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Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology

A technology of laser interference lithography and surface structure, applied in laser welding equipment, microlithography exposure equipment, manufacturing tools, etc., can solve the problem of template pattern shape fixation, and achieve good controllability

Inactive Publication Date: 2010-09-29
CHANGCHUN UNIV OF SCI & TECH +1
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  • Abstract
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Problems solved by technology

The disadvantage of this technique is that it can only be used on a clean plane, and its stencil pattern shape is fixed

Method used

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  • Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology
  • Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology
  • Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology

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Embodiment Construction

[0028] Such as figure 1 As shown, the fabrication system of the self-cleaning surface structure adopting laser interference lithography of the present invention comprises a laser 1, a beam expander 2, a collimation system 3, a reflector 4, a polarization device 5, a beam splitting and refraction system 6, and a base slice 7. After the laser beam emitted by the laser 1 is expanded 2 and collimated 3, the optical path is refracted by the reflector 4, and the beam is converted into linearly polarized light by the polarizing device 5, and then the laser beam is divided into multiple coherent light beams, and then control each optical path of the multiple beams of light separately so that they are irradiated onto the substrate 7 at a certain incident angle at the same time. Erosion material surface, produce micron or nanoscale dense columnar or conical relief structure in a large area, forming a self-cleaning surface structure.

[0029] The beam splitting function in the beam spl...

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Abstract

The invention relates to method and system for manufacturing a self-cleaning surface structure by adopting a laser interference photolithography technology. The method is characterized in that a plurality of coherent laser beams are combined by using a laser interference photolithography system, weakness modulation is carried out on light intensity distribution in an interference field, redistributed laser energy after modulation is used for ablating the surface of optics materials, and a micron-size or nanoscale dense cylindrical or conical anaglyph structure is generated within a large area range, thereby obtaining a super-hydrophobic film, greatly lowering the viscous phenomenon, benefiting to attachments including dusts, liquid and the like on the surface of the materials detaching from the surface of the materials and fulfilling a self-cleaning function. Without external materials, the self-cleaning fine structure generated on the surface of the materials is more stable and durable and can continuously regulate the period and the size from the nanoscale to the micron size by regulating an incidence angle of the interference photolithography system to enable dual structure of nanometer, micro and micro nanometer to become possible.

Description

technical field [0001] The invention relates to a method and system for fabricating self-cleaning surface structures of materials by using laser interference photolithography technology, which belongs to the improvement of the bionic self-cleaning surface structure preparation technology. technical background [0002] At present, one of the anti-contamination methods often used in buildings is to use low surface energy materials and coat them on the surface of buildings, so that it is difficult for pollutants to adhere stably to the surface of the paint film. Some self-cleaning tempered glass also uses TiO 2 Composite solution spraying method. However, since the materials of these self-cleaning films are different from those of the base materials, their different chemical and physical properties will lead to their limited adhesion and durability. Moreover, in the process of tempered glass manufacturing, after different temperature treatments, the crystal form of the self-c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/00G03F7/20B23K26/362
Inventor 王作斌张锦宋正勋翁占坤徐佳刘国强
Owner CHANGCHUN UNIV OF SCI & TECH
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