Product
Patsnap Eureka
For R&D, Patsnap Eureka makes reading and utilizing patents & technical documents easy.
Patsnap Eureka AIR
Designed for self-driven R&D workflows. Generate viable solutions, solve complex R&D challenges, empower your innovation with AI.
Patsnap Eureka Materials
Designed for material experts only. Revolutionize your material R&D, from search, analyze, to developing new materials.
Feature
TechResearch
Generate reliable direction feasibility study reports for your R&D in just a few steps.
TechSeek
Discover and master advanced knowledge NOW. Basics, ideas, possibilities, all at once.
TechMind
As an expert in R&D Theories, TechMind can generates customized viable solutions instantly.
TechRisk
Analyze your overall solution with one click, know your potential R&D risks in advance.
TechMonitor
Get weekly tech updates, stay abreast of the latest tech innovations and key insights.
Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
110results about How to "Achieve exposure" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Comfort bandage
InactiveUS7192409B2Preventing lateral breast shiftingAchieve exposureHead bandagesBreast bandagesMedicineBandage
Owner:LORENZO AIDA IRIS
Three-dimensional printing device and three-dimensional printing method
InactiveCN104802414ASimple structureAchieve exposureAdditive manufacturing apparatus3D object support structuresGraphics3 dimensional printing
Owner:BOE TECH GRP CO LTD
Comfort bandage
InactiveUS20050004501A1Preventing lateral breast shiftingAchieve exposureHead bandagesBreast bandagesBreast boneBandage
A band for use for breast stabilization from lateral gravitational shifting is disclosed. The band comprises a strip to encircle the body, a first section comprising a semi-cylindrical component of a sponge-like material at one end and a nap material patch on its outer surface with a cylindrical side placed over the sternum, and a second section for connecting an end of the body strip to encircle a user's body. The band comprises at least one fenestration to enable breast exposure. The object of this invention is to provide a band centrally placed over the sternum and wrapped under the arms around the chest preventing lateral breast shifting when the patient is in the side-laying position. The invention comprises a body strip to accommodate breast coverage achieved with a fenestrated band. Variations of the band are also useful in dressing bodily wounds, such as on the face or knee.
Owner:LORENZO AIDA IRIS
OLED (organic light emitting diode) display substrate, manufacture method thereof and display device
ActiveCN109360843AGuaranteed encapsulation effectIncrease exposureFinal product manufactureSolid-state devicesGraphicsDisplay device
The invention provides an OLED (organic light emitting diode) display substrate, a manufacture method thereof and a display device, and belongs to the technical field of display. The manufacture method of the OLED display substrate includes the steps: forming an inverted table-shaped structure enclosing a cutting area on the periphery of the cutting area of the OLED display substrate; forming a reflective graphic between the inverted table-shaped structure and a base plate of the OLED display substrate before forming the inverted table-shaped structure. When a cathode of the OLED display substrate is formed, the edge of the cathode on the upper surface of the inverted table-shaped structure naturally fractures. The orthographic projection of the inverted table-shaped structure on the baseplate is positioned in the orthographic projection of the reflective graphic on the base plate. The packaging effect of the OLED display substrate can be ensured, and the performance of the display device is further ensured.
Owner:BOE TECH GRP CO LTD
Multiplex pixel element control circuit for super-large planar array tiled CMOS (complementary metal oxide semiconductor) image sensor
ActiveCN104796636ASimple circuit structureReliable controlTelevision system detailsColor television detailsOxide semiconductorCMOS
The invention discloses a multiplex pixel element control circuit for a super-large planar array tiled CMOS (complementary metal oxide semiconductor) image sensor. The multiplex pixel element control circuit comprises L levels of serial pixel element control sub-circuits A. Each level of serial pixel element control sub-circuits A can generate a control signal of I rows of pixel elements. Each serial pixel element control sub-circuit A comprises K levels of serial pixel element control sub-circuits B and a windowing address strobe circuit. Each serial pixel element control sub-circuit B comprises W levels of smallest pixel element sub-circuits C. By designing the windowing address strobe circuits, except the difference of I / O bonding finger area lead connection modes, the L serial pixel element control sub-circuits A have completely uniform address-coding structures, thus a windowing function of the circuit is achieved. The circuit is simple in structure, reliable to control, good in extensibility and reusability and applicable to CMOS image sensor chip circuits of different planar array scales.
