Quick controllable manufacturing method of large-area micron/nanometer texture on metal material surface

A metal material and nano-texture technology, applied in the direction of manufacturing tools, metal processing equipment, accessory devices, etc., can solve the problems of prolonging the process cycle and material waste, and achieve the effects of avoiding expensive prices, reducing processing costs, and shortening the processing cycle

Inactive Publication Date: 2015-11-25
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the characteristic parameters of the desired texture need to be changed, if the traditional TMECM process is used, the mask must be remade, which not only causes waste of materials, but also greatly prolongs the process cycle

Method used

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  • Quick controllable manufacturing method of large-area micron/nanometer texture on metal material surface
  • Quick controllable manufacturing method of large-area micron/nanometer texture on metal material surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] A controllable manufacturing method of a large-area micro-texture on the surface of a metal material of the present invention, such as figure 1 As shown, it can be divided into two parts: laser interference lithography and micro electrolytic processing, which specifically includes the following steps.

[0025] (1) Substrate pretreatment. The material of the substrate 1 is 304 stainless steel, which is ultrasonically cleaned in acetone, alcohol and deionized water for 5 minutes to remove oil stains and other dust impurities on the surface. Then, place it in a vacuum drying oven at 150° C. and bake for 10 minutes to ensure that its surface is relatively dry, which is beneficial to better bonding of the photoresist 2 and the surface of the substrate 1 .

[0026] (2) Gluing and pre-baking. The positive photoresist model AR-P3740 was selected, and the photoresist 2 was uniformly coated on the surface of the substrate 1 at a speed of 4000 rpm by using a high-speed coater, a...

Embodiment 2

[0032] (1) Substrate pretreatment. The material of the substrate 1 is TC1 titanium alloy, which is ultrasonically cleaned in acetone, alcohol and deionized water for 5 minutes to remove oil stains and other dust impurities on the surface. Then, place it in a vacuum drying oven at 150° C. and bake for 10 minutes to ensure that its surface is relatively dry, which is beneficial to better bonding of the photoresist 2 and the surface of the substrate 1 .

[0033](2) Gluing and pre-baking. The positive photoresist model AR-P3740 was selected, and the photoresist 2 was uniformly coated on the surface of the substrate 1 at a speed of 4000 rpm by using a high-speed coater, and the thickness of the obtained film was 1.4 μm. Then, the substrate 1 was pre-baked on a hot plate at 100° C. for 1 min.

[0034] (3) Interference exposure. The laser is an ultraviolet laser with a wavelength of 365nm, the incident angle is adjusted to 30°, and the exposure is set to 80mJ / cm 2 , the substrate...

Embodiment 3

[0039] The preparation steps are the same as in Example 2. In step 3), the three-beam laser is replaced by a four-beam laser. The photoresist film pattern on the surface of the substrate after development is shown in figure 2 (c) shown.

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Abstract

The invention provides a quick controllable manufacturing method of a large-area micron/nanometer texture on a metal material surface; and the method realizes the preparation of simple-complex, large-area and controllable-size micron/nanometer structures on metal surfaces with low cost and high efficiency through combining with the characteristic that the laser interference photoetching and the micro electrolytic machining both can reach submicron-level and nanometer-level resolutions and by using the characteristics that the laser interference photoetching is easy to realize large-area exposure and the micro electrolytic machining can machine all electric conducting materials. The method can reduce the machining cost and largely shorten the machining period, and has significant meaning on the research of tribological properties of textured surfaces.

Description

technical field [0001] The invention relates to the field of photolithography / micro-electrochemical processing, in particular to a rapid and controllable manufacturing method for large-area micro / nano textures on the surface of metal materials. Background technique [0002] The friction and wear of parts is the main factor affecting the performance and reliability of mechanical systems. According to survey statistics, about 80% of component failures are caused by various forms of mechanical friction and wear. Therefore, the key to ensuring the function and service life of the mechanical system is how to reduce the friction and wear between components. The research found that surface texturing technology is an effective means to improve the tribological properties of the material surface. With the continuous miniaturization of mechanical systems, the demand for surface texture feature size is gradually reduced to micron, submicron and even nanoscale. In mechanical systems,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23H5/06B23H11/00
CPCB23H5/06B23H11/00
Inventor 贺海东曲宁松曾永彬
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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