109results about How to "Achieve exposure" patented technology

A band for use for breast stabilization from lateral gravitational shifting is disclosed. The band comprises a strip to encircle the body, a first section comprising a semi-cylindrical component of a sponge-like material at one end and a nap material patch on its outer surface with a cylindrical side placed over the sternum, and a second section for connecting an end of the body strip to encircle a user's body. The band comprises at least one fenestration to enable breast exposure. The object of this invention is to provide a band centrally placed over the sternum and wrapped under the arms around the chest preventing lateral breast shifting when the patient is in the side-laying position. The invention comprises a body strip to accommodate breast coverage achieved with a fenestrated band. Variations of the band are also useful in dressing bodily wounds, such as on the face or knee.

The invention provides an OLED (organic light emitting diode) display substrate, a manufacture method thereof and a display device, and belongs to the technical field of display. The manufacture method of the OLED display substrate includes the steps: forming an inverted table-shaped structure enclosing a cutting area on the periphery of the cutting area of the OLED display substrate; forming a reflective graphic between the inverted table-shaped structure and a base plate of the OLED display substrate before forming the inverted table-shaped structure. When a cathode of the OLED display substrate is formed, the edge of the cathode on the upper surface of the inverted table-shaped structure naturally fractures. The orthographic projection of the inverted table-shaped structure on the baseplate is positioned in the orthographic projection of the reflective graphic on the base plate. The packaging effect of the OLED display substrate can be ensured, and the performance of the display device is further ensured.

The invention discloses a multiplex pixel element control circuit for a super-large planar array tiled CMOS (complementary metal oxide semiconductor) image sensor. The multiplex pixel element control circuit comprises L levels of serial pixel element control sub-circuits A. Each level of serial pixel element control sub-circuits A can generate a control signal of I rows of pixel elements. Each serial pixel element control sub-circuit A comprises K levels of serial pixel element control sub-circuits B and a windowing address strobe circuit. Each serial pixel element control sub-circuit B comprises W levels of smallest pixel element sub-circuits C. By designing the windowing address strobe circuits, except the difference of I/O bonding finger area lead connection modes, the L serial pixel element control sub-circuits A have completely uniform address-coding structures, thus a windowing function of the circuit is achieved. The circuit is simple in structure, reliable to control, good in extensibility and reusability and applicable to CMOS image sensor chip circuits of different planar array scales.

The invention discloses an integrated preparation method for an LED fluorescent powder coating, which belongs to the photoelectric technical field. The method comprises the following steps: (1), preparing fluorescent powder and sensitive colloid dispersion; (2), spinning the fluorescent powder to form a fluorescent powder-sensitive colloid dispersion coating; (3), obtaining fluorescent powder-sensitive colloid dispersion coating patterns in required shapes and thickness through exposure and development; (4), displacing a fluorescent powder dispersion medium; and (5), removing a coating residue on the surface of an electrode, and showing a chip pattern. The invention provides a wafer level packaging fluorescent powder coating slurry method and a realization method (cleaning and exposing) of the chip electrode pattern, and the problem of applying the fluorescent powder coating technology into LED chip integrated package to realize the separation of the electrode pattern and the fluorescent powder coating in the prior art is solved.

The invention discloses a polyimide oligomer and a liquid photoimagable solder resist ink. A structural formula of the polyimide oligomer is as follows: R1 is alicyclic, R2 is alkyl with at least one carbon ring structure, n is not less than 1 and not more than 30, m is not less than 1 and not more than 30, p is not less than 1 and not more than 30, and (n+1-m-p) is more than 0, x is not less than 5 and not more than 50. The photoimagable polyimide oligomer has the advantages of excellent heat resistance, soldering resistance, golden resistance, chemical resistance, and yellowing resistance. The liquid photoimagable solder resist ink prepared from the oligomer has excellent heat resistance, soldering resistance, golden resistance, chemical resistance, yellowing resistance, insulativity, high resolution, high flexibility and high adhesion, can be used for effectively solving the problem that the liquid photoimagable solder resist ink is easy to yellow at high temperature under the processes of thermocuring, solder coating and reflow soldering, and is especially suitable for preparing white solder resist ink so as to achieve high reflecting whiteness.

