Method for preparing filter membrane mesh structure by laser interference photoetching technology

A technology of laser interference lithography and filter film, which is applied in microlithography exposure equipment, photolithographic process exposure devices, etc., can solve the problems of high cost, poor controllability of mesh structure parameters, complicated manufacturing process, etc. Simple, process saving, controllable structural parameters

Active Publication Date: 2013-02-20
CHANGCHUN UNIV OF SCI & TECH
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Problems solved by technology

The above methods for making the mesh structure of the filter membrane are all directly prepared by chemical and physical methods, which makes the parameters of the mesh structure poorly controllable, and the manufacturing process is complicated or the cost is high.

Method used

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  • Method for preparing filter membrane mesh structure by laser interference photoetching technology
  • Method for preparing filter membrane mesh structure by laser interference photoetching technology

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Embodiment Construction

[0024] Such as figure 1 shown by figure 1 The system shown uses a combination of four laser beams to create a filter membrane mesh structure on the surface of a substrate material. The four beams of coherent light emitted by the beam splitting and refracting system 6 interfere with each other and expose the substrate 7 to form a filter membrane mesh structure. figure 2 For this system, the four-beam laser interference nanolithography method is used to make the atomic force microscope image of the filter membrane mesh. For the method of forming a specific large-area mesh structure, after expanding the beam on the basis of satisfying the allowable range of the light energy threshold, combined with the moving substrate workpiece table 8 or the interference optical system 6, the substrate 7 is scanned and exposed with a multi-beam interference pattern, Form a large-area filter membrane mesh structure.

[0025] The method of forming a specific high-density filter membrane mesh ...

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Abstract

The invention discloses a method and a system for preparing a filter membrane mesh structure by laser interference photoetching technology. The system can generate images with different intervals by different exposure methods of the laser interference photoetching technology. A photoetched image is generated by regulating and controlling light intensity distribution in an interference field by a specified light beam combination method, and ablating the surface of a processed material by using modulated redistributed laser energy. The system consists of a laser, a beam expander, a beam splitter, a reflecting mirror, a polaroid and a mechanism for clamping and regulating the optical elements and devices. By changing the relative arrangement position of the optical devices, an incident angle of a related light beam which is irradiated on the surface of a substrate material is changed so as to regulate parameters of a micro-mesh structure of the surface of the processed material. The system can realize adjustability of photoetching characteristic sizes from nanometers to hundreds of microns. By optical phase shifting or mechanical shifting of a sample, repeated exposure or repeated exposure interpolation, a high-density micro-nano filter membrane mesh structure can be prepared.

Description

technical field [0001] The invention relates to a method and a system for manufacturing a filter membrane mesh structure, which belongs to the improvement and expansion of the filter membrane preparation technology. technical background [0002] Membrane filtration technology has great application value in drug screening, water quality monitoring, environmental engineering and so on. The core element of this technology is a large number of mesh structures with strong size selectivity, which can play the role of microfiltration, ultrafiltration and nanofiltration according to different needs. [0003] The current filter membranes are classified according to the size of the particles that can intercept raw water. The membrane pores are divided into microfiltration membrane (MF), ultrafiltration membrane (UF), nanofiltration membrane (NF) and reverse osmosis membrane (RO) from coarse to fine. There are three types of molding materials: fiber, synthetic resin and ceramic. Fibe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 刘洋王作斌赵乐刘兰娇徐佳侯煜翁占坤宋正勋胡贞
Owner CHANGCHUN UNIV OF SCI & TECH
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