Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Material outboard exposure device

A technology of assembly cavity and assembly port, which is applied in the field of material exposure device outside the cabin, to achieve the effect of high space utilization and compact overall structure

Active Publication Date: 2020-04-21
TECH & ENG CENT FOR SPACE UTILIZATION CHINESE ACAD OF SCI
View PDF5 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, my country is still in its infancy in terms of space material exposure. In order to meet the task requirements of material space exposure, it is urgent to involve a test system that can be repeatedly installed, repeatedly locked and released on the track, and automatically unfolded and closed. / experiment box

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Material outboard exposure device
  • Material outboard exposure device
  • Material outboard exposure device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] Such as Figure 1-5 As shown, a material external exposure device installed on the outer platform of an orbiting spacecraft includes:

[0044] The base 21 is used to be detachably installed on the outer platform of the orbiting spacecraft; the base 21 is a polygonal structure, and a gap 211 is reserved on one edge of the base 21;

[0045] The load center frame 25 is vertically fixed and installed at the center of the base 21;

[0046] The mounting bracket 22 is vertically fixed and installed on the base 21; each side of the mounting bracket 22 corresponding to the base 21 is provided with at least one assembly port;

[0047] Several experiment boxes 1, and several experiment boxes 1 are detachably installed in the assembly port;

[0048] The four-degree-of-freedom inspection robot arm 8 is erected above the experiment box 1, and one end of the four-degree-of-freedom inspection robot arm 8 is rotatably connected to the top of the load center frame 25, and the other end can rotate ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a material outboard exposure device which is installed on an outer side platform of an on-orbit spacecraft. The device comprises a base, a load center frame, an installation support, a plurality of experiment boxes and a four-degree-of-freedom inspection mechanical arm, and a notch is reserved in one edge of the base; the load center frame is vertically and fixedly installed in the center of the base; at least one assembling opening is formed in each side, corresponding to the base, of the installation support; the plurality of experiment boxes are respectively and detachably arranged in the at least one assembling opening; one end of the four-degree-of-freedom inspection mechanical arm is rotationally connected to the top end of the load center frame, and the other end is movably located in the notch; an image acquisition device is mounted on the four-degree-of-freedom inspection mechanical arm in a sliding manner; after the other end of the four-degree-of-freedom inspection mechanical arm is moved out of the notch, the experiment boxes are opened, and the exposed surfaces of the experiment boxes are perpendicular to the base and is parallel to the corresponding side of the base; and the four-degree-of-freedom inspection mechanical arm drives the image acquisition device to rotate around the load center frame and inspects the exposed surfaces of the plurality of experiment boxes in sequence.

Description

Technical field [0001] The present invention relates to the related field of material exposure outside a space station, in particular to a material outside exposure device. Background technique [0002] In order to face the needs of future deep space exploration, it is of far-reaching significance to study the in-orbit behavior of materials and the characteristics and changes of materials in basic disciplines. During the missions of the former Soviet Union and the International Space Station, several in-orbit exposure tests of metals and non-metals have been verified, and significant scientific research results have been achieved. my country’s space material exposure is still in its infancy. In order to meet the task requirements of material space exposure, it is urgent to involve a trial of the materials to be exposed that can be repeatedly installed, can be re-locked and released as a whole on rail, and automatically unfolded and closed. / Experiment box. The in-situ on-orbit i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B64G4/00B64G1/66
CPCB64G1/66B64G4/00B64G2004/005
Inventor 王珂劳冠清吕宏宇杨鹏张聚乐李碘红
Owner TECH & ENG CENT FOR SPACE UTILIZATION CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com