Owner:NO 771 INST OF NO 9 RES INST CHINA AEROSPACE SCI & TECH
Exposure apparatus and exposure method for performing high-speed and efficient direct exposure
ActiveUS7262832B2Low costA large amountPhotomechanical apparatusPhotographic printingEngineeringOptic system
In an exposure apparatus, in which exposure data necessary for direct exposure is sequentially supplied to an exposure engine having a plurality of exposure devices and, based on the supplied exposure data, the exposure engine forms an exposure pattern on an exposure target substrate which moves relative to the exposure engine, lights respectively produced from the exposure device groups based on the identical exposure data supplied to each of the plurality of exposure device groups, are projected via optics so as to be superimposed one on top of another on the same area on the exposure target substrate.
Owner:SHINKO ELECTRIC IND CO LTD
Integrated preparation method for LED fluorescent powder coating
The invention discloses an integrated preparation method for an LED fluorescent powder coating, which belongs to the photoelectric technical field. The method comprises the following steps: (1), preparing fluorescent powder and sensitive colloid dispersion; (2), spinning the fluorescent powder to form a fluorescent powder-sensitive colloid dispersion coating; (3), obtaining fluorescent powder-sensitive colloid dispersion coating patterns in required shapes and thickness through exposure and development; (4), displacing a fluorescent powder dispersion medium; and (5), removing a coating residue on the surface of an electrode, and showing a chip pattern. The invention provides a wafer level packaging fluorescent powder coating slurry method and a realization method (cleaning and exposing) of the chip electrode pattern, and the problem of applying the fluorescent powder coating technology into LED chip integrated package to realize the separation of the electrode pattern and the fluorescent powder coating in the prior art is solved.
Owner:UNIV OF ELECTRONIC SCI & TECH OF CHINA
Polyimide oligomer and liquid photoimagable solder resist ink
ActiveCN103145988AImprove heat resistanceImprove solder resistanceOrganic chemistryInksResistOligomer
The invention discloses a polyimide oligomer and a liquid photoimagable solder resist ink. A structural formula of the polyimide oligomer is as follows: R1 is alicyclic, R2 is alkyl with at least one carbon ring structure, n is not less than 1 and not more than 30, m is not less than 1 and not more than 30, p is not less than 1 and not more than 30, and (n+1-m-p) is more than 0, x is not less than 5 and not more than 50. The photoimagable polyimide oligomer has the advantages of excellent heat resistance, soldering resistance, golden resistance, chemical resistance, and yellowing resistance. The liquid photoimagable solder resist ink prepared from the oligomer has excellent heat resistance, soldering resistance, golden resistance, chemical resistance, yellowing resistance, insulativity, high resolution, high flexibility and high adhesion, can be used for effectively solving the problem that the liquid photoimagable solder resist ink is easy to yellow at high temperature under the processes of thermocuring, solder coating and reflow soldering, and is especially suitable for preparing white solder resist ink so as to achieve high reflecting whiteness.
Owner:东莞德芳油墨科技有限公司
Single-photon avalanche diode pixel structure and pixel array substrate
ActiveCN106206638AFacilitates the study of crosstalk effectsNo avalanche effectDiodeRadiation controlled devicesSingle-photon avalanche diodeVoltage source
The invention provides a single-photon avalanche diode pixel structure and a pixel array substrate. The single-photon avalanche diode pixel structure comprises a single-photon avalanche diode, a first pull-up tube, a pull-down tube unit, a quenching unit and an output unit, wherein the single-photon avalanche diode comprises an anode and a cathode; the cathode of the single-photon avalanche diode is connected with a bias voltage source; the first pull-up tube is connected with a power supply source, a reset signal and the anode of the single-photon avalanche diode; the pull-down tube unit is connected with the first pull-up tube and the anode of the single-photon avalanche diode; the quenching unit is connected with the power supply source, the pull-down unit and the anode of the single-photon avalanche diode; and the output unit is connected with the quenching unit. The single-photon avalanche diode pixel structure can bias voltage of the anode and the cathode of the single-photon avalanche diode below critical avalanche voltage when not selected for exposure and read-out, so that the avalanche effect is avoided. By the pixel array structure provided by the invention, exposure of a single pixel structure can be achieved; and research on the crosstalk effect of the single pixel structure on the adjacent pixel structure is facilitated.
