22 results about "Exposure data" patented technology

The invention provides an exposure apparatus, an exposure method, and an alignment method. In an exposure device provided with a stage or the like, proper alignment is performed in consideration of a linear error generated along with movement of the stage. An exposure device (10) is provided with a pair of calibration scales (62, 64) on which reference marks (CM) facing each other in an X direction (main scanning direction) are disposed, and the reference marks (CM) facing each other are imaged by an alignment camera (80) while a stage (50) moves. The amount of linear error in the amount of movement of the stage (50) is detected on the basis of the amount of misalignment of the reference mark (CM) in the captured image. Then, scale correction processing is performed on the exposure data in accordance with the calculated linear error amount.

The invention relates to the field of image processing, and relates to a high-dynamic image processing method, a chip, equipment, a medium and a program product. The method comprises the following steps: acquiring an original image set comprising an abnormal exposure frame and a plurality of normal exposure frames, and selecting an alignment reference frame from the plurality of normal exposure frames; performing alignment processing on the normal exposure frames which are not selected and the alignment reference frame to generate a ghosting region positioning mask; performing ghosting detection according to the plurality of normal exposure frames and the abnormal exposure frames to obtain an initial ghosting region; determining a target ghosting region according to the ghosting region positioning mask and the initial ghosting region, and selecting a compensation reference frame according to exposure data of the abnormal exposure frame and the normal exposure frame in the target ghosting region; and determining a fusion weight corresponding to each frame in the original image set according to the compensation reference frame, and processing the original image set according to the fusion weight to obtain a target high-dynamic image. By adopting the method, the high-dynamic image generation quality can be improved.

The embodiment of the invention discloses a multi-lens shooting system. The multi-lens shooting system comprises a control assembly, a double-rate synchronous dynamic random access memory DDR, a first processing assembly comprising n image front-end processing units IFPU, a second processing assembly comprising m high dynamic range imaging HDR sensors, and an HDR pipeline arranged on any IFPU, and n and m are integers greater than 0; and the control assembly is used for performing opening and closing control on a connection circuit between the IFPU and the corresponding HDR sensor, controlling the IFPU to output corresponding exposure data to at least one of the DDR pipeline and the HDR pipeline, and controlling the HDR pipeline to perform hardware HDR processing on at least one path of exposure data. According to the invention, the purpose of HDR multi-camera video recording is realized by designing and multiplexing a set of HDR hardware based on time division, and on the premise of ensuring a certain rate, the chip area is effectively reduced, and the construction cost is reduced.

The application provides an exposure data determination method, device and equipment and a storage medium. The method comprises the following steps: obtaining historical bidding data, historical exposure data, a plurality of expected bidding data and historical exposure index data of a to-be-launched object corresponding to the historical bidding data of a target object; determining expected exposure index data of the to-be-launched object corresponding to each of the plurality of expected bidding data; determining fitting parameters according to the expected exposure index data and the plurality of expected bidding data; fitting the expected exposure index data based on the fitting parameters to obtain exposure index fitting data corresponding to different bidding data; and determining exposure data of the target object under different bidding data within a preset time period based on the historical exposure index data, the exposure index fitting data and the historical exposure data. The application can cover exposure estimation of different bidding data, improve the accuracy of exposure data estimation, and facilitate accurate recommendation of objects based on high-accuracy exposure estimation.

The application discloses a wafer surface type detection and compensation method, system, device, medium and program, and the method comprises the following steps: scanning a wafer to obtain a plurality of groups of original data; filtering all the original data to obtain scanning strip data; exposing the wafer and dynamically compensating the scanning strip data of the exposure position by a preset compensation value to obtain exposure strip data; equally spacing sampling the exposure strip data; assigning the exposure data obtained by the equally spacing sampling to the preset compensation value to compensate the height of the wafer in the wafer exposure step, and detecting the wafer surface type by using the equally spacing sampled exposure strip data. The technical scheme provided by the application can solve the technical problem that the wafer surface type detection in the prior art has a large error.

