The application discloses an optical
waveguide device structure and a forming method thereof, and comprises the following steps: forming a
waveguide functional layer, a
hard mask layer and a
photoresist pattern on a substrate; performing first
etching on the
hard mask layer through the
photoresist pattern to form a
hard mask pattern; using a first free radical to perform first
processing on a first sidewall of the hard
mask pattern with the
photoresist pattern, so as to reduce the
surface roughness of the first sidewall; performing second
etching on the
waveguide functional layer through the hard
mask pattern after the photoresist pattern is removed to form a waveguide pattern; using a second free radical to perform second
processing on a second sidewall of the waveguide pattern with the hard
mask pattern, so as to reduce the
surface roughness of the second sidewall; and removing the hard mask pattern. The application can significantly improve the smoothness of the sidewall of the waveguide pattern, thereby improving the key performance of the device.