Owner:SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
Composite material of high-nitrogen-doped grapheme and ultrathin MoSe2 nanosheets and preparation method of composite material
InactiveCN104240792AReaction conditions are easy to controlEasy to operateMaterial nanotechnologyConductive layers on insulating-supportsLow nitrogenActive agent
The invention provides a composite material of high-nitrogen-doped grapheme and ultrathin MoSe2 nanosheets and a preparation method of the composite material. According to the method, after a molybdenum source, a selenium source and low-nitrogen-doped grapheme which are dissolved in water and ethylene glycol are sufficiently mixed, solvent thermal reaction is conducted under the effect of ethidene diamine serving as an active agent, the ultrathin MoSe2 nanosheets are made to grow on the grapheme evenly, meanwhile, the low-nitrogen-doped grapheme is doped deeply, and finally the composite material of the high-nitrogen-doped grapheme and the ultrathin MoSe2 nanosheets is obtained. The high-nitrogen-doped grapheme / molybdenum selenide nanosheets synthesized through the method have the excellent performances of high conductivity, high catalysis and the like at the same time, and can be widely applied to photocatalysis, chemical catalysis, electrodes of solar cells, electrodes of other new energy batteries and electrode materials of super-capacitors.
Owner:SHANGHAI JIAO TONG UNIV
Computer imaging type direct plate making equipment and plate making method
ActiveCN103955112AQuality improvementReduce usagePhotomechanical apparatusForme preparationLight guideSheet film
The invention provides computer imaging type direct plate making equipment and a plate making method. The equipment comprises an exposure light source, a print image imaging device and a printing plate carrying device, which are arranged coaxially; the exposure light source is used for irradiating light to cure a photosensitive material loaded on a printing plate; the print image imaging device is used for forming a target image to replace a film, so as to mask the light from the exposure light source, and thus a corresponding exposure image is formed on the printing plate; to improve the exposure efficiency and the plate making efficiency, the print image imaging device is provided with a light guide layer for trimming non-uniform exposure light to uniform parallel light. Due to the introduction of a light homogenizing layer, dependence on a light source is further reduced, and in particular, good plate making precision can be obtained by combination of light sources with different specifications, light sources or spot light sources with different surface luminescence uniformity and line light sources. A plate making process formed by the plate making equipment can adapt to the plate making requirements of high precision and low cost.
Owner:青岛斯博锐意电子技术有限公司
Intelligent wristband equipment
ActiveCN111150189AAchieve hiddenAchieve exposureBraceletsWrist-watch strapsCamera lensPrivacy protection
The invention provides an intelligent wristband device, which can realize hiding and exposing of a camera lens so as to improve the privacy protection performance of the device and reduce the risk ofprivacy leakage of a user. The intelligent wristband equipment comprises an equipment main body and a camera module, and the camera module comprises a lens; a telescopic receding hole is formed in theside face of a shell of the equipment main body, the camera module is provided with a first position enabling the lens to be kept exposed out of the shell and a second position enabling the lens to be kept hidden in the shell, a telescopic mechanism is further installed on the equipment main body, and the camera module is switched between the first position and the second position by operating the telescopic mechanism so that the camera module can extend out of or retract into the telescopic receding hole. The camera lens can be hidden and exposed, the lens is exposed when the camera needs tobe used, and the lens is hidden in the shell when the camera does not need to be used, so that the privacy protection performance of the device is improved, and the privacy leakage risk of the user is reduced.
Owner:GEER TECH CO LTD
Proximity exposure device
ActiveCN102854752ASuppresses the influence of exposure accuracyAchieve exposurePhotomechanical exposure apparatusMicrolithography exposure apparatusLinear motorRefrigerant
The invention relates to a proximity exposure (PE) device, comprising a workpiece driving part formed by a first linear motor (30) having a first stator (31) and a first rotor (32) opposite to the first stator (31) and a second linear motor (40) having a second stator (41) and a second rotor (42) opposite to the second stator (41); refrigerant circulation paths (35, 45) configured along the rotors (32, 42); refrigerant supply devices (37, 47) for circularly supplying refrigerants to the refrigerant circulation paths (35, 45); and temperature sensors (36, 46) which are configured in the vicinity of inlets (35a, 45a) and outlets (35b, 45b) of the refrigerant circulation paths (35, 45) to detect the refrigerant inlet / outlet temperature. Temperature is managed based on detection values of the temperature sensors (36, 46), thereby making fixed the amount of heat that is transferred from the linear motors (30, 40) to a substrate (W).