The present invention relates to the field of electromechanical equipment for highways, and specifically to a multi-parameter coordinated adjustment system for electromechanical equipment for highways. The system achieves refined monitoring and display control of different sections of highways through the coordinated work of a video acquisition module, a video splitter, a coordinated adjustment module, an adjustment module, and an LED dimming control module. The system utilizes regional segmentation dynamic perception technology to improve its adaptability to complex environments. The data acquisition module is responsible for collecting exposure data from the video acquisition module and related information from an LED controller, while the control module coordinates the operations of the various modules. The video switching module outputs an exposure-adjusted video image according to instructions from the control module. The coordinated adjustment module not only processes brightness information but also calculates the brightness change and ratio of the exposure-adjusted video image and feeds this information back to the video acquisition module to adjust the exposure. This significantly improves the intelligence and response speed of the system and enhances the operational safety and efficiency of highways.

Embodiments of the present application provide a sample data generation method and device, for the received user behavior data, real-time pre-processing of user behavior data into user behavior objects, and the user behavior object is stored in association with the unique identifier corresponding to the user behavior data; for the received exposure data including the display content and its feature data, the display content in the exposure data is pre-processed into exposure data objects, and the exposure data objects are stored in association with the unique identifier corresponding to the exposure data; and, the feature data of the display content in the exposure data is stored in association with the unique identifier corresponding to the exposure data; at the end of each unique identifier corresponding time window, all user behavior objects, exposure data objects and feature data associated with the unique identifier in the time window are obtained, and all user behavior objects, exposure data objects and feature data obtained are spliced into sample data corresponding to the unique identifier associated with the time window.

This application relates to an exposure data adjustment method, apparatus, and computer device. The method includes: determining histogram data and image quality data of a current image; determining first exposure data of the current image based on the histogram data; and determining second exposure data of the current image based on the image quality data; fusing the first exposure data and the second exposure data to obtain desired exposure data; and adjusting the first exposure data based on the difference between the first exposure data and the desired exposure data. By employing the above technical solution, the accuracy of the first exposure data adjustment result is improved.

The invention discloses a three-dimensional visual high-precision real-time positioning method and system for a single agent, and belongs to the technical field of visual localization, and the method comprises the steps: obtaining visual camera exposure real-time data of the single agent, analyzing a visual camera exposure characterization factor, and judging a visual camera exposure execution scheme of the single agent; performing single-agent visual camera exposure adjustment, judging a single-agent visual camera feature compression execution scheme, judging a single-agent visual camera fuzzy execution scheme, analyzing a visual camera high-frequency loss characterization factor to obtain a single-agent visual camera feature execution scheme, performing image partitioning, and performing image segmentation; and performing visual camera feature point adjustment of the single agent. According to the method, the exposure of the visual camera is analyzed and adjusted, so that the quality of a three-dimensional reconstructed image is guaranteed, the environmental adaptability is enhanced, and high-precision real-time positioning is guaranteed. And feature adjustment is carried out to improve the image feature quality so as to optimize the three-dimensional visual positioning precision and meet the real-time performance of positioning.

Method (and apparatus) for producing a 3D target structure in lithographic material. Focus region of a laser writing beam travels through a scanning manifold through the lithographic material. In the focus region of the laser writing beam, an exposure dose is irradiated into the lithographic material, and a structure region is locally defined. At least one exposure data set which represents a local exposure dose for the scan manifold as a function of location is determined. A structure which approximates the target structure is defined based on at least one exposure data set. This structure is analyzed and at least one analysis data set which represents the analyzed structure is determined. Deviation data set which represents deviations of the already defined structure from the target structure is determined. At least one correction exposure data set is determined. Correction structure based on the at least one correction exposure data set is defined.

The utility model belongs to the technical field of PCBs (printed circuit boards), and discloses an optical communication board with a segmented golden finger process. The optical communication board comprises P golden finger arrangement unit structures, each golden finger arrangement unit structure is spaced by N-1 columns of golden fingers through N photosensitive oil exposure data areas; m first photosensitive oil strips transversely penetrate through the (N-1) columns of golden fingers; the N photosensitive oil exposure data areas are exposed through photosensitive oil in the longitudinal direction, 3M second photosensitive oil strips are developed through the photosensitive oil, and the second photosensitive oil strips are communicated with the first photosensitive oil strips. And the 3M second photosensitive oil strips are subjected to golden finger electrical connection, selective dry film exposure, selective dry film development and alkaline etching, and then the optical communication board containing the segmented golden finger process is prepared. According to the utility model, the adhesive force of the photosensitive oil is enhanced, and the reject ratio that the photosensitive oil is easy to fall off is reduced to 0%.

