Laser interference lithographic system

Abstract

The invention discloses a laser interference lithographic system, which comprises at least two lens groups. The lens group comprises a beam splitter, a first completely reflecting mirror and a second completely reflecting mirror. The beam splitter of the lens group is positioned on the main optical axis of incident light. Different lens groups are positioned at different positions of the main optical axis. After passing through the beam splitter of each lens group, the incident light generates reflected light and transmitted light, wherein the reflected light irradiates interference points of a sample to be lithographed after being reflected by the first and second completely reflecting mirrors of the current lens group; and the transmitted light is taken as the incident light of the lens group adjacent to the current lens group. In the laser interference lithographic system provided by the invention, angles of incident planes of interference light can be randomly adjusted about the main optical axis of the incident light so as to greatly widen the adjustment range of the angles of the incident planes of the interference light and meet the diversity of interference patterns.

Description

technical field [0001] The invention relates to the field of micro-nano structure manufacturing, in particular to a laser interference lithography system. Background technique [0002] Surface periodic micro-nano structure, as a cutting-edge technology, has shown attractive application prospects in many fields, such as anti-reflection, light trapping, waterproof self-cleaning, photonic crystals, etc. The methods for making such surface periodic micro-nano structures usually include electron beam etching and nanoimprint lithography, but these two methods are often costly and expensive, and cannot be prepared in a large area or the prepared surface structure is not fine enough; and Laser interference lithography can produce surface periodic micro-nano structures in a large area at a lower cost. [0003] The basic principle of laser interference lithography is to use two or more beams of coherent laser beams to superimpose and irradiate the surface of the sample to generate an...

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Problems solved by technology

[0005] However, the laser interference lithography system in the prior art has the following disadvantages: one is that the beam splitter of the system is far away from the main optical axis, and the optical path system is relatively complicated; the other is that the system is connected to the driving device in order to avoid blocking the incident light The wheel 2 is designed in a fan shape, resulting in a small adjustment range of the interference beam angle, which limits the diversity of interference patterns

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