Owner:V TECH CO LTD
Sectional exposure method of reel-to-reel maskless laser direct-writing photoetching device
ActiveCN110196535AAchieve exposureSolve the problem that cannot be exposedPhotomechanical exposure apparatusMicrolithography exposure apparatusGraphicsPhotolithography
The invention relates to a sectional exposure method of a reel-to-reel maskless laser direct-writing photoetching device. The method comprises the following steps of: (1) cutting an ultrahigh pattern;(2) making and marking material numbers; (3) exposing a material number of the first section; (4) acquiring theoretical sucker coordinates; (5) exposing the material number of the nth section; (6) repeating the steps (4) and (5) until all the sectional material numbers of the graph are exposed. The sectional exposure method of a reel-to-reel maskless laser direct-writing photoetching device can solve the defects in the prior art and can expose the graph with the height exceeding the stroke of a scanning axis.
Owner:HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
Multi-camera exposure synchronous control system and method and unmanned aerial vehicle
ActiveCN110445987AAchieve exposureImage data is accurateTelevision system detailsPicture taking arrangementsMulti cameraControl system
The invention discloses a multi-camera exposure synchronous control system, a multi-camera exposure synchronous control method and an unmanned aerial vehicle. The system comprises a shutter signal conversion module and an image acquisition equipment control assembly comprising a processor, a driving signal module and an image sensor, if the shutter signal conversion module detects the falling edgeof the image acquisition trigger signal, the shutter signal conversion module sends the image acquisition signal corresponding to the image acquisition trigger signal to the processor; if the idle control unit of each processor detects the falling edge of the image acquisition signal, the idle control unit controls the driving signal module to stop sending the synchronization signal; the reset control unit controls the image sensor to reset; the initialization control unit controls the image sensor to be initialized; the sending control unit controls the driving signal module to send the synchronizing signal again, and controls the image sensor to expose when receiving the rising edge of the appointed synchronizing signal; and if the receiving unit detects the rising edge of the next synchronizing signal of the appointed synchronizing signal, the receiving unit receives the image data so as to control the plurality of image sensors to be simultaneously exposed.
Owner:SHANGHAI SEAGULL DIGITAL CAMERA
Server
PendingCN112969334AAchieve exposureRealize pluggingServersData center roomsComputer hardwareEngineering
The invention discloses a server. The server comprises a case capable of being installed on a cabinet, wherein a plurality of hard disk slots in which hard disks can be inserted and pulled are formed in the case; at least part of the case can be pulled relative to the mounting groove of the cabinet so as to expose the hard disk slots; and the hard disk slots are arranged in two rows in the drawing direction, the directions of notches of the two rows of hard disk slots are opposite, each row of hard disk slots are arranged in a matrix mode in the drawing direction, and the plugging direction of the hard disk slots is perpendicular to the thickness direction and the drawing direction of the case at the same time. According to the server, the two rows of disk slots are arranged in parallel on the case, and the whole case can be drawn relative to the mounting slot of the cabinet, or the part of the case provided with the disk slots can be drawn relative to other parts of the case, so that the disk slots are exposed, and the hard disks can be inserted into and pulled out of the disk slots; and due to the fact that the hard disk slots in each row are arranged in the drawing direction in the matrix arrangement mode, the hard disk slots can be arranged in the drawing direction as many as possible, and the placing density of the hard disks is improved.
Owner:联想(北京)信息技术有限公司
Full-soluble edible mushroom protein and preparation method thereof
ActiveCN113508863AAchieve hydrophilic modificationGuarantee authenticityMicroorganism/unicellular-algae proteins working-upPeptidesBiotechnologyNutritive values
The invention discloses a full-soluble edible mushroom protein and a preparation method thereof. The full-soluble edible mushroom protein is prepared by the following steps: unmodified edible mushroom protein is expanded under an alkaline condition, and then acid is added to adjust the edible mushroom protein to be neutral. According to the preparation method, the primary structure of the protein is not changed, the nutritional value of the protein can be reserved to the maximum extent, the obtained edible mushroom protein is free of exogenous additive components, the acceptance degree of consumers is improved to the maximum extent, reasonable utilization of edible mushroom byproducts is achieved, and resource waste and environmental pollution are effectively avoided.
