11 results about "Exposure data" patented technology

The invention provides an exposure apparatus, an exposure method, and an alignment method. In an exposure device provided with a stage or the like, proper alignment is performed in consideration of a linear error generated along with movement of the stage. An exposure device (10) is provided with a pair of calibration scales (62, 64) on which reference marks (CM) facing each other in an X direction (main scanning direction) are disposed, and the reference marks (CM) facing each other are imaged by an alignment camera (80) while a stage (50) moves. The amount of linear error in the amount of movement of the stage (50) is detected on the basis of the amount of misalignment of the reference mark (CM) in the captured image. Then, scale correction processing is performed on the exposure data in accordance with the calculated linear error amount.

The invention relates to the field of image processing, and relates to a high-dynamic image processing method, a chip, equipment, a medium and a program product. The method comprises the following steps: acquiring an original image set comprising an abnormal exposure frame and a plurality of normal exposure frames, and selecting an alignment reference frame from the plurality of normal exposure frames; performing alignment processing on the normal exposure frames which are not selected and the alignment reference frame to generate a ghosting region positioning mask; performing ghosting detection according to the plurality of normal exposure frames and the abnormal exposure frames to obtain an initial ghosting region; determining a target ghosting region according to the ghosting region positioning mask and the initial ghosting region, and selecting a compensation reference frame according to exposure data of the abnormal exposure frame and the normal exposure frame in the target ghosting region; and determining a fusion weight corresponding to each frame in the original image set according to the compensation reference frame, and processing the original image set according to the fusion weight to obtain a target high-dynamic image. By adopting the method, the high-dynamic image generation quality can be improved.

The embodiment of the invention discloses a multi-lens shooting system. The multi-lens shooting system comprises a control assembly, a double-rate synchronous dynamic random access memory DDR, a first processing assembly comprising n image front-end processing units IFPU, a second processing assembly comprising m high dynamic range imaging HDR sensors, and an HDR pipeline arranged on any IFPU, and n and m are integers greater than 0; and the control assembly is used for performing opening and closing control on a connection circuit between the IFPU and the corresponding HDR sensor, controlling the IFPU to output corresponding exposure data to at least one of the DDR pipeline and the HDR pipeline, and controlling the HDR pipeline to perform hardware HDR processing on at least one path of exposure data. According to the invention, the purpose of HDR multi-camera video recording is realized by designing and multiplexing a set of HDR hardware based on time division, and on the premise of ensuring a certain rate, the chip area is effectively reduced, and the construction cost is reduced.

The application provides an exposure data determination method, device and equipment and a storage medium. The method comprises the following steps: obtaining historical bidding data, historical exposure data, a plurality of expected bidding data and historical exposure index data of a to-be-launched object corresponding to the historical bidding data of a target object; determining expected exposure index data of the to-be-launched object corresponding to each of the plurality of expected bidding data; determining fitting parameters according to the expected exposure index data and the plurality of expected bidding data; fitting the expected exposure index data based on the fitting parameters to obtain exposure index fitting data corresponding to different bidding data; and determining exposure data of the target object under different bidding data within a preset time period based on the historical exposure index data, the exposure index fitting data and the historical exposure data. The application can cover exposure estimation of different bidding data, improve the accuracy of exposure data estimation, and facilitate accurate recommendation of objects based on high-accuracy exposure estimation.

The application discloses a wafer surface type detection and compensation method, system, device, medium and program, and the method comprises the following steps: scanning a wafer to obtain a plurality of groups of original data; filtering all the original data to obtain scanning strip data; exposing the wafer and dynamically compensating the scanning strip data of the exposure position by a preset compensation value to obtain exposure strip data; equally spacing sampling the exposure strip data; assigning the exposure data obtained by the equally spacing sampling to the preset compensation value to compensate the height of the wafer in the wafer exposure step, and detecting the wafer surface type by using the equally spacing sampled exposure strip data. The technical scheme provided by the application can solve the technical problem that the wafer surface type detection in the prior art has a large error.

Method (and apparatus) for producing a 3D target structure in lithographic material. Focus region of a laser writing beam travels through a scanning manifold through the lithographic material. In the focus region of the laser writing beam, an exposure dose is irradiated into the lithographic material, and a structure region is locally defined. At least one exposure data set which represents a local exposure dose for the scan manifold as a function of location is determined. A structure which approximates the target structure is defined based on at least one exposure data set. This structure is analyzed and at least one analysis data set which represents the analyzed structure is determined. Deviation data set which represents deviations of the already defined structure from the target structure is determined. At least one correction exposure data set is determined. Correction structure based on the at least one correction exposure data set is defined.

The embodiment of the invention discloses an image generation method and a related device, and the method is applied to a processor of a vehicle electronic rearview mirror system, and comprises the steps: obtaining a first long-frame image and a first short-frame image collected by an image collection device; fusing the first long-frame image and the first short-frame image according to a preset exposure ratio to obtain a first composite image; determining first brightness distribution histogram data of the first short frame image and second brightness distribution histogram data of the first composite image; determining a target exposure ratio according to the first brightness distribution histogram data, the second brightness distribution histogram data, the first exposure duration of the first long frame image, the second exposure duration of the first short frame image and historical exposure data; and fusing the first long-frame image and the first short-frame image according to the target exposure ratio to generate a target composite image. According to the method, the exposure ratio of the image frame can be adaptively regulated and controlled in different dynamic range scenes, and the imaging quality of the streaming media rearview mirror is improved.

A method for producing a three-dimensional target structure (42) in a lithography material by means of a laser lithography device, wherein the target structure is defined as a focus region (26) of a laser writing beam traversing a scanning manifold (38) through the lithography material within a writing region of the laser lithography device, wherein in the focus region of the laser writing beam an exposure dose is irradiated into the lithography material, and a structure region (52) is locally defined, wherein at least one exposure data set representing the local exposure dose of the scanning manifold as a function of position is determined, wherein a structure approximating the target structure is defined on the basis of the at least one exposure data set, wherein this structure is analyzed and at least one analysis data set representing the analyzed structure is determined, wherein a deviation data set representing a deviation of the defined structure from the target structure is determined, wherein at least one correction exposure data set is determined, and wherein a correction structure is defined on the basis of the at least one correction exposure data set. The invention also relates to a laser lithography device.

The invention discloses a black lens chromatic aberration detection device and method based on hyperspectrum, and relates to the field of black lens chromatic aberration detection, and the device comprises a support frame, a hyperspectral camera, an annular light source, a laser range finder, a lens jig, a driving motor and a main control board. The method comprises the steps of initializing a system and collecting a dark background; fixing the lens and the low-signal-value standard white board; driving the jig to move and synchronously acquiring multi-exposure spectrum data and distance data; carrying out dark background deduction and distance light source compensation; synthesizing the multi-exposure data into high-quality fusion spectrum data through an intelligent fusion algorithm; calculating the relative reflectivity of the to-be-measured lens based on the fusion data and the known reflectivity of the standard white board; and finally converting the CIELAB chromatic value into a CIELAB chromatic value and outputting a result. Through multi-exposure fusion and distance compensation, the problems of weak signals, large noise interference, poor measurement repeatability and the like caused by low reflectivity of a black lens are effectively solved, and automatic detection of chromatic aberration parameters is realized.

To perform proper alignment in consideration of a linear error caused by the movement of a stage in an exposure device provided with the stage.SOLUTION: In an exposure device 10, a pair of calibration scales 62 and 64 in which reference marks CM facing each other along an X direction (main scanning direction) are arranged are provided, and the reference marks CM facing each other are imaged by an alignment camera 80 with the movement of a stage 50. A linear error amount with respect to the movement amount of the stage 50 is detected based on the positional deviation amount of the reference mark CM in the captured image. Then, scale correction processing is performed on the exposure data in accordance with the obtained linear error amount.SELECTED DRAWING: Figure 2