The invention provides a composite material of high-nitrogen-doped grapheme and ultrathin MoSe2 nanosheets and a preparation method of the composite material. According to the method, after a molybdenum source, a selenium source and low-nitrogen-doped grapheme which are dissolved in water and ethylene glycol are sufficiently mixed, solvent thermal reaction is conducted under the effect of ethidene diamine serving as an active agent, the ultrathin MoSe2 nanosheets are made to grow on the grapheme evenly, meanwhile, the low-nitrogen-doped grapheme is doped deeply, and finally the composite material of the high-nitrogen-doped grapheme and the ultrathin MoSe2 nanosheets is obtained. The high-nitrogen-doped grapheme/molybdenum selenide nanosheets synthesized through the method have the excellent performances of high conductivity, high catalysis and the like at the same time, and can be widely applied to photocatalysis, chemical catalysis, electrodes of solar cells, electrodes of other new energy batteries and electrode materials of super-capacitors.

The invention provides an intelligent wristband device, which can realize hiding and exposing of a camera lens so as to improve the privacy protection performance of the device and reduce the risk ofprivacy leakage of a user. The intelligent wristband equipment comprises an equipment main body and a camera module, and the camera module comprises a lens; a telescopic receding hole is formed in theside face of a shell of the equipment main body, the camera module is provided with a first position enabling the lens to be kept exposed out of the shell and a second position enabling the lens to be kept hidden in the shell, a telescopic mechanism is further installed on the equipment main body, and the camera module is switched between the first position and the second position by operating the telescopic mechanism so that the camera module can extend out of or retract into the telescopic receding hole. The camera lens can be hidden and exposed, the lens is exposed when the camera needs tobe used, and the lens is hidden in the shell when the camera does not need to be used, so that the privacy protection performance of the device is improved, and the privacy leakage risk of the user is reduced.

The invention relates to a sectional exposure method of a reel-to-reel maskless laser direct-writing photoetching device. The method comprises the following steps of: (1) cutting an ultrahigh pattern;(2) making and marking material numbers; (3) exposing a material number of the first section; (4) acquiring theoretical sucker coordinates; (5) exposing the material number of the nth section; (6) repeating the steps (4) and (5) until all the sectional material numbers of the graph are exposed. The sectional exposure method of a reel-to-reel maskless laser direct-writing photoetching device can solve the defects in the prior art and can expose the graph with the height exceeding the stroke of a scanning axis.

The invention discloses a server. The server comprises a case capable of being installed on a cabinet, wherein a plurality of hard disk slots in which hard disks can be inserted and pulled are formed in the case; at least part of the case can be pulled relative to the mounting groove of the cabinet so as to expose the hard disk slots; and the hard disk slots are arranged in two rows in the drawing direction, the directions of notches of the two rows of hard disk slots are opposite, each row of hard disk slots are arranged in a matrix mode in the drawing direction, and the plugging direction of the hard disk slots is perpendicular to the thickness direction and the drawing direction of the case at the same time. According to the server, the two rows of disk slots are arranged in parallel on the case, and the whole case can be drawn relative to the mounting slot of the cabinet, or the part of the case provided with the disk slots can be drawn relative to other parts of the case, so that the disk slots are exposed, and the hard disks can be inserted into and pulled out of the disk slots; and due to the fact that the hard disk slots in each row are arranged in the drawing direction in the matrix arrangement mode, the hard disk slots can be arranged in the drawing direction as many as possible, and the placing density of the hard disks is improved.

The invention discloses a full-soluble edible mushroom protein and a preparation method thereof. The full-soluble edible mushroom protein is prepared by the following steps: unmodified edible mushroom protein is expanded under an alkaline condition, and then acid is added to adjust the edible mushroom protein to be neutral. According to the preparation method, the primary structure of the protein is not changed, the nutritional value of the protein can be reserved to the maximum extent, the obtained edible mushroom protein is free of exogenous additive components, the acceptance degree of consumers is improved to the maximum extent, reasonable utilization of edible mushroom byproducts is achieved, and resource waste and environmental pollution are effectively avoided.

The present invention relates to an imaging interference photoetching method by adopting circular grating and gated shutter. It is characterized by that it adopts circular grating and gated shutter device to provide illumination perpendicular to mask plane, X-directional bias illumination and Y-directional bias illumination for triple exposure imaging interference photoetching process so as to implement triple exposure required for imaging interference photoetching process.

