Method and system for imaging interference photoetching adopting white laser

Abstract

The invention relates to an imaging interference photoengraving method and the system that adopts white laser. The feature is that is contains plural wave length of white laser light source and light splitting components, and three beams of laser with different wave length are separated from the splitting component to supply illumine on plumbing masking direction, X direction and Y direction. The system needs not any adjusting components in the exposal process. It is benefit for the application of imaging interference photoengraving technology.

Description

technical field [0001] The invention relates to an imaging interference lithography method and system using a white laser, which belongs to the improvement of the imaging interference lithography technology for producing fine patterns. Background technique [0002] Imaging interference lithography is a new lithography technology, which can realize the high resolution of interference lithography and the ability of traditional optical lithography to generate arbitrary graphics. The general imaging interference lithography method is a three-exposure method, and the general The imaging interference lithography system consists of lasers, beam expanders, filtering and collimation systems, beam splitters, masks, imaging systems and resist substrates, etc., document S.R.J.Brueck, Imaging Interferometric Lithography, Microlithography World, Winter 1998, 2 -11 and literature Xiaolan Chen and S.R.J.Brueck, Imaging Interferometric Lithography: A Wavelength Division Multiplex Approach to...

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Problems solved by technology

[0002] Imaging interference lithography is a new lithography technology, which can realize the high resolution of interference lithography and the ability of traditional optical lithography to generate arbitrary graphics. The general imaging interference lithography method is a three-exposure method, and the general The imaging interference lithography system consists of lasers, beam expanders, filtering and collimation systems, beam splitters, masks, imaging systems and resist substrates, etc., document S.R.J.Brueck, Imaging Interferometric Lithography, Microlithography World, Winter 1998, 2 -11 and literature Xiaolan Chen and S.R.J.Brueck, Imaging Interferometric Lithography: A Wavelength Division Multiplex Approach to Extending Optical Lithography, J.Vac.Sci.Technol, B16(6): 3392-3397, Nov / Dec.1998 Introduced imaging interferometric light The principle and general method of lithography technology, but the implementation method and system of imaging interference lithography are less discussed. The method in the literature is to use one wavelength for three exposures, and adjust the optical path between exposures to achieve exposure of different spatial frequency components. , there are problems such as pattern alignment, poor image quality and low exposure efficiency

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