94 results about "Laser interference lithography" patented technology

A method for forming an electrochromic layer pattern includes forming a transparent electrode layer and a photoresist layer on a transparent substrate, forming a photoresist pattern by laser interference lithography, and depositing an electrochromic layer pattern on the transparent electrode through openings defined by the photoresist pattern by depositing an electrochromic layer on a front surface of the substrate and then lifting up the photoresist pattern. An insulation layer may be further formed between the transparent layer and the photoresist layer. Here, the electrochromic layer may be formed after an insulation layer pattern is formed using the photoresist pattern as an etching mask. In this case, the electrochromic layer pattern is formed in openings defined by the insulation layer pattern. As a result, a contact surface area between the electrochromic layer pattern and the ion conductive layer is increased to ensure a rapid response speed.

The laser interference photo-etching method with holographic optical element is characterized in that: use holographic optical element as beam amplitude division element to divide the laser beam to two beams of almost equal strength and angle divided; reflect to make them intersect; on the intersect overlap area, expose the resister basal plate to produce high resolution grating, form minuteness interference image; holographic optical element is element that can produce tri-beam, quad-beam, or quint-beam, or holographic image produced by computer, or diffraction optic element; laser interference photo-etching system realized aforementioned method comprises a laser of ª™-wave, beam expand collimating device, timer shutter, variable density neutral color filter, holographic optical element, adjustable diaphragm, holophote, optical attenuator, basal plate and electric control roller. As the preparation of holographic optical element is easy, with light weight, and can made with low cost according to different angle to adjust different needs, this invention can decrease size, weight and cost of the system, of far reaching importance and application future.

The invention belongs to the technical field of electronics, and particularly relates to a method for preparing a micro-nano structure on a material surface based on laser interference photolithography. The micro-nano structure is formed on photoresist by generation of laser interference, so as to transfer the micro-nano structure on the photoresist to the material surface of a substrate with an etching method, and form the structures such as micro-nano-scale gratings, dot matrixes and linear arrays. By adoption of the method disclosed by the invention, high-quality nano structures can be produced in a large area on various material surfaces. The method disclosed by the invention is simple and convenient, is low in cost and has a great application value.

The invention discloses a method for shifting a phase in laser interference nano lithography. The method is characterized in that in two-beam or multi-beam laser interference lithography, two or more coherent laser beams are combined for interference, and one or more phase-shift locating systems are controlled to change the optical distance of an optical path and shift and locate the phase of interference graphics. In the method, the phase-shift locating system comprises a voltage source, a displacement driver and a reflector, and different voltages are applied to the displacement driver so that the reflector also moves along the axial direction thereof to shift and locate the phase. The phase-shift locating system can also push an optical wedge in a plane direction perpendicular to incoming light by changing the voltage of the voltage source or control an LCD (Liquid Crystal Display) in the plane direction perpendicular to the incoming light by changing the voltage of the voltage source or control the driver to draw optical fiber to shift the phase of the interference graphics by changing the voltage of the voltage source. The phase-shift method can detect the phase difference of the interference graphics, control the phase shift of the interference graphics by adopting feedback (such as phase locking) and lessen phase shift to more accurately locate the graphics.

The invention discloses methods for manufacturing a micro / nano scale pattern stamping die to solve the problems that a laser interference photo-etched die is not exquisite enough in pattern scale, the speed is too low when high-precision patterns are manufactured through electron beam photo-etching, and the electron beam photo-etching is not suitable for large-area manufacture, and belongs to stamping die finish machining methods. One of the methods sequentially includes the steps of electron beam photo-etching, primary dry etching, laser interference etching, secondary dry etching, nanometer stamping and micro-electroforming. The other method sequentially includes the steps of laser interference etching, primary dry etching, electron beam etching, secondary dry etching, nanometer stamping and micro-electroforming. The advantage that electron beam etching is exquisite in manufacture and the advantages that the laser interference etching is low in cost and large in width of a manufactured die are combined, nano scale patterns and micro scale patterns are manufactured at different positions of the stamping die, the expressive force of the manufactured patterns is far better than the expressive force of patterns manufactured through traditional laser interference etching, and the anti-counterfeiting capacity of holographic anti-counterfeiting marks and other products with stamped patterns is improved.

The invention discloses a laser interference lithographic system, which comprises at least two lens groups. The lens group comprises a beam splitter, a first completely reflecting mirror and a second completely reflecting mirror. The beam splitter of the lens group is positioned on the main optical axis of incident light. Different lens groups are positioned at different positions of the main optical axis. After passing through the beam splitter of each lens group, the incident light generates reflected light and transmitted light, wherein the reflected light irradiates interference points of a sample to be lithographed after being reflected by the first and second completely reflecting mirrors of the current lens group; and the transmitted light is taken as the incident light of the lens group adjacent to the current lens group. In the laser interference lithographic system provided by the invention, angles of incident planes of interference light can be randomly adjusted about the main optical axis of the incident light so as to greatly widen the adjustment range of the angles of the incident planes of the interference light and meet the diversity of interference patterns.

In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.

The invention discloses a method for preparing micro-nano textures through ultrasonic vibration and belongs to a preparation method of silicon surface micro-nano textures. The method comprises the following steps: firstly, uniformly coating a layer of photo-etching glue on the surface of a substrate by using a glue homogenizer; then carrying out interferential exposure on the substrate with the photo-etching glue in a laser interferometer system to realize texturing treatment on the photo-etching glue; and finally machining the substrate in an ultrasonic machining system, removing the substrate material in an area which is not covered by the photo-etching glue, gradually increasing the removal depth along with the increase of the ultrasonic machining time, controlling exposure parameters of laser interference photo-etching and ultrasonic vibration machining parameters to prepare periodic micro-nano textures which are controllable in size and large in area. The method for preparing the micro-nano textures through ultrasonic vibration has the advantages that the method is pollution-free due to the adoption of ultrasonic vibration machining, simple to operate, free of damage to the photo-etching glue layer on the surface of the substrate and good in pattern transfer effect; by changing the size of a vibration tool, different areas can be machined; by means of the ultrasonic vibration, the machining accuracy is high and the surface quality is good; the substrate is relatively small in stress in the machining process.

The invention relates to a method for preparing a low-friction and high-hardness artificial hip joint ball through surface patterning. The low-friction and high-hardness artificial hip joint ball is made from a CO-Cr-Mo alloy material, and the method is characterized in that patterned dimple arrays are formed on the surface of the artificial hip joint ball, namely the patterned dimple arrays are made on the friction surface of the artificial hip joint ball through laser interferometric lithography to form a small temporary synovial fluid or tissue fluid storage device, and meanwhile the actual contact area between friction pairs is decreased and abrasive grains produced in the friction process are accommodated to achieve the friction-reducing purpose. The instantaneous high temperature of laser enables the grains to be refined, the material hardness is enhanced, and the artificial hip joint with low friction and high hardness is obtained. The low-friction and high-hardness artificial hip joint ball has good lubricating property and can reduce the friction effect between interfaces of the friction pairs of the artificial hip joint and reduce friction. In addition, the hardness is improved, the abrasion is reduced, and the friction and abrasion resisting performance of an existing artificial hip joint ball is optimized.