Owner:JIANGNAN UNIV
Image interference photoetching method using circular grating and gated optical shutter and its system
InactiveCN1752848AAchieve triple exposureAchieve exposureDiffraction gratingsPhotomechanical exposure apparatusGratingImage resolution
The present invention relates to an imaging interference photoetching method by adopting circular grating and gated shutter. It is characterized by that it adopts circular grating and gated shutter device to provide illumination perpendicular to mask plane, X-directional bias illumination and Y-directional bias illumination for triple exposure imaging interference photoetching process so as to implement triple exposure required for imaging interference photoetching process.
Owner:INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Mechanical property adjustable hydrogel based on photolytic protein as well as preparation method and application thereof
ActiveCN111154119AAchieve releaseAchieve exposureSkeletal/connective tissue cellsCell culture supports/coatingMacromoleculePolymer
The invention discloses a mechanical property adjustable hydrogel based on photolytic protein as well as a preparation method and application thereof. The invention relates to a preparation method ofhydrogel with adjustable mechanical properties based on photolytic protein. The preparation method comprises the following steps: (1) carrying out site mutation and sequence addition on an original photo-decomposable wild protein sequence to ensure that the protein can have different crosslinking sites before and after illumination while ensuring that the protein can be normally folded and expressed; (2) controlling the number of glue connection points by controlling the molar ratio of a multi-arm hydrophilic polymer to protein crosslinking functional groups in the aspect of glue preparation proportion; and finally, in the aspect of macroscopic regulation and control of mechanical properties, regulating and controlling the change degree of the modulus of the whole hydrogel by controlling the illumination intensity and time to prepare the hydrogel with adjustable and controllable mechanical properties based on the photolytic protein. According to the invention, the mechanical propertiesof the hydrogel can be regulated and controlled according to requirements in time and space; and the hydrogel has no cytotoxicity.
Owner:NANJING UNIV
Panel structure, air conditioner and panel lamplight display control method
InactiveCN104976750ALight transmission area is smallAchieve exposureMechanical apparatusSpace heating and ventilation safety systemsElectric controlMicroprocessor
The invention discloses an air conditioner capable of displaying changeable patterns. The air conditioner comprises a photosensitive sensor which is used for sensing the light ray intensity of an environment and generating a light ray intensity signal, a panel which is provided with patterns, a backlight which is used for illuminating the panel, a shading mechanism which is moved relative to the panel and is overlapped with the panel, a driving unit which is used for driving the shading mechanism to move and a microprocessor which is used for detecting the light ray intensity signal which is generated by the photosensitive sensor, wherein the microprocessor is used for controlling the illumination of the backlight according to the light ray intensity signal which is generated by the photosensitive sensor and controlling the driving unit to drive the shading mechanism to move relative to the panel so as to change the displayed region after the backlight irradiates the panel. According to the air conditioner capable of displaying the changeable patterns, no complicated electric control is needed, and the air conditioner capable of displaying the changeable patterns has the advantages that the electric structure is simplified and the cost is reduced.
Owner:GD MIDEA AIR-CONDITIONING EQUIP CO LTD +1
Multiplexing pixel control circuit for super large area array splicing cmos image sensor
ActiveCN104796636BReliable controlSimple structureTelevision system detailsColor television detailsComputer hardwareCMOS
The invention discloses a multiplexed pixel control circuit for splicing CMOS image sensors with super-large area arrays, which includes L-level serial pixel control sub-circuits A, and each level of serial pixel control sub-circuits A can generate 1 row Control signal of pixel, each serial pixel control subcircuit A includes K-level serial pixel control subcircuit B and windowing address gating circuit, each serial pixel control subcircuit B is a basic windowing unit, and generate I / K row pixel control signals, and each pixel control subcircuit B includes a W-level minimum pixel control subcircuit C. Through the design of the window address gating circuit, the L serial pixel control sub-circuits A are completely consistent except for the connection mode of the lead wires in the I / O bonding finger area, so that the complex structure is realized. The window function of the type circuit. The circuit structure of the invention is simple, reliable in control, excellent in scalability and reusability, and can be applied to CMOS image sensor chip circuits of different area array scales.
