Laser interference lithography system with pattern locking function

Abstract

A laser interference lithography system with a pattern locking function comprises a laser, a reflector, a beam splitter, a substrate stage, a substrate and a pattern locking device. A laser beam emitted by the laser is split into an exposure beam and a reference beam by a spectroscope; the exposure beam passes through the beam splitter, and is reflected to the substrate on the substrate stage by the reflector to realize interference; the interference patterns can realize pattern record transfer by exposing the substrate; and the patterns are locked by the pattern locking device to prevent pattern drift during exposure. The pattern locking device includes a null phase meter, an electronic signal processing component, a controller, a driver and a phase modulation executing, wherein the null phase meter is used for measuring pattern phase drift; the pattern phase drift is fed back to the controller through the signal processing component; and the controller controls the phase modulation executer to realize phase locking through the driver. The laser interference lithography system provided by the invention has the advantages of simple structure, high pattern locking accuracy and the like, and is a key system for realizing large-area high-accuracy grating fabrication.

Description

technical field [0001] The invention relates to a laser interference lithography system with pattern locking function, in particular to an interference lithography system for manufacturing large-area gratings. Background technique [0002] Laser interference lithography is an important technology for manufacturing micro-nano array devices using periodic pattern exposure of photosensitive substrates generated by two or more laser interferences. Arrays, gratings, microlens arrays and other devices, these microarray devices are widely used in national defense, people's livelihood, scientific research and other fields. [0003] In recent years, with the continuous improvement of the size, grating line density, and precision requirements of key grating devices in major engineering systems such as large astronomical telescopes, inertial confinement fusion laser ignition systems, and lithography systems, grating manufacturing is moving towards meter-scale, Nano-scale precision, su...

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Problems solved by technology

Suzhou Sudaweige Optoelectronics Technology Co., Ltd. discloses a parallel interference lithography system in the Chinese patent publication number CN101846890. The lithography system uses a grating to split light and a lens to combine light, but there is no interference pattern phase locking in the interference lithography system. device, so the laser interference lithography system is also difficult to realize the fabrication of large-area high-precision gratings

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