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An optical waveguide device structure and method of forming the same

PendingCN122260572AReduce surface roughnessImprove delivery qualityOptical waveguide light guideEtchingSurface roughness
The application discloses an optical waveguide device structure and a forming method thereof, and comprises the following steps: forming a waveguide functional layer, a hard mask layer and a photoresist pattern on a substrate; performing first etching on the hard mask layer through the photoresist pattern to form a hard mask pattern; using a first free radical to perform first processing on a first sidewall of the hard mask pattern with the photoresist pattern, so as to reduce the surface roughness of the first sidewall; performing second etching on the waveguide functional layer through the hard mask pattern after the photoresist pattern is removed to form a waveguide pattern; using a second free radical to perform second processing on a second sidewall of the waveguide pattern with the hard mask pattern, so as to reduce the surface roughness of the second sidewall; and removing the hard mask pattern. The application can significantly improve the smoothness of the sidewall of the waveguide pattern, thereby improving the key performance of the device.
Owner:SHANGHAI BANGXIN SEMI TECHNOLOGY CO LTD