Owner:NO 771 INST OF NO 9 RES INST CHINA AEROSPACE SCI & TECH
Display baseplate, display panel and display device
InactiveCN104570450AFlat surfaceUniform gray scalePhotomechanical treatmentNon-linear opticsPhotoresistDisplay device
The invention provides a display baseplate, a display panel and a display device. The display baseplate comprises an alignment mark, and the alignment mark is used for aligning exposure equipment in the process of exposing to form the diagram of a first film layer on the display baseplate. The thickness of the middle area of the alignment mark is less than that of the marginal area of the alignment mark so that the thickness of the alignment mark is uniform after being coated with a photoresist. The alignment mark of the display baseplate cannot be in the shape of a Chinese character hui after being coated with the photoresist, and the surface of the alignment mark is flat, is uniform in gray scale and is clear in boundary after being coated with the photoresist, thus the problem that the exposure equipment cannot be focused can be solved, the automatic aligning and exposing of the exposure equipment can be realized, and the production efficiency can be improved.
Owner:BOE TECH GRP CO LTD +1
Detection method and system of zero mark exposure
InactiveCN101900946AAchieve exposureExposure automatic detectionPhotomechanical exposure apparatusMicrolithography exposure apparatusEngineering
The invention provides detection method and system of zero mark exposure so as to realize the zero mark exposure detection. The method comprises the following steps of: acquiring a first zero mark signal index of a wafer in which the zero mark exposure is not carried out; carrying out exposure on a zero mark of the wafer; acquiring a second zero mark signal index of the exposed wafer; comparing the first zero mark signal index with the second zero mark signal index to obtain a signal index difference as a zero mark detection value; and comparing the zero mark detection value with a zero mark standard value, and when the zero mark detection value is less than the zero mark standard value, determining that the exposure of the zero mark is not qualified.
Owner:SEMICON MFG INT (SHANGHAI) CORP
Air outlet structure of air purifier
InactiveCN107940711AAchieve complete shadingAchieve partial shadingDucting arrangementsLighting and heating apparatusAir purifiersAir purification
The invention discloses an air outlet structure of an air purifier, comprising: an air outlet channel, the air outlet channel is in a columnar structure; a plurality of fan-shaped shielding parts are arranged in the air outlet channel at intervals, The arc edge is fixed on the inner wall of the air outlet channel, and the top angle is jointly fixed on a rotating shaft coaxial with the air outlet channel, and an air outlet is formed between two adjacent fan-shaped shielding parts; and a rotating plate, which is arranged at intervals There is at least one flow hole not smaller than the air outlet; it is configured to be rotatable around the rotating shaft, so as to completely cover, partially cover or fully expose each air outlet at different rotational positions, thereby continuously adjusting each outlet. The outlet side of the tuyere. The air outlet structure of the air purifier of the present invention can continuously adjust the air output of the air purifier to meet the indoor air purification requirements, and is more convenient and humanized to use.
Owner:苏州格莱威科环保科技有限公司
Exposure head and image forming apparatus
InactiveUS20110128594A1Reduce aberrationAchieve exposureElectrographic process apparatusPrintingOptoelectronicsMagnification
Disclosed is an exposure head including a light emitting element array including light emitting elements disposed in a first direction, a light blocking member including an aperture stop through which lights emitted from the light emitting elements pass, and an image forming optical system that makes an image by using the lights having passed through the light blocking member. An absolute value of a magnification in the first direction of the image forming optical system is equal to or more than 0.7 times and is equal to or less than 0.8 times.
Owner:SEIKO EPSON CORP
Material outboard exposure device
ActiveCN111038746AAchieve exposureCompact structureCosmonautic vehiclesCosmonautic partsStructural engineeringExposure
The invention relates to a material outboard exposure device which is installed on an outer side platform of an on-orbit spacecraft. The device comprises a base, a load center frame, an installation support, a plurality of experiment boxes and a four-degree-of-freedom inspection mechanical arm, and a notch is reserved in one edge of the base; the load center frame is vertically and fixedly installed in the center of the base; at least one assembling opening is formed in each side, corresponding to the base, of the installation support; the plurality of experiment boxes are respectively and detachably arranged in the at least one assembling opening; one end of the four-degree-of-freedom inspection mechanical arm is rotationally connected to the top end of the load center frame, and the other end is movably located in the notch; an image acquisition device is mounted on the four-degree-of-freedom inspection mechanical arm in a sliding manner; after the other end of the four-degree-of-freedom inspection mechanical arm is moved out of the notch, the experiment boxes are opened, and the exposed surfaces of the experiment boxes are perpendicular to the base and is parallel to the corresponding side of the base; and the four-degree-of-freedom inspection mechanical arm drives the image acquisition device to rotate around the load center frame and inspects the exposed surfaces of the plurality of experiment boxes in sequence.
