Image interference photoetching method using circular grating and gated optical shutter and its system

A ring grating and imaging interference technology, which is applied in the improvement field of imaging interference lithography technology, can solve the problems of few implementation and optimization methodologies, low exposure efficiency, and difficulty in pattern alignment, so as to achieve optimized image quality, system stability, The effect of light weight of components

Inactive Publication Date: 2006-03-29
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

Literature Stener R.J.Brueck, Imaging Interfernmetric Lithography, Microlithography World, Winter 1998, 2-11 and Literature Xiaolan Chen and S.R.J.Brueck, Imaging Interferometric Lithography: A Wavelength Division Multiplex Approach to Extending Optical Lithography, J.Vac.Sci.Technol: 3 , Nov / Dec.1998 introduced the imaging interference lithography technology, but only discussed the general methods and simple principles, and rarely discussed the implementation and optimization methods of the imaging interference lithography system. The methods discussed in the literature are in The light path is adjusted between the three exposures, the pattern alignment is difficult, and the exposure efficiency is low

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  • Image interference photoetching method using circular grating and gated optical shutter and its system
  • Image interference photoetching method using circular grating and gated optical shutter and its system
  • Image interference photoetching method using circular grating and gated optical shutter and its system

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Embodiment Construction

[0021] Such as figure 1 As shown, the imaging interference lithography system using a ring grating and a gate shutter of the present invention includes a laser 1, a beam expander 2, a spatial filter 3, a beam expander system 4, a gate shutter 5, a ring grating 6, and a mask 7 , imaging lens 8, resist substrate 9, shutter control power supply 10, the laser beam that laser 1 sends becomes uniform plane wave through beam expander 2, spatial filter 3 and collimation system 4, and this plane wave passes through by shutter control power supply The shutter selected to be opened on the gate shutter 5 controlled by 10 irradiates the corresponding part on the ring grating 6 behind the shutter, and the mask 7 is illuminated vertically through the central light-transmitting hole on the ring grating 6, and the photoresist substrate is resisted by the imaging lens 8. Film 9 was exposed. The first-order diffracted light (+1 order or -1 order) diffracted by the ring grating biases the illumi...

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Abstract

The present invention relates to an imaging interference photoetching method by adopting circular grating and gated shutter. It is characterized by that it adopts circular grating and gated shutter device to provide illumination perpendicular to mask plane, X-directional bias illumination and Y-directional bias illumination for triple exposure imaging interference photoetching process so as to implement triple exposure required for imaging interference photoetching process.

Description

technical field [0001] The invention relates to an imaging interference lithography method and system using a ring grating and a gate shutter, which belongs to the improvement of the imaging interference lithography technology for producing fine patterns. Background technique [0002] Imaging interference lithography is a new type of lithography technology that improves the resolution of lithography. Generally, imaging interference lithography requires three exposures. The system generally consists of a laser, a beam expander collimator, a beam splitter, a mirror, and a mask. and imaging devices. Literature Stener R.J.Brueck, Imaging Interfernmetric Lithography, Microlithography World, Winter 1998, 2-11 and Literature Xiaolan Chen and S.R.J.Brueck, Imaging Interferometric Lithography: A Wavelength Division Multiplex Approach to Extending Optical Lithography, J.Vac.Sci.Technol: 3 , Nov / Dec.1998 introduced the imaging interference lithography technology, but only discussed th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B5/18G02B27/60
Inventor 张锦冯伯儒
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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