The embodiment of the invention discloses an image generation method and a related device, and the method is applied to a processor of a vehicle electronic rearview mirror system, and comprises the steps: obtaining a first long-frame image and a first short-frame image collected by an image collection device; fusing the first long-frame image and the first short-frame image according to a preset exposure ratio to obtain a first composite image; determining first brightness distribution histogram data of the first short frame image and second brightness distribution histogram data of the first composite image; determining a target exposure ratio according to the first brightness distribution histogram data, the second brightness distribution histogram data, the first exposure duration of the first long frame image, the second exposure duration of the first short frame image and historical exposure data; and fusing the first long-frame image and the first short-frame image according to the target exposure ratio to generate a target composite image. According to the method, the exposure ratio of the image frame can be adaptively regulated and controlled in different dynamic range scenes, and the imaging quality of the streaming media rearview mirror is improved.

The invention belongs to the technical field of image fusion, and particularly relates to a multi-modal image fusion method based on Swi n-MOE, and the method comprises the following steps: 1, preparing training data; a multi-focus data set, a multi-exposure data set, an infrared image data set and a visible light image data set are selected, the data sets are divided into a training set, a verification set and a test set, and original images in the multi-focus data set and the multi-exposure data set and corresponding labels of the original images are preprocessed. According to the invention, a dual-channel adaptive attention fusion architecture and a decoder integrated with a hybrid expert system are innovatively designed, the limitation that an existing fusion model only aims at a single task is broken through, the information collaboration advantage in multi-task fusion is fully excavated, joint optimization of multiple fusion tasks is realized, and the fusion efficiency is improved. And knowledge migration and complementation among different fusion data sets are promoted.

The invention discloses a method for processing a right-angle shape on an integrated circuit support plate and the integrated circuit support plate, and the method comprises the steps: carrying out the exposure of an anti-corrosion photosensitive dry film covering a processing copper layer of a working plate according to the exposure data, and enabling the exposure data to comprise the exposure data of an outer-layer circuit pattern and a concave groove pattern, the concave groove pattern exposure data comprises a concave groove target pattern subjected to etching compensation, and the etching compensation method comprises the following steps of: performing line width compensation on the inner wall and the notch end surface of a preset concave groove pattern to obtain a middle design pattern; performing arc-shaped addition compensation on the notch and the inner wall of the groove bottom of the middle design pattern, and performing arc-shaped subtraction compensation on the position, close to the inner wall of the groove bottom, on the inner side wall of the middle design pattern to obtain a concave groove target pattern; and an outer layer circuit and a concave groove are obtained after developing, etching and film stripping, and the angle of the corner of the concave groove is more than 89 degrees. According to the method, the problem of excessive internal corrosion caused by fluid retention is solved, and the cutting precision during carrier plate cutting is improved.

A static mechanical simulation determines stress and deformation in a resist after development. The mechanical simulation takes patterned exposure data and post-exposure bake data as inputs to determine differential initial strain and stress in the resist. The initial strain is related to blanket volume loss that occurs in the resist as a result of exposure and post-exposure bake. Using the initial strain, film property, and geometry layout as inputs, the mechanical simulation determines or even quantifies a final stress and deformation in the resist after development. The final stress and deformation in the resist can be correlated to defect instances. Various strategies, including bulk mask optimization, pre-exposure operations, and enhanced optical proximity correction (OPC) that utilize the mechanical simulation learning, can be applied to reduce the initial strain or stress in the resist and thereby reduce defectivity after development.