Owner:TECH & ENG CENT FOR SPACE UTILIZATION CHINESE ACAD OF SCI
Work structure for providing scanning path of immersion photoetching machine
InactiveCN102707576AAchieve exposurePhotomechanical exposure apparatusMicrolithography exposure apparatusSpiral scanningSilicon
The invention discloses a work structure for providing a scanning path of an immersion photoetching machine. The work structure comprises a silicon wafer which is arranged below an exposure lens of the immersion photoetching machine, and the work structure is characterized in that the silicon wafer comprises a plurality of wafers, and each of the plurality of wafers further comprises a bottom anti-reflection layer and a photo resist; and a plurality of wafers comprise the wafers in a central scanning path area and the wafers in a peripheral scanning path area, and the central scanning path area and the peripheral scanning path area are both in the spiral scanning path structures. According to the work structure provided by the invention, the wafers in the silicon wafer to be exposed are divided into two areas, and the two areas are both in the spiral scanning work path structures, in this way, most part of the silicon wafer is prevented from being impacted by the particles, and the exposure quality can be achieved and the yield of the product can be increased.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP
Hand sewing needle
The invention relates to a hand sewing needle, belonging to sewing supplies in daily life. The hand sewing needle comprises a needle head (1) and a needle body (6) for connecting the needle head (1), wherein the needle body (6) is composed of a needle bar (2) connected at one end of the needle head (1) and a loop bar (3) tightly sleeved on the external wall of the needle bar (2); and the hand sewing needle further comprises a threading ring (4), and the threading ring (4) passes through the loop bar (3) to be fixedly connected with the needle bar (2). By adopting the hand sewing needle with such structure, a thread head can quickly pass through the threading ring, so that time for threading is saved, and the hand sewing needle is convenient to use and brings convenience to life of people, and also can be used for sewing various cloths.
Owner:WUXI LAIJITE INFORMATION TECH
Machining method for boss type diamond composite material anti-abrasion belt, mould and anti-abrasion belt
InactiveCN105537586AImprove processing quality and efficiencyReduce processing costsPolycrystalline diamondMachining
The invention provides a machining method for a boss type diamond composite material anti-abrasion belt, a mould and the anti-abrasion belt. The machining method for the boss type diamond composite material anti-abrasion belt includes the following steps that 1, a sand mould with grooves in the inner surface is made; 2, a plurality of polycrystalline diamonds are embedded in the grooves of the sand mould in a one-to-one correspondence mode; 3, the mould is assembled; 4, anti-abrasion substrate powdery materials are poured into a lower mould body; 5, the mould is sintered, and a boss type diamond composite material anti-abrasion belt blank is obtained; and 6, the boss type diamond composite material anti-abrasion belt blank is machined, and the boss type diamond composite material anti-abrasion belt is obtained. The machining method for the boss type diamond composite material anti-abrasion belt, the mould and the anti-abrasion belt have the beneficial effects that machining of the boss type diamond composite material anti-abrasion belt and exposure of the block-shaped polycrystalline diamonds in the anti-abrasion belt can be realized; the machining quality and efficiency of the boss type diamond composite material anti-abrasion belt are improved, and a sufficient exposure amount of the block-shaped polycrystalline diamonds can be guaranteed.
Owner:CHINA UNIV OF PETROLEUM (BEIJING)
Shutter integrated device, control system and time sequence control method
ActiveCN112730875ASolve debugging difficultiesImprove efficiencyTelevision system detailsColor television detailsComputer hardwareShutter
The invention discloses a shutter integrated device, a control system and a time sequence control method. The shutter integrated device comprises an integrated device bottom plate, a first CCD camera, a second CCD camera, a first shutter switch, a second shutter switch and a light splitting device. The first CCD camera, the second CCD camera and the light splitting device are all installed on the integrated device bottom plate. The first shutter switch is arranged on the first CCD camera, and the second shutter switch is arranged on the second CCD camera; and the first shutter switch and the second shutter switch are respectively connected with the control system. According to the invention, the debugging difficulty caused by the position and state difference of the camera is avoided, the efficiency is improved, the system error is eliminated, the MHz exposure is realized, the exposure images do not interfere with each other and influence each other, and the overall precision and stability of the system are improved.
Owner:INST OF HIGH SPEED AERODYNAMICS OF CHINA AERODYNAMICS RES & DEV CENT
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com