrostatic lens array and a control method, and aims to solve the technical problems that the existing electron beam photoetching efficiency is low, the system is complicated, and flexible zooming cannot be realized. The system sequentially comprises a unified electron source, a micro electrostatic lens array, an electron zooming focusing unit, a diaphragm plate and a vacuum sample table along the movement direction of an electron beam, and further comprises a driving circuit, the uniform electron source provides large-area uniform electron beams, the micro electrostatic lens array realizes on-off control of the electron beams through focusing / deflecting electrodes of each unit, the electronic zoom focusing unit adjusts imaging magnification through voltage ratio of multi-stage electrostatic electrodes, the diaphragm plate blocks the electron beams in an off state, and the driving circuit synchronously controls on-off and zoom magnification of the array. According to the invention, scanning-free and one-frame parallel exposure is realized, the imaging scaling can be flexibly adjusted, and the device has the advantages of high integration level, good stability, high exposure efficiency and strong adaptability, and can be used for high-end nano manufacturing scenes such as mask preparation, quantum devices, advanced packaging and the like.

The invention discloses a packaging structure and a preparation method of a stacked capacitor, and the packaging structure comprises a semiconductor substrate, and a metal film layer is deposited on the first surface of the semiconductor substrate to form a bottom metal layer; the columnar array comprises a bottom metal layer and a plurality of stand columns which are vertically borne on the bottom metal layer and communicated with the bottom metal layer, and a plurality of dielectric layers and metal layers which are arranged at intervals are deposited on the surface of the columnar array; the step part comprises a plurality of steps parallel to the upper surface of the bottom metal layer, and the upper surface and the lower surface of each step are in one-to-one correspondence with the metal layer and the dielectric layer respectively; the connecting part comprises a plurality of through electrodes which are vertically borne on the upper surface of the step and communicated with the step; the multiple through holes are communicated to serve as the positive electrode and the negative electrode of the stacked capacitor; and the filling dielectric layer comprises a first capacitor dielectric layer filled between the stand columns and a second capacitor dielectric layer filled between the through electrodes. The problems of difficulty in groove filling, complexity in etching control and high cost in a traditional deep groove capacitor are solved.

The embodiment of the invention provides Zn-based organic coordination nanoparticles, a preparation method thereof, a photoresist composition and application thereof, the Zn-based organic coordination nanoparticles have a general formula of Znx (M) y (N) z, x, y and z are integers greater than or equal to 1, and M is cinnamic acid and derivatives thereof; n is any one or more of organic fatty amines and derivatives thereof, pyridine and derivatives thereof, pyrrole and derivatives thereof, pyrimidine and derivatives thereof, pyridazine and derivatives thereof, piperidine and derivatives thereof, and amide and derivatives thereof. According to the Zn-based organic coordination nanoparticle photoresist provided by the embodiment of the invention, an exposure pattern can be directly obtained through self-initiation of cinnamic acid absorption photons in the photoresist structure in the absence of a photoinitiator, so that the exposure efficiency is improved.

The utility model belongs to the field of exposure machines, and particularly relates to a CCD (charge coupled device) dynamic compensation mechanism for wafer centering of a double-sided exposure machine, which comprises a bottom plate, a vertical plate is fixedly connected to the edge of the top of the bottom plate, a horizontal adjusting assembly is rotationally connected to one side of the vertical plate, a moving platform is fixedly connected to the surface of the horizontal adjusting assembly, and an angle adjusting assembly is fixedly connected to the top of the moving platform. Through the structural design of the horizontal adjusting assembly, after a customized voice coil motor A is electrified, a transmission rod A directly rotates in a permanent magnetic field through an electrified coil, intermediate transmission parts such as a gear and a screw rod are not needed, mechanical gaps and inertial delay are avoided, the transmission rod A drives a threaded rod to rotate while rotating, and a threaded cylinder is pushed to move by rotating a thread, so that the transmission rod A is driven to rotate. Therefore, the positions of the moving platform, the upper structure of the moving platform and the wafer are changed, so that the CCD dynamic compensation mechanism can quickly respond and adjust the position of the wafer, and the exposure efficiency of the wafer is improved.