Mask plate, manufacturing method and device of mask plate and using method of mask plate

A technology of mask plate and light-transmitting area, which is applied in the field of mask plate, its manufacturing method, and manufacturing device, and can solve the problems of low yield and the like

Active Publication Date: 2015-12-09
BOE TECH GRP CO LTD +1
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the problem of low product yield, the present invention provides a mask and its manufacturing method, manufacturing device, and mask using method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate, manufacturing method and device of mask plate and using method of mask plate
  • Mask plate, manufacturing method and device of mask plate and using method of mask plate
  • Mask plate, manufacturing method and device of mask plate and using method of mask plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0093] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0094] An embodiment of the present invention provides a method for manufacturing a mask, such as diagram 2-1 As shown, the method includes:

[0095] Step 201 , forming a light-transmitting area on the opaque substrate, the area on the light-tight substrate except the light-transmitting area is a light-shielding area, and the opening edge of the light-transmitting area is tooth-shaped.

[0096] To sum up, in the manufacturing method of the mask plate provided by the embodiment of the present invention, since the light-transmitting region is formed on the opaque substrate of the mask plate, the edge of the opening of the light-transmitting region is tooth-shaped, compared with the current With technology, the transition from the light...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a mask plate, a manufacturing method and device of the mask plate and a using method of the mask plate, and belongs to the display technical field. The manufacturing method includes the step that a light transmitting area is formed on a light-proof substrate, the area, except the light transmitting area, of the light-proof substrate is a light blocking area, and the edge of an opening of the light transmitting area is in a tooth shape. The problem that the yield rate of products is low is solved, the effect of increasing the yield rate of the products is achieved, and the mask plate, the manufacturing method and device of the mask plate and the using method of the mask plate are used for a display device.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a mask, its manufacturing method, manufacturing device, and a method for using the mask. Background technique [0002] Liquid Crystal Display (English: LiquidCystalDisplay; Abbreviation: LCD) is a flat and ultra-thin display device. In the photolithography process of LCD, it is necessary to use a mask plate for pattern making. [0003] There is a mask plate in the prior art, the structure of the mask plate is as follows figure 1 As shown, it includes a light-shielding area 01 and a light-transmitting area 02, and the opening edge of the light-transmitting area 02 is circular. The process of using a mask to make graphics is: using an electron beam or laser as a light source, exposing the light source to the substrate coated with photoresist through the mask, and the photoresist on the substrate is exposed to light. , and then develop and etch to form graphics. Since t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/29
Inventor 万冀豫杨同华姜晶晶张思凯冯贺
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap