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Projection system of photoetching machine and method for eliminating smear generated in exposure process

A technology of lithography machine and main control system, which is applied in the direction of microlithography exposure equipment, photomechanical equipment, photoplate making process exposure device, etc., can solve the problems affecting the quality of exposure, and achieve the effect of good graphic quality and clear lines

Inactive Publication Date: 2019-07-02
SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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Problems solved by technology

[0003] During the exposure process, the laser is turned on, and the DMD control board that controls the DMD projection sends a synchronization signal to control the flipping of the DMD lens to realize the projection, and the substrate platform moves to realize the exposure of the PCB board on the substrate platform. However, during the exposure process , the laser is always on, and the DMD micromirror array is in the process of flipping, the projected graphics always exist, and smears will be formed on the PCB board, which will affect the quality of exposure

Method used

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  • Projection system of photoetching machine and method for eliminating smear generated in exposure process
  • Projection system of photoetching machine and method for eliminating smear generated in exposure process

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[0020] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] See figure 1 , the projection system of the lithography machine, including the main control system 1 and the electronically connected with the main control system 1:

[0022] Substrate platform 2, for placing PCB board 9;

[0023] The platform controller 3, the platform controller 3 includes a linear motor driver and a linear motor, which are used to control the displacement of the substrate platform 2, and the platform controller 3 can control the mov...

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Abstract

The invention provides a projection system of a photoetching machine, and also provides a method for eliminating smear generated in an exposure process by adopting the projection system of the photoetching machine. While a DMD control panel sends a projection synchronization pulse signal to control a DMD micromirror array to overturn, the image projection synchronous pulse signal is synchronouslysent to a laser controller, and the laser controller synchronously controls laser emission according to the image projection synchronous pulse signal, so that an obtained exposed image is clear and sharp, and the exposure quality is good.

Description

technical field [0001] The invention relates to the technical field of direct-writing lithography machines, in particular to a projection system of a lithography machine and a method for eliminating smear generated during exposure. Background technique [0002] DMD (Digital Micromirror Device, digital micromirror device) is an important part of the optical system of PCB lithography equipment. It is a device that uses digital voltage signals to control micromirrors to perform mechanical movements to achieve optical functions. It consists of a large number of tiny reflective lenses. , forming a micromirror array, and each micromirror is suspended on a separate static RAM. According to whether 1 or 0 is written into the SDRAM, each can be rotated around an axis to +12 degrees or -12 degrees, so that the The light of the DMD can be reflected in two directions according to the direction of the micromirror to realize the spatial modulation of the light. The DMD-based lithography m...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70025G03F7/70275
Inventor 张峰张雷李伟成
Owner SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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