Transmission-type spectro-grating and interference lithography system

A spectroscopic grating and transmissive technology, applied in the field of lithography, can solve problems such as manufacturing difficulty and cost increase, poor graphic quality, limited lithographic format, etc., and achieve the effect of pixelation control, graphic quality improvement, and simple and reliable structure

Inactive Publication Date: 2013-12-04
SUZHOU UNIV
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Problems solved by technology

Generally suitable for optical laboratories, not for optical processing equipment
Second, the lithography format is limited
If the aperture of the beam expander is to be increased, the manufacturing difficulty and cost will increase significantly
Third, the pattern quality of the edge of the photolithographic area is poor
[0018] First: ±1 order diffraction efficiency needs to be improved
Second: Sufficient suppression of useless diffraction orders (orders 0 and above 2) cannot be achieved
Its exposure area is not easy to achieve precise splicing exposure, which limits the solution's application in large-format lithography

Method used

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  • Transmission-type spectro-grating and interference lithography system
  • Transmission-type spectro-grating and interference lithography system
  • Transmission-type spectro-grating and interference lithography system

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Embodiment Construction

[0054] As mentioned in the background technology, in the existing interference lithography process, when a diffraction grating is used as a spectroscopic device, due to the defects of low diffraction efficiency of the diffraction grating and insufficient suppression of useless diffraction orders, the interference image during exposure has irregular fringes. Issues with sharpness and edge distortion.

[0055] Therefore the object of the present invention is to propose a kind of transmission type spectroscopic grating applied in the interference lithography process and the interference lithography technology using the spectroscopic grating, the transmission type spectroscopic grating can improve the ±1st order diffraction efficiency of the diffraction grating, Suppressing the diffracted light energy of other orders, especially the efficiency of 0-order light and ±2-order light, makes the ±1-order diffraction efficiency of the grating reach more than 92%, which is obviously better...

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Abstract

Provided are a transmission-type spectro-grating and an interference lithography system. The transmission-type spectro-grating comprises a grating groove-shaped area placed on an incident plane and a light blocking area placed on the periphery of the grating groove-shaped area. The grating groove-shaped area comprises a stair-shaped grating structure, and the stair-shaped grating structure is provided with a transmission stair plane and a non-transmission area. The transmission-type spectro-grating can achieve maximum modulation to +/-1 level light, beam splitting light which is transmitted out is made to have the highest energy utilization rate, and an interference pattern obtained through the transmission-type spectro-grating has good border quality, is capable of achieving conducting of precise splicing patterns, and enables a large-size interference lithography technology to be improved obviously.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a spectroscopic grating used in the interference photolithography technology and an interference photolithography system formed by using the spectroscopic grating. Background technique [0002] Interference lithography is an important branch of lithography, which has received extensive attention in recent years. The main advantage of interference lithography is the high pattern resolution that can be achieved. When the wavelength λ and numerical aperture NA of the optical system are fixed, the minimum linewidth that the interference optical system can obtain is λ / (4NA), which is 1 / 2 of the ordinary projection imaging optical system. In addition, the optical path of interference lithography is simple, and the pattern produced has accurate cycle and good uniformity. [0003] There are two typical optical path schemes in interference lithography. Optical path scheme one ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G03F7/20
CPCG02B27/1086G02B5/1842G02B5/1866G03F7/70408
Inventor 胡进浦东林陈林森
Owner SUZHOU UNIV
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