A method for producing a three-dimensional target structure (42) in a lithography material by means of a laser lithography device, wherein the target structure is defined as a focus region (26) of a laser writing beam traversing a scanning manifold (38) through the lithography material within a writing region of the laser lithography device, wherein in the focus region of the laser writing beam an exposure dose is irradiated into the lithography material, and a structure region (52) is locally defined, wherein at least one exposure data set representing the local exposure dose of the scanning manifold as a function of position is determined, wherein a structure approximating the target structure is defined on the basis of the at least one exposure data set, wherein this structure is analyzed and at least one analysis data set representing the analyzed structure is determined, wherein a deviation data set representing a deviation of the defined structure from the target structure is determined, wherein at least one correction exposure data set is determined, and wherein a correction structure is defined on the basis of the at least one correction exposure data set. The invention also relates to a laser lithography device.

The invention provides a detector exposure test method and system, a control terminal and a computer storage medium, and the method comprises the steps: obtaining a current exposure data set based on an exposure test strategy in a detector test set; in the exposure data set, obtaining each exposure data, and sequentially sending each exposure data to the test machine, so that the test machine performs a current exposure test according to each exposure data; acquiring and storing test image data after the test machine executes the current exposure test; in the detector test set, based on the exposure test strategy, obtaining the exposure data set again until the exposure data set is empty; wherein the detector test set is a set of exposure data groups corresponding to each preset exposure test. The exposure data set is automatically acquired through the detector test set, so that the automatic exposure test of the detector is realized.

The invention discloses a black lens chromatic aberration detection device and method based on hyperspectrum, and relates to the field of black lens chromatic aberration detection, and the device comprises a support frame, a hyperspectral camera, an annular light source, a laser range finder, a lens jig, a driving motor and a main control board. The method comprises the steps of initializing a system and collecting a dark background; fixing the lens and the low-signal-value standard white board; driving the jig to move and synchronously acquiring multi-exposure spectrum data and distance data; carrying out dark background deduction and distance light source compensation; synthesizing the multi-exposure data into high-quality fusion spectrum data through an intelligent fusion algorithm; calculating the relative reflectivity of the to-be-measured lens based on the fusion data and the known reflectivity of the standard white board; and finally converting the CIELAB chromatic value into a CIELAB chromatic value and outputting a result. Through multi-exposure fusion and distance compensation, the problems of weak signals, large noise interference, poor measurement repeatability and the like caused by low reflectivity of a black lens are effectively solved, and automatic detection of chromatic aberration parameters is realized.

An information processing device according to an embodiment comprises: a blinking detection unit for detecting the presence or absence of blinking and blinking coordinates from an image based on exposure data; a blinking correction processing unit for performing blinking correction processing for correcting pixel values of the image so as to suppress blinking of the image; a non-blinking correction processing unit for performing non-blinking correction processing for correcting pixel values of the image so as to adjust the brightness of the image; and a synthesis processing unit for synthesizing the image subjected to the blinking correction processing and the image subjected to the non-blinking correction processing on the basis of the presence or absence of the blinking and the blinking coordinates.

The present application provides an image sensor exposure control method and an image sensor, which divides the exposure stage of each frame of image into a pre-reading time period and a subsequent effective exposure time period. In the pre-reading time period, each pixel unit is controlled to perform pre-exposure, and its voltage signal is read at the end of the pre-exposure. By comparing the voltage signal with a plurality of preset threshold voltages, the current brightness interval of each pixel unit is determined, and a corresponding shutter channel and shutter control parameter are assigned to it accordingly. After the end of the pre-reading time period, the charge of each pixel unit is emptied, and in the effective exposure time period, the effective exposure of the pixel unit is controlled based on the assigned shutter control parameter, thereby realizing pixel-level dynamic exposure control for different brightness intervals. The present embodiment can simultaneously obtain effective exposure data of different brightness intervals within a single frame, realize high dynamic range imaging, avoid multi-frame synthesis, and thus reduce the amount of redundant image acquisition and stored data.

To perform proper alignment in consideration of a linear error caused by the movement of a stage in an exposure device provided with the stage.SOLUTION: In an exposure device 10, a pair of calibration scales 62 and 64 in which reference marks CM facing each other along an X direction (main scanning direction) are arranged are provided, and the reference marks CM facing each other are imaged by an alignment camera 80 with the movement of a stage 50. A linear error amount with respect to the movement amount of the stage 50 is detected based on the positional deviation amount of the reference mark CM in the captured image. Then, scale correction processing is performed on the exposure data in accordance with the obtained linear error amount.SELECTED DRAWING: Figure 2