The invention provides a display baseplate, a display panel and a display device. The display baseplate comprises an alignment mark, and the alignment mark is used for aligning exposure equipment in the process of exposing to form the diagram of a first film layer on the display baseplate. The thickness of the middle area of the alignment mark is less than that of the marginal area of the alignment mark so that the thickness of the alignment mark is uniform after being coated with a photoresist. The alignment mark of the display baseplate cannot be in the shape of a Chinese character hui after being coated with the photoresist, and the surface of the alignment mark is flat, is uniform in gray scale and is clear in boundary after being coated with the photoresist, thus the problem that the exposure equipment cannot be focused can be solved, the automatic aligning and exposing of the exposure equipment can be realized, and the production efficiency can be improved.

The invention discloses an air outlet structure of an air purifier, comprising: an air outlet channel, the air outlet channel is in a columnar structure; a plurality of fan-shaped shielding parts are arranged in the air outlet channel at intervals, The arc edge is fixed on the inner wall of the air outlet channel, and the top angle is jointly fixed on a rotating shaft coaxial with the air outlet channel, and an air outlet is formed between two adjacent fan-shaped shielding parts; and a rotating plate, which is arranged at intervals There is at least one flow hole not smaller than the air outlet; it is configured to be rotatable around the rotating shaft, so as to completely cover, partially cover or fully expose each air outlet at different rotational positions, thereby continuously adjusting each outlet. The outlet side of the tuyere. The air outlet structure of the air purifier of the present invention can continuously adjust the air output of the air purifier to meet the indoor air purification requirements, and is more convenient and humanized to use.

The invention relates to a material outboard exposure device which is installed on an outer side platform of an on-orbit spacecraft. The device comprises a base, a load center frame, an installation support, a plurality of experiment boxes and a four-degree-of-freedom inspection mechanical arm, and a notch is reserved in one edge of the base; the load center frame is vertically and fixedly installed in the center of the base; at least one assembling opening is formed in each side, corresponding to the base, of the installation support; the plurality of experiment boxes are respectively and detachably arranged in the at least one assembling opening; one end of the four-degree-of-freedom inspection mechanical arm is rotationally connected to the top end of the load center frame, and the other end is movably located in the notch; an image acquisition device is mounted on the four-degree-of-freedom inspection mechanical arm in a sliding manner; after the other end of the four-degree-of-freedom inspection mechanical arm is moved out of the notch, the experiment boxes are opened, and the exposed surfaces of the experiment boxes are perpendicular to the base and is parallel to the corresponding side of the base; and the four-degree-of-freedom inspection mechanical arm drives the image acquisition device to rotate around the load center frame and inspects the exposed surfaces of the plurality of experiment boxes in sequence.

The invention discloses a work structure for providing a scanning path of an immersion photoetching machine. The work structure comprises a silicon wafer which is arranged below an exposure lens of the immersion photoetching machine, and the work structure is characterized in that the silicon wafer comprises a plurality of wafers, and each of the plurality of wafers further comprises a bottom anti-reflection layer and a photo resist; and a plurality of wafers comprise the wafers in a central scanning path area and the wafers in a peripheral scanning path area, and the central scanning path area and the peripheral scanning path area are both in the spiral scanning path structures. According to the work structure provided by the invention, the wafers in the silicon wafer to be exposed are divided into two areas, and the two areas are both in the spiral scanning work path structures, in this way, most part of the silicon wafer is prevented from being impacted by the particles, and the exposure quality can be achieved and the yield of the product can be increased.

The invention provides a machining method for a boss type diamond composite material anti-abrasion belt, a mould and the anti-abrasion belt. The machining method for the boss type diamond composite material anti-abrasion belt includes the following steps that 1, a sand mould with grooves in the inner surface is made; 2, a plurality of polycrystalline diamonds are embedded in the grooves of the sand mould in a one-to-one correspondence mode; 3, the mould is assembled; 4, anti-abrasion substrate powdery materials are poured into a lower mould body; 5, the mould is sintered, and a boss type diamond composite material anti-abrasion belt blank is obtained; and 6, the boss type diamond composite material anti-abrasion belt blank is machined, and the boss type diamond composite material anti-abrasion belt is obtained. The machining method for the boss type diamond composite material anti-abrasion belt, the mould and the anti-abrasion belt have the beneficial effects that machining of the boss type diamond composite material anti-abrasion belt and exposure of the block-shaped polycrystalline diamonds in the anti-abrasion belt can be realized; the machining quality and efficiency of the boss type diamond composite material anti-abrasion belt are improved, and a sufficient exposure amount of the block-shaped polycrystalline diamonds can be guaranteed.